Patents by Inventor Zongchang Yu

Zongchang Yu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10628935
    Abstract: Methods and systems for identifying defects in an integrated circuit are provided. The method includes receiving input data of a pattern associated with an integrated circuit, determining feature data associated with features of the pattern using the input data, determining defect detection results associated with the pattern using the input data, the feature data, and defect detection techniques, and determining a defect identification result using the defect detection results. The system includes a processor and a memory. The memory is coupled to the processor and configured to store a set of instructions to receive input data of a pattern associated with an integrated circuit, determine feature data associated with features of the pattern using the input data, determine defect detection results associated with the pattern using the input data, the feature data, and defect detection techniques, and determine a defect identification result using the defect detection results.
    Type: Grant
    Filed: January 30, 2017
    Date of Patent: April 21, 2020
    Assignee: Zhongke Jingyuan Electron Limited
    Inventors: Zhaoli Zhang, Jie Lin, Zongchang Yu
  • Patent number: 10565702
    Abstract: Methods and systems for inspecting integrated circuits are provided. The method includes monitoring an inspection of integrated circuits to receive inspection data including machine data and defect detection results, storing the inspection data in a database, modifying, via the database, at least one of a plurality of recipe files associated with the inspection based on the machine data, and modifying, via the database, at least one of a plurality of software parameters associated with the inspection based on the defect detection results. The system includes a memory including instructions executable by a processor to monitor an inspection of integrated circuits to receive and store inspection data including machine data and defect detection results in a database, modify, via the database, a recipe file associated with the inspection based on the machine data, and modify, via the database, a software parameter associated with the inspection based on the defect detection results.
    Type: Grant
    Filed: January 30, 2017
    Date of Patent: February 18, 2020
    Assignee: Dongfang Jingyuan Electron Limited
    Inventors: Zhaoli Zhang, Jie Lin, Hua-yu Liu, Zongchang Yu
  • Patent number: 10521539
    Abstract: A method, a non-transitory computer-readable medium, and an apparatus for optimizing a design layout of an integrated circuit (IC) includes: selecting layout regions from a full-chip design layout for the IC; determining pixel images for the layout regions by performing pixel-based mask optimization for the layout regions, in which each pixel image corresponds to a respective layout region; determining a backpropagation (BP) artificial neural network (ANN) model using the pixel images and the layout regions; and determining a full-chip pixel image for the full-chip design layout using the BP ANN model, in which the BP ANN model uses the full-chip design layout as input.
    Type: Grant
    Filed: May 9, 2017
    Date of Patent: December 31, 2019
    Assignees: Shenzhen Jingyuan Information Technology Limited, Dongfang Jinigryuan Electron Limited
    Inventors: Zongchang Yu, Shengrui Zhang, Weijie Shi
  • Patent number: 10140400
    Abstract: Methods and systems for defect prediction are provided. The method includes receiving feature data of an integrated circuit (IC) and process condition data of a production process associated with the IC, and determining a care area associated with the IC using the feature data, the process condition data, and a defect prediction technique, wherein the care area includes a potential defect and is inspected by a high-resolution inspection system. Based on the provided methods and systems, care areas can be generated incorporating actual process conditions when the inspected IC is being manufactured, and fast and high-resolution IC defect inspection systems can be implemented.
    Type: Grant
    Filed: January 30, 2017
    Date of Patent: November 27, 2018
    Assignee: Dongfang Jingyuan Electron Limited
    Inventors: Zongchang Yu, Jie Lin, Zhaoli Zhang
  • Patent number: 10133838
    Abstract: A method and system for detecting defects of integrated circuits have been provided. The method comprises generating process sensitive patterns of an integrated circuit, scanning the process sensitive patterns using a high-resolution system to provide process condition parameters of the integrated circuit, determining care areas of the integrated circuit using the process condition parameters, and scanning the care areas using the high-resolution system to detect at least one defect of the integrated circuit. The system comprises a processor and a memory with instructions executable by the processor to generate process sensitive patterns of an integrated circuit, scan the process sensitive patterns using a high-resolution system to provide process condition parameters of the integrated circuit, determine care areas of the integrated circuit using the process condition parameters, and scan the care areas using the high-resolution system to detect at least one defect of the integrated circuit.
    Type: Grant
    Filed: January 30, 2017
    Date of Patent: November 20, 2018
    Assignee: Dongfang Jingyuan Electron Limited
    Inventors: Hua-Yu Liu, Jie Lin, Zhaoli Zhang, Zongchang Yu
  • Publication number: 20180225817
    Abstract: A method, a non-transitory computer-readable medium, and an apparatus for optimizing a design layout of an integrated circuit (IC) includes: selecting layout regions from a full-chip design layout for the IC; determining pixel images for the layout regions by performing pixel-based mask optimization for the layout regions, in which each pixel image corresponds to a respective layout region; determining a backpropagation (BP) artificial neural network (ANN) model using the pixel images and the layout regions; and determining a full-chip pixel image for the full-chip design layout using the BP ANN model, in which the BP ANN model uses the full-chip design layout as input.
    Type: Application
    Filed: May 9, 2017
    Publication date: August 9, 2018
    Inventors: Zongchang Yu, Shengrui Zhang, Weijie Shi
  • Publication number: 20180218096
    Abstract: Methods and systems for defect prediction are provided. The method includes receiving feature data of an integrated circuit (IC) and process condition data of a production process associated with the IC, and determining a care area associated with the IC using the feature data, the process condition data, and a defect prediction technique, wherein the care area includes a potential defect and is inspected by a high-resolution inspection system. Based on the provided methods and systems, care areas can be generated incorporating actual process conditions when the inspected IC is being manufactured, and fast and high-resolution IC defect inspection systems can be implemented.
    Type: Application
    Filed: January 30, 2017
    Publication date: August 2, 2018
    Inventors: Zongchang Yu, Jie Lin, Zhaoli Zhang
  • Publication number: 20180218090
    Abstract: A method and system for detecting defects of integrated circuits have been provided. The method comprises generating process sensitive patterns of an integrated circuit, scanning the process sensitive patterns using a high-resolution system to provide process condition parameters of the integrated circuit, determining care areas of the integrated circuit using the process condition parameters, and scanning the care areas using the high-resolution system to detect at least one defect of the integrated circuit. The system comprises a processor and a memory with instructions executable by the processor to generate process sensitive patterns of an integrated circuit, scan the process sensitive patterns using a high-resolution system to provide process condition parameters of the integrated circuit, determine care areas of the integrated circuit using the process condition parameters, and scan the care areas using the high-resolution system to detect at least one defect of the integrated circuit.
    Type: Application
    Filed: January 30, 2017
    Publication date: August 2, 2018
    Inventors: Hua-Yu Liu, Jie Lin, Zhaoli Zhang, Zongchang Yu
  • Publication number: 20180218492
    Abstract: Methods and systems for identifying defects in an integrated circuit are provided. The method includes receiving input data of a pattern associated with an integrated circuit, determining feature data associated with features of the pattern using the input data, determining defect detection results associated with the pattern using the input data, the feature data, and defect detection techniques, and determining a defect identification result using the defect detection results. The system includes a processor and a memory. The memory is coupled to the processor and configured to store a set of instructions to receive input data of a pattern associated with an integrated circuit, determine feature data associated with features of the pattern using the input data, determine defect detection results associated with the pattern using the input data, the feature data, and defect detection techniques, and determine a defect identification result using the defect detection results.
    Type: Application
    Filed: January 30, 2017
    Publication date: August 2, 2018
    Inventors: Zhaoli Zhang, Jie Lin, Zongchang Yu
  • Publication number: 20180218493
    Abstract: Methods and systems for inspecting integrated circuits are provided. The method includes monitoring an inspection of integrated circuits to receive inspection data including machine data and defect detection results, storing the inspection data in a database, modifying, via the database, at least one of a plurality of recipe files associated with the inspection based on the machine data, and modifying, via the database, at least one of a plurality of software parameters associated with the inspection based on the defect detection results. The system includes a memory including instructions executable by a processor to monitor an inspection of integrated circuits to receive and store inspection data including machine data and defect detection results in a database, modify, via the database, a recipe file associated with the inspection based on the machine data, and modify, via the database, a software parameter associated with the inspection based on the defect detection results.
    Type: Application
    Filed: January 30, 2017
    Publication date: August 2, 2018
    Inventors: Zhaoli Zhang, Jie Lin, Hua-yu Liu, Zongchang Yu