Abstract: Disclosed is an apparatus including a mechanical reference frame and a rigid object mechanically coupled to the reference frame by two or more constraints. The stiffnesses of at least two of the constraints are different from one another, and the relative locations and stiffnesses of the constraints cause a designated point on the rigid object to remain stationary with respect to the reference frame during thermal expansion of the rigid object over a range of temperatures.

Abstract: Metrology system, apparatus and method used to implement measurements inside a lithography tool are described, such that the disclosed measurements can be performed without contributing outgassed effluent within the lithography tool. Disclosed is a system including: an objective for projecting an image of an object positioned at an object plane to an image plane; a stage to execute motions relative to the objective while supporting the wafer at the image plane; an optical sensor for producing an optical monitoring signal associated with the motions of the stage; and a glass optical fiber having a metal outer coating, the metal-coated glass optical fiber being arranged to provide light to, or collect light from, the optical sensor.

Abstract: An encoder system includes an encoder scale and an encoder head, in which the encoder head is configured to combine each twice-diffracted measurement beam of multiple twice-diffracted measurement beams with a corresponding reference beam to form multiple output beams, where the encoder head includes a monolithic optical component having multiple facets, the multiple facets being arranged to: receive multiple once-diffracted measurement beams from a surface of the encoder scale; and redirect the multiple once-diffracted measurement beams back towards the surface of the encoder scale, the encoder scale being positioned in a path of the once-diffracted measurement beams to produce the twice-diffracted measurement beams.

Abstract: A method for determining information about changes in a position of an encoder scale includes separating, in a first interferometry cavity, a low coherence beam into a first beam propagating along a first path of the first interferometry cavity and a second beam propagating along a second path of the first interferometry cavity, combining the first beam and the second beam to form a first output beam, separating, in a second interferometry cavity, the first output beam into a measurement beam propagating along a measurement path of the second interferometry cavity and a reference beam propagating along a reference path of the second interferometry cavity, combining the measurement beam and the reference beam to form a second output beam, detecting an interference signal based on the second output beam, and determining the information about changes in the position of the encoder scale based on phase information from the interference signal.

Abstract: An encoder head includes one or more components arranged to: i) direct a first incident beam to the diffractive encoder scale at a first incident angle with respect to the encoder scale; ii) receive a first return beam from the encoder scale at a first return angle, the first return angle being different from the first incident angle; iii) redirect the first return beam to the encoder scale as a second incident beam at a second incident angle; and iv) receive a second return beam back from the encoder scale at a second return angle, the second return angle being different from the second incident angle, in which a difference between the first incident angle and second incident angle is less than a difference between the first incident angle and the first return angle and less than a difference between the second incident angle and the second return angle.