Patents by Inventor Zhongxin Chen

Zhongxin Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Tribological properties of diamond films
    Patent number: 11894230
    Abstract: Methods to manufacture integrated circuits are described. Nanocrystalline diamond is used as a hard mask in place of amorphous carbon. Provided is a method of processing a substrate in which nanocrystalline diamond is used as a hard mask, wherein processing methods result in a smooth surface. The method involves two processing parts. Two separate nanocrystalline diamond recipes are combined—the first and second recipes are cycled to achieve a nanocrystalline diamond hard mask having high hardness, high modulus, and a smooth surface. In other embodiments, the first recipe is followed by an inert gas plasma smoothening process and then the first recipe is cycled to achieve a high hardness, a high modulus, and a smooth surface.
    Type: Grant
    Filed: January 25, 2023
    Date of Patent: February 6, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Vicknesh Sahmuganathan, Jiteng Gu, Eswaranand Venkatasubramanian, Kian Ping Loh, Abhijit Basu Mallick, John Sudijono, Zhongxin Chen
  • METHOD OF FORMING A DIAMOND FILM
    Publication number: 20230279540
    Abstract: Apparatuses and methods for forming a film on a substrate are described. The film is formed on the substrate by depositing an adamantane monomer and an initiator on the substrate to form a polymerizable seed layer and curing the polymerizable seed layer to form a polyadamantane layer.
    Type: Application
    Filed: December 15, 2021
    Publication date: September 7, 2023
    Applicants: Applied Materials, Inc., National University of Singapore
    Inventors: Vicknesh Sahmuganathan, Jiteng Gu, Zhongxin Chen, Kian Ping Loh, John Sudijono, Haisen Xu, Sze Chieh Tan, Yuanxing Han, Jiecong Tang, Eswaranand Venkatasubramanian, Abhijit Basu Mallick
  • TRIBOLOGICAL PROPERTIES OF DIAMOND FILMS
    Publication number: 20230170217
    Abstract: Methods to manufacture integrated circuits are described. Nanocrystalline diamond is used as a hard mask in place of amorphous carbon. Provided is a method of processing a substrate in which nanocrystalline diamond is used as a hard mask, wherein processing methods result in a smooth surface. The method involves two processing parts. Two separate nanocrystalline diamond recipes are combined—the first and second recipes are cycled to achieve a nanocrystalline diamond hard mask having high hardness, high modulus, and a smooth surface. In other embodiments, the first recipe is followed by an inert gas plasma smoothening process and then the first recipe is cycled to achieve a high hardness, a high modulus, and a smooth surface.
    Type: Application
    Filed: January 25, 2023
    Publication date: June 1, 2023
    Applicants: Applied Materials, Inc., National University of Singapore
    Inventors: Vicknesh Sahmuganathan, Jiteng Gu, Eswaranand Venkatasubramanian, Kian Ping Loh, Abhijit Basu Mallick, John Sudijono, Zhongxin Chen
  • Tribological properties of diamond films
    Patent number: 11594416
    Abstract: Methods to manufacture integrated circuits are described. Nanocrystalline diamond is used as a hard mask in place of amorphous carbon. Provided is a method of processing a substrate in which nanocrystalline diamond is used as a hard mask, wherein processing methods result in a smooth surface. The method involves two processing parts. Two separate nanocrystalline diamond recipes are combined—the first and second recipes are cycled to achieve a nanocrystalline diamond hard mask having high hardness, high modulus, and a smooth surface. In other embodiments, the first recipe is followed by an inert gas plasma smoothening process and then the first recipe is cycled to achieve a high hardness, a high modulus, and a smooth surface.
    Type: Grant
    Filed: August 31, 2020
    Date of Patent: February 28, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Vicknesh Sahmuganathan, Jiteng Gu, Eswaranand Venkatasubramanian, Kian Ping Loh, Abhijit Basu Mallick, John Sudijono, Zhongxin Chen
  • Depositing Low Roughness Diamond Films
    Publication number: 20220127721
    Abstract: Methods of depositing a diamond layer are described, which may be used in the manufacture of integrated circuits. Methods include processing a substrate in which nanocrystalline diamond deposited on a substrate, wherein the processing methods result in a nanocrystalline diamond hard mask having high hardness.
    Type: Application
    Filed: October 23, 2020
    Publication date: April 28, 2022
    Applicants: Applied Materials, Inc., National University of Singapore
    Inventors: Vicknesh Sahmuganathan, Zhongxin Chen, Gu Jiteng, Eswaranand Venkatasubramanian, Loh Kian Ping, Abhijit Basu Mallick, John Sudijono
  • TRIBOLOGICAL PROPERTIES OF DIAMOND FILMS
    Publication number: 20220068643
    Abstract: Methods to manufacture integrated circuits are described. Nanocrystalline diamond is used as a hard mask in place of amorphous carbon. Provided is a method of processing a substrate in which nanocrystalline diamond is used as a hard mask, wherein processing methods result in a smooth surface. The method involves two processing parts. Two separate nanocrystalline diamond recipes are combined—the first and second recipes are cycled to achieve a nanocrystalline diamond hard mask having high hardness, high modulus, and a smooth surface. In other embodiments, the first recipe is followed by an inert gas plasma smoothening process and then the first recipe is cycled to achieve a high hardness, a high modulus, and a smooth surface.
    Type: Application
    Filed: August 31, 2020
    Publication date: March 3, 2022
    Applicants: Applied Materials, Inc., National University of Singapore
    Inventors: Vicknesh Sahmuganathan, Gu Jiteng, Eswaranand Venkatasubramanian, Loh Kian Ping, Abhijit Basu Mallick, John Sudijono, Zhongxin Chen