Abstract: Method for nanopatterning of inorganic materials, such as ceramic (e.g. metal oxide) materials, and organic materials, such as polymer materials, on a variety of substrates to form nanopatterns and/or nanostructures with control of dimensions and location, all without the need for etching the materials and without the need for re-alignment between multiple patterning steps in forming nanostructures, such as heterostructures comprising multiple materials. The method involves patterning a resist-coated substrate using electron beam lithography, removing a portion of the resist to provide a patterned resist-coated substrate, and spin coating the patterned resist-coated substrate with a liquid precursor, such as a sol precursor, of the inorganic or organic material. The remaining resist is removed and the spin coated substrate is heated at an elevated temperature to crystallize the deposited precursor material.

Abstract: Method includes receiving a request for a web page, identifying one or more resource portions stored in a cache, each resource portion corresponding to a portion of a structured document for use to render the requested web page, determining whether the web page was requested within a predetermined time threshold since a previous request for the web page, if requested within the predetermined time threshold, instructing the requested web page to be rendered using the one or more resource portions stored in the cache and refreshing the one or more resource portions, if not requested within the predetermined time threshold, regenerating the one or more resource portions and instructing the requested web page to be rendered using the regenerated one or more resource portions and cache the regenerated one or more resource portions.

Abstract: Method for nanopatterning of inorganic materials, such as ceramic (e.g. metal oxide) materials, and organic materials, such as polymer materials, on a variety of substrates to form nanopatterns and/or nanostructures with control of dimensions and location, all without the need for etching the materials and without the need for re-alignment between multiple patterning steps in forming nanostructures, such as heterostructures comprising multiple materials. The method involves patterning a resist-coated substrate using electron beam lithography, removing a portion of the resist to provide a patterned resist-coated substrate, and spin coating the patterned resist-coated substrate with a liquid precursor, such as a sol precursor, of the inorganic or organic material. The remaining resist is removed and the spin coated substrate is heated at an elevated temperature to crystallize the deposited precursor material.

Abstract: The present invention provides an ethylene polymerization catalyst. The present invention also provides a process for preparing the ethylene polymerization catalyst, comprising reacting powdered magnesium with an alkyl halide of formula RX in the presence of an ether solvent to form a magnesium compound having a structure represented by the formula (RMgX)p(MgX2)q, in which R is an alkyl group having from 3 to 12 carbon atoms, X is halogen, and molar ratio of q to p is in the range of from larger than 0 to 1, impregnating the magnesium compound onto silica carrier, reacting the silica loading the magnesium compound with an alkyl halide of formula R1X, a titatium compound and an alkyl aluminum compound to form a main catalyst component, contacting the main catalyst component with a cocatalyst component to form catalyst for ethylene polymerization. The present invention also relates to the use of the catalyst in the polymerization of ethylene.

Abstract: The present invention provides an ethylene polymerization catalyst. The present invention also provides a process for preparing the ethylene polymerization catalyst, comprising reacting powdered magnesium with an alkyl halide of formula RX in the presence of an ether solvent to form a magnesium compound having a structure represented by the formula (RMgX)p(MgX2)q, in which R is an alkyl group having from 3 to 12 carbon atoms, X is halogen, and molar ratio of q to p is in the range of from larger than 0 to 1, impregnating the magnesium compound onto silica carrier, reacting the silica loading the magnesium compound with an alkyl halide of formula R1X, a titatium compound and an alkyl aluminum compound to form a main catalyst component, contacting the main catalyst component with a cocatalyst component to form catalyst for ethylene polymerization. The present invention also relates to the use of the catalyst in the polymerization of ethylene.

Abstract: Disclosed is a catalyst for synthesizing low-, medium- and high-density polyethylene, prepared by using commercial powdered magnesium as a raw material, forming a magnesium halide in the nascent state, then reacting said magnesium halide with a titanium compound and an alkyl aluminum compound in the presence of an electron donor compound to form a complex, supporting said complex onto silica carrier and drying the resulting mixture by heating to form a solid main catalyst component, and finally mixing said main catalyst component with an organometallic compound as cocatalyst. The catalyst according to the present invention is characterized by a simple preparing procedure, smooth and stable reaction, uniform heat liberation and less agglomerates when used for gas phase polymerizing ethylene, high polymerization activity, high sensitivity to the modification by hydrogen and high copolymerization power, and the products thus obtained have good product morphology.