Patents by Inventor Zhuangzhuang Wu

Zhuangzhuang Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11834754
    Abstract: The present invention relates to an ALD (Atomic layer deposition) apparatus and an ALD method. The ALD apparatus is provided with a reacting chamber and an annealing chamber, in which the reacting chamber is positioned with several heaters, a substrate to be deposited with an epitaxial layer may be transferred between different heaters, and each heater may independently moderate temperature. Different heaters correspond to different ALDs, and the number of the heaters may be varied to meet required a film to be deposited or composition of a crystal material. Because the heaters may be optimized to adapt to required temperature of different reactant gases, thickness of the epitaxial layer will meet expectation, and quality of the epitaxial layer will be promoted. Meanwhile, moderating the temperature independently may raise yield of production.
    Type: Grant
    Filed: January 28, 2022
    Date of Patent: December 5, 2023
    Assignee: SiEn (QingDao) Integrated Circuits Co., Ltd.
    Inventors: Zhaosheng Meng, Zhuangzhuang Wu, Min-Hwa Chi
  • Publication number: 20220243359
    Abstract: The present invention relates to an ALD (Atomic layer deposition) apparatus and an ALD method. The ALD apparatus is provided with a reacting chamber and an annealing chamber, in which the reacting chamber is positioned with several heaters, a substrate to be deposited with an epitaxial layer may be transferred between different heaters, and each heater may independently moderate temperature. Different heaters correspond to different ALDs, and the number of the heaters may be varied to meet required a film to be deposited or composition of a crystal material. Because the heaters may be optimized to adapt to required temperature of different reactant gases, thickness of the epitaxial layer will meet expectation, and quality of the epitaxial layer will be promoted. Meanwhile, moderating the temperature independently may raise yield of production.
    Type: Application
    Filed: January 28, 2022
    Publication date: August 4, 2022
    Applicant: SiEn (QingDao) Integrated Circuits Co., Ltd.
    Inventors: Zhaosheng MENG, Zhuangzhuang WU, Min-Hwa CHI
  • Publication number: 20220216101
    Abstract: A Cu interconnect and a method of forming a Cu interconnect of damascene process is provided. A barrier layer is formed at a sidewall and a bottom of a through hole and a groove, constructing a Cu interconnecting line. The barrier layer comprises a metal crystal adhesion layer or a graphene layer. The metal crystal adhesion layer may be a Co, Ru or Os crystal layer. The metal crystal adhesion layer may enhance adhesion of Cu, inhibit diffusion of Cu toward a dielectric layer efficiently, and promoting electro-migration of Cu. The graphene layer may be an Carbon allotrope/graphene complex layer. The graphene layer may provide lower resistance for the Cu interconnect and increase adhesion between barrier and dielectric layer to improve EM. Both the metal crystal adhesion layer and the graphene layer may efficiently reduce the total thickness of the barrier layer and the first barrier layer to efficiently decrease resistance of the through hole.
    Type: Application
    Filed: December 28, 2021
    Publication date: July 7, 2022
    Applicant: SiEn (QingDao) Integrated Circuits Co., Ltd.
    Inventors: Zhaosheng MENG, Zhuangzhuang WU, Min-Hwa CHI
  • Publication number: 20180131133
    Abstract: Embodiments of the present invention provide a press tool and an electronic product detecting apparatus including the press tool. The press tool includes: a connector soft-contact member including: a first base plate; a floating plate mounted to the first base plate; and a buffer member mounted between the first base plate and the floating plate and configured such that when receiving a pressing force, the buffer member generates a repulsive force, so that the floating plate is floatable; and a press member connected with the connector soft-contact member such that they are openable and closable relative to each other. The press member includes a second base plate and a connector bearing piece which is mounted to the second base plate and which is positioned just opposite to the floating plate when the connector soft-contact member and the press member are closed.
    Type: Application
    Filed: August 16, 2017
    Publication date: May 10, 2018
    Inventors: Shaoning Liu, Guofeng Hu, Guoqiang Liu, Weidong Lin, Xiaowen Xu, Yunxiang Jiao, Mingda Zhang, Yang Liu, Feng Wang, Weihua Cao, Liangliang Hu, Yantao Li, Dahai Liu, Jian Ma, Shijie Wang, Xiaobo Wang, Zhuangzhuang Wu, Zhenguo Xing, Yang Yu, Xing Zhang
  • Patent number: 9966699
    Abstract: Embodiments of the present invention provide a press tool and an electronic product detecting apparatus including the press tool. The press tool includes: a connector soft-contact member including: a first base plate; a floating plate mounted to the first base plate; and a buffer member mounted between the first base plate and the floating plate and configured such that when receiving a pressing force, the buffer member generates a repulsive force, so that the floating plate is floatable; and a press member connected with the connector soft-contact member such that they are openable and closable relative to each other. The press member includes a second base plate and a connector bearing piece which is mounted to the second base plate and which is positioned just opposite to the floating plate when the connector soft-contact member and the press member are closed.
    Type: Grant
    Filed: August 16, 2017
    Date of Patent: May 8, 2018
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Shaoning Liu, Guofeng Hu, Guoqiang Liu, Weidong Lin, Xiaowen Xu, Yunxiang Jiao, Mingda Zhang, Yang Liu, Feng Wang, Weihua Cao, Liangliang Hu, Yantao Li, Dahai Liu, Jian Ma, Shijie Wang, Xiaobo Wang, Zhuangzhuang Wu, Zhenguo Xing, Yang Yu, Xing Zhang