Patents by Inventor Zoilo C. Tan

Zoilo C. Tan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electron-beam and X-ray sensitive polymers and resists
    Patent number: 4568734
    Abstract: There are disclosed polymers, E-beam sensitive elements and resists obtained therefrom, that are more sensitive than 5.times.10.sup.-7 coulombs per cm.sup.2 when exposed to a 15 keV electron beam. The polymers are copolymers of either allyl or propargyl methacrylate and of an acrylate or methacrylate bearing an oxygen-containing heterocyclic ring.
    Type: Grant
    Filed: March 12, 1984
    Date of Patent: February 4, 1986
    Assignee: Eastman Kodak Company
    Inventors: Zoilo C. Tan, Robert C. Daly