Abstract: The present invention provides a film edge detecting method and a film edge detecting device. The film edge detecting method is used for detecting a film edge of a film layer formed on a substrate, the film layer comprises a patterned film layer, the method includes: forming at least one scale pattern in the patterned film layer, a film edge of the patterned film layer corresponding to an edge of the scale pattern; obtaining a patterned film edge indication value of the edge of the scale pattern; and obtaining a second distance, which is a distance between the film edge of the non-patterned film layer and a corresponding edge of the substrate, based on the non-patterned film edge indication value and a preset reference value of the corresponding edge of the substrate.

Abstract: An UV curing mask plate, comprising: a mask layer, wherein: the mask layer is arranged on the substrate, and has a position corresponding to alignment marks, selection marks and an area not covered by the sealing frame glue to be cured; the material of the mask layer is a material with the function of blocking UV light.

Abstract: The embodiment of the present invention discloses a display panel, a driving method thereof and a display device, a plurality of shift register units connected in one-to-one correspondence are arranged at one terminal of a plurality of gate lines, a plurality of charging modules connected in one-to-one correspondence are arranged at the other terminal of the plurality of gate lines; each charging module charges a corresponding gate line when the corresponding gate line is applied with a scanning signal by the shift register unit, i.e., when the shift register unit applies a scanning signal to the gate line, the charging module to which the gate line corresponds charges the gate line at the same time, which realizes bidirectional application of the scanning signal to the gate line, and increases the charging rate of the gate line.

Abstract: The present invention provides a substrate dry device and a method for drying the substrate, the substrate dry device comprises a cavity, dry bars and a sensor disposed on the top of the cavity, liquid immerging the substrate is accommodated within the cavity, with the dry bars comprising a first dry bar and a second dry bar arranged parallel to each other, with a gap is formed therebetween and with the sensor disposed on one end or on two ends of the gap for monitoring a position in which the substrate is moved away from the liquid. By use of the above arrangement, the gas is ejected through the dry bars to the surface of the substrate which has moved away from the liquid, the tension of the surface of the liquid film on the substrate is changed by marangori effect under the action of the gas and the surface tension gradient of the liquid film makes the liquid film shrink so that the surface of the substrate becomes dry.

Abstract: Disclosed is a method for preparing a polycrystalline metal oxide pattern, characterized by comprising: annealing a predetermined region of an amorphous metal oxide film by laser, so as to convert the amorphous metal oxide in the predetermined region into a polycrystalline metal oxide; and etching the amorphous metal oxide outside of the predetermined region so as to remove it. By the method according to the present invention, firstly, the predetermined region of an amorphous metal oxide film is annealed by laser so as to convert the amorphous metal oxide into a polycrystalline metal oxide, and then, the amorphous metal oxide outside of the predetermined region is etched away, thereby a polycrystalline metal oxide pattern is formed. The method for preparing a polycrystalline metal oxide pattern according to the present invention is simple, and can effectively shorten the production period and save production costs.

Abstract: The present invention provides a film edge detecting method and a film edge detecting device. The film edge detecting method is used for detecting a film edge of a film layer formed on a substrate, the film layer comprises a patterned film layer, the method includes: forming at least one scale pattern in the patterned film layer, a film edge of the patterned film layer corresponding to an edge of the scale pattern; obtaining a patterned film edge indication value of the edge of the scale pattern; and obtaining a second distance, which is a distance between the film edge of the non-patterned film layer and a corresponding edge of the substrate, based on the non-patterned film edge indication value and a preset reference value of the corresponding edge of the substrate.

Abstract: The embodiments of the present disclosure provide an etching liquid storage apparatus and a wet etching device, which relates to the field of display technology, and can reduce the concentration of foreign ions in the etching liquid, so as to avoid frequent replacement of the etching liquid, thereby ensuring stability of the etching process, meanwhile, can also prolong the service life of the etching liquid, so as to reduce the cost; the etching liquid storage apparatus comprises an etching liquid storage tank, an ion exchange membrane for enabling selective permeation of ions in the etching liquid, and an anode or a cathode located at both sides of the ion exchange membrane; wherein a first chamber is formed between the ion exchange membrane and the anode, a second chamber is formed between the ion exchange membrane and the cathode; it is used for manufacture of the wet etching device.

Abstract: A discharge device and a display panel preparation system based thereon are disclosed. The discharge device includes a conductive contact terminal electrically connected with an electrostatic discharge contactor of a substrate to be processed; and a voltage controller electrically connected to the contact terminal for adjusting a voltage on the contact terminal. The discharge device is able to eliminate (e.g., neutralize) the static electricity on the substrate to be processed.

Abstract: Provided is a manufacturing method of an array substrate with an etching stop layer. The method includes: forming a pattern including a gate, a gate line and a common electrode line on a substrate through a first patterning process; forming a gate insulation layer, an active layer film and an etching stop layer through a second patterning process; wherein, the etching stop layer corresponds to a gap between a source and a drain which are to be formed, and a via hole exposing the common electrode line is formed above the common electrode line; forming at least an active layer, a pattern including source, drain and data line and a protection layer through a third patterning process; wherein, the protection layer exposes a part of the drain; and forming at least a pixel electrode through a fourth patterning process; wherein, the pixel electrode is electrically connected with the drain.

Abstract: A method of removing a photoresist, an exposure apparatus and a method of manufacturing a display substrate are disclosed. The method of removing a photoresist includes the following steps: exposing the photoresist (43) remaining on the substrate (41) after the substrate is subjected to a patterning process; and removing the exposed photoresist (45) by a developing process. In this way, the necessities for the stripping apparatus used in stripping process, the high power apparatus and the chemical gas both used in the ashing process can be eliminated, thereby reducing the equipment cost and production cost.

Abstract: The invention discloses an array substrate, and a method for repairing a broken data line on an array substrate. The method for repairing a broken data line on an array substrate includes steps: performing a treatment on a part of a semiconductor layer corresponding to an opening in a data line so that the part of the semiconductor layer becomes a conductive region, and the ends of the opening in the data line are electrically connected to each other by the conductive semiconductor layer. The above method for repairing a broken data line provided by the invention is not affected by the linewidth of the data line so that the broken data line can be repaired in the case that the linewidth of the data line is relatively small.

Abstract: The present invention provides a substrate dry device and a method for drying the substrate, the substrate dry device comprises a cavity, dry bars and a sensor disposed on the top of the cavity, liquid immerging the substrate is accommodated within the cavity, with the dry bars comprising a first dry bar and a second dry bar arranged parallel to each other, with a gap is formed therebetween and with the sensor disposed on one end or on two ends of the gap for monitoring a position in which the substrate is moved away from the liquid. By use of the above arrangement, the gas is ejected through the dry bars to the surface of the substrate which has moved away from the liquid, the tension of the surface of the liquid film on the substrate is changed by marangori effect under the action of the gas and the surface tension gradient of the liquid film makes the liquid film shrink so that the surface of the substrate becomes dry.

Abstract: Disclosed is a method for preparing a polycrystalline metal oxide pattern, characterized by comprising: annealing a predetermined region of an amorphous metal oxide film by laser, so as to convert the amorphous metal oxide in the predetermined region into a polycrystalline metal oxide; and etching the amorphous metal oxide outside of the predetermined region so as to remove it. By the method according to the present invention, firstly, the predetermined region of an amorphous metal oxide film is annealed by laser so as to convert the amorphous metal oxide into a polycrystalline metal oxide, and then, the amorphous metal oxide outside of the predetermined region is etched away, thereby a polycrystalline metal oxide pattern is formed. The method for preparing a polycrystalline metal oxide pattern according to the present invention is simple, and can effectively shorten the production period and save production costs.

Abstract: An array substrate, a testing method and a manufacturing method of the array substrate are disclosed. The array substrate comprises a first test line (3), a second test line (4), and first data lines (1) and second data lines (2) that are disposed alternately. The first data lines (1) are directly connected to the first test line (3), and the second data lines (2) are connected to the second test line (4) through switch elements (7); or, the second data lines (2) are directly connected to the second test line (4), and the first data lines (1) are connected to the first test line (3) through switch elements (7). With the array substrate, charges in the display region can be avoided from being transferred to a test line, thereby decreasing the accumulation of static electricity, and enhancing reliability of the short bar region.

Abstract: A thin film transistor and manufacturing method thereof, an array substrate (1) comprising the thin film transistor and manufacturing method thereof. The method of manufacturing the thin film transistor comprises forming an active layer (4) and a source-drain electrode layer (5), forming a photoresist layer (6) on the source-drain electrode layer (5) and forming a pattern of the photoresist layer by a pattern process; etching the source-drain electrode layer (5) by using the pattern of the photoresist layer as a mask to form a pattern of the source-drain electrode layer including a source electrode and a drain electrode; and removing the photoresist, then etching the active layer (4) by using the pattern of the source-drain electrode layer as a mask to form a pattern of the active layer.

Abstract: The present disclosure relates to an array substrate, a method of manufacturing the same and a display device. The array substrate comprises a gate line PAD region and a data line PAD region. In the gate line PAD region of the array substrate, gate-line wirings, which are parallel to the gate lines and are electrically insulated from the gate lines, are provided between adjacent gate lines. In the data line PAD region of the array substrate, data-line wirings, which are parallel to the data lines and are electrically insulated from the data lines, are provided between adjacent data lines. Both of the gate-line wirings and the data-line wirings are conductive wiring segments. By forming the gate-line wirings and the data-line wirings in the PAD region, the ability of resisting scratch of the product can be improved while not deteriorating performance of display of the product.

Abstract: The present invention provides an array substrate, its manufacturing method, and a display device. The array substrate comprises a gate metal layer, a gate insulating layer, a source/drain metal layer, first common electrode lines arranged on an identical layer to the gate metal layer, a first via hole arranged in the gate insulating layer and corresponding to the first common electrode line, a source/drain metal filling part arranged within the first via hole, a second via hole in communication with the first via hole, and a transparent connection part. The first common electrode lines are, by means of the transparent connection part and the source/drain metal filling part, in electrical connection with each other through the second via hole. According to the present invention, it is able to reduce the depth of the via holes in the array substrate, and improve the uneven diffusion of an alignment layer.

Abstract: The present invention provides an array substrate, its manufacturing method, and a display device. The array substrate comprises a gate metal layer, a gate insulating layer, a source/drain metal layer, first common electrode lines arranged on an identical layer to the gate metal layer, a first via hole arranged in the gate insulating layer and corresponding to the first common electrode line, a source/drain metal filling part arranged within the first via hole, a second via hole in communication with the first via hole, and a transparent connection part. The first common electrode lines are, by means of the transparent connection part and the source/drain metal filling part, in electrical connection with each other through the second via hole. According to the present invention, it is able to reduce the depth of the via holes in the array substrate, and improve the uneven diffusion of an alignment layer.

Abstract: The present invention discloses a method for manufacturing a thin-film transistor, comprising the steps of: forming a semiconductor active layer, and a doped semiconductor active layer; forming a source-drain metal layer; forming a channel region; and implanting ions for lowering the TFT leakage current into the surface of the semiconductor active layer in the channel region via ion implantation after forming the channel region. The invention further relates to a thin-film transistor, a TFT array substrate and a display device. The invention has the following beneficial effects: by implanting ions for lowering the TFT leakage current into the channel region, the electrical performance of a TFT may be improved, and the thickness of a semiconductor active layer in a channel region may be changed controllably.

Abstract: The present disclosure provides an array substrate, a manufacturing method thereof, and a display device. The array substrate comprises a gate electrode, a gate line, a data line, a gate insulating layer, an active layer, a source electrode and a drain electrode on a substrate. The gate electrode, the gate line and the data line are arranged on an identical layer, the gate line intersects the data line at a right angle, and the data line is disconnected at an intersection with the gate line. The source electrode and the drain electrode are arranged above the gate electrode, the gate line and the data line, and the disconnected data lines are connected via the source electrode.