Patents by Inventor Zomer Silvester HOUWELING
Zomer Silvester HOUWELING has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240116760Abstract: A carbon nanotube membrane including carbon nanotubes having a pre-selected bonding configuration or (m, n) chirality, wherein the carbon nanotube membrane has a substantial amount of carbon nanotubes having zigzag (m, 0) chirality and/or armchair (m, m) chirality. An apparatus for the treatment of a carbon-based membrane, a method for treating carbon based membranes, pellicles including carbon based membranes, lithographic apparatuses includes carbon nanotube membranes, as well as the use of carbon nanotube membranes in lithographic apparatuses and methods are also described.Type: ApplicationFiled: February 3, 2022Publication date: April 11, 2024Inventors: Paul Alexander VERMEULEN, Zomer Silvester HOUWELING
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Publication number: 20230333462Abstract: A pellicle membrane for use in a lithographic apparatus, the pellicle membrane characterized by in plane variation in composition is described. A method of manufacturing a pellicle membrane, the method including: providing a first material layer on a sacrificial layer on a substrate; providing a photoresist layer on the first material layer; patterning the photoresist layer; etching the first material layer to form a patterned surface; and either i) depositing a layer of a second material on the patterned surface and subsequently lifting off the portion of the second material deposited on the patterned photoresist layer, or ii) removing the remaining photoresist layer, depositing a layer of a second material on the patterned surface, and subsequently planarizing the surface.Type: ApplicationFiled: August 5, 2021Publication date: October 19, 2023Applicant: ASML NETHERLANDS B. V.Inventors: Ties Wouter VAN DER WOORD, Alexander Ludwig KLEIN, Zomer Silvester HOUWELING, Inci DONMEZ NOYAN, Volker Dirk HILDENBRAND, Adrianus Johannes Maria HILDENBRAND, Johan Hendrik GIESBERS
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Publication number: 20230168577Abstract: An optical element for a lithographic apparatus, the optical element including an anchor layer selected to support a top layer having self-terminating growth in an operating lithographic apparatus or plasma containing environment. Also described is a method of manufacturing an optical element, the method including depositing a top layer on anchor layer via exposure to plasma, preferably electromagnetically induced plasma. Lithographic apparatuses including such optical elements are also described.Type: ApplicationFiled: April 21, 2021Publication date: June 1, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Zomer Silvester HOUWELING, Volker Dirk HILDENBRAND, Alexander Ludwig KLEIN, Paul Alexander VERMEULEN
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Patent number: 11567399Abstract: A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.Type: GrantFiled: December 31, 2021Date of Patent: January 31, 2023Assignee: ASML Netherlands B.V.Inventors: Zomer Silvester Houweling, Chaitanya Krishna Ande, Dennis De Graaf, Thijs Kater, Michael Alfred Josephus Kuijken, Mahdiar Valefi
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Publication number: 20220276553Abstract: A pellicle membrane for a lithographic apparatus, the membrane including uncapped carbon nanotubes. A method of regenerating a pellicle membrane, the method including decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. A method of reducing the etch rate of a pellicle membrane, the method including providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane. An assembly for a lithographic apparatus, the assembly including a biased electrode near or including the pellicle membrane or heating means for the pellicle membrane.Type: ApplicationFiled: August 20, 2020Publication date: September 1, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Andrey NIKIPELOV, Sander BALTUSSEN, Vadim Yevgenyevich BANINE, Alexandr DOLGOV, DONMEZ NOYAN, Zomer Silvester HOUWELING, Arnoud Willem NOTENBOOM, Marcus Adrianus VAN DE KERKHOF, Ties Wouter VAN DER WOORD, Paul Alexander VERMEULEN, David Ferdinand VLES, Victoria VORONINA, Halil Gökay YEGEN
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Publication number: 20220121110Abstract: A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.Type: ApplicationFiled: December 31, 2021Publication date: April 21, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Zomer Silvester HOUWELING, Chaitanya Krishna ANDE, Dennis DE GRAAF, Thijs KATER, Michael Alfred Josephus KUIJKEN, Mahdiar VALEFI
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Patent number: 11237475Abstract: A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.Type: GrantFiled: November 6, 2018Date of Patent: February 1, 2022Assignee: ASML Netherlands B.V.Inventors: Zomer Silvester Houweling, Chaitanya Krishna Ande, Dennis De Graaf, Thijs Kater, Michael Alfred Josephus Kuijken, Mahdiar Valefi
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Publication number: 20200341365Abstract: A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.Type: ApplicationFiled: November 6, 2018Publication date: October 29, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Zomer Silvester HOUWELING, Chaitanya Krishna ANDE, Dennis DE GRAAF, Thijs KATER, Michael Alfred Josephus KUIJKEN, Mahdiar VALEFI
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Patent number: 10712656Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.Type: GrantFiled: August 26, 2016Date of Patent: July 14, 2020Assignee: ASML Netherlands B.V.Inventors: Zomer Silvester Houweling, Eric Willem Felix Casimiri, Tamara Druzhinina, Paul Janssen, Michael Alfred Josephus Kuijken, Martinus Hendrikus Antonius Leenders, Sicco Oosterhoff, Mária Péter, Willem Joan Van Der Zande, Pieter-Jan Van Zwol, Beatrijs Louise Marie-Joseph Katrien Verbrugge, Johannes Petrus Martinus Bernardus Vermeulen, David Ferdinand Vles, Willem-Pieter Voorthuijzen
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Publication number: 20180239240Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.Type: ApplicationFiled: August 26, 2016Publication date: August 23, 2018Inventors: Zomer Silvester HOUWELING, Eric Willem Felix CASIMIRI, Tamara DRUZHININA, JANSSEN Paul, Michael Alfred Josephus KUIJKEN, Martinus Hendrikus Antonius LEENDERS, Sicco OOSTERHOFF, Mária PÉTER, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Beatrijs Louise Marie-Joseph Katrie VERBRUGGE, Johannes Petrus Martinus Bernardus VERMEULEN, David Ferdinand VLES, Willem-Pieter VOORTHUIJZEN