Patents by Inventor Zi-Neng HUANG

Zi-Neng HUANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Gas-flow control method for plasma apparatus
    Patent number: 9384949
    Abstract: A gas-flow control method for a plasma apparatus is provided. The gas-flow control method includes mounting a first adjusting mechanism on a gas-distribution plate. The gas-distribution plate includes a number of exhaust openings, and the exhaust openings in a first area of the gas-distribution plate are masked by the first adjusting mechanism. The gas-flow control method also includes exhausting a gas from the exhaust openings in a first unmasked area of the gas-distribution plate, and the gas passing through the first adjusting mechanism into a plasma chamber. The gas-flow control method further includes generating an electric field to excite the gas in the plasma chamber into plasma.
    Type: Grant
    Filed: August 8, 2014
    Date of Patent: July 5, 2016
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD
    Inventors: Zi-Neng Huang, Chang-Sheng Lee, Shen-Chieh Liu, Cherng-Chang Tsuei
  • GAS-FLOW CONTROL METHOD FOR PLASMA APPARATUS
    Publication number: 20160042982
    Abstract: A gas-flow control method for a plasma apparatus is provided. The gas-flow control method includes mounting a first adjusting mechanism on a gas-distribution plate. The gas-distribution plate includes a number of exhaust openings, and the exhaust openings in a first area of the gas-distribution plate are masked by the first adjusting mechanism. The gas-flow control method also includes exhausting a gas from the exhaust openings in a first unmasked area of the gas-distribution plate, and the gas passing through the first adjusting mechanism into a plasma chamber. The gas-flow control method further includes generating an electric field to excite the gas in the plasma chamber into plasma.
    Type: Application
    Filed: August 8, 2014
    Publication date: February 11, 2016
    Inventors: Zi-Neng HUANG, Chang-Sheng LEE, Shen-Chieh LIU, Cherng-Chang TSUEI