Patents by Inventor Zouming Zhu

Zouming Zhu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature CVD systems
    Patent number: 8663390
    Abstract: A method and apparatus for delivering precursor materials to a processing chamber is provided. In one embodiment, a deposition apparatus is provided. The apparatus includes a chamber having a longitudinal axis, and a gas distribution assembly coupled to a sidewall of the chamber. The gas distribution assembly comprises a plurality of plenums coupled to one or more gas sources, an energy source positioned to provide energy to each of the plurality of plenums, and a variable power source coupled to the energy source, wherein the gas distribution assembly provides a flow path through the chamber that is normal to the longitudinal axis of the chamber.
    Type: Grant
    Filed: July 1, 2011
    Date of Patent: March 4, 2014
    Assignee: Applied Materials, Inc.
    Inventors: David Keith Carlson, Satheesh Kuppurao, Howard Beckford, Herman Diniz, Kailash Kiran Patalay, Brian Hayes Burrows, Jeffrey Ronald Campbell, Zouming Zhu, Xiaowei Li, Errol Antonio Sanchez
  • INDEPENDENT RADIANT GAS PREHEATING FOR PRECURSOR DISASSOCIATION CONTROL AND GAS REACTION KINETICS IN LOW TEMPERATURE CVD SYSTEMS
    Publication number: 20110259432
    Abstract: A method and apparatus for delivering precursor materials to a processing chamber is provided. In one embodiment, a deposition apparatus is provided. The apparatus includes a chamber having a longitudinal axis, and a gas distribution assembly coupled to a sidewall of the chamber. The gas distribution assembly comprises a plurality of plenums coupled to one or more gas sources, an energy source positioned to provide energy to each of the plurality of plenums, and a variable power source coupled to the energy source, wherein the gas distribution assembly provides a flow path through the chamber that is normal to the longitudinal axis of the chamber.
    Type: Application
    Filed: July 1, 2011
    Publication date: October 27, 2011
    Inventors: DAVID KEITH CARLSON, SATHEESH KUPPURAO, HOWARD BECKFORD, HERMAN DINIZ, KAILASH KIRAN PATALAY, BRIAN HAYES BURROWS, JEFFREY RONALD CAMPBELL, ZOUMING ZHU, XIAOWEI LI, ERROL ANTONIO SANCHEZ
  • Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature CVD systems
    Patent number: 7976634
    Abstract: A method and apparatus for delivering precursor materials to a processing chamber is described. The apparatus includes a gas distribution assembly having multiple gas delivery zones. Each zone may include a plenum having an inlet for receiving a precursor gas and at least one source of non-thermal energy, such as an infrared light source. The at least one source of non-thermal energy is may be varied to control the intensity of wavelengths from the infrared light source.
    Type: Grant
    Filed: November 8, 2007
    Date of Patent: July 12, 2011
    Assignee: Applied Materials, Inc.
    Inventors: David Keith Carlson, Satheesh Kuppurao, Howard Beckford, Herman Diniz, Kailash Kiran Patalay, Brian Hayes Burrows, Jeffrey Ronald Campbell, Zouming Zhu, Xiaowei Li, Errol Antonio Sanchez
  • Independent Radiant Gas Preheating for Precursor Disassociation Control and Gas Reaction Kinetics in Low Temperature CVD Systems
    Publication number: 20080210163
    Abstract: A method and apparatus for delivering precursor materials to a processing chamber is described. The apparatus includes a gas distribution assembly having multiple gas delivery zones. Each zone may include a plenum having an inlet for receiving a precursor gas and at least one source of non-thermal energy, such as an infrared light source. The at least one source of non-thermal energy is may be varied to control the intensity of wavelengths from the infrared light source.
    Type: Application
    Filed: November 8, 2007
    Publication date: September 4, 2008
    Inventors: David Keith Carlson, Satheesh Kuppurao, Howard Beckford, Herman Diniz, Kailash Kiran Patalay, Brian Hayes Burrows, Jeffrey Ronald Campbell, Zouming Zhu, Xiaowei Li, Errol Antonio Sanchez