Abstract: A test structure and a test method are provided. The test structure includes: a first interdigital structure including first and second conductive comb tooth portions, where comb tooth ends of the second and first conductive comb tooth portions are arranged alternately in sequence and spaced apart and there is a first distance between the comb tooth ends of the second and first conductive comb tooth portions; and a second interdigital structure including third and fourth conductive comb tooth portions, where comb tooth ends of the fourth and third conductive comb tooth portions are arranged alternately in sequence and spaced apart; there is a second distance between the comb tooth ends of the fourth and third conductive comb tooth portions, which is not equal to the first distance; and the first and second conductive comb tooth portions are electrically connected to the third and fourth conductive comb tooth portions respectively.

Abstract: Provided are a formation method of a photomask and a photomask. The formation method of a photomask comprises: providing a substrate, the substrate having chip regions, as well as a first scribe line and a second scribe line which are located on two opposite sides of the chip region; and forming a first set of marks in the first scribe line and forming a second set of marks in the second scribe line, the first set of marks comprising first sub-mark sets and first spaces which are alternately arranged along an extension direction of the first scribe line, the second set of marks comprising second sub-mark sets and second spaces which are alternately arranged along an extension direction of the second scribe line, the first sub-mark set and the second space being in alignment arrangement, the second sub-mark set and the first space being in alignment arrangement.