Patents by Inventor Zhongli Ma

Zhongli Ma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220185775
    Abstract: Provided in the present invention is a novel diaroyl carbazole compound, used together with a carbazolyl oxime ester photo initiator to show a significant synergistic initiation effect in a photoresist composition; the best sensitising effect is shown when the molar ratio of the diaroyl carbazole compound and the carbazolyl oxime ester photoinitiator is 0.1-1.
    Type: Application
    Filed: March 17, 2020
    Publication date: June 16, 2022
    Applicant: IGM (ANQING) HIGH TECHNOLOGY DEVELOPMENT CO., LTD.
    Inventors: Wenchao Zhao, Jiaqi Li, Zhongli Ma, Chenlong Wang, Yonglin Wang
  • Patent number: 9409861
    Abstract: The present invention provides a photocurable composition prepared using mercapto benzophenone compounds as key raw materials. The present invention aims to solve the problems existing in the prior photo-curing technology that low-molecular photoinitiators are easy to remain and migrate, while macromolecular photoinitiators has low initiation efficiency due to a low content of effective components and also has the problem of certain migration. The photocurable composition in the present invention can be easily prepared and has high addition efficiency with ethylenically unsaturated compounds, and the photocurable composition obtained by addition has no residual mercapto and has features of high initiation activity and zero migration rates when it is used in photocurable coatings, binder and ink formula.
    Type: Grant
    Filed: May 14, 2015
    Date of Patent: August 9, 2016
    Assignee: Insight High Technology (Beijing) Co. Ltd.
    Inventors: Wenchao Zhao, Zhongli Ma, Jiaqi Li, Lixiu Yao, Jue Zhang, Weijing Hu, Jing Li, Yonglin Wang
  • Publication number: 20150246878
    Abstract: The present invention provides a photocurable composition prepared using mercapto benzophenone compounds as key raw materials. The present invention aims to solve the problems existing in the prior photo-curing technology that low-molecular photoinitiators are easy to remain and migrate, while macromolecular photoinitiators has low initiation efficiency due to a low content of effective components and also has the problem of certain migration. The photocurable composition in the present invention can be easily prepared and has high addition efficiency with ethylenically unsaturated compounds, and the photocurable composition obtained by addition has no residual mercapto and has features of high initiation activity and zero migration rates when it is used in photocurable coatings, binder and ink formula.
    Type: Application
    Filed: May 14, 2015
    Publication date: September 3, 2015
    Inventors: Wenchao ZHAO, Zhongli MA, Jiaqi LI, Lixiu YAO, Jue ZHANG, Weijing HU, Jing LI, Yonglin WANG
  • Patent number: 9061979
    Abstract: The present invention provides a photocurable composition prepared using mercapto benzophenone compounds as key raw materials. The present invention aims to solve the problems existing in the prior photo-curing technology that low-molecular photoinitiators are easy to remain and migrate, while macromolecular photoinitiators has low initiation efficiency due to a low content of effective components and also has the problem of certain migration. The photocurable composition in the present invention can be easily prepared and has high addition efficiency with ethylenically unsaturated compounds, and the photocurable composition obtained by addition has no residual mercapto and has features of high initiation activity and zero migration rates when it is used in photocurable coatings, binder and ink formula.
    Type: Grant
    Filed: February 7, 2013
    Date of Patent: June 23, 2015
    Assignee: Insight High Technology (Beijing) Co. Ltd.
    Inventors: Wenchao Zhao, Zhongli Ma, Jiaqi Li, Lixiu Yao, Jue Zhang, Weijing Hu, Jing Li, Yonglin Wang