NAIL POLISH MACHINE THAT CAN BE APPLIED AND DRIED ON 5 FINGERS SIMULTANEOUSLY

Abstract

A nail polishing and drying device is provided. The nail polishing and drying device includes: a hand mould used for keeping a hand in a stable manner, a slipper located on the hand mould and is adjusted according to a finger dimension by moving forward backward in a horizontal manner, a nail detecting sensor placed within the slipper and determines the finger housing to send a nail polish by informing a system whether a finger is inside or not, a main hose transferring the nail polish to a hose separator acting as a distributor by pulling the nail polish from a nail polish chamber; an air drying or a UV drying system consisting of extra hoses transferring the nail polish coming from the main hose separately to spraying nozzles by being connected to the hose separator and applies the nail polish to five fingers simultaneously.

Description

CROSS REFERENCE TO THE RELATED APPLICATIONS

This application is the national stage entry of International Application No. PCT/TR2019/050126, filed on Feb. 27, 2019, which is based upon and claims priority to Turkish Patent Application No. 2018/16275 filed on Oct. 31, 2018, the entire contents of which are incorporated herein by reference.

TECHNICAL FIELD

The present invention is related to the nail polish machines that provides automatically applying and drying the nail polishes which are applied by women on their toes and fingers in terms of beauty and aesthetic.

The present invention is particularly related to the nail polish machine that automatically applies and dries nail polish on fingers and toes by means of placing them on moulds designed according to thereof.

BACKGROUND

Today women apply paint called nail polish on their fingers and toes in order to add a different outlook to themselves in terms of beauty and aesthetics.

The nail polishes of the prior art is applied by a person to the nails manually by means of a brush.

In the prior art there are machines apart from manual polishing, such as a 3d printer that applies nail polish on the nails by making patterns.

These machines in the prior art do not polish five fingers simultaneously in order to make a design. At the same time with the prior art, it takes too much time to make a design on one finger. Therefore it is a process that takes a long time.

In the prior art, polishes made with design are not always appropriate for daily usage. Particularly for women who work in corporations do not have the opportunity to use patterned nail polish.

In the prior art, polishing is made by means of an ink cartridge. Therefore it is not appropriate for the use of accessible and preferred nail polishes within the market.

Machines used in the state of the art are not appropriate for individual and mobile usage due to their dimensions and costs.

The method used in the state of the art can be used within more limited times. For this reason they do not appeal to the whole market.

During manual nail polish applying process in the prior art, the brush can be shifted and applied on the skin. Thus it requires extra effort for cleaning the skin.

In the prior art, it is difficult to manually apply nail polish on each nail equally. For this reason due to lack of equal outlook on each nail, the aesthetic outlook requirement which is the aim of polishing the nails, cannot be fulfilled fully.

In the prior art, after manual nail polishing, the nail polish is dried by the individual by means of blowing upon or waiting to dry. However when it is blown upon the nail polish, because the nail polish is a fluid, it shifts on the nail and its view is demolished. Waiting for it to dry also causes time wasting.

As a result of the researches made in the literature, we come across to the utility model with application No TR2011/09777 titled as “Nail polishing machine”. In the abstract of the invention with classification A45D 29/00 it is stated that “The invention is related to a nail polishing machine which is appropriate for using in centers such as beauty salons, hairdressers etc. and individual usages, provides automatic design application on the users nail and/or polishing the users nail by nail polish, operated by means of an open/close button and provides polishing/designing the nails with the spraying nozzle located within itself, comprises a sheath where there is a cartridge including ink that enables coloring, at least one holder which is located on the open section of said sheath facing the user and enables holding the finger of the nail on which the nail polish/design will be applied in a stable manner and provides performing the application without outpouring and spoiling, a screen which provides to display and arrange different pattern applications by the user.”

In the abovementioned application, a machine that can only apply patterned nail polish only on one finger each time is disclosed. This application can be shown as an example to some disadvantages mentioned above.

As a result; parallel developments are made to the developing technology in terms of the nail polish machines, for this reason new structures are required in order to eliminate the abovementioned disadvantages and bring solution to the prior systems.

SUMMARY

The present invention, different from the structures used in the prior art, is related to the nail polish machines developed in the direction of solving said disadvantages and brought some additional advantages.

The purpose of the invention is to enable simultaneous polishing five fingers with known nail polishes within the current market with a desired color and within a very short time.

Another purpose of the invention is to provide opportunity for polishing a required number of fingers.

Another purpose of the invention is to dry the nail polish within a short period of time with a dryer system included within the device after fast polishing. Therefore it is to perform the required process in a healthy manner.

Another purpose of the invention is to present an option to all women that can be preferred both during work and during private times.

Another purpose of the invention is to prevent the nail polish to be applied on the skin by means of the nail bordering apparatus. Therefore the person would not waste time by cleaning the nail polish from the skin.

Another purpose of the invention is to provide applying nail polish on each nail in a balanced manner by means of the spraying nozzle.

The structural and characteristic features and all advantages of the invention will be clarified by the following drawings and with reference to these drawings and therefore the evaluation shall be made by taking these figures and the detailed description into consideration.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1; is a perspective view of the nail polishing and drying device of the invention in a closed manner.

FIG. 2; is a perspective view of the hand mould whereupon the hand will be located for applying nail polish to the hand nails.

FIG. 3; is a perspective view of the foot mould whereupon the feet will be located for applying nail polish to the toe nails.

FIG. 4; is a perspective view of the slipper located within the housing of fingers formed within the foot and hand mould and the silicones used as a nail bordering apparatus.

FIG. 5; is a perspective view of the angled single-row brushes used as a nail bordering apparatus.

FIG. 6; is a perspective view of the nail bordering apparatus with three different types which are located on the slipper.

FIG. 7; is a perspective view of the drying apparatus.

FIG. 8; is a perspective view of the hand mould, liquid cleaning system and polishing apparatus in a disassembled manner.

FIG. 9; is a perspective view of the hose separator.

FIG. 10; is a perspective view of the air drying system which provides drying the nail polish on the nail after nail polishing process.

FIG. 11; is a perspective view of UV drying system which provides drying the nail polish on the nail after nail polishing process.

FIG. 12; is a perspective view of the waste system where nail polish wastes remaining on the device are cleaned and collected by air or liquid after whole nail polishing process is completed.

FIG. 13; is a perspective view of the device cleaning apparatus.

FIG. 14; is a perspective view of the power source used for operating the nail polishing and drying device.

FIG. 15; is a perspective view of the motor which provides operating the pump included within the nail polishing and drying device.

PART REFERENCE NUMBERS

1. Nail polishing and drying device

10. Upper body

11. Finger entrance opening

20. Hand mould

21. Finger housings

211. Slipper spring

22. Palm housing

23. Nail polish chamber housing

30. Foot mould

31. Toe housings

32. Foot housing

33. Heel

40. Slipper

41. Slipper path

42. Bordering apparatus assembly holes

50. Nail detecting sensor

60. Nail bordering apparatuses

61. Silicone

611. Right silicone

612. Left silicone

613. End silicone

62. Angled one-row brush

621. Angled left brush

622. Angled right brush

623. Angled end brush

63. Non-angled double row brush

631. Non-angled double row right and left brush

632. Non-angled double row end brush

70. Polishing apparatuses

71. Nail polish chamber

72. Main hose

73. Hose separator

731. Main hose connection hole

732. Extra hose connection holes

74. Extra hoses

75. Spraying nozzle

80. Drying apparatuses

81. Air drying system

811. Fan

82. UV drying system

90. Device cleaning apparatuses

91. Liquid and air cleaning system

911. Liquid and air chamber

912. Pump

913. Liquid and air channel

92. Waste system

921. Waste channel

922. Waste path

923. Waste chamber

G. Power source

M. Motors

DETAILED DESCRIPTION OF THE EMBODIMENTS

Construction principal;

Said nail polishing and drying device (1) consists of; upper body (10), hand mould (20), foot mould (30), slipper (40), nail detecting sensor (50), nail bordering apparatuses (60), polishing apparatuses (70), drying apparatuses (80), device cleaning apparatuses (90). FIG. 1 is a perspective view of the upper body (10) of the nail polishing and drying device (1) in an assembled manner. The upper body (10) is the element located on the top after all elements are assembled. Said hand mould (20) consists of, finger housings (21), palm housing (22) and nail polish chamber housing (23). FIG. 2 is a perspective view of the hand mould (20).

The hand mould (20) is the section whereon the hand is placed in order to polish the nails. Same mould can be used for two hands. When left hand is placed, the thumb remains on the right side. When right hand is placed on the mould then the thumb is located on the left side.

The finger housings (21) are the recessed sections formed on the hand mould (20). There are 6 housing. Right or left hand can be placed on these 6 finger housings (21) at will.

The palm housing (22) is the section whereon the palm is located when hand is placed in the device. In order to keep the fingers stable, palm is placed here and support is received.

The foot mould (30) is the section where the foot is placed in order to polish the nails. Foot mould (30) is made separately, one for right and one for left foot. Toe housings (31) consist of foot housing (32) and heel (33). FIG. 3 is a perspective view of the foot mould (30).

The slipper (40) makes the necessary forward and backward movement in order to make length and distance adjustment provided to comply with the length and structure of the hand and foot in order to perform polishing by inserting hand or foot into the moulds. FIG. 4 is a perspective view of the slipper (40) which is manufactured in a single piece.

The nail detecting sensor (50) determines the border between the nail and skin in order not to contaminate the skin with the nail polish to be applied on the nail. At the same time the nail detecting sensor (50) provides polishing desired number of nails such as a single or a plurality of nails by perceiving the numbers of nails in the mould.

The nail bordering apparatuses (60) consists of, silicone (61), angled one-row brush (62) and non-angled double row brush (63). The border determined by the nail detecting sensor (50) is protected by the nail bordering apparatuses (60) and leakage of the nail polish from the nail to the skin or polishing the skin is prevented during polishing process. FIG. 6 is a perspective view where nail bordering apparatuses (60) are totally together.

3 different apparatuses are used for the nail bordering method. These apparatuses are with silicone (61), angled one-row brushes (62) and non-angled double row brushes (63). These apparatuses act as a barrier and prevent leakage of the nail brush from the nail to the skin or polishing the skin.

As said silicone (61) apparatus 3 different apparatuses are used consisting of the right silicone (611), left silicone (612) and end silicone (613). It prevents leakage of the nail polish from the nail to the skin or polishing the skin by acting as a barrier.

As an angled one-row brush (62), angled left brush (621), angled right brush (622) and angled end brush (623) are used. FIG. 5 shows the angled one-row brushes (62) on the slipper (40).

Non-angled double row right and left brush (631) and non-angled double row end brush (632) is used for the non-angled double row brush (63).

The polishing apparatuses (70) are the structures that transfer polish on the nail. Polishing apparatuses (70) consists of; nail polish chamber (71), main hose (72), hose separator (73), extra hoses (74) and spraying nozzle (75). FIG. 8 is the perspective vies of these elements.

The nail polish chamber (71) is the section that provides nail polish intake by means of the pump (912) from the nail polish bottle to be used.

The main hose (72) connects the nail polish required for all nails to the other extra hose.

The hose separator (73) is the element to which 6 extra hoses (74) will be connected. The first distribution for delivering the nail polish coming from the main hose (72) to the spraying nozzle (75) is enabled here. There is a main hose connection hole (731) at the side section of the hose separator (73) through which the main hose (72) will pass. In the front section there are six extra hose connection holes (732) where extra hoses (74) will be inserted. FIG. 9 is a detailed perspective view of the hose separator (73).

The extra hoses (74) are the carriers which separate the nail polish coming from the main hose (72) in order to apply them separately on the nails.

The spraying nozzle (75) enables spraying the nail polish coming from the extra hoses (74) on the nail with forward and backward angular movements. Then the nail polish is applied.

The drying apparatuses (80) are located at the center connected to the internal section of the upper body (10).

The drying apparatuses (80) are the elements which enable drying the nail polish after polishing process is completed. There are two different systems as the drying apparatus (80). These are the air drying system (81) and UV drying systems (82).

Drying is enabled by means of the fan (811) included within the air drying system (81). FIG. 7 is a perspective view of the air drying system (81).

The UV drying system (82) enables drying by means of UV beams. FIG. 11 shows this structure in a perspective manner. FIG. 7 shows the perspective views of the drying apparatuses (80).

The device cleaning apparatuses (90) are the apparatuses used for cleaning the residual nail polish from the hoses and other sections after the nail polish process application with the device is completed. The device cleaning apparatuses (90) consist of the liquid and air cleaning system (91) and the waste system (92). FIG. 13 shows the perspective views of the device cleaning apparatuses (90).

The liquid and air cleaning system (91) consists of; the liquid and air chamber (911), pump (912) and the liquid and air channel (913). The cleaning lotion liquid is transferred into the liquid and air channel (913) through the liquid and air chamber (911) by means of the pump (912) and enables to discard the residual nail polish into an external separate chamber. In FIG. 8 the liquid and air cleaning system (91) is shown in a perspective manner.

The liquid and air cleaning system (91) is the element which enables to transfer the liquid or air included within the liquid and air chamber (911) by means of vacuum pumping by the pump (912) into the hose separator (73).

For operating the pump (912) motor (M) is used. The required energy in order to operate the motor (M) is obtained from the power source (G). The view of the motor (M) is seen in FIG. 15; and the view of the power source (G) is seen in FIG. 14.

Cleaning is performed by liquid by adding liquid into the liquid and air chamber (911). Cleaning can be performed by vacuum pumping of the air included inside by leaving the internal section empty.

The waste system (92) consists of; the waste channel (921), waste path (922), waste chamber (923). The waste system (92) is the method in which the residues are collected within the waste chamber (923) as a result of cleaning the hoses from the nail polish by means of a liquid or air. FIG. 12 shows the perspective view of the elements that creates the waste system (92).

Assembly Principal;

FIG. 10 is a perspective view of the nail polishing and drying device (1) to which onto the hand mould (20) the polishing apparatuses (70) and the drying apparatuses (80) are mounted.

There is a nail polish chamber housing (23) at the rear low section of the hand mould (20) as seen in FIG. 8. The nail polish chamber (71) is placed in the nail polish chamber housing (23). The nail polish chamber (71) is connected with the main hose (72) which is place on the upper par.

The main hose (72) is connected to the hose separator (73). Also 6 extra hoses (74) are connected to the hose separator (73). Each extra hose (74) is extended separately to the spraying nozzles (75) formed on the hand mould (20). The spraying nozzles (75) are located on the finger housings (21) to the section where the nail corresponds.

After this positioning, the air drying system (81) is located again corresponding to the finger housings (21). The fan (811) included within the air drying system (81) provides the nail polish drying fast when it is operated after the nail polishing process. FIG. 10 shows the perspective view of this structure.

FIG. 11 shows UV drying system (82) which is one of the drying apparatuses (80) located on the polishing apparatuses (70) placed on the hand mould (20). In addition to these in each finger housing (21) slippers (40) seen in FIGS. 4 and 5 are placed. The slipper rails (211) are formed in the finer housings (21) in order to place the slippers (40). The slipper paths (41) which are formed at the edges of the slippers (40) are seated on said slipper rails (211). This structure is shown in FIG. 11.

Also the nail bordering apparatuses (60) which are used to prevent the nail polish contacting to the skin are mounted on the slipper (40). Among the nail bordering apparatuses (60) mentioned in the configuration principal, the silicone (61), angled one-row brush (62) or non-angled double row brush (63) are mounted. These apparatuses are fixed by passing through the bordering apparatus assembly holes (42) formed of the slipper (40).

After all elements are assembled, they are located on the upper body (10) hand mould (20) and then fixed to the hand mould (20). The finger entrance opening (11) located in front of the upper body (10) is the section where hand fingers or toes are inserted into the nail polishing and drying device (1). In FIG. 8 the finger entrance opening (11) is shown.

The assembly principal described for the hand mould (20) is also available for the foot mould (30).

Operation Principal;

The operation principal will be described based on the hand mould (20) in general.

After assembly, fingers to apply nail polish are placed into the nail polishing and drying device (1) as in FIG. 1 into the slippers (40) located in the finger housing (21) on the hand mould (20). After hand is placed to the hand mould (20) within the nail polishing and drying device (1), the length and distance adjustment is made by means of the slipper (40) provided to comply with the length and structure of the hand.

After the distance adjustment is made, the nail detecting sensor (50) in the slipper (40) is actuated and determines the border between the nail and the skin.

Another task of the nail detecting sensor (50) is to perceive the number of the present fingers in the nail polishing and drying device (1) and enables painting only within those areas. Therefore the user whether prefers to polish 1, 2 or 5 fingers. After the borders are determined, by creating barrier with the nail bordering apparatuses (60), leakage of nail polish from the nail to the skin and polishing the skin is prevented by 3 different methods. These methods are silicone (61), angled one-row brush (62) and non-angled double row brushes (63) described in the configuration principal. One method among these three methods is used to prevent polishing the skin with the nail polish.

Positioning of the finger into the slipper (40) is confirmed by means of the nail detecting sensor (50). Then the nail polishing and drying device (1) is operated.

After the nail border is determined by the nail detecting sensors (50), then after creating barrier between the nail and the skin by means of the nail bordering apparatuses (60), polishing process is started by the polishing apparatuses (70). After the nail polish bottle is placed in the nail polish chamber (71), nail polish is transferred to the 6 extra hoses (74) separated by the hose separator (73) by enabling nail polish to be pulled to the main hose (72) by the pump connected hereto. The nail polish is carried to the spraying nozzles (75) coming from the main hose (72) by means of the extra hoses (74) in order to be applied on the nails separately. The spraying nozzles (75) enable to apply nail polish carried to them, on the nails by spraying the nail polish on the nail with forward backward and angular motions. After the polishing process is completed, the nail polish is dried on the nail with the drying apparatuses (80) located at the center of the nail polishing and drying device (1).

After the nail polish is dried and the user takes his/her hand or foot out of the nail polishing and drying device (1), it is provided to clean the residual nail polish with the device cleaning apparatuses (90) from the hose and other sections in the nail polishing and drying device (1). In order to clean the device, the liquid and air cleaning system (91) is used. The liquid and air cleaning system (91) is used by using liquid and air as it is mentioned in the configuration principal.

Liquid is filled into the liquid and air chamber (911) within the liquid and air cleaning system (91). Liquid included here is pulled by means of the cleaning pump (912) and is transferred into the hose separator (73) through the liquid and air channel (913) and then to the extra hoses (74). Liquid which reaches extra hoses (74) is transferred into the finger housings (21) through spraying nozzles (75) and cleaning is enabled.

When the liquid and air chamber (911) used herein is left empty, cleaning process is performed by transferring the vacuum pumped air into the extra hoses (74) when the pump (912) is actuated.

A configuration which is under the finger housings (21) is developed in the waste system (92). FIG. 12 shows the waste system (92). The residues occur during cleaning are filled through the waste channel (921) to waste path (922) and then into the waste chamber (923). The wastes collected within the waste chamber (923) after cleaning are discharged manually.

In General;

Only fingers placed in the machine can be polished by means of nail detecting sensors (50) in the nail polishing and drying device (1). In other words it provides opportunity to the individual for polishing and drying whether 1, or 2 or 5 fingers.

Claims

1. A nail polishing and drying device comprising:

a hand mould used for keeping a hand, wherein a nail polish is applied to the hand in a stable manner,

finger housings, wherein the finger housings are formed on the hand mould, and five fingers are placed to the finger housings,

a slipper, wherein the slipper is located in the finger housings and the slipper is adjusted according to a finger dimension by moving forward backward in a horizontal manner,

a nail detecting sensor, wherein the nail detecting sensor is placed within the slipper and determines the finger housing to send the nail polish by informing a system whether a finger is inside or not,

a nail polish chamber, wherein the nail polish to be applied to a nail is stored in the nail polish chamber,

polishing apparatuses with spraying nozzles used to spray the nail polish on the nail,

drying apparatuses, wherein the drying apparatuses are configured for the nail polish to dry on the nail after applying the nail polish,

a main hose, wherein the main hose transfers the nail polish to a hose separator acting as a distributor by pulling the nail polish from the nail polish chamber,

extra hoses, wherein the extra hoses provides transferring the nail polish coming from the main hose separately to the spraying nozzles by connecting to the hose separator,

nail bordering apparatuses containing a silicone or an angled one-row brush or a non-angled double row brush, wherein the nail bordering apparatuses are fixed in the slipper and positioned between the nail and a skin, and preventing the nail polish from slipping onto the skin.

2. The nail polishing and drying device according to claim 1, comprising an upper body, wherein the upper body is fixed to the hand mould by placing the upper body on the hand mould after an assembly and the upper body enables to keep the hand closed in an internal section during a nail polishing process.

3. The nail polishing and drying device according to claim 2, comprising a finger entrance opening, wherein the finger entrance opening is formed in a front section of the upper body and through the finger entrance opening the hand and fingers are entered into the nail polishing and drying device.

4. The nail polishing and drying device according to claim 1, comprising a slipper rail, wherein the slipper rail provides moving the slipper horizontally in the finger housing, is formed at edges of the finger housing.

5. The nail polishing and drying device according to claim 1, comprising a palm housing, wherein the palm housing is formed on the hand mould, below the finger housings and a hand palm is placed in the palm housing.

6. The nail polishing and drying device according to claim 1, comprising a nail polish chamber housing, wherein the nail polish chamber housing is created for placing the nail polish chamber to a lower part of the hand mould.

7. The nail polishing and drying device according to claim 1, comprising a foot mould, wherein the foot mould provides an automatic nail polishing to toes by connecting harmoniously with elements.

8. The nail polishing and drying device according to claim 7, comprising toe housings, wherein the toe housings is formed on the foot mould and toes are placed in the toe housings.

9. The nail polishing and drying device according to claim 7, comprising a foot housing, wherein the foot housing is formed on the foot mould and foot base and a heel are placed in the foot housing.

10. The nail polishing and drying device according to claim 7, comprising a heel, wherein the heel provides a high rear section of the foot mould, and correct positioning of a foot.

11. The nail polishing and drying device according to claim 1, comprising a slipper path, wherein the slipper is seated to the slipper rail and the slipper path is formed at edges of the slipper.

12. The nail polishing and drying device according to claim 1, comprising bordering apparatus assembly holes, wherein the bordering apparatus assembly holes are formed on the slipper to fix the nail bordering apparatuses on the slipper.

13. (canceled)

14. The nail polishing and drying device (1) according to claim 1, wherein the silicone comprises

a right silicone, wherein the right silicone closes a right side of the nail;

a left silicone, wherein the left silicone closes a left side of the nail; and

an end silicone, wherein the end silicone prevents polishing the skin with the nail polish by closing an end section of the nail.

15. (canceled)

16. The nail polishing and drying device according to claim 1, wherein the angled one-row brush comprises

an angled right brush and an angled left brush, wherein the angled right brush and the angled left brush close right and left sides of the nail and

an angled end brush, wherein the angled end brush closes an end section of the nail.

17. (canceled)

18. The nail polishing and drying device according to claim 1, wherein the non-angled double row brush comprises

a non-angled double row right and left brush, wherein the non-angled double row right and left brush close right and left section of the nail and

a non-angled double row end brush, wherein the non-angled double row end brush closes an end section of the nail.

19. (canceled)

20. The nail polishing and drying device according to claim 1, comprises device cleaning apparatuses, wherein the device cleaning apparatuses are used for cleaning nail polish residues from the nail polishing and drying device after a nail polishing process.

21. The nail polishing and drying device according to claim 20, wherein each device cleaning apparatus comprises a liquid and air cleaning system, wherein the liquid and air cleaning system provides water and air to clean the nail polish residues left in the main hose and the extra hoses by.

22. The nail polishing and drying device according to claim 21, wherein the liquid and air cleaning system comprises

a liquid and air chamber, wherein a cleaning liquid is stored in the liquid and air chamber;

a pump, wherein the pump provides pulling the cleaning liquid inside the liquid and air chamber;

a liquid and air channel, wherein the liquid and air channel is used in transferring the cleaning liquid pulled by the pump to the extra hoses.

23. The nail polishing and drying device according to claim 22, wherein the liquid and air cleaning system cleans the main hose and the extra hoses with an air vacuum pumped as a result of a vacuum pumping the air available in the liquid and air chamber when the liquid and air chamber is left empty.

24. The nail polishing and drying device according to claim 20, comprising a waste system during cleaning with the device cleaning apparatuses, wherein the waste system provides taking wastes poured in the finger housings outside the nail polishing and drying device.

25. The nail polishing and drying device (1) according to claim 24, wherein the waste system comprises

a waste channel, wherein the wastes enter occurred after the nail polishing and drying device is cleaned by a liquid and air cleaning system;

a waste path, wherein the wastes entered the waste channel are transferred and

a waste chamber, wherein the wastes entering the waste path are poured and stored.