Abstract: The present invention relates to a graphene oxide material, a halogenated graphene material, preparation methods therefor, and an electrolysis system. A method for producing a graphene oxide material in an electrolysis system comprises the following steps: applying a voltage between a working electrode and a counter electrode, and exfoliating graphite and/or amorphous carbon under the action of electrolysis so as to generate the graphene oxide material, wherein before applying the voltage and/or in the process of applying the voltage, light irradiation is performed on the electrolysis system.

Abstract: An objective lens, an optical imaging device, an optical system, and a test method of the optical system, relating to the field of optical testing. The purpose is to optimize the structure of the objective lens. The objective lens comprises a housing and an optical focusing assembly. The housing comprises a cavity, and the cavity is provided with a first opening and a second opening. The optical focusing assembly is mounted in the cavity, the focal point of the optical focusing assembly is located at the second opening, and the optical focusing assembly is configured to focus light entering the housing from the first opening a to the focal point. The optical focusing assembly in the objective lens focuses light on the basis of one of the reflection principle and the refraction principle.

Abstract: The present invention relates to a graphene oxide material, a halogenated graphene material, preparation methods therefor, and an electrolysis system. A method for producing a graphene oxide material in an electrolysis system comprises the following steps: applying a voltage between a working electrode and a counter electrode, and exfoliating graphite and/or amorphous carbon under the action of electrolysis so as to generate the graphene oxide material, wherein before applying the voltage and/or in the process of applying the voltage, light irradiation is performed on the electrolysis system.

Abstract: The present invention provides a nano-presion photo/electrochemical planarization and polishing method and an apparatus therefor. The method comprises through electrochemical, photochemical or photoelectrochemical means, an etchant being generated on a surface of a tool electrode which has a nanometer-sized planeness; the generated etchant reacting with a scavenger contained in an working electrolyte solution, or decaying itself in the working electrolyte solution, such that a confined etchant liquid layer is generated on the tool electrode surface and having a confined thickness of nanoscale; and by a chemical reaction between the etchant contained in the confined etchant liquid layer and a surface of a workpiece, the surface of the workpiece being polished or planarized to a nanometer scaled profile precision and surface roughness, thereby, realizing the planarization and polishing in nano-precision for the workpiece.