VAPORIZATION DEVICE AND VAPORIZATION SYSTEM

Abstract

In order to make it possible to accurately detect the liquid level of a liquid material in a container, a vaporization device is adapted to include: a container 10 that contains a liquid material X; a heater 30 that heats the liquid material X in the container 10; and a liquid level sensor 20 that detects the liquid level of the liquid material in the container 10, in which when viewing the inside of the container 10 from above, a vaporization region S1 in which the liquid material X is vaporized, and a liquid level stable region S2 different from the vaporization region S1 are configured to be formed, and the liquid level sensor 20 detects the liquid level of the liquid material X in the liquid level stable region S2.

Description

TECHNICAL FIELD

The present invention relates to a vaporization device that vaporizes a liquid material, and to a vaporization system using the vaporization device.

BACKGROUND ART

As this sort of vaporization device, as disclosed in Patent Literature 1, there is one including: a container into which a liquid material is introduced; and a heater for heating the liquid material in the container and configured to heat the liquid material to vaporize it and lead the resulting gas out of the container to introduce it into various equipment.

This vaporization device further includes a liquid level sensor inserted into the container in order to make it possible to check the remaining amount of the liquid material in the container.

However, bubbling due to vaporizing the liquid material occurs in the container, and therefore there is a problem of being unable to accurately detect a liquid level for reasons such as fluctuation of the liquid level and attachment of the liquid material scattered from a liquid surface to the liquid level sensor. Such a problem becomes more noticeable as a vaporization device is downsized.

CITATION LIST

Patent Literature

Patent Literature 1

Japanese Unexamined Patent Publication JP-A-07-194961

SUMMARY OF INVENTION

Technical Problem

Therefore, the present invention has been made in order to solve the above-described problem, and the main object thereof is to provide a vaporization device capable of accurately detecting the liquid level of a liquid material in a container.

Solution to Problem

That is, the vaporization device of the present invention is one including: a container that contains a liquid material; a heater that heats the liquid material in the container; and a liquid level sensor that detects the liquid level of the liquid material in the container, in which when viewing the inside of the container from above, a vaporization region in which the liquid material is vaporized, and a liquid level stable region are formed, and the liquid level sensor detects the liquid level of the liquid material in the liquid level stable region.

In the vaporization device configured as described, when viewing the inside of the container from above, the vaporization region and the liquid level stable region are formed, and the liquid level sensor detects the liquid level in the liquid level stable region, thus making it possible to accurately detect the liquid level of the liquid material in the container.

In addition, the liquid level stable region here is not limited to a region in which the liquid level does not fluctuate at all, and to the extent that detection accuracy by the liquid level sensor can be improved more than before, the liquid level may fluctuate.

As a more specific embodiment, a configuration in which the heater is provided to part of a side wall of the container or to the vicinity of it can be cited.

In such a configuration, a side where the heater is arranged in the container can be actively heated to form the vaporization region on the heater side and also form the liquid level stable region on a side opposite to the heater. As a result, fluctuation occurring on a liquid surface in the vaporization region can be reduced until reaching the liquid level stable region, and the liquid material scattered from the liquid surface in the vaporization region can be prevented from reaching the liquid level sensor, thus making it possible to accurately detect the liquid level of the liquid material.

It is preferable to further include a separation member that separates between the vaporization region and the liquid level stable region so as to enable the liquid material to be circulated between these regions.

In such a configuration, the separation member can surely prevent the liquid level in the vaporization region from fluctuating and the liquid material scattered from the liquid surface in the vaporization region from reaching the liquid level stable region.

In order to keep the liquid level at the same height between the vaporization region and the liquid level stable region, it is preferable that the separation member separates between the vaporization region and the liquid level stable region so as to enable material gas resulting from vaporization of the liquid material to be circulated between these regions.

As a specific embodiment for forming the vaporization region and the liquid level stable region in the container, one configured so that a calorific value given per unit volume per unit time is lower in the liquid level stable region than in the vaporization region can be cited.

Meanwhile, if the material gas resulting from vaporization of the liquid material is condensed and liquefied in the container, the liquid material may be led out of the container together with the material gas to make it impossible to accurately control, for example, the flow rate of the material gas, or the like.

Accordingly, in order to suppress the material gas from being liquefied, it is preferable to include a heater that is provided in an upper part of the container and heats material gas resulting from vaporization of the liquid material.

Even if the material gas is liquefied in the container, in order to prevent the liquid material resulting from the liquefaction from being led out of the container together with the material gas, it is preferable that a lead-out port for leading material gas resulting from vaporization of the liquid material out of the container is provided on a vaporization region side of the container.

In a configuration in which the liquid material is introduced into the vaporization region, the introduced liquid material may be vaporized at once to rapidly raise the pressure inside the container, possibly making it impossible to accurately control, for example, the flow rate of the material gas.

Accordingly, in order to avoid a rapid pressure rise in the container, it is preferable that an introduction port for introducing the liquid material into the container is formed on a liquid level stable region side of the container.

Also, the vaporization system according to the present invention is one including: the above-described vaporization device; a liquid material supply device that supplies the liquid material to the vaporization device; and a control device that controls the supply amount of the liquid material on the basis of a detection signal of the liquid level sensor.

In such a vaporization system, the liquid level sensor can accurately detect the liquid level of the liquid material, thus making it possible to improve control of the supply amount of the liquid material by the control device.

Advantageous Effects of Invention

According to the present invention configured as described, even in the case of the device of a small size, the liquid surface of the liquid material in the container can be accurately detected.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is a diagram schematically illustrating the configuration of a vaporization system in one embodiment of the present invention.

FIG. 2 is a diagram schematically illustrating the configuration of a vaporization device in the same embodiment.

FIG. 3 is a diagram when viewing the vaporization device in the same embodiment from a level direction of a liquid level.

FIG. 4 is a diagram when viewing a vaporization device in another embodiment from a level direction of a liquid level.

FIG. 5 is a diagram schematically illustrating the configuration of a vaporization device in another embodiment.

FIG. 6 is a diagram schematically illustrating the configuration of a vaporization device in another embodiment.

FIG. 7 is a diagram schematically illustrating the configuration of a vaporization device in another embodiment.

LIST OF REFERENCE CHARACTERS

100 Vaporization device

X Liquid material

10 Container

20 Liquid level sensor

30 Heater

P1 Introduction port

P2 Lead-out port

11 Side wall

S1 Vaporization region

S2 Liquid level stable region

40 Separation member

DESCRIPTION OF EMBODIMENTS

In the following, one embodiment of the vaporization device according to the present invention will be described with reference to drawings.

A vaporization device 100 of the present embodiment is one constituting part of a vaporization system Z used in a manufacturing process of, for example, semiconductors or the like, and as illustrated in FIG. 1, is introduced with a liquid material X from a liquid material supply device 200 through an introduction path L1 and vaporizes the liquid material X to produce material gas. The material gas produced by the vaporization device 100 is sent to target equipment through a lead-out path L2 as illustrated in FIG. 1.

The introduction path L1 and the lead-out path L2 are respectively provided with on-off valves V1, V2, and adapted to be switchable to any one, for example, whether introducing the liquid material X into the vaporization device 100 or leading the material gas out of the vaporization device 100 by opening/closing these on-off valves V1, V2 appropriately depending on circumstances. In addition, it is also possible to open both the on-off valves V1, V2, and close both.

Specifically, the supply amount of the liquid material X is adapted to be controllable in such a manner that the below-described liquid level sensor 20 detects the liquid level of the liquid material X in the vaporization device 100 and on the basis of the resulting detection signal, an unillustrated control device adjusts the opening level of the on-off valve V1 provided in the introduction path L1.

Also, the lead-out path L2 is provided with a flow rate controller MFC such as a differential pressure type or thermal type mass flow controller, and adapted to be able to control the flow rate of the material gas flowing through the lead-out path L2 to, for example, a preset target flow rate. In addition, a control valve constituting the flow rate controller MFC can be provided with a function as the above-described on-off valve V2, and in such a case, the on-off valve V2 is not necessarily required to be provided.

As illustrated in FIG. 2, the vaporization device 100 of the present embodiment includes: a container 10 that contains the liquid material X; the liquid level sensor 20 that detects the liquid level of the liquid material X in the container 10; and a heater 30 that heats the liquid material X in the container 10.

The container 10 is one whose inside is formed as a vaporization chamber S for vaporizing the liquid material X and that is, for example, of a casing shape. The container 10 here is one of a vertically-long vertically-mounted type, and formed with an introduction port P1 connected with the above-described introduction path L1 and a lead-out port P2 connected with the above-described lead-out path L2.

The introduction port P1 is positioned in the lower part of the container 10, and specifically, formed in the lower end part of a side wall 11 of the container 10. In addition, the introduction port P1 may be formed in the bottom wall 12 of the container 10 or may be provided in the upper part of the container 10.

The lead-out port P2 is positioned in the upper part of the container 10, and specifically, formed in the upper end part of a side wall 11 of the container 10. In addition, the lead-out port P2 may be formed in the upper wall 13 of the container 10.

The liquid level sensor 20 can use various types, such as a contact-type that detects the liquid level with a sensor part (not illustrated) in contact with the liquid material X, a noncontact-type that detects the liquid level with a sensor part not in contact with the liquid material X, a type having a movable part like a float type, and a type not having a movable part like an electrode type. Note that in the case of having a movable part, particles may be produced in the container 10, and therefore the liquid level sensor 2 not having a movable part is used here.

Specifically, the liquid level sensor 20 is a contact-type one inserted into the container 10 through an insertion hole provided in the upper wall 13 of the container 10, and configured to include a resistance temperature detector (not illustrated) such as a thermistor and to be able to detect the liquid level using the difference in heat dissipation factor between a liquid phase and a gas phase.

The heater 30 can use various types such as ones using a cartridge heater and a heating wire heater, and is a rubber heater constituted by, for example, silicon and the like. Note that the detailed arrangement of the heater 30 will be described below.

Further, as illustrated in FIG. 3, when viewing the inside of the container 10 from above (an arrow R direction in FIG. 2) (i.e., as viewed from a level direction of the liquid level stable in the container 10), the vaporization device 100 of the present embodiment is configured to form a vaporization region S1 in which the liquid material X in the container 10 is vaporized and a liquid level stable region S2 in which the liquid level is stable differently from the vaporization region S1, and the above-described liquid level sensor 20 is arranged so as to detect the liquid level in the liquid level stable region S2. In addition, the vaporization region S1 and the liquid level stable region S2 are not required to be strictly distinct regions, but the vaporization region S1 and the liquid level stable region S2 may partially overlap each other in a boundary part in cases such as when these regions S1, S2 are continuously formed.

The vaporization region S1 is a region on a side where the above-described heater 30 is provided in the container 10, and a region in which the liquid material X is actively heated. The vaporization region S1 here is a region in which a calorific value given per unit volume per unit time is higher than that in the liquid level stable region S2 and bubbles of various sizes are generated.

On the other hand, the liquid level stable region S2 is a region on a side where the above-described liquid level sensor 20 is provided in the container 10, and a region in which a variation in liquid level is smaller than that in the vaporization region S1. The liquid level stable region S2 here is a region whose temperature is lower than that in the vaporization region; however, in cases such as when the container 10 is of a small size, the liquid level stable region S2 and the vaporization region S1 may become substantially equalized in temperature. In addition, the liquid level stable region S2 is not required to be a region in which the liquid level does not fluctuate at all, and to the extent that the detection accuracy of the liquid level sensor 20 can be improved more than before, the liquid level may fluctuate, bubbles may be generated, or the liquid material X may be vaporized.

As illustrated in FIG. 2 and FIG. 3, the vaporization region S1 and the liquid level stable region S2 in the present embodiment are formed by arrangement of the above-described heater 30, and here the vaporization device 10 is further provided with a separation member 40 separating between the vaporization region S1 and the liquid level stable region S2.

Describing more specifically, the heater 30 is provided to part of the periphery of the vaporization chamber S without surrounding the whole of the vaporization chamber S. In doing so, in the vaporization chamber S, a region that is near to the heater 30 and in which the amount of heat transferred is large serves as the vaporization region S1, and a region that is far from the heater 30 and in which the amount of heat transferred is small serves as the liquid level stable region S2.

The heater 30 here is provided to part of the side wall of the container 10, and arranged so as to partially heat the liquid material X. In addition, the heater 30 is not necessarily required to be provided to the side wall 11, but may be provided in the vicinity of the side wall 11, or may be separated from the side wall 11 to the extent that the liquid material X can be vaporized. That is, the heater 30 may be provided integrally with the side wall 11, or may be formed as a separate body from the side wall 11 and provided separately from the side wall 11.

The container 10 in the present embodiment is of a rectangular parallelepiped shape, and as illustrated in FIG. 3, has: a first side wall 111 and a second side wall 112 which are opposite to each other; and a third side wall 113 and a fourth side wall 114 which are interposed between them and opposite to each other. In the present embodiment, the heater 30 is provided to the second side wall 112 without being provided to the first side wall 111. It may be appropriately selected whether or not to provide the heater 30 to the third side wall 113 or to the fourth side wall 114; however, in the case of providing, without providing at least on the first side wall 111 side of the third side wall 113 or fourth side wall 114, providing on the second side wall 112 side is preferable.

In the present embodiment, as illustrated in FIG. 2, in addition to the above-described heater 30 (hereinafter also referred to as a first heater 31), a second heater 32 for heating the material gas resulting from vaporization of the liquid material X is provided in the upper part of the container 10, and a third heater 33 for making the vaporization of the liquid material X highly efficient is provided in the lower part of the container 10.

In addition, the first heater 31, the second heater 32, and the third heater 33 may be ones that are respectively separate bodies, or may be ones that are partially or wholly integrally formed.

The second heater 32 is one that suppresses the material gas from being liquefying, and provided at least on the vaporization region S1 side in the upper wall 13 of the container 10. In addition, the second heater 32 may be provided from the vaporization region S1 side to the liquid level stable region S2 side in the upper wall 13, or may be provided from the upper wall 13 to the upper part of the first side wall 111. Also, the second heater 32 is not necessarily required to be provided to the upper wall 13, but may be provided in the vicinity of the upper wall 13, or may be separated from the upper wall 13 to the extent that the material gas can be suppressed from liquefying.

The third heater 33 is one that heats the liquid material X, and provided on the vaporization region S1 side in the bottom wall 12 of the container 10. In addition, the third heater 33 is not necessarily required to be provided to the bottom wall 12, but may be provided in the vicinity of the bottom wall 12, or may be separated from the bottom wall 12 to the extent that the liquid material X can be heated.

The separation member 40 is one that, as illustrated in FIG. 2 and FIG. 3, is interposed between the vaporization region S1 and the liquid level stable region S2 in the container 10, and makes it possible to circulate the liquid material X between the vaporization region S1 and the liquid level stable region S2, as well as to also here circulate the material gas between the vaporization region S1 and the liquid level stable region S2.

Specifically, the separation member 40 is one provided substantially parallel to the first side wall 111 and the second side wall 112, and here, for example, a rectangular-shaped flat plate provided from the third side wall 113 to the fourth side wall 114. In order to make the volumes of the vaporization region S1 and the liquid level stable region S2 substantially equal to each other, the separation member 40 separates between these regions S1, S2. In addition, the shape and arrangement of the separation member 40, the volume ratio between the vaporization region S1 and the liquid level stable region S2 separated by the separation member 40, and the like may be appropriately changed.

In the present embodiment, the lower end of the separation member 40 is separated from the bottom wall 12 to make it possible to circulate the liquid material X through the resulting interval, and also the upper end of the separation member 40 is separated from the upper wall 13 to make it possible to circulate the material gas through the resulting interval. In other words, the interval between the lower end of the separation member 40 and the bottom wall 12 allows a liquid phase in the vaporization region S1 and a liquid phase in the liquid level stable region S2 to communicate together, and also, the interval between the upper end of the separation member 40 and the upper wall 13 allows a gas phase in the vaporization region S1 and a gas phase in the liquid level stable region S2 to communicate together. Note that the liquid phase here refers to a region in which liquid exists, and the gas phase refers to a region in which gas exists.

Here, in the liquid level stable region S2, the above-described liquid level sensor 20 is provided, and specifically, arranged so that the lower end of the liquid level sensor 20 is positioned lower than the upper end of the separation member 40. Also, in the liquid level stable region S2, the above-described introduction port P1 is provided, and here the introduction port P1 is formed in a position opposite to the first heater 31, i.e., in the first side wall 111.

On the other hand, in the vaporization region S1, the above-described lead-out port P2 is provided, and here formed above the first heater 31 in the second side wall 112.

According to the vaporization device 100 according to the present embodiment configured as described, since the arrangement of the heater 30, and the separation member 40 allow the vaporization chamber S to be separated into the vaporization region S1 and the liquid level stable region S2, and also the liquid level sensor 20 is configured to detect the liquid level in the liquid level stable region S2, it can be prevented that the fluctuation of the liquid level due to bubbling occurring in the vaporization region S1 arrives at the liquid level stable region S2 and that the liquid material X scattered from the liquid surface in the vaporization region S1 is attached to the liquid level sensor 20.

As a result, the liquid level of the liquid material X can be accurately detected by the liquid level sensor 20, and on the basis of the detected liquid level, for example, it becomes possible to accurately control the supply amount of the liquid material X and accurately grasp the remaining amount of the liquid material X in the container 10. Such working effects are more noticeably produced as the vaporization device 100 is downsized; however, it goes without saying that even the vaporization device 100 of a large size can obtain the same working effects.

Also, since the material gas can pass between the vaporization region S1 and the liquid level stable region S2, pressure is substantially the same between the gas phase in the vaporization region S1 and the gas phase in the liquid level stable region S2, making it possible to make the liquid level substantially the same between the vaporization region S1 and the liquid level stable region S2.

Further, since the material gas is heated by the second heater 32, the material gas can be suppressed from liquefying. Still further, since the lead-out port P2 is formed in the vaporization region S1, even if the material gas liquefies, the liquid material X resulting from the liquefaction can be prevented from being led out of the container 10, and for example, the accuracy of flow rate control by, for example, the mass flow controller or the like can be ensured.

In addition, since the introduction port P1 is formed in the liquid level stable region S2, the liquid material X introduced into the container 10 through the introduction port P1 can be prevented from being vaporized at once, making it possible to prevent a rapid pressure rise in the container 10.

Note that the present invention is not limited to the above-described embodiment.

For example, in the above-described embodiment, the second side wall 112 is provided with the heater 30; however, the heater 30 may be provided on the vaporization region S1 side in the bottom wall 12, i.e., nearer to the first side wall 111 side (in the vicinity of the first side wall 111) than the separation member 40 in the bottom wall 12 without being provided to the second side wall 112. That is, it may be configured to provide the third heater 33 without providing the first heater 31 in the first embodiment.

Further, the vaporization device 100 only has to be configured to make the liquid level stable region S2 lower in temperature than the vaporization region S1 even in a configuration in which the entire periphery of the side walls 11 (i.e., the first side wall 111, second side wall 112, third side wall 113, and fourth side wall 114) of the container 10 is provided with the heater 30 or the entire bottom wall 12 of the container 10 is provided with the heater 30.

Specifically, one in which the heater 30 is configured so as to make a heating capacity for the liquid level stable region S2 lower than a heating capacity for the vaporization region S1, a configuration in which the liquid level stable region S2 is provided with a cooling mechanism, or the like can be cited.

Also, the separation member 40 is not required to be provided from the third side wall 113 to the fourth side wall 114, but as illustrated in FIG. 4, may be attached to, for example, the bottom wall 12 in such a way as to be separated from one or both of the third side wall 113 and the fourth side wall 114.

Further, the separation member 40 in the above-described embodiment separates between the vaporization region S1 and the liquid level stable region S2 while making it possible to circulate the material gas between the vaporization region S1 and the liquid level stable region S2; however, for example, if the gas phase in the liquid level stable region S2 is opened to the atmosphere, or by other means, the material gas may be unable to be circulated between the vaporization region S1 and the liquid level stable region S2.

Still further, as illustrated in FIG. 4, the introduction port P1 may be formed on the vaporization region S1 side, and for example, may be formed on the vaporization region S1 side in the second side wall 112, third side wall 113, or fourth side wall 114.

In such a configuration, the liquid material X is not directly introduced into the liquid level stable region S2, and therefore the liquid level in the liquid level stable region S2 can be suppressed from being fluctuated by introduction of the liquid material X.

On the other hand, as illustrated in FIG. 4, the lead-out port P2 may be formed on the liquid level stable region S2 side, and for example, may be formed in the upper end part of the first side wall 111, or in the upper end part on the liquid level stable region S2 side in the third side wall 113 or the fourth side wall 114.

In such a configuration, the lead-out port P2 can be kept away from the liquid surface in the vaporization region S1, and even when the liquid material X is scattered on the liquid surface in the vaporization region S1, the scattered liquid material X can be suppressed from arriving at the lead-out port P2.

In addition, as illustrated in FIG. 5, the vaporization device 100 may be configured to include: a first container 10A inside which a vaporization region S1 is formed; and a second container 10B inside which a liquid level stable region S2 is formed and that communicates with the first container 10A, in which the second container 10B is provided with a liquid level sensor 20.

Describing more specifically, the first container 10A and the second container 10B are arranged mutually separated via a space S3, and here tubular members provided so that tube axis directions are parallel to each other.

The first container 10A is such that the outer circumferential part thereof is provided with a heater 30 (a rubber heater or a winding heater) and the upper end part thereof communicates with a lead-out port P2 for leading out material gas.

The second container 10B is such that the inside thereof is inserted with the liquid level sensor 20 and the lower end part thereof communicates with an introduction port Pb for introducing a liquid material X.

The first container 10A and the second container 10B are configured such that the upper end parts thereof communicate with each other, while the lower end parts thereof communicate with each other, and a gas phase in the first container 10A and a gas phase in the second container 10B communicate together, while a liquid phase in the first container 10A and a liquid phase in the second container 10B communicate together.

In such a configuration, the space S3 interposed between the first container 10A and the second container 10B functions as the separation member 40, the same working effects as in the first embodiment can be obtained without providing the separation member 40 separately from the respective containers 10A, 10B.

As still another embodiment, as illustrated in FIG. 6, the separation member 40 may be tilted with respect to the first side wall 111 and the second side wall 112. Specifically, this separation member 40 is provided below the liquid level sensor 20, and arranged separated from the liquid level sensor 20 so that bubbles generated in the vaporization region S1 float along the separation member 40. In other words, in the vaporization device 100, a heater 30 is provided on the second side wall 112 side of the bottom wall 12, and the separation member 40 is tilted in such a manner as to gradually rise from the first side wall 111 toward the second side wall 112.

Even in such a configuration, as viewed from the level direction of the liquid level, the vaporization region S1 and the liquid level stable region S2 can be formed in the container 10, thus making it possible for the liquid level sensor 2 to accurately detect the liquid level in the liquid level stable region S2.

In addition, the vaporization device 100 may be one not including the separation member 40.

Specifically, as such a vaporization device 100, as illustrated in FIG. 7, a configuration in which a container 10 is a horizontally long one of which one end part in its longer direction is provided with a heater 30 and the other end part in the longer direction is provided with a liquid level sensor 20 can be cited. In such a configuration, in a vaporization chamber S of the container 10, one end part side in the longer direction is formed as a vaporization region S1, while the other end part side in the longer direction is formed as a liquid level stable region S2, and the liquid level sensor 20 is arranged so as to detect a liquid level in the liquid level stable region S2.

In such a configuration, a liquid material X scattered from a liquid surface in the vaporization region S1 can be prevented from arriving at the liquid level sensor 20, making it possible to accurately detect the liquid level of the liquid material X.

Besides, it goes without saying that the present invention is not limited to the above-described embodiments, but can be variously modified without departing from the scope thereof.

INDUSTRIAL APPLICABILITY

According to the present invention, the liquid level of the liquid material in the container can be accurately detected.

Claims

1. A vaporization device comprising:

a container that contains a liquid material;

a heater that heats the liquid material in the container; and

a liquid level sensor that detects a liquid level of the liquid material in the container, wherein

when viewing an inside of the container from above, a vaporization region in which the liquid material is vaporized, and a liquid level stable region are formed, and

the liquid level sensor detects the liquid level of the liquid material in the liquid level stable region.

2. The vaporization device according to claim 1, wherein

the heater is provided to a side wall of the container on a vaporization region side or to a vicinity of it.

3. The vaporization device according to claim 1, further comprising

a separation member that separates between the vaporization region and the liquid level stable region so as to enable the liquid material to be circulated between these regions.

4. The vaporization device according to claim 3, wherein

the separation member separates between the vaporization region and the liquid level stable region so as to enable material gas resulting from vaporization of the liquid material to be circulated between these regions.

5. The vaporization device according to claim 1, configured so that a calorific value given per unit volume per unit time is lower in the liquid level stable region than in the vaporization region.

6. The vaporization device according to claim 1, comprising

a heater that is provided in an upper part of the container and heats material gas resulting from vaporization of the liquid material.

7. The vaporization device according to claim 1, wherein

a lead-out port for leading material gas resulting from vaporization of the liquid material out of the container is provided on a vaporization region side of the container.

8. The vaporization device according to claim 1, wherein

an introduction port for introducing the liquid material into the container is formed on a liquid level stable region side of the container.

9. A vaporization system comprising:

the vaporization device according to claim 1;

a liquid material supply device that supplies the liquid material to the vaporization device; and

a control device that controls a supply amount of the liquid material on a basis of a detection signal of the liquid level sensor.