Abstract: An abrasive article for polishing a substrate surface. The abrasive article includes a holder pad assembly and an abrasive member held in place with respect to a holder pad. The abrasive member further includes a first surface engaged with the holder pad assembly, and a second surface including an abrasive. A preload mechanism is positioned to bias the second surfaces of the abrasive member toward the substrate surface. One or more fluid bearing features on the second surface of the abrasive member is configured to generate lift forces during relative motion between the abrasive article and the substrate surface.

Abstract: A support assembly includes a base layer, a circuit defined along the base layer, and a first material molded on at least a portion of the base layer. The first material substantially forms a shape of at least a portion of the support assembly. Further disclosed is a molded suspension assembly. The molded suspension assembly includes a thin and elongate metallic substrate and a non-metallic material molded along at least a portion of one side of the metallic substrate. The non-metallic material interlocks with the metallic substrate. The molded suspension assembly includes a transducer support area at or near a first end of the molded suspension assembly.

Abstract: A polishing article with a plurality of polishing pads adapted to polish a substrate. Gimbal structures are attached to the polishing pads that permit the polishing pads to move independently along at least a pitch axis and a roll axis. Stems supported by preload flexures apply preloads through dimple structures to the polishing pads. A plurality of stand-offs provide fixed boundary conditions between the preload and the gimbal structures. Recesses allow for the preload flexures to move vertically.

Abstract: A carabiner with a generally C-shaped body includes a first end and a second end located on opposite sides of an opening. A primary gate is mounted to the second end. The primary gate is rotatable about a first axis perpendicular to a plane that bisects the C-shaped body. The primary gate is rotatable between a closed position with the primary gate engaged with the first end and the C-shaped body enclosing an interior region, and an open position with the primary gate located generally in the interior region. A secondary gate is attached to the primary gate and adapted to be displaced in the plane relative to the primary gate between a closed configuration that separates the interior region into a first portion and a second portion, and an open configuration that provides access to the interior region. The secondary gate can be displaced in the plane to extend across the interior region as the primary gate rotates between the open position and the closed position.

Abstract: The intersection of discrete polishing islands staggered in a curvilinear shape with a workpiece maintains a substantially uniform film thickness throughout the polishing operation and also leading to a stable polishing operation due to the substantially invariant pressurization.

Abstract: The present application is directed to a slider supporting apparatus for flying a slider of a hard disk drive in the manufacturing process to provide electrical performance characteristics. The present invention discloses an integrated design including the electrical interconnect, the gimballing mechanism, the preload mechanism and the slider supporting mechanism integrated into a single supporting structure.

Abstract: The present application is directed to a slider supporting apparatus for flying a slider of a hard disk drive in the manufacturing process to provide electrical performance characteristics. The present invention discloses an integrated design including the electrical interconnect, the gimballing mechanism, the preload mechanism and the slider supporting mechanism integrated into a single supporting structure.

Abstract: The present application is directed to a slider supporting apparatus for flying a slider of a hard disk drive in the manufacturing process to provide electrical performance characteristics. The present invention discloses an integrated design including the electrical interconnect, the gimballing mechanism, the preload mechanism and the slider supporting mechanism integrated into a single supporting structure.

Abstract: An abrasive article with an abrasive element fabricated on a flexible foil suspended by a hydrostatic preloader, a gimball mechanism or a soft pad capable of selectively engaging with substrate to remove material while monitoring the contact pressure. A hydrostatic pressure bed is applied to the non-abrasive surface of the tensioned flexible foil to provide a contact pressure to the abrasive surface against the substrate. A series of fluid bearing surfaces are fabricated or imparted onto the abrasive side of the flexible foil to cause controlled interference and pressure with the substrate. A hydrostatic pressure emanating from the preloader supports the non-abrasive side of the flexible foil under tension while the abrasive side of the flexible foil engages a substrate.

Abstract: This invention relates to methods for plate dressing using slurry charged with abrasives and soft polymeric or metallic micro-nano spheres additives to produce substantially uniform abrasive height. Additionally, methods for plate dressing using slurry charged with abrasives and self-assembled polymers to produce substantially uniform abrasive height are disclosed.

Abstract: An abrasive article referred to as composite polishing pad (CPP) includes a plurality of fixed abrasive elements or a plurality of chemical mechanical polishing (CMP) pads attached to a plurality of pressure pads suspended to flexible structures capable to follow the wafer topography. A plurality of stems with dimpled ends act on the pressure pads to generate desired pressure acting on the wafer. The stems are attached to a spring arrangement capable of substantial vertical deflection under a desired load. In one embodiment a plurality of pressure pads suspended to a plurality of stems by revolute joints. The stems are attached to a spring arrangement capable of substantial vertical deflection under a desired load. In another embodiment, a plurality of pressure pads are attached to a plurality of stems suspended to a series of springs capable of substantial vertical deflection under a desired load.

Abstract: An abrasive article with an array of independently gimballed abrasive members that are capable of selectively engaging with nanometer-scale and/or micrometer-scale height variations and micrometer-scale and/or millimeter-scale wavelengths of waviness, on the surfaces of substrates. Each abrasive member maintains a fluid bearing (air is the typical fluid) with the substrate. The spacing and pitch of the abrasive members can be adjusted to follow the topography of the substrate to remove a generally uniform layer of material; to engage with the peaks on the substrate to remove target wavelengths of waviness; and/or to remove debris and contamination from the surface of the substrate.

Abstract: A low-cost approach to near field nano-scale photolithography using a plasmonic head with hydrostatic gas bearings. The hydrostatic gas bearing flies the plasmonic head at less than 100 nm, and more preferably less than 50 nm, above the photo-resist without the need to spin the substrate. The plasmonic head concentrates short-wavelength surface plasmons into about sub-100 nm regions on the photo-resist and can pattern features of about 80 nm or less.

Abstract: A method of making an abrasive article including the step of preparing a master plate with a surface having a shape. Depositing a spacer layer on the surface of the master plate. A slurry containing an adhesive and abrasive particles is deposited on a surface of the spacer layer. A substrate embedded with abrasive particles having a surface generally complementary to the surface of the master plate is fabricated. A spacer layer is formed by various method controlled the height of the protruded abrasive particles. The master plate and the spacer layer are separated from the substrate to expose abrasive particle protruding a substantially uniform height. An abrasive article made according to this method is also disclosed.

Abstract: One or more individually gimballed dressing bars for embedding abrasive particles into a substrate at a substantially uniform height. A hydrostatic and/or hydrodynamic fluid bearing (air is the typical fluid) is maintained between the dressing bar and the substrate. The fluid bearing permits the dressing bar to follow micrometer-scale and/or millimeter-scale wavelengths of waviness on the substrate, while maintaining a constant clearance, to uniformly embed the abrasive particle into the substrate.

Abstract: A low hysteresis pivot bearing suitable for a variety of applications. The relationship between torque and angular displacement is substantially linear, with negligible residual hysteresis. The pivot bearing includes a stationary shaft and at least one intermediate member pivotally connected to the stationary shaft by an intermediate member bearing. At least one outer sleeve is pivotally connected to the intermediate member by an outer sleeve bearing. At least one rotary actuator angularly displaces the intermediate member relative to the stationary shaft.

Abstract: A polishing pad is located on a reciprocal motion generator. The polishing pad includes a plurality of discrete fluid channels. An abrasive article is located on the polishing pad. The abrasive article is reciprocally energized relative to the work piece. A fluid pressure in one or more of the discrete fluid channels is altered to selectively deform the abrasive article to preferentially remove material from the work piece.

Abstract: A dressing bars for embedding abrasive particles into a substrate at a substantially uniform height. Spacing pads, hydrostatic and/or hydrodynamic fluid bearing (air is the typical fluid) maintains a constant spacing and attitude between the dressing bar and the substrate. The fluid bearing permits the dressing bar to maintain a desirable stiffness between the lapping plate and the dressing bar. The bar geometry and fluid bearing design permits the bar to mitigate or compensate for the micrometer-scale and/or millimeter-scale wavelengths of waviness on the substrate, while maintaining a substantially constant clearance to uniformly embed the abrasive particle into the substrate.

Abstract: An abrasive article with an array of independently gimballed abrasive members that are capable of selectively engaging with nanometer-scale and/or micrometer-scale height variations and micrometer-scale and/or millimeter-scale wavelengths of waviness, on the surfaces of substrates. Each abrasive member maintains a fluid bearing (air is the typical fluid) with the substrate. The spacing and pitch of the abrasive members can be adjusted to follow the topography of the substrate to remove a generally uniform layer of material; to engage with the peaks on the substrate to remove target wavelengths of waviness; and/or to remove debris and contamination from the surface of the substrate.

Abstract: A method of making an abrasive article including the step of preparing a master plate with a surface having a shape. Depositing a spacer layer on the surface of the master plate. A slurry containing an adhesive and abrasive particles is deposited on a surface of the spacer layer. A substrate embedded with abrasive particles having a surface generally complementary to the surface of the master plate is fabricated. A spacer layer is formed by various method controlled the height of the protruded abrasive particles. The master plate and the spacer layer are separated from the substrate to expose abrasive particle protruding a substantially uniform height. An abrasive article made according to this method is also disclosed.