MASK MADE OF KNITTED FABRIC

Abstract

A mask made of knitted fabric includes a knitted cloth and two ear loops. The two ear loops are knitted together with the knitted cloth and are respectively located on two sides of the knitted cloth. The knitted cloth is composed of a double-layer knitted structure and a single-layer knitted structure. The double-layer knitted structure is a basis of the knitted cloth. The single-layer knitted structure defines at least one bending line, the single-layer knitted structure is only connected to one of two surface layer textures to which the double-layer knitted structure belongs, and whether the bending line is a valley fold line or a mountain fold line is determined by connection between the single-layer knitted structure and the double-layer knitted structure.

Description

FIELD OF THE INVENTION

The invention relates to a mask made of knitted fabric, and more particularly to a mask made of knitted fabric composed of a double-layer knitted structure and a single-layer knitted structure.

BACKGROUND OF THE INVENTION

Currently, there are many types of masks. For example, cloth masks are made of cotton, and Pitta Mask produced by a Japanese company ARAX is made of polyurethane materials. Among them, as for cloth mask, this type of mask is mostly composed of knitted fabrics splicing with each other. When a wearer wears the cloth mask, a stitching line of a cloth surface is likely to rub against the wearer's face, causing discomfort to the wearer. In addition, although Pitta Mask is an integral structure, the product cannot be folded at will. When the wearer takes off this type of mask, it is difficult to reduce a folded size of the mask, and it is not convenient for the wearer to store it away.

Furthermore, although Taiwan Patent No. 1511758 discloses a fabric knitted mask that can improve portability and storability, according to the specification it can be found that the mask must be additionally shaped by ultrasonic welding after knitting to form a crease, resulting in complicated production procedures. In addition, the two ear loops used in the mask are sewn with the mask body after the mask body is knitted, in addition to the extra ear loop stitching steps making the production steps cumbersome, when the ear loops are accidentally not connected to the mask body or when a wearer pulls the ear loops vigorously, it is easy to separate the ear loops from the mask body.

SUMMARY OF THE INVENTION

A main object of the invention is to solve the problem that conventional cloth masks or masks made of polyurethane materials cannot be folded.

Another object of the invention is to solve the problem of cumbersome manufacturing steps of conventional foldable fabric knitted masks.

In order to achieve the above objects, the invention provides a mask made of knitted fabric comprising a knitted cloth and two ear loops knitted together with the knitted cloth and respectively located on two sides of the knitted cloth, the knitted cloth is composed of a double-layer knitted structure and a single-layer knitted structure, the double-layer knitted structure is a basis of the knitted cloth, the single-layer knitted structure defines at least one bending line for the knitted cloth to fold, the single-layer knitted structure is only connected to one of two surface layer textures to which the double-layer knitted structure belongs, and wherein whether the bending line is a valley fold line or a mountain fold line is determined by connection between the single-layer knitted structure and the double-layer knitted structure.

In one embodiment, the two ear loops are respectively a tubular knitted fabric formed by a sac-like knitting, and the two ear loops are connected to the knitted cloth by an intarsia knitting.

In one embodiment, the single-layer knitted structure forms the bending lines, the bending lines include a plurality of longitudinal bending lines and a plurality of oblique bending lines connected between any two of the adjacent longitudinal bending lines respectively, the plurality of longitudinal bending lines are arranged at intervals, and each of the oblique bending lines intersects with one of the other oblique bending lines on one of the longitudinal bending lines.

In one embodiment, parts of the plurality of oblique bending lines form a plurality of diamond-shaped patterns on a surface of the knitted cloth, and the diamond-shaped patterns located at a center of the knitted cloth are larger than the remaining diamond-shaped patterns.

In one embodiment, the knitted cloth includes an antibacterial yarn added by plating on one side of the double-layer knitted structure.

In one embodiment, the antibacterial yarn is a graphene yarn.

In one embodiment, two opposite sides of the knitted cloth that are not adjacent to the two ear loops have different shapes.

In one embodiment, the two ear loops define two imaginary lines respectively connected with the two ear loops and parallel to each other, the two imaginary lines divide the knitted cloth from top to bottom as a first side block, a middle block and a second side block, and where the first side block close to a center line of the knitted cloth and where the second side block close to the center line of the knitted cloth are knitted by a partial knitting.

Accordingly, compared with the prior art, the invention has the following features: the knitted cloth is composed of the double-layer knitted structure and the single-layer knitted structure, wherein the single-layer knitted structure is knitted as the at least one bending line, when the knitted cloth is not in use, inconvenience of storing away and being disorganized can be avoided.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a front view of a mask according to an embodiment of the invention;

FIG. 2 is a schematic diagram of a structure of an unfolded knitted cloth according to an embodiment of the invention;

FIG. 3 is a schematic diagram of a structure of a folded knitted cloth according to an embodiment of the invention; and

FIG. 4 is a schematic diagram of a folded mask according to an embodiment of the invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

The detailed description and technical content of the invention are described below with reference to the drawings.

Please refer to FIG. 1, FIG. 2, FIG. 3, and FIG. 4. The invention provides a mask 10 made of knitted fabric. The mask 10 includes a knitted cloth 11 and two ear loops 13, 14. The ear loops 13, 14 are respectively located on two sides of the knitted cloth 11. The two ear loops 13, 14 are not disposed on the knitted cloth 11 in an additional splicing manner, but are integrally formed on the knitted cloth 11. That is, the two ear loops 13, 14 and the knitted cloth 11 are knitted together.

Further, the knitted cloth 11 is composed of a double-layer knitted structure 111 and a single-layer knitted structure 112. The double-layer knitted structure 111 is taken as a basis of the knitted cloth 11. The double-layer knitted structure 111 includes two surface layer textures 113, 114 and a cross-linked texture 115 that cross-links the two surface layer textures 113, 114. The single-layer knitted structure 112 only includes one surface layer texture 116. The surface layer texture 116 to which the single-layer knitted structure 112 belongs only connects with one of the two surface layer textures 113, 114 to which the double-layer knitted structure 111 belongs; and the surface layer texture 116 to which the single-layer knitted structure 112 belongs is integrally formed with one of the two surface layer textures 113, 114 to which the double-layer knitted structure 111 belongs. For example in FIG. 2, the surface layer texture 116 of the single-layer knitted structure 112 is connected to the surface layer texture 113 of the double-layer knitted structure 111; or the surface layer texture 116 of the single-layer knitted structure 112 is connected to the surface layer texture 114 of the double-layer knitted structure 111. In addition, since a flexural rigidity of the single-layer knitted structure 112 is less than that of the double-layer knitted structure 111, the single-layer knitted structure 112 has to define at least one bending line 117 so that the knitted cloth 11 can be folded. Whether the at least one bending line 117 is a valley fold line or a mountain fold line is determined by connection between the single-layer knitted structure 112 and the double-layer knitted structure 111. Taking FIG. 1 and FIG. 2 for example, if the bending line 117 is a mountain fold line, the bending line 117 makes the double-layer knitted structure 111 be bent in an inverted V-shaped as where the single-layer knitted structure 112 connected to the surface layer texture 113 of the double-layer knitted structure 111 shown in FIG. 3; On the contrary, if the bending line 117 is a valley fold line, the bending line 117 makes the double-layer knitted structure 111 be bent in a V-shaped as where the single-layer knitted structure 112 connected to the surface layer texture 114 of the double-layer knitted structure 111 shown in FIG. 3.

Further, since the knitted cloth 11 is composed of the double-layer knitted structure 111 and the single-layer knitted structure 112, the knitted cloth 11 is capable of defining the bending line 117 by the single-layer knitted structure 112, and thereby the knitted cloth 11 can be folded to improve a portability of the mask 10. Furthermore, the invention simultaneously forms the double-layer knitted structure 111 and the single-layer knitted structure 112 when the knitted cloth 11 is knitted; that is, the bending line 117 is formed at the same time during a knitting process, instead of using conventional additional manufacturing process steps to form the bending line 117, which specifically simplifies a manufacturing process of the knitted cloth 11.

In one embodiment, the two ear loops 13, 14 are respectively a tubular knitted fabric 131 formed by a sac-like knitting, and the two ear loops 13, 14 are connected to the knitted cloth 11 by an intarsia knitting. In addition, the intarsia knitting is a technique well known to those having ordinary skill in the art, so it will not be repeated herein.

Please refer to FIG. 1, FIG. 2, FIG. 3, and FIG. 4. In one embodiment, the single-layer knitted structure 112 forms a plurality of bending lines 117. The plurality of bending lines 117 include a plurality of longitudinal bending lines 118 and a plurality of oblique bending lines 119. The plurality of longitudinal bending lines 118 are arranged at intervals; and the plurality of longitudinal bending lines 118 can be a mountain fold line or a valley fold line respectively. In one embodiment, at least one of the longitudinal bending lines 118 is composed of at least one valley fold line segment 120 and at least one mountain fold line segment 121. Furthermore, the plurality of oblique bending lines 119 are respectively connected between any two of the adjacent longitudinal bending lines 118, and each of the plurality of oblique bending lines 119 intersects with one of the other oblique bending lines 119 on one of the longitudinal bending lines 118. In one embodiment, each of the plurality of oblique bending lines 119 is a mountain fold line.

Further, please refer to FIG. 1. In one embodiment, parts of the plurality of oblique bending lines 119 form a plurality of diamond-shaped patterns 122 on a surface of the knitted cloth 11. The plurality of diamond-shaped patterns 122 are arranged at positions that are not adjacent to edges of the knitted cloth 11, wherein those of the diamond-shaped patterns 122 located at a center of the knitted cloth 11 are larger than the remaining diamond-shaped patterns 122. Moreover, the other parts of the oblique bending lines 119 are respectively connected at one side of one of the diamond-shaped patterns 122 opposite to one of the other diamond-shaped patterns 122.

On the other hand, in one embodiment, two opposite sides of the knitted cloth 11 that are not adjacent to the two ear loops 13, 14 have different shapes to respectively fit a nose and a chin of a wearer. Specifically, the two ear loops 13, 14 define two imaginary lines 132, 133 respectively connected with the two ear loops 13, 14 and parallel to each other. The knitted cloth 11 is divided from top to bottom by the two imaginary lines 132, 133 into a first side block 123, a middle block 124 and a second side block 125. In detail, the first side block 123 corresponds to the nose of the wearer, and the second side block 125 corresponds to the chin of the wearer. An area of the first side block 123 is larger than an area of the second side block 125, so that the knitted cloth 11 can specifically fit the wearer's face, and the wearer can figure out a wearing direction of the mask 10 according to differences between the first side block 123 and the second side block 125. Further, where the first side block 123 close to a center line 126 of the knitted cloth 11 and where the second side block 125 close to the center line 126 of the knitted cloth 11 are knitted by a partial knitting to form curvatures thereon, so as to fit to the nose and the chin of the wearer.

In addition, in one embodiment, in order to enhance an antibacterial function of the knitted cloth 11, the knitted cloth 11 includes an antibacterial yarn on one side of the double-layer knitted structure 111. The antibacterial yarn is added to the knitted cloth 11 by plating during a knitting process of the knitted cloth 11. In one embodiment, the antibacterial yarn is a graphene yarn.

Claims

1. A mask made of knitted fabric comprising:

a knitted cloth, composed of a double-layer knitted structure and a single-layer knitted structure, the double-layer knitted structure being a basis of the knitted cloth, the single-layer knitted structure defining at least one bending line for the knitted cloth to fold, the single-layer knitted structure only connected to one of two surface layer textures to which the double-layer knitted structure belonging, and wherein whether the bending line is a valley fold line or a mountain fold line is determined by connection between the single-layer knitted structure and the double-layer knitted structure; and

two ear loops, knitted together with the knitted cloth, and the two ear loops respectively located on two sides of the knitted cloth.

2. The mask made of knitted fabric as claimed in claim 1, wherein the two ear loops are respectively a tubular knitted fabric formed by a sac-like knitting, and the two ear loops are connected to the knitted cloth by an intarsia knitting.

3. The mask made of knitted fabric as claimed in claim 2, wherein the single-layer knitted structure forms the bending lines, the bending lines include a plurality of longitudinal bending lines and a plurality of oblique bending lines connected between any two of the adjacent longitudinal bending lines respectively, the plurality of longitudinal bending lines are arranged at intervals, and each of the oblique bending lines intersects with one of the other oblique bending lines on one of the longitudinal bending lines.

4. The mask made of knitted fabric as claimed in claim 3, wherein parts of the plurality of oblique bending lines form a plurality of diamond-shaped patterns on a surface of the knitted cloth, and the diamond-shaped patterns located at a center of the knitted cloth are larger than the remaining diamond-shaped patterns.

5. The mask made of knitted fabric as claimed in claim 1, wherein the knitted cloth includes an antibacterial yarn added by plating on one side of the double-layer knitted structure.

6. The mask made of knitted fabric as claimed in claim 5, wherein the antibacterial yarn is a graphene yarn.

7. The mask made of knitted fabric as claimed in claim 6, wherein two opposite sides of the knitted cloth that are not adjacent to the two ear loops have different shapes.

8. The mask made of knitted fabric as claimed in claim 7, wherein the two ear loops define two imaginary lines respectively connected with the two ear loops and parallel to each other, the two imaginary lines divide the knitted cloth from top to bottom as a first side block, a middle block and a second side block, and where the first side block close to a center line of the knitted cloth and where the second side block close to the center line of the knitted cloth are knitted by a partial knitting.

9. The mask made of knitted fabric as claimed in claim 1, wherein two opposite sides of the knitted cloth that are not adjacent to the two ear loops have different shapes.

10. The mask made of knitted fabric as claimed in claim 9, wherein the two ear loops define two imaginary lines respectively connected with the two ear loops and parallel to each other, the two imaginary lines divide the knitted cloth from top to bottom as a first side block, a middle block and a second side block, and where the first side block close to a center line of the knitted cloth and where the second side block close to the center line of the knitted cloth are knitted by a partial knitting.