METHOD OF CREATING A DESIGN ON A HELMET

A method of creating a design on complex curves and irregular contours of a protective helmet, quickly and without having to first disassemble the helmet. A design is transferred to a clear film/acetate, which is then exposed onto a photoresist mask, transferring the design to the photoresist mask. The mask is washed out creating blast-able areas in the design mask. The mask is adhered to an area of the helmet, which is otherwise covered with a sealed protective bag. Sandblasting/abrasive-blasting etches portions of the helmet surface through the blast-able area of the mask. Various colors or other special effects may be painted/applied onto the etched portions of the helmet surface. The protective bag and photoresist mask can be removed, and the painted areas buffed/polished in a final step.

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Description
FIELD OF THE INVENTION

The present invention is directed to decorating a motorcycle helmet (or sports helmet, e.g., baseball, football, snow, skate, bicycle, etc.), and more particularly to a method of economically creating custom and personalized designs on all types of protective helmets.

BACKGROUND OF THE INVENTION

Designs on motorcycle and other helmets are typically done during manufacturing and involve a process where a print is made, and applied to the helmet with water transfer method, for example, then the helmet receives a clear coat of lacquer to protect it.

This is all done on the outer shell prior to the helmet being assembled. This process makes custom designs highly uneconomical and individual changes to standard designs cannot be made.

The secondary way to apply a design on a helmet is to remove all trim, and hardware, sand the helmet down completely and then repaint it with a design and then again apply a clear coat of lacquer and then replacing all trim and hardware. This is a time-consuming and usually expensive method that also relies on the individual painter's skill rather than a printed process.

There remains a need for a more economical way to apply a design to a protective helmet which enables custom work without requiring the skill of an artisan every time.

SUMMARY OF THE INVENTION

It is an object of the present invention to provide methods of creating a design on complex curves and irregular contours of a helmet quickly and without having to disassemble the helmet.

A method of creating a design on complex curves and irregular contours of a protective helmet, quickly and without having to first disassemble the helmet. A design is transferred to a clear film/acetate, which is then exposed onto a photoresist mask, transferring the design to the photoresist mask. The mask is washed out creating blast-able areas in the design mask. The mask is adhered to an area of the helmet, which is otherwise covered with a sealed protective bag. Sandblasting/abrasive-blasting etches portions of the helmet surface through the blast-able area of the mask. Various colors or other special effects may be painted/applied onto the etched portions of the helmet surface. The protective bag and photoresist mask can be removed, and the painted areas buffed/polished in a final step. Thus the helmet has had no dismantling, gluing, or otherwise potentially invasive work that could cause damage, add extra weight or compromise the safety and original factory build quality, very important as helmets are certified safety products from the manufacturer and any disassembly or assembly by non-qualified individuals would certainly void any warranties.

A further understanding of the nature and advantages of the invention will become apparent by reference to the remaining portions of the specification and drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

Features and advantages of the present invention will become appreciated as the same become better understood with reference to the specification, claims, and appended drawings.

FIG. 1 is an elevational view of a backside of a motorcycle helmet adjacent a “mask” having a design of a lion printed on a photoresist film;

FIG. 2 shows the photoresist film adhered to the helmet;

FIG. 3 shows taping around the film with the helmet placed in a thick plastic bag and the film area cut out and taped;

FIG. 4 illustrates a photoresist mask applied to complex curves, vents and a shield of the helmet;

FIG. 5 schematically illustrates a sandblaster abrading portions of a topcoat paint layer of the helmet only within areas not covered by the photoresist mask;

FIG. 6 is a dose-up sectional view of the paint layer being removed with sandblasting;

FIG. 7 schematically illustrates a cleaning phase after abrasion of the topcoat paint layer using compressed air;

FIG. 8 illustrates application of a bonding agent layer to the masked area;

FIG. 9 shows initial application of a diluted color layer;

FIG. 10 is a close-up sectional view showing the color layer being added;

FIG. 11 illustrates application of a full-strength layer of color.

FIG. 12 indicates addition of any special color, flake, or metallic accent;

FIG. 13 shows the fully painted helmet after removal of the photoresist mask; and

FIG. 14 schematically illustrates light buffering, cleaning, and polishing of the helmet.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

The present application is directed to methods of applying or creating a design on a cycle helmet; in particular, a motorcycle helmet. Of course, the present application can be utilized for any number of helmets, such as for bicycling, skiing, hockey, baseball, football, etc.

The process begins with creating a design in the computer with an illustrative program such as Adobe Illustrator. The design is then printed on a specialized clear printing acetate.

The printed acetate film is then put together with a photosensitive mask material. This photoresist mask is quite bendable, stretches and has a self-adhesive. The acetate design and the photoresist Mask material are placed in an UV Light exposure unit to “expose” the photosensitive mask material.

The photosensitive mask is then washed out with warm water leaving a clear area to “blast” in. The blue portion that does not wash out blocks (masks) the area for blasting.

The photoresist mask is then positioned onto the helmet.

FIG. 1 schematically illustrates the backside of a helmet adjacent a “mask” with a design. The mask is a photoresist film mask. Any desired image may be transferred to the photomask (or photoresist film) as any designer can understand.

FIG. 2 shows the photoresist film mask (shown in blue for contrast) adhered to the helmet. The photoresist mask acts as a stencil or patterned mask allowing selected unmasked portions of the helmet to be removed (e.g., by sandblasting/abrasive-blasting) while other masked portions remain intact. In the illustrated embodiment, the regions of the helmet under the darker portions of the photoresist mask are exposed and susceptible to abrasion, while the lighter colored regions are not. The blue photoresist sheets are not only sticky on one side but they are quite stretchy and flexible in all directions so that they can hold to the helmet. Also, the adhesive does not leave any residue that might damage the helmet.

FIG. 3 shows taping placed around the film, and then the helmet is placed in a sealed thick plastic protective bag with the film area cut out and taped. This protects other areas of the helmet with the bag, and only the area on which the photoresist mask has been applied is exposed. The helmet is masked everywhere so that none of the silica gets in the helmet or the vents etc.

FIG. 4 shows that the photoresist mask can be used on complex curves, vents, and the shield. Since a helmet is a complex curved surface, an appropriate material that can stretch and curve and stick is necessary.

FIG. 5 illustrates an abrasion phase. Recessed portions are formed by a sandblasting process. Abrasion is only into the clear topcoat and paint layer if required of the helmet through the areas of the photoresist mask that do not protect the helmet. The sandblasting gun is controllable to etch down to specific depths from a few microns to millimeters. A shallower abrasion may be required for a subtle design in the helmet. Color may also be added into the etching process including metallic particles, flakes, and chrome effect. Or a matte or shiny clear coat may be applied to achieve matte design on a gloss helmet or vice versa.

The sandblasting is done in a booth that can use any pressure and flow of any abrasive material required. A suitable sandblasting machine is a Guyson SBP40 model 6.

FIG. 6 indicates in cross-section a close-up view of the paint layer that is removed with sandblasting.

In addition to using a photo resist film as described, the process of sandblasting/abrasive blasting a design into the clear coat and possibly the paint of a helmet can also be achieved by utilizing stencils made from self-adhesive vinyl for larger, simpler areas that do not require the minute detail.

FIG. 7 schematically illustrates a cleaning phase. After the mask is sandblasted. compressed air is used to remove any dust and debris from around the helmet and masking. The area that has been sandblasted is then wiped and degreased to be ready for color application.

Subsequently, in FIG. 8, a bonding agent is applied. One layer of bonding agent is lightly applied to the masked area, as painters will understand.

FIG. 9 shows application of a first layer of color. Preferably, a diluted color layer is applied.

FIG. 10 is a dose-up cross-section shoving where and how the color layer is added.

FIG. 11 shows application of the final layer of color. A full-strength layer of color is then applied to give an opaque finish. A clear coat layer/hardener is sometimes added at this point depending on the final result desired. The paint is applied using a high volume/low pressure system which allows the paint to be sprayed extremely fine so that it can penetrate and adhere to very small areas.

In FIG. 12, any desired special color, flake, metallic effects, etc. is added.

Finally, in FIG. 13 the mask is removed carefully with a damp, soft cloth. Preferably, the amount of paint added matches the amount of material that has been removed during the abrading process so that the final surface is even and smooth, as opposed to convex or concave. This can be further controlled by fine polishing of the finished surface.

FIG. 14 indicates a light buffing of the helmet with appropriate buffing agents.

Those skilled in the art will appreciate that various changes and modifications may be made to the preferred embodiments, the invention in its broader aspects is not limited to the specific details, representative devices, and illustrative examples shown and described.

Claims

1. A method of forming a design on a helmet, comprising:

transferring a design to a photoresist mask;
exposing the photoresist mask to create an open area with the shape of the design;
adhering the photoresist mask to an area on a helmet;
securing a protective cover around the helmet except over the photoresist mask;
sandblasting/abrasive-blasting the photoresist mask to etch portions of the helmet underneath the open (blast-able) area;
applying paint to the etched portions of the helmet;
removing the protective cover and photoresist mask from the helmet; and
buffing the painted etched portions of the helmet.
Patent History
Publication number: 20210387307
Type: Application
Filed: Jun 14, 2021
Publication Date: Dec 16, 2021
Inventors: Simon Mather-Neill (Santa Barbara, CA), Kimberly A. Mather-Neill (Santa Barbara, CA)
Application Number: 17/347,304
Classifications
International Classification: B24C 1/04 (20060101); A42C 2/00 (20060101);