Patents by Inventor Zhongren JIANG

Zhongren JIANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Liquid chemical vapor recovery device, wet stripping device, photoresist stripping process, and method for manufacturing thin film transistor-liquid crystal display using the same
    Patent number: 11231652
    Abstract: Disclosed is a liquid chemical vapor recovery device, a wet stripping device, a photoresist stripping process and a method for manufacturing a thin film transistor-liquid crystal display using the same. The liquid chemical vapor recovery device comprises: an exhaust pipe for discharging a gas in a processing chamber for wet processing with a liquid chemical, the gas comprising a vapor of the liquid chemical; and a reflux pipe for refluxing the liquid chemical condensed in the exhaust pipe to a liquid chemical storage tank, the reflux pipe having an inlet connected to the exhaust pipe and an outlet connected to the liquid chemical storage tank, wherein, at least a part of the exhaust pipe positioned upstream of the inlet of the reflux pipe is formed as a pipe segment with a rugged inner surface.
    Type: Grant
    Filed: April 13, 2018
    Date of Patent: January 25, 2022
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Qianqian Li, Shikai Wang, Dongseob Kim, Jun Geng, Yadong Liang, Xiaoning Liu, Mingming Wang, Hao Yin, Yadong Xu, Zhongren Jiang
  • LIQUID CHEMICAL VAPOR RECOVERY DEVICE, WET STRIPPING DEVICE, PHOTORESIST STRIPPING PROCESS, AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR-LIQUID CRYSTAL DISPLAY USING THE SAME
    Publication number: 20190064674
    Abstract: Disclosed is a liquid chemical vapor recovery device, a wet stripping device, a photoresist stripping process and a method for manufacturing a thin film transistor-liquid crystal display using the same. The liquid chemical vapor recovery device comprises: an exhaust pipe for discharging a gas in a processing chamber for wet processing with a liquid chemical, the gas comprising a vapor of the liquid chemical; and a reflux pipe for refluxing the liquid chemical condensed in the exhaust pipe to a liquid chemical storage tank, the reflux pipe having an inlet connected to the exhaust pipe and an outlet connected to the liquid chemical storage tank, wherein, at least a part of the exhaust pipe positioned upstream of the inlet of the reflux pipe is formed as a pipe segment with a rugged inner surface.
    Type: Application
    Filed: April 13, 2018
    Publication date: February 28, 2019
    Inventors: Qianqian Li, Hao Yin, Yadong Xu, Mingming Wang, Xiaoning Liu, Yadong Liang, Dongseob Kim, Zhongren Jiang, Jun Geng, Shikai Wang
  • SUBSTRATE PROCESSING APPARATUS
    Publication number: 20180108549
    Abstract: The disclosure provides a substrate processing apparatus. The substrate processing apparatus includes: an etching region and one or more aerosol absorption devices arranged outside a substrate inlet of the etching region. The aerosol absorption device includes one or more spraying pipes. The aerosol absorption device is capable of absorbing the aerosol of the etching solution from the etching region, thereby reducing the damage of the aerosol to the substrate processing components.
    Type: Application
    Filed: February 7, 2017
    Publication date: April 19, 2018
    Inventors: Xiaoning LIU, Shikai WANG, Dongseob KIM, Jun GENG, Zhen HU, Xuanqi LIANG, Feng ZHANG, Tengfei HUANG, Yang PAN, Zhongren JIANG