Patents by Inventor Zhongzi XU

Zhongzi XU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220274882
    Abstract: An infrared selective radiation cooling nano-functional composition and a preparation method thereof, wherein the composition is prepared from silica, a rare earth silicate compound and a molybdate compound according to a mass ratio of 1:(0.5-2):(0.5-2) by ball milling and uniform mixing, and the silica, the rare earth silicate compound and the molybdate compound have high infrared selective radiation performance at 8-10 ?m, 9-12 ?m and 10-14 ?m. The rare earth silicate and molybdate compound are prepared by a sol-gel and a high-temperature solid phase process according to stoichiometric ratios SiO2-(0.5-2)Re2O3-(0.1-1.0)Na2O (Re?La, Sm, Eu, Gd, Tb, Dy, Er, Tm, Yb, Y or Sc) and RMoO4 (R?Mg, Ca, Sr or Ba).
    Type: Application
    Filed: April 14, 2020
    Publication date: September 1, 2022
    Applicant: NANJING TECH UNIVERSITY
    Inventors: Chunhua LU, Yaru NI, Zhenggang FANG, Zhongzi XU
  • Patent number: 10756219
    Abstract: It discloses a texturing method for a diamond wire cut polycrystalline silicon slice, including the following steps: firstly, immersing the diamond wire cut polycrystalline silicon slice into a mixed aqueous solution of an alkali solution and an alkali reaction control agent, removing a damaged layer on a surface of the silicon slice, and then immersing the silicon slice into a hydrofluoric acid solution containing inorganic ions and organic molecules for reaction; secondly, pretreating the polycrystalline silicon surface by a mixed solution of hydrofluoric acid and hydrogen peroxide, adding a pore-forming regulator at the same time, and finally texturing the surface of the silicon slice by a mixed acid solution of hydrofluoric acid and nitric acid.
    Type: Grant
    Filed: September 20, 2016
    Date of Patent: August 25, 2020
    Assignee: NANJING TECH UNIVERSITY
    Inventors: Zisheng Guan, Jun Li, Zhimei Shen, Chunhua Lu, Zhongzi Xu
  • Publication number: 20190067496
    Abstract: It discloses a texturing method for a diamond wire cut polycrystalline silicon slice, including the following steps: firstly, immersing the diamond wire cut polycrystalline silicon slice into a mixed aqueous solution of an alkali solution and an alkali reaction control agent, removing a damaged layer on a surface of the silicon slice, and then immersing the silicon slice into a hydrofluoric acid solution containing inorganic ions and organic molecules for reaction; secondly, pretreating the polycrystalline silicon surface by a mixed solution of hydrofluoric acid and hydrogen peroxide, adding a pore-forming regulator at the same time, and finally texturing the surface of the silicon slice by a mixed acid solution of hydrofluoric acid and nitric acid.
    Type: Application
    Filed: September 20, 2016
    Publication date: February 28, 2019
    Inventors: Zisheng GUAN, Jun LI, Zhimei SHEN, Chunhua LU, Zhongzi XU