Patents by Inventor Zhuan Liu

Zhuan Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190391687
    Abstract: A sensing unit in the touch panel includes a first electrode formed in a first film and a second electrode formed in a second film. The first electrode includes multiple extending portions and at least one connecting portion. The extending portions extend along a first direction. The connecting portion extends along a second direction which is different from the first direction. The extending portions are spaced from each other by a distance along the second direction, and the connecting portion connects the extending portions. The second electrode includes a circular pad having an opening. The extending portions at least partially overlap with the circular pad, and the connecting portion is formed in an area overlapping with the opening.
    Type: Application
    Filed: October 5, 2018
    Publication date: December 26, 2019
    Inventors: Cheng-Hung TSAI, Ying-Zhuan LIU, Xue-Xia CAI, Yuan-Ting CHEN, Jui-Ni LI, Wai-Pan WU, Shen-Feng TAI
  • Publication number: 20190042024
    Abstract: A sensor pattern and a capacitive touch screen are provided. The sensor pattern comprises: a plurality of unit blocks, and a first unit block of the unit blocks comprises: a first 1st-type sensor element, a first 2nd-type sensor element, and a second 2nd-type sensor element. The first 1st-type sensor element is disposed on a first patterned layer, having a border trace, two parallel main traces, a bridge, a first cell, and a second cell, wherein the first and second cells are not aligned. The first 2nd-type sensor element is disposed on a second patterned layer, having a main trace and a sub-trace, wherein the main trace surrounds the first cell of the first 1st-type sensor element. The second 2nd-type sensor element is disposed on the second patterned layer, having a main trace and a sub-trace, wherein the main trace surrounds the second cell of the first 1st-type sensor element.
    Type: Application
    Filed: July 30, 2018
    Publication date: February 7, 2019
    Inventors: Cheng-Hung Tsai, Ying-Zhuan Liu, Yuan-Ting Chen, Chin-Yuan Chiang, Jui-Ni Li, Wai Pan Wu, Shen-Feng Tai
  • Patent number: 9824176
    Abstract: A measurement target for a semiconductor device is designed. The semiconductor device includes a structure to be measured that has a spectrum response that is comparable to or below system noise level for an optical critical dimension measurement device to be used to measure the structure. The measurement target is designed by obtaining a process window and design rules for the semiconductor device and determining prospective pitches through modeling to identify pitches that produce a spectrum response from the structures that is at least 10 times greater than a system noise level for the optical critical dimension measurement device. A resonance window for each prospective pitch is determined and robustness of the resonance window is determined through modeling. Pitches of the array are selected based on the prospective pitches, resonance windows, and robustness. The target design may accordingly be produced and used to generate a measurement target.
    Type: Grant
    Filed: July 24, 2015
    Date of Patent: November 21, 2017
    Assignee: Nanometrics Incorporated
    Inventors: Jiangtao Hu, Bingqing Li, Zhuan Liu
  • Publication number: 20170024509
    Abstract: A measurement target for a semiconductor device is designed. The semiconductor device includes a structure to be measured that has a spectrum response that is comparable to or below system noise level for an optical critical dimension measurement device to be used to measure the structure. The measurement target is designed by obtaining a process window and design rules for the semiconductor device and determining prospective pitches through modeling to identify pitches that produce a spectrum response from the structures that is at least 10 times greater than a system noise level for the optical critical dimension measurement device. A resonance window for each prospective pitch is determined and robustness of the resonance window is determined through modeling. Pitches of the array are selected based on the prospective pitches, resonance windows, and robustness. The target design may accordingly be produced and used to generate a measurement target.
    Type: Application
    Filed: July 24, 2015
    Publication date: January 26, 2017
    Inventors: Jiangtao HU, Bingqing Li, Zhuan Liu
  • Patent number: 9239523
    Abstract: An empirical diffraction based overlay (eDBO) measurement of an overlay error is produced using diffraction signals from a plurality of diffraction based alignment pads from an alignment target. The linearity of the overlay error is tested using the same diffraction signals or a different set of diffraction signals from diffraction based alignment pads. Wavelengths that do not have a linear response to overlay error may be excluded from the measurement error.
    Type: Grant
    Filed: March 22, 2011
    Date of Patent: January 19, 2016
    Assignee: Nanometrics Incorporated
    Inventors: Jie Li, Zhuan Liu, Silvio J. Rabello, Nigel P. Smith
  • Patent number: 9115987
    Abstract: An optical metrology device simultaneously detects light with multiple angles of incidence (AOI) and/or multiple azimuth angles to determine at least one parameter of a sample. The metrology device focuses light on the sample using an optical system with a large numerical aperture, e.g., 0.2 to 0.9. Multiple channels having multiple AOIs and/or multiple azimuth angles are selected simultaneously by passing light reflected from the sample through a plurality of pupils in a pupil plate. Beamlets produced by the plurality of pupils are detected, e.g., with one or more spectrophotometers, to produce data for the multiple AOIs and/or multiple azimuth angles. The data for multiple AOI and/or multiple azimuth angles may then be processed to determine at least one parameter of the sample, such as profile parameters or overlay error.
    Type: Grant
    Filed: December 4, 2013
    Date of Patent: August 25, 2015
    Assignee: Nanometrics Incorporated
    Inventors: Zhuan Liu, Shifang Li
  • Publication number: 20150153165
    Abstract: An optical metrology device simultaneously detects light with multiple angles of incidence (AOI) and/or multiple azimuth angles to determine at least one parameter of a sample. The metrology device focuses light on the sample using an optical system with a large numerical aperture, e.g., 0.2 to 0.9. Multiple channels having multiple AOIs and/or multiple azimuth angles are selected simultaneously by passing light reflected from the sample through a plurality of pupils in a pupil plate. Beamlets produced by the plurality of pupils are detected, e.g., with one or more spectrophotometers, to produce data for the multiple AOIs and/or multiple azimuth angles. The data for multiple AOI and/or multiple azimuth angles may then be processed to determine at least one parameter of the sample, such as profile parameters or overlay error.
    Type: Application
    Filed: December 4, 2013
    Publication date: June 4, 2015
    Applicant: Nanometrics Incorporated
    Inventors: Zhuan Liu, Shifang Li
  • Patent number: 8649630
    Abstract: The method and apparatus for processing distorted image is provided by the present invention, and the distortion parameter of the distorted image is obtained after a terminal implements the image conversion processing for an obtained distorted image; the terminal implements recovery processing for the distorted image based on the distortion parameter. The method and apparatus of the present invention could ensure that the terminal recovers a distorted image to a clear image quickly and accurately, improving the user's experience.
    Type: Grant
    Filed: November 30, 2010
    Date of Patent: February 11, 2014
    Assignee: ZTE Corporation
    Inventor: Zhuan Liu
  • Publication number: 20130242303
    Abstract: A dual optical metrology system includes a first metrology device and a second metrology device, each producing light at different oblique angles of incidence on the same spot of a sample from different azimuth angles. The dual optical metrology system further includes a rotating stage or flip mirrors capable of altering the orientation of the light beams so the first and second metrology devices can measure the same spot on the sample at different orientations. Thus, the first and second metrology devices generate first and second sets of optical metrology data, respectively, at a first orientation with respect to the sample. After the sample is rotated, the first and second metrology devices generate third and fourth sets of optical metrology data. The first, second, third, and fourth sets of data can then be used to determine one or more parameters of the sample.
    Type: Application
    Filed: March 13, 2012
    Publication date: September 19, 2013
    Applicant: Nanometrics Incorporated
    Inventor: Zhuan Liu
  • Patent number: 8501501
    Abstract: A sample with at least a first structure and a second structure is measured and a first model and a second model of the sample are generated. The first model models the first structure as an independent variable and models the second structure. The second model of the sample models the second structure as an independent variable. The measurement, the first model and the second model together to determine at least one desired parameter of the sample. For example, the first structure may be on a first layer and the second structure may be on a second layer that is under the first layer, and the processing of the sample may at least partially remove the first layer, wherein the second model models the first layer as having a thickness of zero.
    Type: Grant
    Filed: July 26, 2012
    Date of Patent: August 6, 2013
    Assignee: Nanometrics Incorporated
    Inventors: Ye Feng, Zhuan Liu
  • Publication number: 20130156325
    Abstract: The method and apparatus for processing distorted image is provided by the present invention, and the distortion parameter of the distorted image is obtained after a terminal implements the image conversion processing for an obtained distorted image; the terminal implements recovery processing for the distorted image based on the distortion parameter. The method and apparatus of the present invention could ensure that the terminal recovers a distorted image to a clear image quickly and accurately, improving the user's experience.
    Type: Application
    Filed: November 30, 2010
    Publication date: June 20, 2013
    Applicant: ZTE CORPORATION
    Inventor: Zhuan Liu
  • Patent number: 8252608
    Abstract: A sample with at least a first structure and a second structure is measured and a first model and a second model of the sample are generated. The first model models the first structure as an independent variable and models the second structure. The second model of the sample models the second structure as an independent variable. The measurement, the first model and the second model together to determine at least one desired parameter of the sample. For example, the first structure may be on a first layer and the second structure may be on a second layer that is under the first layer, and the processing of the sample may at least partially remove the first layer, wherein the second model models the first layer as having a thickness of zero.
    Type: Grant
    Filed: November 21, 2011
    Date of Patent: August 28, 2012
    Assignee: Nanometrics Incorporated
    Inventors: Ye Feng, Zhuan Liu
  • Patent number: 8126694
    Abstract: A model of a sample with a periodic or non-periodic pattern of conductive and transparent materials is produced based on the effect that the pattern has on TE polarized incident light. The model of the pattern may include a uniform film of the transparent material and an underlying uniform film of the conductive material. When the pattern has periodicity in two directions, the model may include a uniform film of the transparent material and an underlying portion that based on the physical characteristics of the periodic pattern in the TM polarization direction. When the sample includes an underlying periodic pattern that is orthogonal to the top periodic pattern, the sample may be modeled by modeling the physical characteristics of the top periodic pattern and the effect of the bottom periodic pattern. The model may be stored and used to determine a characteristic of the sample.
    Type: Grant
    Filed: May 2, 2008
    Date of Patent: February 28, 2012
    Assignee: Nanometrics Incorporated
    Inventors: Zhuan Liu, Jiangtao Hu, Yudong Hao
  • Patent number: 8062910
    Abstract: A sample that is processed to remove a top layer, e.g., using chemical mechanical polishing or etching, is accurately measured using multiple models of the sample. The multiple models may be constrained based on a pre-processing measurement of the sample. By way of example, the multiple models of the sample may be linked in pairs, where one pair includes a model simulating the pre-processed sample and another model simulating the post-processed sample with a portion of the top layer remaining, i.e., under-processing. Another pair of linked models includes a model simulating the pre-processed sample and a model simulating the post-processing sample with the top layer removed, i.e., the correct amount of processing or over-processing. The underlying layers in the linked model pairs are constrained to have the same parameters. The modeling process may use a non-linear regression or libraries.
    Type: Grant
    Filed: November 13, 2008
    Date of Patent: November 22, 2011
    Assignee: Nanometrics Incorporated
    Inventors: Ye Feng, Zhuan Liu
  • Publication number: 20110238365
    Abstract: An empirical diffraction based overlay (eDBO) measurement of an overlay error is produced using diffraction signals from a plurality of diffraction based alignment pads from an alignment target. The linearity of the overlay error is tested using the same diffraction signals or a different set of diffraction signals from diffraction based alignment pads. Wavelengths that do not have a linear response to overlay error may be excluded from the measurement error.
    Type: Application
    Filed: March 22, 2011
    Publication date: September 29, 2011
    Applicant: NANOMETRICS INCORPORATED
    Inventors: Jie Li, Zhuan Liu, Silvio J. Rabello, Nigel P. Smith
  • Publication number: 20090296075
    Abstract: An overlay error is determined using a diffraction based overlay target by generating a number of narrow band illumination beams that illuminate the overlay target. Each beam has a different range of wavelengths. Images of the overlay target are produced for each different range of wavelengths. An intensity value is then determined for each range of wavelengths. In an embodiment in which the overlay target includes a plurality of measurement pads, which may be illuminated and imaged simultaneously, an intensity value for each measurement pad in each image is determined. The intensity value may be determined statistically, such as by summing, finding the mean or median of the intensity values of pixels in the image. Spectra is then constructed using the determined intensity value, e.g., for each measurement pad. Using the constructed spectra, the overlay error may then be determined.
    Type: Application
    Filed: May 29, 2008
    Publication date: December 3, 2009
    Applicant: Nanometrics Incorporated
    Inventors: Jiangtao Hu, Chandra Saru Saravanan, Silvio J. Rabello, Zhuan Liu, Nigel P. Smith
  • Publication number: 20090276198
    Abstract: A model of a sample with a periodic or non-periodic pattern of conductive and transparent materials is produced based on the effect that the pattern has on TE polarized incident light. The model of the pattern may include a uniform film of the transparent material and an underlying uniform film of the conductive material. When the pattern has periodicity in two directions, the model may include a uniform film of the transparent material and an underlying portion that based on the physical characteristics of the periodic pattern in the TM polarization direction. When the sample includes an underlying periodic pattern that is orthogonal to the top periodic pattern, the sample may be modeled by modeling the physical characteristics of the top periodic pattern and the effect of the bottom periodic pattern. The model may be stored and used to determine a characteristic of the sample.
    Type: Application
    Filed: May 2, 2008
    Publication date: November 5, 2009
    Applicant: Nanometrics Incorporated
    Inventors: Zhuan Liu, Jiangtao Hu, Yudong Hao
  • Patent number: 7465590
    Abstract: A sample that is processed to remove a top layer, e.g., using chemical mechanical polishing or etching, is accurately measured using multiple models of the sample. The multiple models may be constrained based on a pre-processing measurement of the sample. By way of example, the multiple models of the sample may be linked in pairs, where one pair includes a model simulating the pre-processed sample and another model simulating the post-processed sample with a portion of the top layer remaining, i.e., under-processing. Another pair of linked models includes a model simulating the pre-processed sample and a model simulating the post-processing sample with the top layer removed, i.e., the correct amount of processing or over-processing. The underlying layers in the linked model pairs are constrained to have the same parameters. The modeling process may use a non-linear regression or libraries.
    Type: Grant
    Filed: June 30, 2005
    Date of Patent: December 16, 2008
    Assignee: Nanometrics Incorporated
    Inventors: Ye Feng, Zhuan Liu
  • Patent number: 7450225
    Abstract: A metrology system performs optical metrology while holding a sample with an unknown focus offset. The measurements are corrected by fitting for the focus offset in a model regression analysis. Focus calibration is used to determine the optical response of the metrology device to the focus offset. The modeled data is adjusted based on the optical response to the focus offset and the model regression analysis fits for the focus offset as a variable parameter along with the sample characteristics that are to be measured. Once an adequate fit is determined, the values of the sample characteristics to be measured are reported. The adjusted modeled data may be stored in a library, or alternatively, modeled data may be adjusted in real-time.
    Type: Grant
    Filed: April 13, 2007
    Date of Patent: November 11, 2008
    Assignee: Nanometrics Incorporated
    Inventors: Zhuan Liu, Yudong Hao, Ye Feng, Yongdong Liu
  • Patent number: 7362448
    Abstract: A residue detection system collects at least one of the spectrum and image from a measurement region on a sample. Spectral analysis is performed on the collected spectrum to determine whether residue is present and if so the thickness of the residue. The spectral analysis uses a calibration metric that correlates a monitoring parameter to the thickness of the residue. The monitoring parameter is at least one of the reflectance value at one or more of the local minima and maxima in the spectrum, the shape of one or more of the local minima and maxima in the spectrum, and the difference in reflectance values between at least two of the local minima and maxima in the spectrum. In one embodiment, imaging analysis is performed on the collected image of the measurement region if no residue is detected by the spectral analysis.
    Type: Grant
    Filed: September 8, 2004
    Date of Patent: April 22, 2008
    Assignee: Nanometrics Incorporated
    Inventors: Zhuan Liu, Sangbong Lee, Jiangtao Hu, Chandra Saravanan