FLUORINATION PROCESSES

Abstract

A process for preparing a fluorinating reagent from a calcium-containing compound is disclosed. The process bypasses the requirement to form hydrofluoric acid. The fluorinating reagent can be used to prepare high-value fluorochemicals.

Description

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a continuation of International Application No. PCT/GB2022/053347, filed Dec. 21, 2022, which claims the benefit of UK Application No. GB2118767.9, filed Dec. 22, 2021, which is incorporated by reference herein in its entirety.

INTRODUCTION

The present disclosure relates to fluorination processes and fluorination reagents. In particular, the present application describes novel fluorination reagents, methods of preparation of fluorinating reagents from a salt comprising calcium and fluorine, as well as use of fluorinating reagents to prepare fluorochemicals. Fluorination process described herein can avoid a need to use hydrofluoric acid as an intermediate for fluorochemical production.

BACKGROUND OF THE INVENTION

Fluorochemicals can be present in our daily life with applications in the metallurgical industry, Li-ion batteries, electrical appliances, luminescent nanoparticles and electronics, fluoropolymers (PTFE known as Teflon or ETFE), refrigerants (HFOs), air conditioning, as well as agrochemicals, anesthetics, and pharmaceuticals. Generally fluorine atoms incorporated in organic fluorochemicals can be derived from the naturally occurring mineral fluorspar (calcium fluoride, CaF₂) by applying a workflow commencing with its conversion into highly toxic hydrogen fluoride (HF) (FIG. 1). Specifically, metallurgical grade Fluorspar (Metspar, 60-96% CaF₂, ˜40% of total fluorspar production) can be employed as a flux in steelmaking, while acid grade fluorspar (Acidspar, ≥97% CaF₂, ˜60% of total fluorspar production), can be used in the manufacture of hydrofluoric acid (HF) and/or aluminium trifluoride (AlF₃).

Industrial practice for the manufacture of organic fluorochemicals can rely upon energy-intensive treatment of acid grade calcium fluoride acidspar with sulfuric acid at elevated temperatures to generate hydrogen fluoride gas which can either be stored for use as liquified gas, or diluted in water for use as an aqueous solution. Safety of HF-based processes can be a concern of both producers and users, for exampled, due to HF being a highly dangerous and corrosive acid which can require extreme caution for safe handling.

Developing alternative routes for accessing value-added fluorochemicals can be extremely challenging. For example, due to the high lattice energy of CaF₂ (˜2640 kJ·mol⁻¹, or ˜1320 kJ·mol⁻¹ for each mole of fluoride generated).

SUMMARY OF THE INVENTION

According to a first aspect of the present invention there is provided a process for the preparation of a fluorinating reagent, the process comprising the step of:

• • a) together a fluorine-containing compound and an ionic compound in the solid state, wherein the fluorine-containing compound is at least one of calcium fluoride and fluorapatite,
    wherein the anion of said ionic compound is combinable with Ca²⁺ to form a calcium salt having a lattice energy that is greater than 2450 KJ mol⁻¹.

According to a second aspect of the present invention there is provided a process for the preparation of a fluorochemical, the process comprising the step of:

• • a) preparing a fluorinating reagent as described herein, and
  • b) contacting an organic substrate with the fluorinating reagent,
    wherein step b) is conducted simultaneously with, or after, step a).

According to a third aspect of the present invention there is provided a process for the preparation of a fluorochemical, the process comprising the steps of:

• • a) pulverising a fluorine-containing compound in the solid state, wherein the fluorine-containing compound is at least one of calcium fluoride and fluorapatite; and
  • b) contacting the product of step a) with an organic substrate;
    wherein step b) is conducted simultaneously with, or after, step a).

According to a fourth aspect of the present invention there is provided a use of a fluorine-containing compound, the fluorine-containing compound being at least one of calcium fluoride and fluorapatite, as a fluorine source in a process for preparing a fluorochemical, wherein the process does not comprise a step of reacting the fluorine-containing compound with sulfuric acid to generate hydrofluoric acid.

According to a fifth aspect of the present invention there is provided a use of a fluorine-containing compound, the fluorine-containing compound being at least one of calcium fluoride and fluorapatite, as a fluorine source in a process for preparing a fluorinating reagent, wherein the process does not comprise a step of reacting the fluorine-containing compound with sulfuric acid to generate hydrofluoric acid.

In the aforementioned aspects, the fluorine-containing compound is suitably calcium fluoride (e.g., acid grade fluorspar).

According to a sixth aspect of the invention, there is provided a fluorinating reagent obtained, directly obtained or obtainable by a process of the first aspect.

According to a seventh aspect of the invention, there is provided a fluorinating reagent comprising a mixture of inorganic salts.

Calcium fluoride may be the sole fluorine source in the processes and uses of the invention.

In one aspect, described herein are activated fluorination reagents. In some embodiments, activated fluorination reagents comprise a first salt comprising calcium and fluorine. In some embodiments, the activated fluorination reagent comprises a second salt comprising an anion, which has a lattice energy greater than 2450 KJ/mol when combined with Ca²⁺ to form a third salt. In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises characteristic 2θ reflections at about 21.9°, 30.3°, 31.6°, and/or 43.4°.

In another aspect, described herein are methods of synthesizing an organo-fluorine compound. In some embodiments, the methods comprise combining a first salt, the first salt comprising calcium and fluorine, with a second salt. In some embodiments, the second salt comprises an anion, which has a lattice energy greater than 2450 KJ/mol when combined with Ca²⁺ to form a third salt.

In some embodiments, the first and second salt are combined to form a salt mixture. In some embodiments, the methods comprise applying mechanical force to the salt mixture to form an activated salt-mixture. In some embodiments, the methods comprise combining the activated salt mixture with a first reactant. In some embodiments, the first reactant comprises an organic compound. In some embodiments the methods comprise fluorinating the first reactant to yield an organo-fluorine compound.

In another aspect, described herein are methods of fluorinating an organic compound. In some embodiments, the methods comprise combining an activated fluorination reagent with the organic compound and fluorinating the organic compound to produce an organo-fluorine compound. In some embodiments, the activated fluorination reagent has a powder x-ray diffraction spectrum of the activated reagent comprising characteristic 2θ reflections at about 21.9°, 30.3°, 31.6°, and/or 43.4°.

In another aspect, described herein are methods of manufacturing an activated fluorination reagent. In some embodiments, the methods comprise combining a first salt comprising calcium and fluorine, with a second salt to form a salt mixture. In some embodiments, the second salt comprises an anion, which has a lattice energy greater than 2450 KJ/mol when combined with Ca²⁺ to form a third salt. In some embodiments, the methods comprise applying mechanical force to the salt mixture to yield the activated fluorination reagent.

In another aspect, described herein, are methods of recovering fluorine from a waste material to form an activated fluorination reagent. Such methods can be used for example to recover fluorine from a fluorine depleted waste material or produce a fluorination reagent from a waste stream comprising fluorine such as waste comprising CaF₂ or NaF. In some embodiments, the methods comprise combining a waste material comprising a first salt comprising calcium and fluorine, with a second salt to form a salt-waste mixture. In some embodiments, the second salt comprises an anion, which has a lattice energy greater than 2450 KJ/mol when combined with Ca²⁺ to form a third salt. In some embodiments, the second salt combines with the first salt to form a salt-waste mixture that has a powder x-ray diffraction spectrum comprising characteristic 2θ reflections at about 21.9°, 30.3°, 31.6°, and/or 43.4°. In some embodiments, the methods comprise applying mechanical force to the salt-waste mixture to yield the activated fluorination reagent.

In some embodiments of the fluorination reagents or any of the methods described herein, the first salt is CaF₂. In some embodiments, the first salt is fluorapatite (Ca₅(PO₄)₃F). In some embodiments, the second salt is a metal hydroxide. In some embodiments the second salt is NaOH. In some embodiments the second salt is KOH. In some embodiments, the second salt is a metal sulphite. In some embodiments, the second salt is Na₂SO₃. In some embodiments, the second salt is K₂SO₃.

In some embodiments, the second salt is a metal sulphate. In some embodiments, the second salt is KHSO₄. In some embodiments, the second salt is an inorganic phosphate (e.g. K₂HPO₄, KH₂PO₄, K₃PO₄). In some embodiments, the second salt is K₂HPO₄. In some embodiments, the second salt is KH₂PO₄. In some embodiments, the second salt is K₃PO₄. In some embodiments, the inorganic phosphate is a pyrophosphate (e.g. K₄P₂O₇ or Na₃P₂O₇).

In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprising characteristic 2θ reflections at about 18.0°, 18.7°, 21.9°, 22.6°, 24.5°, 25.4°, 26.5°, 27.0°, 28.0°, 29.2°, 30.3°, 31.6°, 33.0°, 34.8°, 36.4°, 37.70, 39.50, 40.4°, 41.7°, 42.4°, 43.4°, 46.1°, 48.4°, 49.4°, 52.8°, and/or 53.9°. In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises at least two characteristic 2θ reflections selected from the group of about 18.0°, 18.7°, 21.9°, 22.6°, 24.5°, 25.4°, 26.5°, 27.0°, 28.0°, 29.2°, 30.3°, 31.6°, 33.0°, 34.8°, 36.4°, 37.70, 39.50, 40.4°, 41.7°, 42.4°, 43.4°, 46.1°, 48.4°, 49.40, 52.8°, and 53.9°. In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises at least three characteristic 2θ reflections selected from the group of about 18.0°, 18.7°, 21.9°, 22.6°, 24.5°, 25.4°, 26.5°, 27.0°, 28.0°, 29.2°, 30.3°, 31.6°, 33.0°, 34.8°, 36.4°, 37.7°, 39.5°, 40.4°, 41.7°, 42.4°, 43.4°, 46.1°, 48.4°, 49.4°, 52.8°, and 53.9°. In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises characteristic at least four 2θ reflections selected from the group of about 18.0°, 18.7°, 21.9°, 22.6°, 24.5°, 25.4°, 26.5°, 27.0°, 28.0°, 29.2°, 30.3°, 31.6°, 33.0°, 34.8°, 36.4°, 37.70, 39.50, 40.4°, 41.7°, 42.4°, 43.4°, 46.1°, 48.4°, 49.4°, 52.8°, and 53.9°. In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises characteristic 2θ reflections at about 21.90, 30.3°, 31.6°, and 43.4°.

In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises characteristic 2θ reflections at about 18.0°, 18.7°, 21.9°, 22.6°, 24.5°, 25.4°, 26.5°, 27.0°, 28.0°, 29.2°, 30.3°, 31.6°, 33.0°, 34.8°, 36.4°, 37.70, 39.50, 40.4°, 41.7°, 42.4°, 43.4°, 46.1°, 48.4°, 49.4°, 52.8°, and 53.9°.

In some embodiments, a ratio of the first salt to the second salt is about 1:0.5 to 1:100. In some embodiments, a ratio of the first salt to the second salt is about 1:1 to 1:10. In some embodiments, a ratio of the first salt to the second salt is about 1:1 to 1:5. In some embodiments, a ratio of the first salt to the second salt is about 1:1. In some embodiments, a ratio of the first salt to the second salt is about 1:2. In some embodiments, a ratio of the first salt to the second salt is about 1:3. In some embodiments, a ratio of the first salt to the second salt is about 1:5.

In some embodiments of any of the methods described herein, the mechanical force is applied using a ball mill, a mortar and pestle, a twin-screw extruder, using an ultrasonic bath, or a mechanical press.

In some embodiments, the method does not comprise reacting a strong acid with the first salt to form hydrofluoric acid. In some embodiments, the mechanical force is applied at a frequency of about 0.5 Hz-60 kHz. In some embodiments, the mechanical force is applied at a frequency of about 10 Hz-20 kHz. In some embodiments, the mechanical force is applied at a frequency of about 30 Hz. In some embodiments, the mechanical force is applied at a frequency of about 35 Hz. In some embodiments, the mechanical force is applied at a frequency of about 60 Hz.

In some embodiments, the mechanical force is applied at a temperature of about 20-300° C. In some embodiments, the mechanical force is applied at a temperature of about 20-100° C. In some embodiments, the mechanical force is applied at a temperature of about 30° C. In some embodiments, the mechanical force is applied at a temperature of about 60° C. In some embodiments, the mechanical force is applied at a temperature of about 90° C.

In some embodiments, the first and second salt are combined as solids without the addition of solvent.

In some embodiments, the organic compound is aromatic or aliphatic and comprises at least one leaving group located at a site to be fluorinated. In some embodiments, the organic compound is a sulphonyl halide, an acyl halide, an aryl halide or an alkyl halide. In some embodiments, the organic compound is an aromatic sulphonyl halide (e.g. tosyl chloride), a benzoyl halide (e.g. 4-methoxybenzoyl chloride) a halobenzene (e.g. chlorobenzene) or a benzyl halide (e.g. benzyl chloride). In some embodiments, the first salt, second salt, and the organic compound are combined in the same step. In some embodiments, the first salt, second salt are combined prior to addition of the organic compound. In some embodiments, the first salt, second salt, and the organic compound is added together with one or more solvents in which the organic compound is soluble in at least one of the one or more solvents.

In some embodiments, the one or more solvents comprise a solvent selected from the group consisting of acetonitrile, propionitrile, toluene, 1,2-dichlorobenzene, chlorobenzene, fluorobenzene, 1,2-difluorobenzene, dichloroethane, trifluorotoluene, chloroform, tert-butanol, tert-amyl alcohol and water, wherein any one or more of the aforementioned organic solvents may be in admixture with water.

In some embodiments, the one or more solvents comprise acetonitrile, chlorobenzene, tert-butanol, tert-amyl alcohol and/or water. In some embodiments, the one or more solvents comprise a cryptand, a crown ether and a hydrogen-bonding phase transfer agent.

In some embodiments, the fluorination reaction is performed at a temperature of about 20-300° C. In some embodiments, the fluorination reaction is performed at a temperature of about 20-100° C. In some embodiments, the fluorination reaction yield of the organofluorine compound is at least about 10% (measured based on a starting amount the organic compound). In some embodiments, the fluorination reaction yield is at least about 30% (measured based on a starting amount the organic compound). In some embodiments, the fluorination reaction yield is at least about 50% (measured based on a starting amount the organic compound). In some embodiments, the fluorination reaction yield is at least about 80% (measured based on a starting amount the organic compound).

In some embodiments, the fluorination reaction is a mono-fluorination reaction. In some embodiments, the fluorination reaction is a di-fluorination reaction.

BRIEF DESCRIPTION OF THE DRAWINGS

The novel features of the invention are set forth with particularity in the appended claims. A better understanding of the features and advantages of the present invention will be obtained by reference to the following detailed description that sets forth illustrative embodiments, in which the principles of the invention are utilized, and the accompanying drawings (also “Figure” and “FIG.” herein), of which:

FIG. 1 shows possible manufacturing schemes of fluorochemicals from salts comprising fluorine.

FIG. 2 shows: Top: ¹⁹F NMR in D₂O of the fluorinating reagent derived from CaF₂ and K₂HPO₄ under mechanochemical conditions. Bottom: ¹⁹F NMR in D₂O of the fluorinating reagent derived from CaF₂ and K₂HPO₄ under mechanochemical conditions, following spiking with KF.

FIG. 3 shows the NMR yields (%) of TsF and TsCl when various phosphates were used as activators of Fluorspar.

FIG. 4 shows a PXRD diffractogram of the milling product of fluorspar and KH₂PO₄ after 3 hours at 35 Hz.

FIG. 5 shows a PXRD diffractogram of the milling product of fluorspar and K₃PO₄ after 3 hours at 35 Hz.

FIG. 6 shows a PXRD diffractogram of the milling product of fluorspar with Na₃PO₄ after 3 hours at 30 Hz.

FIG. 7 shows a PXRD diffractogram of the milling product of fluorspar with Na₂HPO₄ after 3 hours at 35 Hz.

FIG. 8 shows a PXRD diffractogram of the milling product of fluorspar with NaH₂PO₄ after 3 hours at 35 Hz.

FIG. 9 shows a PXRD diffractogram of the milling product of fluorspar with KPO₃ after 3 hours at 35 Hz.

FIG. 10 shows a PXRD diffractogram of the milling product of fluorspar with K₄P₂O₇ after 3 hours at 35 Hz.

FIG. 11 shows a PXRD diffractogram of the milling product of fluorspar with K₅P₃O₁₀ after 3 hours at 35 Hz.

FIG. 12 shows a PXRD diffractogram of the milling product of fluorspar with Na₄P₂O₇ after 3 hours at 35 Hz.

FIG. 13 shows a PXRD diffractogram of the milling product of fluorspar with Na₅P₃O₁₀ after 3 hours at 35 Hz.

FIG. 14 shows a PXRD diffractogram of the milling product of fluorspar with Na(PO₃)₃ after 3 hours at 35 Hz.

FIG. 15 shows a PXRD diffractogram of the milling product of fluorspar with CaHPO₄ after 3 hours at 30 Hz.

FIG. 16 shows a PXRD diffractogram of the milling product of fluorspar with Ca₃(PO₄)₂ after 3 hours at 30 Hz.

FIG. 17 shows stacked PXRD diffractograms of the milling products of fluorspar after subsequent addition and milling at 30 Hz for 3 hours of K₂HPO₄ resulting in CaF₂:K₂HPO₄ ratios of 1:1, 1:2, 1:2.5, and 1:3.

FIG. 18 shows the NMR yields of TsF from TsCl using fluorspar and K₂HPO₄ as an activator wherein the fluorspar and K₂HPO₄ are milled at different frequencies.

FIG. 19 shows the NMR yields of TsF from TsCl using fluorspar and varying amounts of K₂HPO₄ activator resulting in the use of different ratios of CaF₂:K₂HPO₄. In A, 1 equivalent of K₂HPO₄ was added to fluorspar, in B, 2 equivalents total are added, and in C, 2.5 total equivalents of K₂HPO₄ are added.

FIG. 20 shows the NMR yields of TsF from TsCl using fluorspar and K₂HPO₄ as an activator with different amounts of water added to the fluorination reaction.

FIG. 21 shows the NMR yields of TsF from TsCl using fluorspar and K₂HPO₄ as an activator with different amounts of water added to the fluorination reaction and 5 hour or 18 hour reaction times.

FIG. 22 shows the fluorination substrate scope of R—SO₂Cl species.

FIG. 23 shows the fluorination substrate scope of R—X species.

FIG. 24 shows ¹⁹F NMR (24A) and ³¹P NMR (24B) of the soluble product of milling of fluorspar and K₂HPO₄.

FIG. 25 shows the PXRD diffractogram of the milling product of fluorspar with K₂HPO₄ after 9 hours at 30 Hz referenced to crystalline KF (bottom).

FIG. 26 shows the PXRD diffractogram of the milling product (Fluoromix) of fluorspar reacted with K₂HPO₄.

FIG. 27 shows stacked PXRD diffractograms of (from top to bottom), fluorspar milled with K₂HPO₄ for 9 hours at 30 Hz, KF milled with K₂HPO₄ for 3 hours at 30 Hz, KF milled with K₂HPO₄ for 3 hours at 30 Hz followed by CaHPO₄ for 3 hours at 30 Hz, and crystalline CaF₂.

FIG. 28 shows the simulated crystal structure of the product of KF milled with K₂HPO₄ for 3 hours at 30 Hz (A) and KF milled with K₂HPO₄ for 3 hours at 30 Hz followed by CaHPO₄ for 3 hours at 30 Hz, and crystalline CaF₂ (B).

FIG. 29 shows stacked PXRD diffractograms of fluorspar, K₂HPO₄, and fluorapatite.

FIG. 30 shows overlayed PXRD diffractograms of fluoromix, KF milled with K₂HPO₄ for 3 hours at 30 Hz, KF milled with K₂HPO₄ for 3 hours at 30 Hz followed by CaHPO₄ for 3 hours at 30 Hz, and crystalline CaF₂, and fluorspar.

FIG. 31 shows the PXRD diffractogram of the water insoluble solid formed from the milling reaction of CaF₂ (fluorspar) and K₂HPO₄.

FIG. 32 shows the PXRD diffractogram of water insoluble solid formed from the milling reaction of CaF₂ (fluorspar) and K₂HPO₄ overlayed with the PXRD diffractogram of the milling product of fluorspar and CaHPO₄ (32A) and the PXRD diffractogram of the product formed from the milling reaction of fluorspar and CaHPO₄ after 3 hours at 30 Hz (32B).

FIG. 33 shows the PXRD diffractogram of X (KF milled with K₂HPO₄ for 3 hours at 35 Hz).

FIG. 34 shows the PXRD diffractogram of Y (KF milled with K₂HPO₄ for 3 hours at 35 Hz followed by CaHPO₄ for 3 hours at 35 Hz).

FIG. 35 shows the NMR yield of TsF from TsCl upon reaction with fluoromix or X (KF milled with K₂HPO₄ for 3 hours at 35 Hz) or Y (KF milled with K₂HPO₄ for 3 hours at 35 Hz followed by CaHPO₄ for 3 hours at 35 Hz) independently.

FIG. 36 shows the PXRD diffractogram of fluorspar with NaOH.

FIG. 37 shows NMR yields of TsF from TsCl using fluorspar and various non-phosphate activators.

FIG. 38 shows the PXRD diffractogram of the product of the fluorspar milling reaction with K₂CO₃ for 3 hours at 35 Hz.

FIG. 39 shows the PXRD diffractogram of the product of the fluorspar milling reaction with KHCO₃ for 3 hours at 35 Hz.

FIG. 40 shows the PXRD diffractogram of the product of the fluorspar milling reaction with K₂SO₄ for 3 hours at 35 Hz.

FIG. 41 shows the PXRD diffractogram of the product of the fluorspar milling reaction with KHSO₄ for 3 hours at 35 Hz.

FIG. 42 shows the PXRD diffractogram of the product of the fluorspar milling reaction with K₂S₂O₇ for 3 hours at 35 Hz.

FIG. 43 shows the PXRD diffractogram of the product of the fluorspar milling reaction with Na₂SO₃ for 1.5 hours at 35 Hz.

FIG. 44 shows the PXRD diffractogram of the product of the fluorspar milling reaction with KNO₃ for 3 hours 35 Hz.

FIG. 45 shows the PXRD diffractogram of the product of the fluorspar milling reaction with KOH for 3 hours 35 Hz.

FIG. 46 shows the PXRD diffractogram of the product of the fluorspar milling reaction with NaOH for 3 hours 35 Hz.

FIG. 47 shows the reaction scope of R—SO₂Cl species with fluorapatite using a phosphate activator and associated yields.

FIG. 48 shows stacked PXRD diffractograms of the products of the fluorapatite milling reaction upon subsequent additions of K₄P₂O₇ (4 separate additions of 1 equivalent).

FIG. 49 shows the PXRD diffractogram of pure fluorapatite after 1 hour of milling overlayed with a fluorapatite sample (1 equiv.) that was milled for 12 hours total at 35 Hz with K₄P₂O₇ (4 equiv.).

FIG. 50 shows stacked PXRD diffractograms of the reaction 1:4 equiv. milling reaction (D) between fluorapatite (Ca₅(PO₄)₃F) and K₄P₂O₇, and the milling reaction between potassium fluoride (KF, 1 equiv.) and K₂HPO₄ (2 equiv., 35 Hz, 3 hours) followed by CaHPO₄ (1 equiv., 35 Hz, 3 hours).

FIG. 51 shows the PXRD diffractogram of the water insoluble product of the reaction between fluorapatite and potassium pyrophosphate overlayed with the PXRD diffractogram of fluorapatite.

FIG. 52 shows the PXRD diffractogram of the milling reaction of fluorapatite and 1 equivalent of K₄P₂O₇ for 9 hours at 30 Hz.

FIG. 53 shows the PXRD diffractogram of the milling reaction of 4 subsequent additions of 1 equivalent of K₄P₂O₇ to 1 equivalent of fluorapatite with 3 hours of milling at 35 Hz after each addition.

FIG. 54 shows a general scheme for which the effect of the variation of screw temperature on the generation of active fluorination material was tested.

FIG. 55 shows a general scheme for which the effect of the variation of screw speed on the generation of active fluorination material was tested.

FIG. 56 shows a general scheme for which the effect of the variation of the number of recycling times on the generation of active fluorination material was tested.

FIG. 57 shows a general scheme for which only CaF₂ is added into the twin-screw extruder without the K₂HPO₄.

FIG. 58 shows a general scheme for which the effect of varying screw configuration on generation of active fluorination material was tested.

DETAILED DESCRIPTION OF THE INVENTION

Throughout the entirety of the description and claims of this specification, where subject matter is described herein using the term “comprise” (or “comprises” or “comprising”), the same subject matter instead described using the term “consist of” (or “consists of” or “consisting of”) or “consist essentially of” (or “consists essentially of” or “consisting essentially of”) is also contemplated.

The term “about” or “approximately” may mean within an acceptable error range for the particular value, which will depend in part on how the value is measured or determined, e.g., the limitations of the measurement system. Unless otherwise specified herein, “about” generally refers to a range of +/−10% of the stated value. In the case of X-ray diffraction reflections, however, “about” generally refers to a range of +/−0.1° of the stated value. Whenever the term “no more than,” “less than,” or “less than or equal to” precedes the first numerical value in a series of two or more numerical values, the term “no more than,” “less than,” or “less than or equal to” applies to each of the numerical values in that series of numerical values. For example, less than or equal to 3, 2, or 1 is equivalent to less than or equal to 3, less than or equal to 2, or less than or equal to 1.

Certain inventive embodiments herein contemplate numerical ranges. When ranges are present, the ranges include the range endpoints. Additionally, every sub range and value within the range is present as if explicitly written out.

Certain inventive embodiments herein contemplate characteristic x-ray diffraction reflections. In certain embodiments, the presence or absence of a characteristic x-ray diffraction reflection is determined by identification of a peak in an x-ray diffraction spectrum located at a characteristic 2θ value.

In certain embodiments, a peak is present when a 2θ signal has a signal to noise ratio of at least 3.

In certain embodiments, a peak is present when a 2θ signal has a signal to noise ratio of at least 5. In certain embodiments, a peak is present when a 2θ signal has a signal to noise ratio of at least 10.

In certain embodiments, a peak is present when a 2θ signal has a signal to noise ratio of at least 20.

In certain embodiments, peaks are identified in a raw powder x-ray diffraction spectrum. In certain embodiments, peaks are identified in a background subtracted powder x-ray diffraction spectrum. In some embodiments, peaks corresponding to a first salt are subtracted from a raw spectrum to yield a background subtracted spectrum. In some embodiments, peaks corresponding to a second salt are subtracted from a raw spectrum to yield a background subtracted spectrum. In some embodiments, one or more known contaminant peaks are subtracted from a raw spectrum to yield a background subtracted spectrum. In some embodiments, peaks corresponding to one or more of: a first salt, a second salt, and/or a known contaminant are subtracted from a raw spectrum to yield a background subtracted spectrum.

Throughout the description and claims of this specification, the singular encompasses the plural unless the context otherwise requires. In particular, where the indefinite article is used, the specification is to be understood as contemplating plurality as well as singularity, unless the context requires otherwise.

Features described in conjunction with a particular aspect, embodiment or example of the invention are to be understood to be applicable to any other aspect, embodiment or example described herein unless incompatible therewith. All of the features disclosed in this specification (including any accompanying claims, abstract and drawings), and/or all of the steps of any method or process so disclosed, may be combined in any combination, except combinations where at least some of such features and/or steps are mutually exclusive. The invention is not restricted to the details of any of the specific embodiments recited herein. The invention extends to any novel one, or any novel combination, of the features disclosed in this specification (including any accompanying claims, abstract and drawings), or to any novel one, or any novel combination, of the steps of any method or process so disclosed.

Unless otherwise specified, where the quantity or concentration of a particular component of a given product is specified as a weight percentage (wt. % or % w/w), said weight percentage refers to the percentage of said component by weight relative to the total weight of the product as a whole. It will be understood by those skilled in the art that the sum of weight percentages of all components of a product will total 100 wt. %. However, where not all components are listed (e.g. where a product is said to “comprise” one or more particular components), the weight percentage balance may optionally be made up to 100 wt % by unspecified ingredients.

As described hereinbefore, in a first aspect the present invention provides a process for the preparation of a fluorinating reagent, the process comprising the step of:

• • a) pulverising together a fluorine-containing compound and an ionic compound in the solid state, wherein the fluorine-containing compound is at least one of calcium fluoride and fluorapatite,
    wherein the anion of said ionic compound is combinable with Ca²⁺ to form a calcium salt having a lattice energy that is greater than 2450 KJ mol⁻¹.

Through rigorous investigations, the inventors have arrived at a solution to the long-standing problem described hereinbefore by devising a process that allows calcium fluoride and fluorapatite to be directly converted into a fluorinating reagent without the need for converting them into HF using sulfuric acid. This is achieved by reacting calcium fluoride and/or fluorapatite with particular ionic compounds according to the conditions outlined in step a) (e.g. ball milling, or other mechanochemical technique). The process of the invention therefore allows for the preparation of value-added fluorochemicals using more environmentally-friendly and sustainable techniques.

Calcium fluoride (CaF₂, melting point, −1420° C.) is a white solid that is poorly soluble in water (0.016 g/L at 20° C.) and is insoluble in organic solvents. Under ambient conditions, calcium fluoride crystallizes in the fluorite structure (α, space group Fm-3m) wherein Ca²⁺ ions are cubically coordinated to eight nearest-neighbor F⁻ ions. The calcium fluoride used as part of the invention may be naturally occurring (i.e. as fluorspar) or may be synthetic (e.g. industrially produced calcium fluoride having fewer impurities). Fluorapatite is a crystalline solid having the formula Ca₅(PO₄)₃F.

The process of the invention involves reacting the fluorine-containing compound (i.e., calcium fluoride and/or fluorapatite) with particular ionic compounds in the solid state using a high-energy mixing technique, such as one that is sufficient to mechanically reduce the particle size of (e.g. crush) the reactants and bring them into contact with one another. Pulverising together the reactants according to step a) achieves this objective. It will, however, be appreciated that synonymous high-energy mixing techniques resulting in particle size reduction of the reactants and/or an increased surface area to volume ratio of the reactants, such as crushing together, grinding together, milling together, mashing together, macerating together and the like, are embraced by step a).

The process may be a mechanochemical process and/or step a) may be conducted under mechanochemical conditions. Mechanochemistry is a developing area of chemical synthesis and is widely understood to refer to chemical transformations that are initiated by and/or sustained by the application of a mechanical stress to one or more solid reactants.

Step a) may be conducted in a ball mill, a pestle and mortar or a twin screw extruder (TSE). Other techniques and apparatuses suitable for carrying out step a) will be familiar to one skilled in the art, e.g. those skilled in the art of mechanochemistry, including an ultrasonic bath and/or a mechanical press.

In particular embodiments, step a) is conducted in a ball mill. Exemplary ball mills include a planetary ball mill, a vibratory ball mill, an attritor ball mill or a tumbling ball mill. Most suitably, the ball mill is a vibratory ball mill.

The person skilled in the art of ball milling will be able to select appropriate conditions, including ball size and weight, and vessel size. For example, a stainless steel vessel and one or more stainless steel balls may be used. Alternatively, a zirconia vessel and one or more zirconia balls may be used. A ball, or balls, (each) weighing 2-20 g (e.g., 3 g, 4 g, 7 g or 16 g) may, for example, be used.

Step a) may be carried out for any suitable period of time. For example, step a) may be carried out for 0.5-12 hours (e.g., the fluorine-containing compound and ionic compound may be ball milled together for 0.5-12 hours).

In particular embodiments, step a) comprises ball milling the fluorine-containing compound together with the ionic compound at a frequency of 0.5-80 Hz. More suitably, step a) comprises ball milling the fluorine-containing compound together with the ionic compound at a frequency of 5-65 Hz. Even more suitably, step a) comprises ball milling the fluorine-containing compound together with the ionic compound at a frequency of 15-45 Hz. Most suitably, step a) comprises ball milling the fluorine-containing compound together with the ionic compound at a frequency of 20-40 Hz (e.g., 28-38 Hz).

Twin screw extrusion may be performed at various speeds (S_S), screw temperatures (S_T) and residence times (T_R), as described herein. A single pass through the extruder may be sufficient to form the fluorinating reagent. Alternatively, when step a) is conducted in a twin screw extruder, step a) may comprise collecting the product emerging from the twin screw extruder and subjecting it to one or more additional passes through the twin screw extruder.

Step a) is conducted in the solid state. In its simplest sense, step a) is conducted in the absence (or substantial absence) of any solvent. However, the use of some solvent is known to offer advantages in some solid state (e.g. mechanochemical) reactions. Examples of such techniques include solvent-assisted mechanochemistry (sometimes termed liquid-assisted mechanochemistry, e.g. liquid-assisted grinding). Suitably, the amount and type of solvent used (if any) is such that >50 wt % of the fluorine-containing compound, the ionic compound, and any reaction products derived therefrom, remain in the solid state throughout step a). More suitably, >70 wt % of the fluorine-containing compound, the ionic compound, and any reaction products derived therefrom, remain in the solid state throughout step a). Even more suitably, >90 wt % of the fluorine-containing compound, the ionic compound, and any reaction products derived therefrom, remain in the solid state throughout step a). Yet more suitably, >95 wt % of the fluorine-containing compound, the ionic compound, and any reaction products derived therefrom, remain in the solid state throughout step a).

In particular embodiments, step a) is conducted in the absence (or substantial absence) of any solvent. Suitably, step a) involves pulverising together the fluorine-containing compound and the ionic compound in a ball mill (i.e. ball milling the fluorine-containing compound and the ionic compound).

In particular embodiments, step a) is conducted in the absence (or substantial absence) of any solvent. Suitably, step a) involves pulverising together the fluorine-containing compound and the ionic compound in a twin screw extruder.

During step a), the fluorine-containing compound is reacted with an ionic compound, the anion of which is combinable with Ca²⁺ to form a calcium salt having a lattice energy that is greater than 2400 KJ mol⁻¹. The person of skill in the art will be familiar with the term lattice energy as denoting the amount of energy required to dissociate one mole of an ionic compound into its constituent ions in the gaseous state. Calcium fluoride and fluorapatite, being only slightly soluble in certain acids, are chemically inert to nearly all organic chemicals. The stability of calcium fluoride and fluorapatite is attributed in a large part to their high lattice energy (2630 KJ mol⁻¹ for calcium fluoride). The inventors have, however, determined that this stability can be overcome by pulverising together (e.g. ball milling) calcium fluoride and/or fluorapatite with certain ionic compounds according to step a). Without wishing to be bound by theory, the inventors believe that the energetic bar to reactivity of calcium fluoride or fluorapatite can be overcome by the use of high-energy reaction conditions, combined with the use of a thermodynamic sink for Ca²⁺. In particular, the use of ionic compounds, the anions of which (e.g. sulphate, carbonate or phosphate) are able to form calcium salts having lattice energies that are similar to, or preferably greater than, 2630 KJ mol⁻¹ (e.g. CaSO₄=2489 KJ mol⁻¹; CaCO₃=2804 KJ mol⁻¹; Ca₃(PO₄)₂=10,602 KJ mol⁻¹) facilitates the formation of fluorine-containing species that have improved reactivity towards organic chemicals.

The fluorine-containing compound is typically calcium fluoride or fluorapatite. Suitably, the fluorine-containing compound is calcium fluoride. Where the fluorine-containing compound is calcium fluoride, a quantity of fluorapatite may form (e.g., transiently) during the course of step a). In particular embodiments, the calcium fluoride is acid grade fluorspar.

In some instances, the fluorine-containing compound used in the first aspect may be calcium fluoride, fluorapatite and/or any other salt comprising calcium and fluorine. Such other salts may be described elsewhere herein as a first salt comprising calcium and fluorine.

Particularly suitably, the anion of the ionic compound is combinable with Ca²⁺ to form a calcium salt having a lattice energy that is greater than the lattice energy of calcium fluoride (i.e. greater than 2630 KJ mol⁻¹).

The ionic compound is suitably inorganic. The ionic compound may be a salt. Suitably, the ionic compound is a salt of an oxoacid.

The ionic compound may be a phosphate, carbonate, sulphate, sulphite or nitrate salt. Alternatively, the ionic compound may be a phosphate, carbonate or sulphate salt. It will be understood that phosphate, carbonate, sulphate, sulphite or nitrate salts described herein are salts that contains at least one of these anions, meaning that salts such as hydrogen phosphate salts, dihydrogen phosphate salts, hydrogen sulphate salts and bicarbonate salts are also encompassed. It will be understand that phosphate salts encompass metaphosphate salts, and that phosphate salts and sulphate salts encompass pyrophosphate salts and pyrosulfate salts respectively. Alternatively, the ionic compound may be a hydroxide salt or a citrate salt. Alternatively/additionally, the ionic compound may be an alkali metal salt or an alkaline earth metal salt, for example a potassium salt, a sodium salt or a magnesium salt.

In particular embodiments, the ionic compound is a phosphate salt.

The ionic compound may be a phosphate salt of potassium, sodium or calcium, a sulphate salt of potassium, sodium or caesium, a carbonate salt of potassium or sodium, a sulphite salt of potassium or sodium, a nitrate salt of potassium or sodium, a hydroxide salt of potassium or sodium, or a citrate salt of potassium or sodium. For example, the ionic compound may be selected from the group consisting of K₃PO₄, K₂HPO₄, KH₂PO₄, Na₃PO₄, Na₂HPO₄, KPO₃, K₄P₂O₇, K₅P₃O₁₀, Na₄P₂O₇, Na₅P₃O₁₀, (NaPO₃)₃, CaHPO₄, K₂CO₃, KHCO₃, K₂SO₄, KHSO₄, Cs₂SO₄, MgSO₄, Ag₂SO₄, K₂S₂O₇, Na₂SO₃, Na₂SO₄, Na₂CO₃, KNO₃, Na₃C₆H₅O₇, NaOH and KOH.

Particular, non-limiting examples of the ionic compound include phosphate salts of potassium and sodium, sulphate salts of potassium and sodium, and carbonate salts of potassium and sodium. Suitably, the ionic compound is a phosphate salt of potassium or sodium. More suitably, the ionic compound is a phosphate salt of potassium. Most suitably, the ionic compound is K₃PO₄ or K₂HPO₄, of which K₂HPO₄ is most preferred.

Alternatively, the ionic compound may be selected from the group consisting of K₃PO₄, K₂HPO₄, KH₂PO₄, KPO₃, Na₃PO₄, Na₂HPO₄, Cs₂SO₄, Na₂SO₃, K₄P₂O₇, K₅P₃O₁₀, Na₄P₂O₇, Na₅P₃O₁₀, Na₃C₆H₅O₇, K₂SO₄, Na₂SO₄, MgSO₄, Na₂CO₃, K₂CO₃, KHCO₃, NaOH and KOH. Suitably, the ionic compound is selected from the group consisting of K₃PO₄, K₂HPO₄, KPO₃, Na₃PO₄, Na₂HPO₄, K₄P₂O₇, K₅P₃O₁₀, Na₄P₂O₇, Na₅P₃O₁₀, K₂CO₃, KHCO₃, NaOH and KOH. More suitably, the ionic compound is selected from the group consisting of K₂HPO₄, KPO₃, Na₂HPO₄, K₄P₂O₇, K₅P₃O₁₀ and Na₄P₂O₇.

In some instances, the ionic compound used in the first aspect may be described elsewhere herein as a second salt.

In particular embodiments, the ionic compound is K₂HPO₄, KPO₃, Na₂HPO₄, K₄P₂O₇, K₅P₃O₁₀ or Na₄P₂O₇ and step a) is conducted in the absence (or substantial absence) of any solvent. Suitably, step a) involves pulverising together the fluorine-containing compound and the ionic compound in a ball mill (i.e. ball milling the fluorine-containing compound and the ionic compound).

In particular embodiments, the ionic compound is a phosphate, sulphate or carbonate salt of potassium or sodium (e.g. K₃PO₄ or K₂HPO₄) and step a) is conducted in the absence (or substantial absence) of any solvent. Suitably, step a) involves pulverising together the fluorine-containing compound and the ionic compound in a ball mill (i.e. ball milling the fluorine-containing compound and the ionic compound).

It will be appreciated that ionic compounds having properties similar to those recited herein may also be suitable for use in step a).

The molar ratio of the fluorine-containing compound to the ionic compound in step a) may be (0.1-7):1 (e.g., (0.3-6):1). Suitably, the molar ratio of the fluorine-containing compound to the ionic compound in step a) may be (0.5-5):1. More suitably, the molar ratio of the fluorine-containing compound to the ionic compound in step a) is (1-2):1.

In some embodiments, the ionic compound is pulverized together with the fluorine-containing compound in portions. For example, step a) may comprise: (a-i) pulverising together the fluorine-containing compound and a first portion of the ionic compound, and (a-ii) pulverising together the product of step (a-i) and a second portion of the ionic compound. Optionally, step a) further comprises a step (a-iii) of pulverising together the product of step (a-ii) and a third portion of the ionic compound. Optionally, step a) further comprises a step (a-iv) of pulverising together the product of step (a-iii) and a fourth portion of the ionic compound. The portions of the ionic compound may be the same or different.

In some embodiments, solid CO₂ (i.e., dry ice) is pulverised together with the fluorine-containing compound and the ionic compound. In such embodiments, between 5 and 15 equivalents of solid CO₂ (relative to 1 equivalent of fluorine-containing compound) may be used in step a).

In some embodiments, the product resulting from step a) may be heat-treated. Suitably, the product resulting from step a) may be heated to a temperature of 300-700° C. (e.g., 500-600° C.).

In embodiments, essentially no HF is produced at any point during step a). For example, <1 ppm (e.g., <1 ppb) of HF may be produced at any point during step a).

The fluorinating reagent afforded by step a) can be used to prepare a fluorochemical (e.g. an organic fluorochemical). Thus, in a second aspect, the invention provides a process for the preparation of a fluorochemical, the process comprising the steps of:

• • a) preparing a fluorinating reagent as described herein; and
  • b) contacting an organic substrate with the fluorinating reagent,
    wherein step b) is conducted simultaneously with, or after, step a).

The organic substrate to be fluorinated may take a variety of forms. Suitably the organic substrate is an electrophile.

The organic substrate may be aliphatic (e.g. an alkyl halide) or aromatic (e.g. an aryl halide or a heteroaryl halide) in nature. The organic substrate suitably has at least one leaving group located at the site to be fluorinated. Leaving groups will be known to those of skill in the art of organic chemistry. Particular, non-limiting examples of suitable leaving groups include halide (particularly chloro or bromo), tosylate, triflate, mesylate, phosphate, nitro, ammonium and iodonium groups. Most suitably, the leaving group is halide.

The organic substrate may be any one of those organic substrates employed in the Examples outlined herein. In such Examples, the exemplified leaving group(s) may, where chemically feasible, be replaced with any one of the other aforementioned leaving groups.

In particular embodiments, the organic substrate is a sulphonyl halide, an acyl halide, an aryl halide or an alkyl halide (including alkylaryl halides, such as benzyl halides). In such embodiments, halide is suitably chloride. Sulphonyl, acyl, aryl and benzylic fluorides are among the most common fluorinated motifs in organic synthesis with broad applicability as either reagents, synthetic intermediates or biological probes. More suitably, the organic substrate is a sulphonyl halide, an acyl halide, an aryl halide or a heteroaryl halide. Particular, non-limiting examples include aromatic sulphonyl halide (e.g. tosyl chloride), benzoyl halides (e.g. 4-methoxybenzoyl chloride), halobenzenes (e.g. chlorobenzene) and benzyl halides (e.g. benzyl chloride).

In particular embodiments, the organic substrate is a sulphonyl halide, an aryl halide, an alkylaryl halide, an acyl halide, an α-halo carbonyl or an alkyl halide.

In particular embodiments, the organic substrate is ArOCHX₂, wherein Ar is an aromatic group (e.g., biphenyl) and X is halide (e.g., chloro).

In particular embodiments, where the organic substrate has more than one leaving group (e.g., 2 leaving groups), the leaving groups may be attached to the same carbon atom (e.g., 2 geminal halide leaving groups).

In many instances, the organic substrate has a molecular weight of <500 g mol⁻¹. Suitably, the organic substrate has a molecular weight of <300 g mol⁻¹.

In particular embodiments, the organic substrate is a sulfonyl halide, an acyl halide, an aryl halide or an alkyl halide (e.g. where halide is bromide) and the ionic compound used in step a) is a phosphate, sulphate or carbonate salt of potassium or sodium (e.g. K₃PO₄ or K₂HPO₄). Suitably, step a) is conducted in the absence (or substantial absence) of any solvent. Alternatively/additionally, step a) involves pulverising together the fluorine-containing compound (e.g., calcium fluoride) and the ionic compound in a ball mill (i.e. ball milling calcium fluoride and the ionic compound).

In particular embodiments, the organic substrate is a sulphonyl halide, an aryl halide, an alkylaryl halide, an acyl halide, an α-halo carbonyl or an alkyl halide and the ionic compound used in step a) is a phosphate, carbonate, sulphate, sulphite, nitrate, hydroxide or citrate salt (e.g. K₃PO₄, K₂HPO₄, KPO₃, Na₃PO₄, Na₂HPO₄, K₄P₂O₇, K₅P₃O₁₀, Na₄P₂O₇, Na₅P₃O₁₀, K₂CO₃, KHCO₃, NaOH or KOH). Suitably, step a) is conducted in the absence (or substantial absence) of any solvent. Alternatively/additionally, step a) involves pulverising together the fluorine-containing compound (e.g., calcium fluoride) and the ionic compound in a ball mill (i.e. ball milling calcium fluoride and the ionic compound) or a twin screw extruder.

Step b) may be conducted simultaneously with step a), such that the organic substrate is available for reaction with the fluorinating reagent as soon as the latter forms during step a). Accordingly, step b) may comprise contacting the organic substrate with the fluorinating reagent under identical conditions to those used to form the fluorinating reagent. In this sense, steps a) and b) may collectively define a single step in which the fluorine-containing compound, the ionic compound and the organic substrate are pulverised together in the solid state (e.g. by ball milling).

Alternatively, step b) may be conducted after step a), such that a quantity of fluorinating reagent is allowed to form before being reacted with the organic substrate.

When step b) is conducted after step a), step b) may be conducted in the solid state. For example, step b) may comprise pulverising together the organic substrate and the fluorinating reagent formed from step a) in the solid state. Suitably, step b) is conducted in a ball mill. More suitably, step b) is conducted in the absence (or substantial absence) of a solvent. In certain embodiments, steps a) and b) are both conducted in a ball mill (e.g. the same ball mill), suitably in the absence (or substantial absence) of a solvent.

Alternatively, when step b) is conducted after step a), step b) may be conducted in solution. For example, step b) may comprise mixing together the organic substrate and the fluorinating reagent in a solvent in which the organic substrate is soluble. Any suitable solvent or combinations of solvents may be used depending on the nature of the organic substrate, including, for example, those solvents employed in the Examples outlined herein (e.g., those listed in Table 3.5). The solvent may, for example, be selected from the group consisting of tetrahydrofuran, 2-methyl tetrahydrofuran, 1, 4-dioxane, diglyme, monoglyme, acetonitrile, propionitrile, tert-butyl isocyanide, tert-butanol, tert-amyl alcohol, toluene, m-xylene, hexane, trifluorotoluene, 1,2-difluorobenzene, 1,2-dichlorobenzene, 1,3-dichlorobenzene, fluorobenzene and chlorobenzene. Particular, non-limiting examples include acetonitrile, propionitrile, toluene, 1,2-dichlorobenzene, chlorobenzene, fluorobenzene, 1,2-difluorobenzene, dichloroethane, trifluorotoluene, chloroform, tert-butanol, tert-amyl alcohol and water. Suitably, step b) is conducted in a solvent selected from the group consisting of acetonitrile, toluene, chlorobenzene, 1,2-difluorobenzene, dichloroethane, trifluorotoluene, chloroform, tert-butanol and tert-amyl alcohol. More suitably, step b) is conducted in acetonitrile, chlorobenzene, tert-butanol or tert-amyl alcohol. Most suitably, step b) is conducted in acetonitrile.

Any one or more of the aforementioned organic solvents may be in admixture with water. For example, the organic solvent may be in admixture with water at a concentration of 0.01-5M. Suitably, the organic solvent may be in admixture with water at a concentration of 0.01-1M (e.g., 0.05-0.5M).

In particular embodiments, step b) is conducted after step a), and step b) is conducted a solvent selected from the group consisting of tetrahydrofuran, 2-methyl tetrahydrofuran, 1, 4-dioxane, diglyme, monoglyme, acetonitrile, propionitrile, tert-butyl isocyanide, tert-butanol, tert-amyl alcohol, toluene, m-xylene, hexane, trifluorotoluene, 1,2-difluorobenzene, 1,2-dichlorobenzene, 1,3-dichlorobenzene, fluorobenzene and chlorobenzene, any one of which may be in admixture with water. Suitably, the organic substrate is a sulphonyl halide, an aryl halide, an alkylaryl halide, an acyl halide, an α-halo carbonyl or an alkyl halide and the ionic compound used in step a) is a phosphate, carbonate, sulphate, sulphite, nitrate, hydroxide or citrate salt (e.g. K₃PO₄, K₂HPO₄, KPO₃, Na₃PO₄, Na₂HPO₄, K₄P₂O₇, K₅P₃O₁₀, Na₄P₂O₇, Na₅P₃O₁₀, K₂CO₃, KHCO₃, NaOH or KOH). Step a) may involve pulverising together the fluorine-containing compound (e.g., calcium fluoride) and the ionic compound in a ball mill (i.e. ball milling calcium fluoride and the ionic compound) or a twin screw extruder.

When step b) is conducted after step a), the fluorinating reagent formed in step a) may be isolated or purified prior to reacting it with the organic substrate.

The skilled person will be able to select appropriate reaction conditions (e.g. temperature, pressure, etc) for carrying out step b) in solution. For example, when step b) is conducted in solution after step a), step b) may be performed at a temperature of 15-180° C. Suitably, step b) is performed at a temperature of 15-150° C.

Step b) may be conducted in the presence of at least one of a cryptand, a crown ether and a hydrogen-bonding phase transfer catalysts. Suitably, step b) is conducted after step a), and is performed in solution. Suitable cryptands include Kryptofix 221® and Kryptofix 222®. Suitable crown ethers include 18-crown-6, dibenzo-18-crown-6, dibenzo-30-crown-10 and dicyclohexano-18-crown-6. Suitable hydrogen-bonding phase transfer catalysts include Schreiner's urea. Amongst the aforementioned cryptands, crown ethers and hydrogen-bonding phase transfer catalysts, 18-crown-6 and dibenzo-18-crown-6 are particularly suitable.

The process may further comprise one or more additional steps in which the fluorochemical formed in step b) is isolated and/or purified.

The fluorochemical may be otherwise described herein as a fluorinated compound or an organo-fluorine compound.

As described hereinbefore, in a third aspect the present invention provides a process for the preparation of a fluorochemical, the process comprising the steps of:

• • a) pulverising a fluorine-containing compound in the solid state, wherein the fluorine-containing compound is at least one of calcium fluoride and fluorapatite; and
  • b) contacting the product of step a) with an organic substrate;
    wherein step b) is conducted simultaneously with, or after, step a).

Through further investigations, the inventors have surprisingly determined that the formation of HF can be bypassed and calcium fluoride or fluorapatite can be directly converted into value-added fluorochemicals using a process that is similar to the process to the first aspect, albeit without the need for the fluorine-containing compound to be pulverised together with an ionic compound as defined herein.

Accordingly, it will be understood that steps a) and b) of the third aspect may have any of those definitions recited hereinbefore in relation to corresponding steps a) and b) of the first and second aspect.

In particular embodiments, step b) is conducted in solution, in the presence of an ionic compound as defined herein (e.g. K₂HPO₄).

As described hereinbefore, in a fourth aspect, the present invention provides a use of a fluorine-containing compound, the fluorine-containing compound being at least one of calcium fluoride and fluorapatite, as a fluorine source in a process for preparing a fluorochemical, wherein the process does not comprise a step of reacting the fluorine-containing compound with sulfuric acid to generate hydrofluoric acid.

As discussed hereinbefore, in a fifth aspect, the present invention provides a use of a fluorine-containing compound, the fluorine-containing compound being at least one of calcium fluoride and fluorapatite, as a fluorine source in a process for preparing a fluorinating reagent, wherein the process does not comprise a step of reacting the fluorine-containing compound with sulfuric acid to generate hydrofluoric acid.

It will be understood that features of the fourth and fifth aspect may have any of those definitions recited hereinbefore in relation to the first, second and third aspects.

According to a sixth aspect of the invention, there is provided a fluorinating reagent obtained, directly obtained or obtainable by a process of the first aspect.

According to a seventh aspect of the invention, there is provided a fluorinating reagent comprising a mixture of inorganic salts.

The sixth and seventh aspects of the invention may be further defined as follows.

The fluorinating reagent may be provided as a mixture of inorganic salts.

The fluorinating reagent (e.g., the mixture of inorganic salts) suitably comprises calcium, fluorine and oxygen, as well as: (i) at least one of potassium and sodium, and (ii) at least one of phosphorus, sulfur, nitrogen and carbon. More suitably, the fluorinating reagent comprises calcium, fluorine and oxygen, as well as: (i) at least one of potassium and sodium, and (ii) at least one of phosphorus, sulfur and carbon. Most suitably, the fluorinating reagent comprises calcium, fluorine, oxygen, potassium and phosphorus. The fluorinating reagent may additionally comprise hydrogen.

The mixture of inorganic salts suitably comprises a first inorganic salt and a second inorganic salt, wherein: (i) the first inorganic salt comprises Ca²⁺ and at least one anion selected from phosphate, sulfate, sulfite, nitrate, carbonate and hydroxide, and (ii) the second inorganic salt comprises fluoride and at least one cation selected from K⁺ and Na²⁺. Suitably, the first inorganic salt comprises Ca²⁺ and at least one anion selected from phosphate, sulfate, carbonate and hydroxide (e.g., phosphate), and/or the second inorganic salt comprises fluoride and K⁺. The mixture of inorganic salts may further comprise one or more additional inorganic salts (i.e., in addition to the first and second inorganic salts), each comprising a cation selected from Ca²⁺, K⁺ and Na²⁺, and an anion selected from fluoride, phosphate, sulfate, sulfite, nitrate, carbonate and hydroxide (e.g., fluoride, phosphate, carbonate and hydroxide).

The fluorinating reagent (e.g., the mixture of inorganic salts) may comprise calcium fluoride and/or fluorapatite. Trace quantities (i.e., those detectable by XRPD) of calcium fluoride and/or fluorapatite, originating from starting materials used in the process of the first aspect, may be present in the fluorinating reagent. Fluorapatite may be present in the fluorinating reagent even when it is not used as the fluorine-containing compound in the process of the first aspect.

The fluorinating reagent may be provided as a powder. The powder may have an average particle size, as determined by SEM or TEM analysis, of <500 μm. Suitably, the powder has an average particle size of <100 μm. More suitably, the powder has an average particle size of <50 μm.

The fluorinating reagent may be characterised by X-ray powder diffraction (XRPD) using Cu Kα1 (λ=1.5406 Å) and/or Cu Kα2 (λ=1.5444 Å). Due to differences in instruments, samples, and sample preparation, peak values are often reported with the modifier “±0.2° 2θ ”. This is common practice in the solid-state chemical arts because of the variation inherent in peak values.

The fluorinating reagent may have an XRPD pattern comprising peaks corresponding ±0.2° 2θ to at least 10%, at least 30%, at least 50%, at least 70%, at least 90%, or 100% of the 2-theta values reported in any one of Tables 5.7.1-5.7.13, 5.12.1, and 6.3.1-6.3.9, outlined herein. For example, the fluorinating reagent may have an XRPD pattern comprising peaks corresponding ±0.2° 2θ to at least 30% of the 25 2-theta values reported in Table 5.12.1 outlined herein, meaning that the fluorinating reagent may have an XRPD pattern comprising peaks corresponding to at least 8 of those 2-theta values reported in Table 5.12.1 (e.g., those not attributed to CaF₂), recognising that each 2-theta value reported in Table 5.12.1 can be modified ±0.2° 2θ. For example, the fluorinating reagent may have an XRPD pattern comprising peaks corresponding ±0.2° 2θ to at least 50% of the 33 2-theta values reported in Table 6.3.3 outlined herein, meaning that the fluorinating reagent may have an XRPD pattern comprising peaks corresponding to at least 17 of those 2-theta values reported in Table 6.3.3, recognising that each 2-theta value reported in Table 5.12.1 can be modified ±0.2° 2θ. Suitably, the fluorinating reagent has an XRPD pattern comprising peaks corresponding ±0.2° 2θ to at least 10%, at least 30%, at least 50%, at least 70%, at least 90%, or 100% of the 2-theta values reported in any one of Tables 5.7.2-5.7.11 and 5.12.1 outlined herein. More suitably, the fluorinating reagent has an XRPD pattern comprising peaks corresponding ±0.2° 2θ to at least 10%, at least 30%, at least 50%, at least 70%, at least 90%, or 100% of the 2-theta values reported in any one of Tables 5.7.7, 5.7.8 and 5.12.1 outlined herein.

The fluorinating reagent may have an XRPD pattern comprising peaks at 2-theta values of 21.9±0.2° 2θ, 30.3±0.2° 2θ, 31.6±0.2° 2θ and 43.4±0.2° 2θ. The XRPD pattern may comprise one or more additional peaks at 2-theta values of 18.0±0.2° 2θ, 18.7±0.2° 2θ, 22.6±0.2° 2θ, 24.5±0.2° 2θ, 25.4±0.2° 2θ, 26.5±0.2° 2θ, 27.0±0.2° 2θ, 28.0±0.2° 2θ, 29.2±0.2° 2θ, 33.0±0.2° 2θ, 34.8±0.2° 2θ, 36.4±0.2° 2θ, 37.7±0.2° 2θ, 39.5±0.2° 2θ, 40.4±0.2° 2θ, 41.7±0.2° 2θ, 42.4±0.2° 2θ, 46.1±0.2° 2θ, 48.4±0.2° 2θ, 49.4±0.2° 2θ, 52.8±0.2° 2θ, and 53.9±0.2° 2θ. The XRPD pattern may comprise peaks at at least five, at least ten, at least fifteen or at least twenty of the aforementioned 2-theta values. The fluorinating reagent may have an XRPD pattern substantially the same as that shown in FIG. 10. Suitably, the fluorinating reagent: (i) comprises calcium, fluorine, oxygen, potassium and phosphorus, and/or (ii) comprises a first inorganic salt and a second inorganic salt, wherein the first inorganic salt comprises Ca²⁺ and phosphate, and the second inorganic salt comprises fluoride and K⁺.

The fluorinating reagent may have an XRPD pattern comprising one or more peaks at 2-theta values of 17.5±0.2° 2θ, 21.2±0.2° 2θ, 23.5±0.2° 2θ, 24.8±0.2° 2θ, 29.4±0.2° 2θ, 29.6±0.2° 2θ, 30.5±0.2° 2θ, 31.5±0.2° 2θ, 35.4±0.2° 2θ, 36.7±0.2° 2θ, 37.4±0.2° 2θ, 39.8±0.2° 2θ, 42.9±0.2° 2θ, 47.1±0.2° 2θ, 48.1±0.2° 2θ, 51.4±0.2° 2θ, 53.2±0.2° 2θ, 54.2±0.2° 2θ, 58.2±0.2° 2θ, 60.9±0.2° 2θ and 63.4±0.2° 2θ. The XRPD pattern may at least two, at least three, at least four, at least five, at least ten, at least fifteen or at least twenty of the aforementioned 2-theta values. The fluorinating reagent may have an XRPD pattern substantially the same as that shown in FIG. 26. Suitably, the fluorinating reagent: (i) comprises calcium, fluorine, oxygen, potassium and phosphorus, and/or (ii) comprises a first inorganic salt and a second inorganic salt, wherein the first inorganic salt comprises Ca²⁺ and phosphate, and the second inorganic salt comprises fluoride and K⁺. The fluorinating reagent may comprise K₃(HPO₄)F.

The fluorinating reagent may comprise K₃(HPO₄)F and has an XRPD pattern comprising one or more peaks at 2-theta values of 21.1±0.2° 2θ, 29.6±0.2° 2θ, 30.5±0.2° 2θ, 37.4±0.2° 2θ, 42.9±0.2° 2θ, 54.2±0.2° 2θ, 58.2±0.2° 2θ and 60.9±0.2° 2θ. Suitably, the fluorinating reagent comprises at least two, at least three, at least four, at least five, at least six, at least seven, or eight peaks at the aforementioned 2-theta values. More suitably, the fluorinating reagent comprises peaks at all eight of the aforementioned 2-theta values. The fluorinating reagent may further comprise calcium fluoride and/or fluorapatite (e.g., trace quantities of calcium fluoride and/or fluorapatite).

The fluorinating reagent may have an XRPD pattern substantially as shown in any one of FIGS. 4-16. 26. 38-46 and 52-53. Suitably, the fluorinating reagent has an XRPD pattern substantially as shown in any one of FIGS. 10, 11 and 26.

It will be understood that a fluorinating reagent is a reagent which, under those conditions described herein, is able to fluorinate an organic substrate described herein.

The fluorinating reagent of the sixth or seventh aspect may be used in the process of the second aspect. Thus, instead of preparing a fluorinating reagent, step a) of the second aspect may comprise providing a fluorinating reagent of the sixth or seventh aspect.

The following numbered statements 1 to 100 describe particular aspects and embodiments of the invention:

• • 1. A process for the preparation of a fluorinating reagent, the process comprising the step of:
    • a) pulverising together a fluorine-containing compound and an ionic compound in the solid state, wherein the fluorine-containing compound is at least one of calcium fluoride and fluorapatite,
  • wherein the anion of said ionic compound is combinable with Ca²⁺ to form a calcium salt having a lattice energy that is greater than 2450 KJ mol⁻¹.
  • 2. The process of statement 1, wherein the fluorine-containing compound is calcium fluoride.
  • 3. A process for the preparation of a fluorinating reagent, the process comprising the step of:
    • a) pulverising together calcium fluoride and an ionic compound in the solid state, wherein the anion of said ionic compound is combinable with Ca²⁺ to form a calcium salt having a lattice energy that is greater than 2450 KJ mol⁻¹.
  • 4. The process of statement 1, 2 or 3, wherein the anion of said ionic compound is combinable with Ca²⁺ to form a calcium salt having a lattice energy that is greater than 2630 KJ mol⁻¹.
  • 5. The process of any one of the preceding statements, wherein the ionic compound is a salt.
  • 6. The process of any one of the preceding statements, wherein the ionic compound is a salt of an oxoacid.
  • 7. The process of any one of the preceding statements, wherein the ionic compound is a phosphate, carbonate, sulphate, sulphite, nitrate, hydroxide or citrate salt.
  • 8. The process of any one of the preceding statements, wherein the ionic compound is a phosphate, carbonate or sulphate salt.
  • 9. The process of any one of the preceding statements, wherein the ionic compound is a phosphate salt.
  • 10. The process of any one of the preceding statements, wherein, the ionic compound is an alkali metal salt or an alkaline earth metal salt.
  • 11. The process of any one of the preceding statements, wherein the ionic compound is a potassium salt, a sodium salt, a calcium salt, a caesium salt or a magnesium salt.
  • 12. The process of any one of the preceding statements, wherein the ionic compound is a potassium salt, a sodium salt or a magnesium salt.
  • 13. The process of any one of the preceding statements, wherein the ionic compound is selected from the group consisting of a phosphate, sulphate or carbonate salt of potassium or sodium.
  • 14. The process of any one of the preceding statements, wherein the ionic compound is a phosphate salt of potassium or sodium.
  • 15. The process of any one of the preceding statements, wherein the ionic compound is a phosphate salt of potassium.
  • 16. The process of statement 1, 2 or 3, wherein the ionic compound is selected from the group consisting of K₃PO₄, K₂HPO₄, KH₂PO₄, Na₃PO₄, Na₂HPO₄, KPO₃, K₄P₂O₇, K₅P₃O₁₀, Na₄P₂O₇, Na₅P₃O₁₀, (NaPO₃)₃, CaHPO₄, K₂CO₃, KHCO₃, K₂SO₄, KHSO₄, Cs₂SO₄, MgSO₄, Ag₂SO₄, K₂S₂O₇, Na₂SO₃, Na₂SO₄, Na₂CO₃, KNO₃, Na₃C₆H₅O₇, NaOH and KOH.
  • 17. The process of statement 16, wherein the ionic compound is selected from the group consisting of K₃PO₄, K₂HPO₄, KPO₃, Na₃PO₄, Na₂HPO₄, K₄P₂O₇, K₅P₃O₁₀, Na₄P₂O₇, Na₅P₃O₁₀, K₂CO₃, KHCO₃, NaOH and KOH.
  • 18. The process of statement 16, wherein the ionic compound is selected from the group consisting of K₂HPO₄, KPO₃, Na₂HPO₄, K₄P₂O₇, K₅P₃O₁₀ and Na₄P₂O₇.
  • 19. The process of statement 1, 2 or 3, wherein the ionic compound is K₃PO₄ or K₂HPO₄.
  • 20. The process of any one of the preceding statements, wherein >50 wt % of the fluorine-containing compound, the ionic compound, and any reaction products derived therefrom, remain in the solid state throughout step a).
  • 21. The process of any one of the preceding statements, wherein >70 wt % of the fluorine-containing compound, the ionic compound, and any reaction products derived therefrom, remain in the solid state throughout step a).
  • 22. The process of any one of the preceding statements, wherein >90 wt % of the fluorine-containing compound, the ionic compound, and any reaction products derived therefrom, remain in the solid state throughout step a).
  • 23. The process of any one of the preceding statements, wherein >95 wt % of the fluorine-containing compound, the ionic compound, and any reaction products derived therefrom, remain in the solid state throughout step a).
  • 24. The process of any one of the preceding statements, wherein step a) is conducted in the absence of a solvent.
  • 25. The process of any one of the preceding statements, wherein step a) is a mechanochemical process.
  • 26. The process of any one of the preceding statements, wherein step a) is conducted in a ball mill, a pestle and mortar, a twin screw extruder, an ultrasonic bath or a mechanical press.
  • 27. The process of any one of the preceding statements, wherein step a) is conducted in a ball mill, a pestle and mortar or a twin screw extruder.
  • 28. The process of any one of the preceding statements, wherein step a) is conducted in a ball mill.
  • 29. The process of statement 28, wherein the ball mill is a planetary mill, a vibratory mill, an attritor mill or a tumbling ball bill.
  • 30. The process of statement 28, wherein the ball mill is a vibratory mill.
  • 31. The process of statement 28, 29 or 30, wherein step a) comprises ball milling the fluorine-containing compound together with the ionic compound at a frequency of 0.5-80 Hz (e.g., 20-40 Hz).
  • 32. The process of any one of statements 1 to 27, wherein step a) is conducted in a twin screw extruder.
  • 33. The process of statement 32, wherein step a) comprises collecting the product emerging from the twin screw extruder and subjecting it to one or more additional passes through the twin screw extruder.
  • 34. The process of any one of the preceding statements, wherein the molar ratio of the fluorine-containing compound to the ionic compound in step a) is (0.1-7):1 (e.g., (0.3-6):1).
  • 35. The process of any one of the preceding statements, wherein the molar ratio of the fluorine-containing compound to the ionic compound in step a) is (0.5-5):1 (e.g., (1-2):1).
  • 46. The process of any one of the preceding statements, wherein the ionic compound is pulverized together with the fluorine-containing compound in portions.
  • 37. The process of statement 36, wherein step a) comprises: (a-i) pulverising together the fluorine-containing compound and a first portion of the ionic compound, and (a-ii) pulverising together the product of step (a-i) and a second portion of the ionic compound.
  • 38. The process of statement 37, wherein step a) further comprises a step (a-iii) of pulverising together the product of step (a-ii) and a third portion of the ionic compound.
  • 39. The process of statement 38, wherein step a) further comprises a step (a-iv) of pulverising together the product of step (a-iii) and a fourth portion of the ionic compound.
  • 40. The process of any one of the preceding statements, wherein <1 ppm (e.g., <1 ppb) of HF is produced at any point during step a).
  • 41. A process for the preparation of a fluorochemical, the process comprising the steps of:
    • a) preparing a fluorinating reagent as described in any one of the preceding statements; and
    • b) contacting an organic substrate with the fluorinating reagent,
  • wherein step b) is conducted simultaneously with, or after, step a).
  • 42. The process of statement 41, wherein the organic substrate is aromatic or aliphatic.
  • 43. The process of statement 41 or 42, wherein the organic substrate comprises at least one leaving group located at the site to be fluorinated.
  • 44. The process of statement 43, wherein the organic substrate has more than one leaving group (e.g., 2 leaving groups), optionally wherein the leaving groups may be attached to the same carbon atom (e.g., 2 geminal halide leaving groups).
  • 45. The process of any one of statements 41 to 44, wherein the organic substrate has a molecular weight of <500 g mol⁻¹.
  • 46. The process of statement 45, wherein the organic substrate has a molecular weight of <300 g mol⁻¹ (e.g., <200 g mol⁻¹).
  • 47. The process of any one of statements 41 to 46, wherein the organic substrate is a sulphonyl halide, an aryl halide, an alkylaryl halide, an acyl halide, an α-halo carbonyl or an alkyl halide.
  • 48 The process of any one of statements 41 to 46, wherein the organic substrate is a sulphonyl halide, an acyl halide, a heteroaryl halide, an aryl halide or an alkyl halide.
  • 49. The process of any one of statements 41 to 46, wherein the organic substrate is an aromatic sulphonyl halide (e.g. tosyl chloride), a benzoyl halide (e.g. 4-methoxybenzoyl chloride) a halobenzene (e.g. chlorobenzene) or a benzyl halide (e.g. benzyl chloride).
  • 50. The process of any one of statements 41 to 49, wherein step b) is conducted simultaneously with step a) and step b) comprises contacting the organic substrate with the fluorinating reagent under identical conditions to those used to form the fluorinating reagent.
  • 51. The process of any one of statements 41 to 49, wherein and step b) is conducted after step a) and step b) comprises pulverising together the organic substrate and the fluorinating reagent formed from step a) in the solid state.
  • 52. The process of any one of statements 41 to 49, wherein step b) is conducted after step a) and step b) comprises mixing together the organic substrate and the fluorinating reagent in one or more solvents in which the organic substrate is soluble.
  • 53. The process of statement 52, wherein step b) is conducted in one or more solvents selected from the group consisting of tetrahydrofuran, 2-methyl tetrahydrofuran, 1, 4-dioxane, diglyme, monoglyme, acetonitrile, propionitrile, tert-butyl isocyanide, tert-butanol, tert-amyl alcohol, toluene, m-xylene, hexane, trifluorotoluene, 1,2-difluorobenzene, 1,2-dichlorobenzene, 1,3-dichlorobenzene, fluorobenzene and chlorobenzene.
  • 54. The process of statement 52, wherein step b) is conducted in a one or more solvents selected from the group consisting of acetonitrile, propionitrile, toluene, 1,2-dichlorobenzene, chlorobenzene, fluorobenzene, 1,2-difluorobenzene, dichloroethane, trifluorotoluene, chloroform, tert-butanol, tert-amyl alcohol and water.
  • 55. The process of statement 52, wherein step b) is conducted in one or more solvents selected from the group consisting of acetonitrile, propionitrile, toluene, chlorobenzene, 1,2-difluorobenzene, dichloroethane, trifluorotoluene, chloroform, tert-butanol and tert-amyl alcohol.
  • 56. The process of statement 52, wherein step b) is conducted in acetonitrile, propionitrile, chlorobenzene, tert-butanol or tert-amyl alcohol.
  • 57. The process of any one of statements 53 to 56, wherein any one or more of the organic solvents are in admixture with water.
  • 58. The process of statement 57, wherein the organic solvent may be in admixture with water at a concentration of 0.01-5M (e.g., 0.01-1M, such as 0.05-0.5M).
  • 59. The process of any one of statements 41 to 58, wherein step b) is conducted in the presence of at least one of a cryptand, a crown ether and a hydrogen-bonding phase transfer catalyst.
  • 60. The process of statement 59, wherein step b) is conducted in the presence of a crown ether.
  • 61. The process of 60, wherein the crown ether is 18-crown-6 or dibenzo-18-crown-6. 62. The process of any one of statements 52 to 61, wherein step b) is conducted at a temperature of 15-180° C.
  • 63. A process for the preparation of a fluorochemical, the process comprising the steps of:
    • a) pulverising a fluorine-containing compound in the solid state, wherein the fluorine-containing compound is at least one of calcium fluoride and fluorapatite; and
    • b) contacting the product of step a) with an organic substrate;
  • wherein step b) is conducted simultaneously with, or after, step a).
  • 64. A process for the preparation of a fluorochemical, the process comprising the steps of:
    • a) pulverising a calcium fluoride in the solid state; and
    • b) contacting the product of step a) with an organic substrate;
  • wherein step b) is conducted simultaneously with, or after, step a).
  • 65. The process of statement 63 or 64, wherein step b) is conducted in solution, in the presence of an ionic compound as described herein (e.g., K₂HPO₄).
  • 66. Use of a fluorine-containing compound, the fluorine-containing compound being at least one of calcium fluoride and fluorapatite, as a fluorine source in a process for preparing a fluorochemical or a fluorinating reagent, wherein the process does not comprise a step of reacting the calcium fluoride with sulfuric acid to generate hydrofluoric acid.
  • 67. Use of calcium fluoride as a fluorine source in a process for preparing a fluorochemical, wherein the process does not comprise a step of reacting the calcium fluoride with sulfuric acid to generate hydrofluoric acid.
  • 68. A fluorinating reagent obtained, directly obtained or obtainable by the process of any one of statements 1 to 40. 69. A fluorinating reagent comprising a mixture of inorganic salts.
  • 70. The fluorinating reagent of statement 68, wherein the fluorinating reagent comprises a mixture of inorganic salts.
  • 71. The fluorinating reagent of statement 68, 69 or 70, wherein the fluorinating reagent comprises calcium, fluorine and oxygen, as well as: (i) at least one of potassium and sodium, and (ii) at least one of phosphorus, sulfur, nitrogen and carbon.
  • 72. The fluorinating reagent of statement 68, 69 or 70, wherein the fluorinating reagent comprises calcium, fluorine and oxygen, as well as: (i) at least one of potassium and sodium, and (ii) at least one of phosphorus, sulfur and carbon.
  • 73. The fluorinating reagent of statement 68, 69 or 70, wherein the fluorinating reagent comprises calcium, fluorine, oxygen, potassium and phosphorus.
  • 74. The fluorinating reagent of any one of statements 68 to 73, wherein the fluorinating reagent comprises a mixture of inorganic salts, the mixture comprising a first inorganic salt and a second inorganic salt, wherein: (i) the first inorganic salt comprises Ca²⁺ and at least one anion selected from phosphate, sulfate, sulfite, nitrate, carbonate and hydroxide, and (ii) the second inorganic salt comprises fluoride and at least one cation selected from K⁺ and Na²+.
  • 75. The fluorinating reagent of statement 74, wherein the first inorganic salt comprises Ca²⁺ and at least one anion selected from phosphate, sulfate, carbonate and hydroxide (e.g., phosphate), and/or the second inorganic salt comprises fluoride and K⁺.
  • 76. The fluorinating reagent of any one of statements 68 to 75, wherein the fluorinating reagent is provided as a powder.
  • 77. The fluorinating reagent of statements 76, wherein the powder has an average particle size, as determined by SEM or TEM analysis, of <500 μm (e.g., <100 μm).
  • 78. The fluorinating reagent of any one of statements 68 to 77, wherein the fluorinating reagent has an XRPD pattern comprising peaks corresponding ±0.2° 2θ to at least 10%, at least 30%, at least 50%, at least 70%, at least 90%, or 100% of the 2-theta values reported in any one of Tables 5.7.1-5.7.13, 5.12.1, and 6.3.1-6.3.9, outlined herein.
  • 79. The fluorinating reagent of any one of statements 68 to 77, wherein the fluorinating reagent has an XRPD pattern comprising peaks corresponding ±0.2° 2θ to at least 10%, at least 30%, at least 50%, at least 70%, at least 90%, or 100% of the 2-theta values reported in any one of Tables 5.7.2-5.7.11 and 5.12.1 outlined herein.
  • 80. The fluorinating reagent of any one of statements 68 to 77, wherein the fluorinating reagent has an XRPD pattern comprising peaks corresponding ±0.2° 2θ to at least 10%, at least 30%, at least 50%, at least 70%, at least 90%, or 100% of the 2-theta values reported in any one of Tables 5.7.7, 5.7.8 and 5.12.1 outlined herein.
  • 81. The fluorinating reagent of any one of statements 68 to 77, wherein the fluorinating reagent has an XRPD pattern comprising peaks at 2-theta values of 21.9±0.2° 2θ, 30.3±0.2° 2θ, 31.6±0.2° 2θ and 43.4±0.2° 2θ. 82. The fluorinating reagent of statement 81, wherein the XRPD pattern comprises one or more additional peaks at 2-theta values of 18.0±0.2° 2θ, 18.7±0.2° 2θ, 22.6±0.2° 2θ, 24.5±0.2° 2θ, 25.4±0.2° 2θ, 26.5±0.2° 2θ, 27.0±0.2° 2θ, 28.0±0.2° 2θ, 29.2±0.2° 2θ, 33.0±0.2° 2θ, 34.8±0.2° 2θ, 36.4±0.2° 2θ, 37.7±0.2° 2θ, 39.5±0.2° 2θ, 40.4±0.2° 2θ, 41.7±0.2° 2θ, 42.4±0.2° 2θ, 46.1±0.2° 2θ, 48.4±0.2° 2θ, 49.4±0.2° 2θ, 52.8±0.2° 2θ, and 53.9±0.2° 2θ.
  • 83. The fluorinating reagent of statement 82, wherein the XRPD pattern comprises at least five of the additional peaks.
  • 84. The fluorinating reagent of statement 82, wherein the XRPD pattern comprises at least ten of the additional peaks.
  • 85. The fluorinating reagent of statement 82, wherein the XRPD pattern comprises at least fifteen of the additional peaks.
  • 86. The fluorinating reagent of statement 82, wherein the XRPD pattern comprises at least twenty of the additional peaks.
  • 87. The fluorinating reagent of any one of statements 68 to 77, wherein the fluorinating reagent may have an XRPD pattern comprising one or more peaks at 2-theta values of 17.5±0.2° 2θ, 21.2±0.2° 2θ, 23.5±0.2° 2θ, 24.8±0.2° 2θ, 29.4±0.2° 2θ, 29.6±0.2° 2θ, 30.5±0.2° 2θ, 31.5±0.2° 2θ, 35.4±0.2° 2θ, 36.7±0.2° 2θ, 37.4±0.2° 2θ, 39.8±0.2° 2θ, 42.9±0.2° 2θ, 47.1±0.2° 2θ, 48.1±0.2° 2θ, 51.4±0.2° 2θ, 53.2±0.2° 2θ, 54.2±0.2° 2θ, 58.2±0.2° 2θ, 60.9±0.2° 2θ and 63.4±0.2° 2θ.
  • 88. The fluorinating reagent of statement 87, wherein the XRPD pattern comprises at least two or at least three of the peaks.
  • 89. The fluorinating reagent of statement 87, wherein the XRPD pattern comprises at least four or at least five of the peaks.
  • 90. The fluorinating reagent of statement 87, wherein the XRPD pattern comprises at least ten or at least fifteen of the peaks.
  • 91. The fluorinating reagent of statement 87, wherein the XRPD pattern comprises at least twenty of the peaks.
  • 92. The fluorinating reagent of any one of statements 87 to 91, wherein the fluorinating reagent comprises K₃(HPO₄)F.
  • 93. The fluorinating reagent of any one of statements 68 to 77, wherein the fluorinating reagent comprises K₃(HPO₄)F and one or more peaks at 2-theta values of 21.1±0.2° 2θ, 29.6±0.2° 2θ, 30.5±0.2° 2θ, 37.4±0.2° 2θ, 42.9±0.2° 2θ, 54.2±0.2° 2θ, 58.2±0.2° 2θ and 60.9±0.2° 2θ.
  • 94. The fluorinating reagent of statement 93, wherein the fluorinating reagent has an XRPD pattern comprising at least two of the peaks.
  • 95. The fluorinating reagent of statement 93, wherein the fluorinating reagent has an XRPD pattern comprising at least four of the peaks.
  • 96. The fluorinating reagent of statement 93, wherein the fluorinating reagent has an XRPD pattern comprising at least six of the peaks.
  • 97. The fluorinating reagent of statement 93, wherein the fluorinating reagent has an XRPD pattern comprising all eight of the peaks.
  • 98. The fluorinating reagent of any one of statements 68 to 97, wherein the fluorinating reagent comprises calcium fluoride and/or fluorapatite (e.g., a trace quantity of calcium fluoride and/or fluorapatite).
  • 99. The fluorinating reagent of any one of statements 68 to 98, wherein the fluorinating reagent has an XRPD pattern substantially as shown in any one of FIGS. 4-16. 26. 38-46 and 52-53.
  • 100. The fluorinating reagent of any one of statements 68 to 98, wherein the fluorinating reagent has an XRPD pattern substantially as shown in any one of FIGS. 10, 11 and 26.

In some embodiments, provided herein is an activated fluorinated reagent. In some embodiments, the activated fluorinated reagent comprises a first salt, the first salt comprising calcium and fluorine, and a second salt. In some embodiments, the second salt comprises an anion. The first salt and second salt are described elsewhere herein.

In some embodiments, provided herein is a method of synthesizing a fluoro compound. In some embodiments, provided herein is a method of synthesizing an organo-fluorine compound. In some embodiments, the method comprises combining a first salt, the first salt comprising calcium and fluorine, with a second salt to form a salt mixture.

Provided herein, in some embodiments, are compositions and methods that use a first salt. In any composition or method provided herein, any suitable first salt is used. In some embodiments, the first salt comprises calcium and fluorine. In some embodiments, the first salt comprises fluorine. In some embodiments, the first salt comprises calcium. In some embodiments, the first salt is CaF₂. In some embodiments, the first salt is fluorspar. In some embodiments, the first salt is fluorapatite (Ca₅(PO₄)₃F). In some embodiments, waste material comprises the first salt. In some embodiments, the first salt is added in an amount necessary to provide an activated fluorination reagent.

In some embodiments, the methods and compositions described herein do not comprise reacting a strong acid with the first salt to form hydrofluoric acid. In some embodiments, essentially no HF is produced during the reaction. In some embodiments, <1 ppm of HF is observable in a mixture at any point during the reaction. In some embodiments, <1 ppb of HF is observable in a mixture at any point during the reaction.

In some embodiments, provided herein are compositions and methods that use a second salt. In some embodiments, any suitable second salt is used in any composition or method provided herein. In some embodiments, the second salt comprises an anion. In some embodiments, the second salt comprises an anion, which has a lattice energy greater than 2450 kJ/mol when combined with Ca²⁺ to form a third salt. In some embodiments, the second salt comprises a cation and anion.

In some embodiments, any composition or method herein comprises a second salt, the second salt comprising an anion, which has a lattice energy greater than 2450 kJ/mol when combined with Ca²⁺ to form a third salt. In some embodiments, the anion and Ca²⁺ can form a third salt which has a lattice energy greater than 2450 kJ/mol when combined. In some embodiments, the fluorinating reagent comprises a salt which has a lattice energy greater than 2450 kJ/mol.

In some embodiments, the second salt is a metal hydroxide. In some embodiments, the second salt is NaOH and/or KOH. In some embodiments, the second salt is NaOH. In some embodiments the second salt is KOH. In some embodiments, the second salt is a metal sulphite. In some embodiments, the second salt comprises Na₂SO₃ and/or K₂SO₃. In some embodiments, the second salt is Na₂SO₃. In some embodiments, the second salt is K₂SO₃. In some embodiments, the second salt is a metal sulphate. In some embodiments, the second salt comprises KHSO₄. In some embodiments, the second salt is an inorganic phosphate.

In some embodiments, the second salt comprises K₂HPO₄, KH₂PO₄, and/or K₃PO₄. In some embodiments, the second salt is K₂HPO₄. In some embodiments, the second salt is KH₂PO₄. In some embodiments, the second salt is K₃PO₄. In some embodiments, the inorganic phosphate is a pyrophosphate. In some embodiments, the inorganic phosphate comprises K₄P₂O₇ and/or Na₃P₂O₇.

In some embodiments, an inorganic phosphate is K₄P₂O₇. In some embodiments, an inorganic phosphate is Na₃P₂O₇. In some embodiments, the second salt is Na₃PO₄, Na₂HPO₄, NaH₂PO₄, K₂SO₄, Na₂SO₄, MgSO₄, Ag₂SO₄, Na₂CO₃, and/or KHCO₃. In some embodiments, the second salt comprises Na₃PO₄. In some embodiments, the second salt comprises Na₂HPO₄. In some embodiments, the second salt comprises NaH₂PO₄.

In some embodiments, the second salt comprises K₂SO₄. In some embodiments, the second salt comprises Na₂SO₄. In some embodiments, the second salt comprises MgSO₄. In some embodiments, the second salt comprises Ag₂SO₄. In some embodiments, the second salt comprises Na₂CO₃. In some embodiments, the second salt comprises KHCO₃.

In some embodiments, any suitable ratio of first salt to second is used in any composition or method provided herein. In some embodiments, any suitable ratio of first salt to second is used in any composition or method provided herein. In some embodiments, the ratio of the first salt to the second salt is about 1:0.5 to 1:150 or any range therein. In some embodiments, the ratio of first salt to second salt is about 2:1 to 150:1 or any range therein. In some embodiments, the ratio of the first salt to the second salt is about 1:0.5 to 1:100. In some embodiments, the ratio of the first salt to the second salt is about 1:1 to 1:10. In some embodiments, the ratio of first salt to second salt is about 1:0.5 to 1:2. In some embodiments, the ratio of first salt to second salt is about 1:0.5 to 1:4. In some embodiments, the ratio of first salt to second salt is about 1:0.5 to 1:8. In some embodiments, the ratio of first salt to second salt is about 1:0.5 to 1:10. In some embodiments, the ratio of first salt to second salt is about 1:0.5 to 1:20. In some embodiments, the ratio of the first salt to the second salt is about 1:1 to 1:5. In some embodiments, the ratio of the first salt to the second salt is about 1:0.5, 1:1, 1:2, 1:3, 1:4, 1:5, 1:6, 1:7, 1:8, 1:9, 1:10, 1:15, 1:20, 1:25, 1:30, 1:40, 1:50, 1:60, 1:70, 1:80, 1:90, or 1:100. In some embodiments, the range of first salt to second salt is about 1:2, 1:1, 2:1, 3:1, 4:1, 5:1, 6:1, 7:1, 8:1, 9:1, 10:1, 15:1, 20:1, 25:1, 30:1, 40:1, 50:1, 60:1, 70:1, 80:1, 90:1, or 100:1. In some embodiments, the ratio of the first salt to the second salt is about 1:1. In some embodiments, the ratio of the first salt to the second salt is about 1:2. In some embodiments, the ratio of the first salt to the second salt is about 1:3. In some embodiments, the ratio of the first salt to the second salt is about 1:5. In some embodiments, the range of first salt to second salt is 1:8. In some embodiments, the ratio of first salt to second salt is 2:1.

In some embodiments, the method comprises applying mechanical force to the salt mixture to form an activated salt-mixture. In some embodiments, the activated salt mixture is the fluorinating reagent. In some embodiments, the activated salt mixture is the activated fluorinated reagent.

In some embodiments, mechanical force is applied to the salt mixtures provided in any of the compositions or methods herein. In some embodiments, mechanical force is applied to the salt-waste mixtures provided herein. In some embodiments, mechanical force is applied to the salt mixtures provided herein to yield activated fluorinated reagents.

In some embodiments, mechanical force is applied to the salt-waste mixtures provided herein to yield activated fluorinated reagents. In some embodiments, the mechanical force is applied using a ball mill, a mortar and pestle, a twin-screw extruder, using an ultrasonic bath, or a mechanical press.

In some embodiments, the mechanical force is applied using a ball mill. In some embodiments, the mechanical force is applied using a mortar and pestle. In some embodiments, the mechanical force is applied using a twin-screw extruder. In some embodiments, the mechanical force is applied using an ultrasonic bath. In some embodiments, the mechanical force is applied using a mechanical press.

In some embodiments, mechanical frequency is applied at any suitable frequency in any composition or method provided herein. In some embodiments, the mechanical force is applied at a frequency of about 0.5 Hz-60 kHz or any range therein. In some embodiments, the mechanical force is applied at a frequency of about 0.5 Hz-60 kHz. In some embodiments, the mechanical force is applied at a frequency of about 0.5 Hz-10 Hz. In some embodiments, the mechanical force is applied at a frequency of about 0.5 Hz-100 Hz. In some embodiments, the mechanical force is applied at a frequency of about 0.5-1 kHz. In some embodiments, the mechanical force is applied at a frequency of about 0.5-10 kHz. In some embodiments, the mechanical force is applied at a frequency of about 0.5-20 kHz. In some embodiments, the mechanical force is applied at a frequency of about 0.5-30 kHz. In some embodiments, the mechanical force is applied at a frequency of about 0.5-50 kHz. In some embodiments, the mechanical force is applied at a frequency of about 0.5-60 kHz. In some embodiments, the mechanical force is applied at a frequency of about 10 Hz-20 kHz. In some embodiments, the mechanical force is applied at a frequency of about 0.5 Hz, 1 Hz, 5 Hz, 10 Hz, 15 Hz, 20 Hz, 25 Hz, 30 Hz, 35 Hz, 40 Hz, 45 Hz, 50 Hz, 55 Hz, or 60 Hz. In some embodiments, the mechanical force is applied at a frequency of about 1 kHz, 5 kHz, 10 kHz, 15 kHz, 20 kHz, 25 kHz, 30 kHz, 35 kHz, 40 kHz, 45 kHz, 50 kHz, 55 kHz, or 60 kHz. In some embodiments, the mechanical force is applied at a frequency of about 30 Hz. In some embodiments, the mechanical force is applied at a frequency of about 35 Hz. In some embodiments, the mechanical force is applied at a frequency of about 60 Hz.

In some embodiments, the mechanical frequency is applied at any suitable temperature in any composition or method provided herein. In some embodiments, the mechanical force is applied at a temperature of about 20° C. to about 300° C. In some embodiments, the mechanical force is applied at a temperature of about 20° C. to about 30° C., about 20° C. to about 40° C., about 20° C. to about 60° C., about 20° C. to about 90° C., about 20° C. to about 100° C., about 20° C. to about 130° C., about 20° C. to about 150° C., about 20° C. to about 200° C., about 20° C. to about 250° C., about 20° C. to about 280° C., about 20° C. to about 300° C., about 30° C. to about 40° C., about 30° C. to about 60° C., about 30° C. to about 90° C., about 30° C. to about 100° C., about 30° C. to about 130° C., about 30° C. to about 150° C., about 30° C. to about 200° C., about 30° C. to about 250° C., about 30° C. to about 280° C., about 30° C. to about 300° C., about 40° C. to about 60° C., about 40° C. to about 90° C., about 40° C. to about 100° C., about 40° C. to about 130° C., about 40° C. to about 150° C., about 40° C. to about 200° C., about 40° C. to about 250° C., about 40° C. to about 280° C., about 40° C. to about 300° C., about 60° C. to about 90° C., about 60° C. to about 100° C., about 60° C. to about 130° C., about 60° C. to about 150° C., about 60° C. to about 200° C., about 60° C. to about 250° C., about 60° C. to about 280° C., about 60° C. to about 300° C., about 90° C. to about 100° C., about 90° C. to about 130° C., about 90° C. to about 150° C., about 90° C. to about 200° C., about 90° C. to about 250° C., about 90° C. to about 280° C., about 90° C. to about 300° C., about 100° C. to about 130° C., about 100° C. to about 150° C., about 100° C. to about 200° C., about 100° C. to about 250° C., about 100° C. to about 280° C., about 100° C. to about 300° C., about 130° C. to about 150° C., about 130° C. to about 200° C., about 130° C. to about 250° C., about 130° C. to about 280° C., about 130° C. to about 300° C., about 150° C. to about 200° C., about 150° C. to about 250° C., about 150° C. to about 280° C., about 150° C. to about 300° C., about 200° C. to about 250° C., about 200° C. to about 280° C., about 200° C. to about 300° C., about 250° C. to about 280° C., about 250° C. to about 300° C., or about 280° C. to about 300° C. In some embodiments, the mechanical force is applied at a temperature of about 20° C., about 30° C., about 40° C., about 60° C., about 90° C., about 100° C., about 130° C., about 150° C., about 200° C., about 250° C., about 280° C., or about 300° C. In some embodiments, the mechanical force is applied at a temperature of at least about 20° C., about 30° C., about 40° C., about 60° C., about 90° C., about 100° C., about 130° C., about 150° C., about 200° C., about 250° C., or about 280° C. In some embodiments, the mechanical force is applied at a temperature of at most about 30° C., about 40° C., about 60° C., about 90° C., about 100° C., about 130° C., about 150° C., about 200° C., about 250° C., about 280° C., or about 300° C. In some embodiments, the mechanical force is applied at a temperature of about 30° C. In some embodiments, the mechanical force is applied at a temperature of about 60° C. In some embodiments, the mechanical force is applied at a temperature of about 90° C.

In any of the compositions or methods provided herein, the mechanical force may be applied to the first and second salt together. In any of the compositions or methods provided herein, the mechanical force may be applied to the first salt alone. In some embodiments, the mechanical force may be applied for any suitable time period.

In some embodiments, the mechanical force may be applied for about 0.5 hours to about 12 hours. In some embodiments, the mechanical force may be applied for 0.5-1 hour. In some embodiments, the mechanical force may be applied for 0.5-4 hours. In some embodiments, the mechanical force may be applied for 0.5-8 hours. In some embodiments, the mechanical force may be applied for 4-8 hours. In some embodiments, the mechanical force may be applied for 4-12 hours. In some embodiments, the mechanical force may be applied for about 0.5, 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, or 12 hours. In some embodiments, the mechanical force is applied for about 1 hour. In some embodiments, the mechanical force is applied for about 2 hours. In some embodiments, the mechanical force is applied for about 3 hours. In some embodiments, the mechanical force is applied for about 4 hours. In some embodiments, the mechanical force is applied for about 6 hours. In some embodiments, the mechanical force is applied for about 9 hours. In some embodiments, longer mechanical force times may be associated with higher yields of fluorinated product.

In some embodiments, provided herein are salt mixtures produced by ball milling in any composition or method provided herein. In some embodiments, ball milling is completed by combining said salts into jars and adding balls. In some embodiments, the jars and balls comprise stainless steel.

In some embodiments, the jar has a volume of 15 mL. In some embodiments, the jar has a volume of 30 mL. In some embodiments, multiple balls are used. In some embodiments, 2-20 balls are used. In some embodiments, 1 ball is used. In some embodiments, the ball weight is 1-20 g or any range therein. In some embodiments, the ball weight is 1-2 g. In some embodiments, the ball weight is 1-3 g. In some embodiments, the ball weight is 1-5 g. In some embodiments, the ball weight is 1-10 g. In some embodiments, the ball weight is 1-13 g. In some embodiments, the ball weight is 1-18 g. In some embodiments, the ball weight is 1-3 g. In some embodiments, the ball weight is 3-5 g. In some embodiments, the ball weight is 3-10 g. In some embodiments, the ball weight is 5-10 g. In some embodiments, the ball weight is 5-18 g. In some embodiments, the ball weight is 5-20 g. In some embodiments, the ball weight is about 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, or 20 g. In some embodiments, the ball weight is 2 g. In some embodiments, the ball weight is 3 g. In some embodiments, the ball weight is 4 g. In some embodiments, the ball weight is 7 g. In some embodiments, the ball weight is 9 g. In some embodiments, 2 balls were used and the ball weights were 3 g. In some embodiments, the ball weight is 16 g. In some instances, ball weight is used as an analog of ball size. In some embodiments, the ball size may affect the fluorination reaction yield.

In some embodiments, mechanical force is applied in the compositions or methods herein using a twin-screw extruder. In some embodiments, a twin-screw extruder may be fixed with a gravimetric single screw feeder (e.g., hopper) for programmed addition of solids. FIG. 54 shows a schematic of a twin-screw extruder (TSE) wherein the first and second salts may be added into the TSE at a rate of F_R, followed by extruding of the salts at varying screw speeds (S_S), screw temperatures (S_T), and residence times (T_R), providing the fluorinating reagent (e.g., fluoromix). In some embodiments, the screw configuration may be modified wherein C indicates conveying, K indicates kneading, and R indicates reverse elements.

In some embodiments, the screw temperature (S_T) in a twin-screw extruder is applied at any suitable temperature in any composition or method provided herein. In some embodiments, the screw temperature is about 0° C. to about 300° C. In some embodiments, the screw temperature is about 0° C. to about 25° C., about 0° C. to about 50° C., about 0° C. to about 100° C., about 0° C. to about 150° C., about 0° C. to about 200° C., about 0° C. to about 250° C., about 0° C. to about 300° C., about 25° C. to about 50° C., about 25° C. to about 100° C., about 25° C. to about 150° C., about 25° C. to about 200° C., about 25° C. to about 250° C., about 25° C. to about 300° C., about 50° C. to about 100° C., about 50° C. to about 150° C., about 50° C. to about 200° C., about 50° C. to about 250° C., about 50° C. to about 300° C., about 100° C. to about 150° C., about 100° C. to about 200° C., about 100° C. to about 250° C., about 100° C. to about 300° C., about 150° C. to about 200° C., about 150° C. to about 250° C., about 150° C. to about 300° C., about 200° C. to about 250° C., about 200° C. to about 300° C., or about 250° C. to about 300° C. In some embodiments, the screw temperature is about 0° C., about 25° C., about 50° C., about 100° C., about 150° C., about 200° C., about 250° C., or about 300° C. In some embodiments, the screw temperature is 50° C. In some embodiments, the screw temperature is 100° C. In some embodiments, the screw temperature is 150° C. In some embodiments, the screw temperature is 200° C.

In some embodiments, the screw speed (S_S) in a twin-screw extruder is applied at any suitable speed in any composition or method provided herein. In some embodiments, the screw speed is set at a range of about 1 rpm to about 80 rpm. In some embodiments, the screw speed is set at a range of about 1 rpm to about 5 rpm, about 1 rpm to about 10 rpm, about 1 rpm to about 15 rpm, about 1 rpm to about 25 rpm, about 1 rpm to about 40 rpm, about 1 rpm to about 50 rpm, about 1 rpm to about 60 rpm, about 1 rpm to about 70 rpm, about 1 rpm to about 75 rpm, about 1 rpm to about 80 rpm, about 5 rpm to about 10 rpm, about 5 rpm to about 15 rpm, about 5 rpm to about 25 rpm, about 5 rpm to about 40 rpm, about 5 rpm to about 50 rpm, about 5 rpm to about 60 rpm, about 5 rpm to about 70 rpm, about 5 rpm to about 75 rpm, about 5 rpm to about 80 rpm, about 10 rpm to about 15 rpm, about 10 rpm to about 25 rpm, about 10 rpm to about 40 rpm, about 10 rpm to about 50 rpm, about 10 rpm to about 60 rpm, about 10 rpm to about 70 rpm, about 10 rpm to about 75 rpm, about 10 rpm to about 80 rpm, about 15 rpm to about 25 rpm, about 15 rpm to about 40 rpm, about 15 rpm to about 50 rpm, about 15 rpm to about 60 rpm, about 15 rpm to about 70 rpm, about 15 rpm to about 75 rpm, about 15 rpm to about 80 rpm, about 25 rpm to about 40 rpm, about 25 rpm to about 50 rpm, about 25 rpm to about 60 rpm, about 25 rpm to about 70 rpm, about 25 rpm to about 75 rpm, about 25 rpm to about 80 rpm, about 40 rpm to about 50 rpm, about 40 rpm to about 60 rpm, about 40 rpm to about 70 rpm, about 40 rpm to about 75 rpm, about 40 rpm to about 80 rpm, about 50 rpm to about 60 rpm, about 50 rpm to about 70 rpm, about 50 rpm to about 75 rpm, about 50 rpm to about 80 rpm, about 60 rpm to about 70 rpm, about 60 rpm to about 75 rpm, about 60 rpm to about 80 rpm, about 70 rpm to about 75 rpm, about 70 rpm to about 80 rpm, or about 75 rpm to about 80 rpm. In some embodiments, the screw speed is set at a range of about 1 rpm, about 5 rpm, about 10 rpm, about 15 rpm, about 25 rpm, about 40 rpm, about 50 rpm, about 60 rpm, about 70 rpm, about 75 rpm, or about 80 rpm. In some embodiments, the screw speed is 10 rpm. In some embodiments, the screw speed is 25 rpm. In some embodiments, the screw speed is 75 rpm.

In some embodiments, the residence time (T_R) in a twin-screw extruder is set to any suitable time in any composition or method provided herein. In some embodiments, the residence time is about 1 seconds to about 420 seconds. In some embodiments, the residence time is about 1 seconds to about 20 seconds, about 1 seconds to about 40 seconds, about 1 seconds to about 60 seconds, about 1 seconds to about 80 seconds, about 1 seconds to about 120 seconds, about 1 seconds to about 140 seconds, about 1 seconds to about 165 seconds, about 1 seconds to about 220 seconds, about 1 seconds to about 300 seconds, about 1 seconds to about 420 seconds, about 20 seconds to about 40 seconds, about 20 seconds to about 60 seconds, about 20 seconds to about 80 seconds, about 20 seconds to about 120 seconds, about 20 seconds to about 140 seconds, about 20 seconds to about 165 seconds, about 20 seconds to about 220 seconds, about 20 seconds to about 300 seconds, about 20 seconds to about 420 seconds, about 40 seconds to about 60 seconds, about 40 seconds to about 80 seconds, about 40 seconds to about 120 seconds, about 40 seconds to about 140 seconds, about 40 seconds to about 165 seconds, about 40 seconds to about 220 seconds, about 40 seconds to about 300 seconds, about 40 seconds to about 420 seconds, about 60 seconds to about 80 seconds, about 60 seconds to about 120 seconds, about 60 seconds to about 140 seconds, about 60 seconds to about 165 seconds, about 60 seconds to about 220 seconds, about 60 seconds to about 300 seconds, about 60 seconds to about 420 seconds, about 80 seconds to about 120 seconds, about 80 seconds to about 140 seconds, about 80 seconds to about 165 seconds, about 80 seconds to about 220 seconds, about 80 seconds to about 300 seconds, about 80 seconds to about 420 seconds, about 120 seconds to about 140 seconds, about 120 seconds to about 165 seconds, about 120 seconds to about 220 seconds, about 120 seconds to about 300 seconds, about 120 seconds to about 420 seconds, about 140 seconds to about 165 seconds, about 140 seconds to about 220 seconds, about 140 seconds to about 300 seconds, about 140 seconds to about 420 seconds, about 165 seconds to about 220 seconds, about 165 seconds to about 300 seconds, about 165 seconds to about 420 seconds, about 220 seconds to about 300 seconds, about 220 seconds to about 420 seconds, or about 300 seconds to about 420 seconds. In some embodiments, the residence time is about 1 seconds, about 20 seconds, about 40 seconds, about 60 seconds, about 80 seconds, about 120 seconds, about 140 seconds, about 165 seconds, about 220 seconds, about 300 seconds, or about 420 seconds. In some embodiments, the residence time is 80 seconds. In some embodiments, the residence time is 165 seconds. In some embodiments, the residence time is 420 seconds.

In some embodiments, the fluorinated reagent is recycled through the twin-screw extruder (e.g., twin-screw extruder) any suitable number of times in any composition or method provided herein. In some embodiments, the fluorinated reagent was recycled through the extruder 1 time. In some embodiments, the fluorinated reagent was recycled through the extruder 2 times. In some embodiments, the fluorinated reagent was recycled through the extruder 3 times.

In some embodiments, the activated fluorinating reagent or third salt described in any of the compositions or methods herein is characterized with Powder X-ray diffraction. The powder x-ray diffraction spectrum of the activated fluorinating reagent described herein may exhibit one or more characteristic reflections at about 18.0°, 18.7°, 21.9°, 22.6°, 24.5°, 25.4°, 26.5°, 27.0°, 28.0°, 29.2°, 30.3°, 31.6°, 33.0°, 34.8°, 36.4°, 37.70, 39.50, 40.4°, 41.7°, 42.4°, 43.4°, 46.1°, 48.4°, 49.40, 52.8°, and/or 53.9°.

In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises characteristic 2θ reflections at about 18.0°, 18.7°, 21.9°, 22.6°, 24.5°, 25.4°, 26.5°, 27.0°, 28.0°, 29.2°, 30.3°, 31.6°, 33.0°, 34.8°, 36.4°, 37.70, 39.50, 40.4°, 41.7°, 42.4°, 43.4°, 46.1°, 48.4°, 49.4°, 52.8°, and/or 53.9°.

In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises at least two characteristic 2θ reflections at about 18.0°, 18.7°, 21.9°, 22.6°, 24.5°, 25.4°, 26.5°, 27.0°, 28.0°, 29.2°, 30.3°, 31.6°, 33.0°, 34.8°, 36.4°, 37.70, 39.50, 40.4°, 41.7°, 42.4°, 43.4°, 46.1°, 48.4°, 49.40, 52.8°, and/or 53.9°.

In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises at least three characteristic 2θ reflections selected from the group of about 18.0°, 18.7°, 21.9°, 22.6°, 24.5°, 25.4°, 26.5°, 27.0°, 28.0°, 29.2°, 30.3°, 31.6°, 33.0°, 34.8°, 36.4°, 37.70, 39.50, 40.4°, 41.7°, 42.4°, 43.4°, 46.1°, 48.4°, 49.40, 52.8°, and 53.9°.

In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises characteristic at least four 2θ reflections selected from the group of about 18.0°, 18.7°, 21.9°, 22.6°, 24.5°, 25.4°, 26.5°, 27.0°, 28.0°, 29.2°, 30.3°, 31.6°, 33.0°, 34.8°, 36.4°, 37.7°, 39.5°, 40.4°, 41.7°, 42.4°, 43.4°, 46.1°, 48.4°, 49.4°, 52.8°, and 53.9°. In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises characteristic 2θ reflections at about 21.9°, 30.3°, 31.6°, and 43.4°.

In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises characteristic 2θ reflections at about 18.0°, 18.7°, 21.9°, 22.6°, 24.5°, 25.4°, 26.5°, 27.0°, 28.0°, 29.2°, 30.3°, 31.6°, 33.0°, 34.8°, 36.4°, 37.70, 39.50, 40.4°, 41.7°, 42.4°, 43.4°, 46.1°, 48.4°, 49.4°, 52.8°, and 53.9°.

In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises 1, 2, 3, 4, 5, 6, 7, 8, 9, or 10 characteristic 2θ reflections.

In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises relative peak intensities of characteristic reflections which are at least 0.1%, at least 1%, or at least 5% relative to the tallest peak in a raw spectrum. In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises relative peak intensities of characteristic reflections which are at least 0.1%, at least 1%, or at least 5% relative to the tallest peak in a background subtracted spectrum. In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises relative peak intensities of characteristic reflections which are at least 10%, at least 15%, or at least 20% relative to the tallest peak in a background subtracted spectrum.

In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises relative peak integrations of characteristic reflections which are at least 0.1%, at least 1%, or at least 5% relative to the peak with the largest integration in a raw spectrum. In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises relative peak integrations of characteristic reflections which are at least 0.1%, at least 1%, or at least 5% relative to the peak with the largest integration in a background subtracted spectrum. In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises relative peak integrations of characteristic reflections which are at least 10%, at least 15%, or at least 20% relative to the peak with the largest integration in a background subtracted spectrum.

In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises relative peak integrations of characteristic reflections which are about one or more values independently selected from those described in any one of the Tables provided herein, e.g. Tables 5.7.1, 5.7.2, 5.7.3, 5.7.4, 5.7.5, 5.7.6, 5.7.7, 5.7.8, 5.7.9, 5.7.10, 5.7.11, 5.7.12, 5.7.13, 5.12.1, 5.12.2, 5.12.3, 5.12.4, 5.12.5, 5.13.1, 5.13.2, 5.14.1, 5.14.2, 5.14.3, 5.14.4, 6.3.1, 6.3.2, 6.3.3, 6.3.4, 6.3.5, 6.3.6, 6.3.7, 6.3.8, 6.3.9, 7.7.1, 7.7.2, and/or combinations thereof.

In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises relative peak intensities of characteristic reflections which are about one or more values independently selected from those described in any one of the Tables provided herein, e.g. Tables 5.7.1, 5.7.2, 5.7.3, 5.7.4, 5.7.5, 5.7.6, 5.7.7, 5.7.8, 5.7.9, 5.7.10, 5.7.11, 5.7.12, 5.7.13, 5.12.1, 5.12.2, 5.12.3, 5.12.4, 5.12.5, 5.13.1, 5.13.2, 5.14.1, 5.14.2, 5.14.3, 5.14.4, 6.3.1, 6.3.2, 6.3.3, 6.3.4, 6.3.5, 6.3.6, 6.3.7, 6.3.8, 6.3.9, 7.7.1, 7.7.2, and/or combinations thereof.

In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises d-spacing values of characteristic reflections which are about one or more values independently selected from those described in any one of the Tables provided herein, e.g. Tables 5.7.1, 5.7.2, 5.7.3, 5.7.4, 5.7.5, 5.7.6, 5.7.7, 5.7.8, 5.7.9, 5.7.10, 5.7.11, 5.7.12, 5.7.13, 5.12.1, 5.12.2, 5.12.3, 5.12.4, 5.12.5, 5.13.1, 5.13.2, 5.14.1, 5.14.2, 5.14.3, 5.14.4, 6.3.1, 6.3.2, 6.3.3, 6.3.4, 6.3.5, 6.3.6, 6.3.7, 6.3.8, 6.3.9, 7.7.1, 7.7.2, and/or combinations thereof.

In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises absolute peak intensities of characteristic reflections which are about one or more values independently selected from those described in any one of the Tables provided herein, e.g. Tables 5.7.1, 5.7.2, 5.7.3, 5.7.4, 5.7.5, 5.7.6, 5.7.7, 5.7.8, 5.7.9, 5.7.10, 5.7.11, 5.7.12, 5.7.13, 5.12.1, 5.12.2, 5.12.3, 5.12.4, 5.12.5, 5.13.1, 5.13.2, 5.14.1, 5.14.2, 5.14.3, 5.14.4, 6.3.1, 6.3.2, 6.3.3, 6.3.4, 6.3.5, 6.3.6, 6.3.7, 6.3.8, 6.3.9, 7.7.1, 7.7.2, and/or combinations thereof.

In some embodiments, a powder x-ray diffraction spectrum of the activated reagent comprises a ratio of any spectral property of any characteristic reflection to the same spectral property of another characteristic reflection which is about a ratio of the spectral properties of the corresponding characteristic reflections described in any one of the Tables provided herein, e.g. Tables 5.7.1, 5.7.2, 5.7.3, 5.7.4, 5.7.5, 5.7.6, 5.7.7, 5.7.8, 5.7.9, 5.7.10, 5.7.11, 5.7.12, 5.7.13, 5.12.1, 5.12.2, 5.12.3, 5.12.4, 5.12.5, 5.13.1, 5.13.2, 5.14.1, 5.14.2, 5.14.3, 5.14.4, 6.3.1, 6.3.2, 6.3.3, 6.3.4, 6.3.5, 6.3.6, 6.3.7, 6.3.8, 6.3.9, 7.7.1, 7.7.2.

In some embodiments, the spectral property can include an absolute intensity, a relative intensity, an absolute area, a relative area, an estimated d-spacing, a full-width at half max peak resolution, and/or combinations thereof. In some embodiments, the method comprises combining the activated salt mixture with a first reactant, the first reactant, and fluorinating the first reactant to yield a fluorinated compound. In some embodiments, the first reactant is an organic compound.

In some embodiments, the fluorinated compound is an organo-fluorine compound. In some embodiments, the first reactant is an inorganic compound.

In any of the compositions or methods described herein, fluorinating is performed at any suitable temperature. In some embodiments, the fluorination reaction is performed at a temperature of about 0° C. to about 400° C. In some embodiments, the fluorination reaction is performed at a temperature of about 0° C. to about 20° C., about 0° C. to about 50° C., about 0° C. to about 100° C., about 0° C. to about 150° C., about 0° C. to about 200° C., about 0° C. to about 250° C., about 0° C. to about 300° C., about 0° C. to about 350° C., about 0° C. to about 400° C., about 20° C. to about 50° C., about 20° C. to about 100° C., about 20° C. to about 150° C., about 20° C. to about 200° C., about 20° C. to about 250° C., about 20° C. to about 300° C., about 20° C. to about 350° C., about 20° C. to about 400° C., about 50° C. to about 100° C., about 50° C. to about 150° C., about 50° C. to about 200° C., about 50° C. to about 250° C., about 50° C. to about 300° C., about 50° C. to about 350° C., about 50° C. to about 400° C., about 100° C. to about 150° C., about 100° C. to about 200° C., about 100° C. to about 250° C., about 100° C. to about 300° C., about 100° C. to about 350° C., about 100° C. to about 400° C., about 150° C. to about 200° C., about 150° C. to about 250° C., about 150° C. to about 300° C., about 150° C. to about 350° C., about 150° C. to about 400° C., about 200° C. to about 250° C., about 200° C. to about 300° C., about 200° C. to about 350° C., about 200° C. to about 400° C., about 250° C. to about 300° C., about 250° C. to about 350° C., about 250° C. to about 400° C., about 300° C. to about 350° C., about 300° C. to about 400° C., or about 350° C. to about 400° C. In some embodiments, the fluorination reaction is performed at a temperature of about 0° C., about 20° C., about 50° C., about 100° C., about 150° C., about 200° C., about 250° C., about 300° C., about 350° C., or about 400° C. In some embodiments, the fluorination reaction is performed at a temperature of at least about 0° C., about 20° C., about 50° C., about 100° C., about 150° C., about 200° C., about 250° C., about 300° C., or about 350° C. In some embodiments, the fluorination reaction is performed at a temperature of at most about 20° C., about 50° C., about 100° C., about 150° C., about 200° C., about 250° C., about 300° C., about 350° C., or about 400° C. In some embodiments, the fluorination is performed at a temperature of about 100° C.

In some embodiments, the fluorination reaction yield is measured. The fluorination reaction yield is for example, measured by ¹⁹F NMR using 4-fluoroanisole as an internal standard. In some embodiments, the reaction yield of the organo-fluorine compound is about 0.1% to about 95%. In some embodiments, the reaction yield of the organo-fluorine compound is about 0.1% to about 1%, about 0.1% to about 10%, about 0.1% to about 20%, about 0.1% to about 30%, about 0.1% to about 40%, about 0.1% to about 50%, about 0.1% to about 60%, about 0.1% to about 70%, about 0.1% to about 80%, about 0.1% to about 90%, about 0.1% to about 95%, about 1% to about 10%, about 1% to about 20%, about 1% to about 30%, about 1% to about 40%, about 1% to about 50%, about 1% to about 60%, about 1% to about 70%, about 1% to about 80%, about 1% to about 90%, about 1% to about 95%, about 10% to about 20%, about 10% to about 30%, about 10% to about 40%, about 10% to about 50%, about 10% to about 60%, about 10% to about 70%, about 10% to about 80%, about 10% to about 90%, about 10% to about 95%, about 20% to about 30%, about 20% to about 40%, about 20% to about 50%, about 20% to about 60%, about 20% to about 70%, about 20% to about 80%, about 20% to about 90%, about 20% to about 95%, about 30% to about 40%, about 30% to about 50%, about 30% to about 60%, about 30% to about 70%, about 30% to about 80%, about 30% to about 90%, about 30% to about 95%, about 40% to about 50%, about 40% to about 60%, about 40% to about 70%, about 40% to about 80%, about 40% to about 90%, about 40% to about 95%, about 50% to about 60%, about 50% to about 70%, about 50% to about 80%, about 50% to about 90%, about 50% to about 95%, about 60% to about 70%, about 60% to about 80%, about 60% to about 90%, about 60% to about 95%, about 70% to about 80%, about 70% to about 90%, about 70% to about 95%, about 80% to about 90%, about 80% to about 95%, or about 90% to about 95%. In some embodiments, the reaction yield of the organo-fluorine compound is about 0.1%, about 1%, about 10%, about 20%, about 30%, about 40%, about 50%, about 60%, about 70%, about 80%, about 90%, or about 95%. In some embodiments the reaction yield of the organo-fluorine compound is measured based on a starting amount of the organic compound.

In some embodiments, the organic compound in any of the compositions or methods provided herein comprises an aromatic or aliphatic and comprises at least one leaving group located at a site to be fluorinated. In some embodiments, the leaving group comprises a halogen. In some embodiments, the organic compound comprises an aromatic. In some embodiments, the organic compound comprises an aliphatic. In some embodiments, the organic compound comprises an aromatic and comprises at least one leaving group located at a site to be fluorinated. In some embodiments, the organic compound comprises an aliphatic and comprises at least one leaving group at a site to be fluorinated. In some embodiments, the fluorination occurs at the same site of the leaving group as described in Scheme 0.1.

In some embodiments, R is an aromatic. In some embodiments, R is an aliphatic. In some embodiments, X is a leaving group. In some embodiments, X is a halogen. In some embodiments, X is a bromide. In some embodiments, X is a chloride.

In some embodiments, the organic compound is a sulphonyl halide, an acyl halide, an aryl halide, and/or an alkyl halide. In some embodiments, the organic compound comprises a sulphonyl halide. In some embodiments, the organic compound comprises an acyl halide. In some embodiments, the organic compound comprises an aryl halide. In some embodiments, the organic compound comprises an alkyl halide.

In some embodiments, the organic compound is an aromatic sulphonyl halide, a benzoyl halide, a halobenzene, or a benzyl halide. In some embodiments, the organic compound is an aromatic sulphonyl halide. In some embodiments, the organic compound comprises tosyl chloride. In some embodiments, the organic compound is a benzoyl halide. In some embodiments, the organic compound comprises 4-methoxybenzoyl chloride. In some embodiments, the organic compound is a halobenzene. In some embodiments, the organic compound comprises chlorobenzene. In some embodiments, the organic compound is a benzyl halide. In some embodiments, the organic compound is benzyl chloride. In some embodiments, the organic compound is an α-halo carbonyl. In some embodiments, the organic compound is a α-bromo carbonyl. In some embodiments, the organic compound is an alkyl halide. In some embodiments, the organic compound is an alkyl bromide. In some embodiments, the compound is a (hetero)aryl halide. In some embodiments, the compound is a (hetero)aryl chloride.

In some embodiments, the fluorination reaction is a mono-fluorination reaction. In some embodiments, the fluorination reaction is a poly-fluorination reaction. In some embodiments, the fluorination reaction is a di-fluorination reaction. In some embodiments, the fluorinated product is stable to reaction against the second salt after formation.

In some embodiments, the inorganic compound of any of the compositions or methods provided herein comprises a salt. In some embodiments, the inorganic compound comprises a cation and an anion. In some embodiments, the anion is a halogen. In some embodiments, the halogen is a chlorine. In some embodiments, the halogen is a bromine. In some embodiments, the halogen is an iodine. In some embodiments, the anion is exchangeable with fluorine, providing the fluoro compound. In some embodiments, the fluoro compound is NaF. In some embodiments, the fluoro compound is KF.

In any of the methods or compositions provided herein, in some embodiments, the first salt, second salt, and the organic compound are combined in the same step. In any of the methods or compositions provided herein, in other embodiments, the first salt and second salt are combined prior to addition of the organic compound.

In some embodiments, a solvent is used in the fluorination of an organic compound in any of the compositions or methods provided herein. In some embodiments, the first and second salt are combined as solids without the addition of solvent. In other embodiments, the first salt, second salt, and the organic compound is added together with one or more solvents in which the organic compound is soluble in at least one of the one or more solvents. In some embodiments, the first salt and second salt are combined prior to addition of the organic compound.

In some embodiments, a solvent is used in the fluorination of an organic compound in any of the compositions or methods provided herein. In some embodiments, the solvent is an aqueous solvent. In some embodiments, the solvent is a polar aprotic solvent.

In some embodiments, the solvent is a polar aprotic solvent with a polarity index of less than 6.3. In some embodiments, the solvent is an organic solvent with a polarity index of 6.3 or less. In some instances, an organic solvent is a carbon containing solvent. In some embodiments, the first salt is soluble in the solvent. In some embodiments, the second salt is soluble in the solvent. In some embodiments, the organic compound is soluble in the solvent. In some embodiments, the first salt, second salt, and the organic compound are soluble in the solvent.

In some embodiments, the one or more solvents comprise a solvent selected from the group consisting of acetonitrile, propionitrile, toluene, 1,2-dichlorobenze, chlorobenzene fluorobenzene, 1,2-difluorobenze, dichloroethane, trifluorotoluene, chloroform, tert-butanol, tert-amyl alcohol, and/or water. In some embodiments, the one or more solvents comprise acetonitrile, chlorobenzene, tert-butanol, tert-amyl alcohol, and/or water. In some embodiments, the solvent may comprise acetonitrile. In some embodiments, the solvent may comprise propionitrile. In some embodiments, the solvent may comprise toluene. In some embodiments, the solvent may comprise 1,2-dichlorobenzene. In some embodiments, the solvent may comprise fluorobenzene. In some embodiments, the solvent may comprise 1,2-difluorobenze. In some embodiments, the solvent may comprise dichloroethane. In some embodiments, the solvent may comprise trifluorotoluene. In some embodiments, the solvent may comprise chloroform. In some embodiments, the solvent may comprise tert-butanol. In some embodiments, the solvent may comprise tert-amyl alcohol.

In some embodiments, the solvent may comprise water. In some embodiments, the solvent may comprise tetrahydrofuran, 2-methyltetrahydrofuran, 1,4-dioxane, tert-butyl isocyanide, m-xylene, hexane, diglyme, and/or monoglyme. In some embodiments, the solvent may comprise tetrahydrofuran. In some embodiments, the solvent may comprise 2-methyltetrahydrofuran. In some embodiments, the solvent may comprise 1,4-dioxane. In some embodiments, the solvent may comprise tert-butyl isocyanide. In some embodiments, the solvent may comprise m-xylene. In some embodiments, the solvent may comprise hexane. In some embodiments, the solvent may comprise diglyme. In some embodiments, the solvent may comprise monoglyme. In some embodiments, any one or more of the aforementioned organic solvents may be in admixture with water.

In some embodiments, in any composition or method herein, the organic solvent may be in admixture with water at a concentration of about 0.01M to about 5M or any range therein. In some embodiments, the organic solvent may be in admixture with water at a concentration of about 0.01 M to about 1 M. In some embodiments, the organic solvent may be in admixture with water at a concentration of about 0.01 M to about 0.05 M, about 0.01 M to about 0.1 M, about 0.01 M to about 0.2 M, about 0.01 M to about 0.3 M, about 0.01 M to about 0.4 M, about 0.01 M to about 0.6 M, about 0.01 M to about 0.8 M, about 0.01 M to about 1 M, about 0.05 M to about 0.1 M, about 0.05 M to about 0.2 M, about 0.05 M to about 0.3 M, about 0.05 M to about 0.4 M, about 0.05 M to about 0.6 M, about 0.05 M to about 0.8 M, about 0.05 M to about 1 M, about 0.1 M to about 0.2 M, about 0.1 M to about 0.3 M, about 0.1 M to about 0.4 M, about 0.1 M to about 0.6 M, about 0.1 M to about 0.8 M, about 0.1 M to about 1 M, about 0.2 M to about 0.3 M, about 0.2 M to about 0.4 M, about 0.2 M to about 0.6 M, about 0.2 M to about 0.8 M, about 0.2 M to about 1 M, about 0.3 M to about 0.4 M, about 0.3 M to about 0.6 M, about 0.3 M to about 0.8 M, about 0.3 M to about 1 M, about 0.4 M to about 0.6 M, about 0.4 M to about 0.8 M, about 0.4 M to about 1 M, about 0.6 M to about 0.8 M, about 0.6 M to about 1 M, or about 0.8 M to about 1 M. In some embodiments, the organic solvent may be in admixture with water at a concentration of about 0.01 M, about 0.05 M, about 0.1 M, about 0.2 M, about 0.3 M, about 0.4 M, about 0.6 M, about 0.8 M, or about 1 M. In some embodiments, the organic solvent may be in admixture with water at a concentration of about 0.25 M. In some instances, the inclusion of water may increase the yield of organo-fluorine product.

In other embodiments, in any composition or method herein, the one or more solvents may comprise an additive. In some embodiments, in any composition or method herein, the one or more solvents may comprise a cryptand, a crown ether, and a hydrogen-bonding phase transfer agent. In some embodiments, the one or more solvents comprise a cryptand. In some embodiments, the one or more solvents comprise a crown ether. In some embodiments, the one or more solvents comprise a hydrogen-bonding phase transfer agent. In some embodiments, the crown ether is 18-crown-6. In some embodiments, the crown ether is 30-crown-6. In some embodiments, the crown ether is a dibenzo derivative of a crown ether. In some embodiments the dibenzo derivative of the crown ether is dibenzo 18-crown-6 ether. In some embodiments the dibenzo derivative of the crown ether is dibenzo-30-crown-6-ether. In some embodiments, the crown ether is dicyclohexano-18-crown-6-ether. In some embodiments, the cryptand is [2.2.2]cryptand. In some embodiments, the cryptand is [2.2.1]cryptand. In some embodiments, the one or more solvents may comprise schreiner's urea.

In some embodiments, the cryptand, crown ether, or hydrogen-bond phase transfer agent is added in any suitable amount to any composition or method provided herein. In some embodiments, the cryptand, crown ether, or hydrogen-bond phase transfer agent, are added in amount of about 0.01 equivalents to about 5 equivalents. In some embodiments, the cryptand, crown ether, or hydrogen-bond phase transfer agent, are added in amount of about 0.01 equivalents to about 0.1 equivalents, about 0.01 equivalents to about 1 equivalents, about 0.01 equivalents to about 2 equivalents, about 0.01 equivalents to about 3 equivalents, about 0.01 equivalents to about 4 equivalents, about 0.01 equivalents to about 5 equivalents, about 0.1 equivalents to about 1 equivalents, about 0.1 equivalents to about 2 equivalents, about 0.1 equivalents to about 3 equivalents, about 0.1 equivalents to about 4 equivalents, about 0.1 equivalents to about 5 equivalents, about 1 equivalents to about 2 equivalents, about 1 equivalents to about 3 equivalents, about 1 equivalents to about 4 equivalents, about 1 equivalents to about 5 equivalents, about 2 equivalents to about 3 equivalents, about 2 equivalents to about 4 equivalents, about 2 equivalents to about 5 equivalents, about 3 equivalents to about 4 equivalents, about 3 equivalents to about 5 equivalents, or about 4 equivalents to about 5 equivalents. In some embodiments, the cryptand, crown ether, or hydrogen-bond phase transfer agent, are added in amount of about 0.01 equivalents, about 0.1 equivalents, about 1 equivalent, about 2 equivalents, about 3 equivalents, about 4 equivalents, or about 5 equivalents. In some embodiments, the cryptand, crown ether, or hydrogen-bond phase transfer agent is added in amount to increase the yield of the organo-fluorine product.

In any composition or method herein, in some embodiments, fluorinating may take place for any suitable amount of time. In some embodiments, fluorinating may take place for about 0.5 hrs to about 24 hrs. In some embodiments, fluorinating may take place for about 0.5 hrs to about 1 hr, about 0.5 hrs to about 3 hrs, about 0.5 hrs to about 5 hrs, about 0.5 hrs to about 12 hrs, about 0.5 hrs to about 16 hrs, about 0.5 hrs to about 24 hrs, about 1 hr to about 3 hrs, about 1 hr to about 5 hrs, about 1 hr to about 12 hrs, about 1 hr to about 16 hrs, about 1 hr to about 24 hrs, about 3 hrs to about 5 hrs, about 3 hrs to about 12 hrs, about 3 hrs to about 16 hrs, about 3 hrs to about 24 hrs, about 5 hrs to about 12 hrs, about 5 hrs to about 16 hrs, about 5 hrs to about 24 hrs, about 12 hrs to about 16 hrs, about 12 hrs to about 24 hrs, or about 16 hrs to about 24 hrs. In some embodiments, fluorinating may take place for about 0.5 hrs, about 1 hr, about 3 hrs, about 5 hrs, about 12 hrs, about 16 hrs, or about 24 hrs. In some embodiments, fluorinating may take place for at least about 0.5 hrs, about 1 hr, about 3 hrs, about 5 hrs, about 12 hrs, or about 16 hrs. In some embodiments, fluorinating may take place for 3 hours. In some embodiments, fluorinating may take place for 5 hrs. In some embodiments, fluorinating may take place for 12 hrs. In some embodiments, fluorinating may take place for 16 hrs.

In further embodiments, provided herein is a method of fluorinating an organic compound. In some embodiments, the method comprises combining an activated fluorinating reagent with the organic compound, wherein the activated fluorinating reagent and the organic compound are described elsewhere herein. In some embodiments, the method comprises fluorinating the organic compound to produce an organo-fluorine compound.

In some embodiments, provided herein is a method of manufacturing an activated fluorination reagent. In some embodiments, the method comprises combining a first salt, the first salt comprising calcium and fluorine, with a second salt to form a salt mixture, wherein the first salt and second salt are described elsewhere herein. In some embodiments, the method comprises applying mechanical force to the salt mixture to form an activated salt mixture, wherein the mechanical force is described elsewhere herein. In some embodiments, the method comprises combining the activated salt mixture with a first reactant. In some embodiments, the first reactant is an organic compound, wherein the organic compound is described elsewhere herein. In some embodiments, the method comprises fluorinating the first reactant to yield an organo-fluorine compound.

In other embodiments, provided herein is a method of recovering fluorine from a waste material to form an activated fluorination reagent. In some embodiments, the method comprises combining a waste material comprising a first salt comprising calcium and fluorine with a second salt to form a salt-waste mixture, wherein the first salt and second salt are described elsewhere herein. In some embodiments, the method comprises applying mechanical force to the salt-waste mixture to yield the activated fluorination reagent, wherein the mechanical force is described elsewhere herein.

EXAMPLES

Materials and Methods

Unless otherwise stated, all reagents were purchased from commercial suppliers (Sigma-Aldrich, Alfa Aesar, Fluorochem, Apollo Scientific and Fisher Chemicals) and used without further purification. Dry solvents were purchased from commercial suppliers or dried on a column of alumina. Reagent grade calcium fluoride (CaF₂, ≥97.0%, Alfa Aesar), potassium phosphate (K₃PO₄, ≥98%, Sigma Aldrich, CAS 7778-53-2), dipotassium hydrogen phosphate (K₂HPO₄, ≥98.0%, Alfa Aesar), potassium dihydrogen phosphate (KH₂PO₄, ≥99.0%, Alfa Aesar), sodium phosphate (Na₃PO₄, ≥96.0%, Sigma Aldrich), disodium hydrogen phosphate (Na₂HPO₄, ≥98%, Fisher Scientific), sodium dihydrogen phosphate (NaH₂PO₄, 96%, Fisher Scientific), potassium tripolyphosphate (K₅P₃O₁₀, ≥94%, Strem Chemicals), sodium pyrophosphate tetrabasic decahydrate (Na₄P₂O₇·10H₂O, ≥99%, Sigma Aldrich, CAS 13472-36-1), sodium tripolyphosphate (Na5P3_O10, Alfa Aesar), sodium trimetaphosphate (Na₃P₃O₉, Alfa Aesar), sodium hexametaphosphate (Graham's salt, 65-70% P₂O₅ basis, Sigma Aldrich), potassium metaphosphate (KPO₃, 98%, Strem Chemicals), anhydrous calcium hydrogen phosphate (CaHPO₄, 98.0-105.0%, Sigma Aldrich) were used without drying and stored under ambient conditions.

Potassium pyrophosphate (K₄P₂O₇, 97.0%, Sigma Aldrich), anhydrous potassium fluoride (KF, 99%, Alfa Aesar), were used without drying and stored in a dessicator.

Fluorspar (acid grade) was purchased from Mistral Industrial Chemicals (UK), produced by Minersa group (Asturias region, Spain) and contains CaF₂ (>97%), total carbonates (<1.50%), SiO₂ (<1.00%), BaSO₄ (<0.50%), Pb (<0.10%), Fe₂O₃ (<0.10%), S (<0.15%), H₂O (<1.0%). Fluorspar (acid grade) was used without drying and stored under ambient conditions.

Unless otherwise stated, all reagents were purchased from commercial suppliers (Sigma-Aldrich, Alfa Aesar, Fluorochem, Minersa Group (Fluorspar), Apollo Scientific and Fisher Chemicals) and used without further purification. Unless otherwise specified, CaF₂ used was purchased from Alfa Aesar (>97%, reagent grade), and K₂HPO₄ was acquired from Fisher Chemical (anhydrous, crystalline powder). Dry solvents were purchased from commercial suppliers or dried on a column of alumina. Column chromatography was performed on Merck silica gel (60, particle size 0.040-0.063 mm).

NMR experiments were recorded on BrukerAVIIIHD 400, AVIIIHD 500, AVII 500, or AV NEO 600 NMR Spectrometers. ¹H and ¹³C NMR spectral data are reported as chemical shifts (δ) in parts per million (ppm) relative to the solvent peak using the Bruker internal referencing procedure (edlock). Chemical shifts are reported using the internal standard residual CDCl₃ (δ=7.26 ppm for 1H NMR spectra and 5=77.16 ppm for ¹³C NMR spectra). ¹⁹F NMR spectra are referenced relative to CFCl₃. Data are reported as follows: chemical shift, multiplicity (s=singlet, d=doublet, t=triplet, q=quartet, pent=pentet, sept=septet, br=broad, m=multiplet), coupling constants (Hz) and integration. NMR spectra were processed with MestReNova 14.2.1 or Topspin 3.5 or 4.0. ¹⁹F NMR yields were determined using 4-fluoroanisole (−123.7 ppm) as an internal standard. The standard was added to the crude residue after solvent evaporation, dissolved in CDCl₃, and an aliquot was taken to be analyzed by ¹⁹F NMR.

Powder X-ray diffraction (PXRD) data was collected using a Bruker D8 Advance X-Ray diffractometer with Bragg-Brentano geometry. Cu K α1 and 2 were used and measurements were performed at room temperature unless otherwise stated. All PXRD data was collected at room temperature. For simulated structures a Rietveld refinement of powder diffraction data was performed using the TOPAS Academic (V6).

Ball milling experiments were performed using a Retsch MM 400 mixer mill. Mechanochemical reactions were performed in 15 mL, 30 mL or 50 mL stainless steel jars with either two stainless steel balls of mass 2 g, or one stainless steel ball of various mass (2 g, 3 g, 4 g, 7 g, or 9 g). No precaution was taken to exclude air and moisture.

1. One-Pot Solid State Reactions

General Procedure 1 (GP1): To a 15 mL (or 50 mL) stainless steel milling jar was added a 4 g stainless-steel ball (or 2×2 g), CaF₂ (5.0 mmol), K₂HPO₄ (2.0 mmol) and the corresponding sulfonyl chloride (1.0 equiv). The jar was then closed and securely fitted to the mill which was set for 60 minutes at the frequency of 30 Hz. After that time, the jar was opened and the solid residue was scratched out with a spatula and collected in a beaker. The jar was rinsed with EtOAc (3×5 mL) and transferred to the beaker. The resulting suspension was stirred at room temperature for 5 minutes, filtered over a short plug of silica gel (washed with −20 mL EtOAc); the solvent was removed in vacuo and the crude mixture purified by silica gel chromatography if required.

1.1. Varying Salt

Following GP1 outlined above, and having regard to Scheme 1.1 below, the effect of varying the nature of the salt was investigated. The results are outlined in Table 1.1.

TABLE 1.1
Effect of varying the salt on product yield
Entry	Salt	TsF	TsCl	pTSA	MB
1	K3PO4	7%	18%	0%	25%
2	K2HPO4	17%	62%	0%	79%
3	KH2PO4	<1%	97%	0%	80%
4	Na3PO4	6%	74%	0%	80%
5	Na2HPO4	2%	97%	0%	99%
6	NaH2PO4	<1%	>99%	0%	>99%
7	K2SO4	1%	92%	0%	95%
8	Na2SO4	3%	92%	0%	95%
9	MgSO4	1%	97%	0%	98%
10	Ag2SO4	<1%	4%	25%	30%
11	Na2CO3	3%	93%	0%	93%
12	KHCO3	5%	80%	0%	85%
with TsF = pTolSO2F;
TsCl = pTolSO2Cl;
MB = Mass Balance

1.2. Varying Ball Size

Following GP1 outlined above, and having regard to Scheme 1.2. below, the effect of varying the ball size was investigated. The results are outlined in Table 1.2. The ball size used may have an effect on the resulting fluorinated product (TsF) yield. Exemplary ball sizes may include 7 and 9 g based on organo-fluorine product (TsF) yield.

TABLE 1.2
Effect of varying ball size on product yield
	Entry	Ball size (g)	TsF	TsCl	pTSA	MB
	1	2	18%	45%	0%	63%
	2	3	23%	55%	0%	78%
	3	4	25%	40%	0%	65%
	4	7	30%	9%	2%	41%
	5	9	31%	6%	4%	41%
	6	2 × 3	19%	46%	0%	65%

1.3. Varying Ratio of CaF₂ to K₂HPO₄

Following GP1 outlined above, and having regard to Scheme 1.3 below, the effect of varying the relative amounts of CaF₂ and K₂HPO₄ was investigated. The results are outlined in Table 1.3. The data may support that higher ratios of CaF₂ to K₂HPO₄ may be beneficial for product yield.

TABLE 1.3
Effect of varying ratio of CaF2 to K2HPO4 on product yield
	Entry	CaF2 (equiv)	TsF	TsCl	pTSA	MB
	1	6	23%	51%	1%	75%
	2	5	25%	40%	0%	65%
	3	4	30%	35%	2%	67%
	4	3	17%	56%	1%	74%
	5	2	12%	67%	1%	80%
	6	1	13%	37%	0%	50%
	7	1*	13%	51%	0%	64%
	*using 0.5 equiv of K2HPO4

1.4. Assessing the Stability of p-Toluenesulphonyl Chloride and p-Toluenesulphonyl Fluoride Under Mechanical Forces

To investigate the stability of p-toluenesulphonyl chloride and p-toluenesulphonyl fluoride under solid state, ball milling conditions, the reactions depicted in Scheme 1.4 were performed.

In the first reaction, a 50 mL stainless steel milling jar was charged with stainless-steel balls (2×2 g), p-toluenesulfonyl chloride (1.0 equiv) and K₂HPO₄ (2.0 mmol). The jar was then closed and securely fitted to the mill which was set for 60 minutes at the frequency of 30 Hz. The jar was then opened and the solid residue was scratched out with a spatula and collected in a beaker. The jar was rinsed with EtOAc (3×5 mL) and transferred in a beaker. The resulting suspension was stirred at room temperature for 5 minutes, filtered over a short plug of silica gel (washed with ˜20 mL EtOAc), and the solvent was removed in vacuo. NMR yield was determined using 4-fluoroanisole as an internal standard. The standard was added to the crude residue, which dissolved in CDCl₃ by swirling, and analysed by ¹H NMR.

In the second reaction, a 50 mL stainless steel milling jar was charged with stainless-steel balls (2×2 g), p-toluenesulfonyl fluoride (1.0 equiv), CaF₂ (5.0 equiv) and K₂HPO₄ (2.0 mmol). The jar was then closed and securely fitted to the mill which was set for 60 minutes at the frequency of 30 Hz. The jar was then opened and the solid residue was scratched out with a spatula and collected in a beaker. The jar was rinsed with EtOAc (3×5 mL) and transferred in a beaker. The resulting suspension was stirred at room temperature for 5 minutes, filtered over a short plug of silica gel (washed with −20 mL EtOAc), and the solvent was removed in vacuo. NMR yield was determined using 4-fluoroanisole as an internal standard. The standard was added to the crude residue, which was dissolved in CDCl₃ by swirling, and analysed by ¹⁹F NMR.

Under mechanical forces, the instability of both p-toluenesulphonyl chloride and p-toluenesulphonyl fluoride was assessed with 22% and 19% loss of material, respectively.

1.5. Assessing Fluoride Leaching from P-Toluenesulphonyl Fluoride

To investigate the leaching of any fluoride from p-toluenesulphonyl fluoride under solid state, ball milling conditions, the reaction depicted in Scheme 1.5 was performed.

To a 50 mL stainless steel milling jar was added stainless-steel balls (2×2 g), p-toluenesulfonyl fluoride (1.0 equiv) and K₂HPO₄ (2.0 mmol). The jar was then closed and securely fitted to the mill which was set for 60 minutes at the frequency of 30 Hz. The jar was then opened and the solid residue was scratched out with a spatula and collected in a beaker. The jar was rinsed with EtOAc (3×5 mL) and transferred in a beaker. The resulting suspension was stirred at room temperature for 5 minutes, filtered over a short plug of silica gel (washed with −20 mL EtOAc), and the solvent was removed in vacuo. NMR yield was determined using 4-fluoroanisole as an internal standard. The standard was added to the crude residue, dissolved in CDCl₃ by swirling, and analysed by ¹⁹F NMR.

Under mechanical forces and in presence of K₂HPO₄, fluoride leaching from p-toluenesulfonyl fluoride was assessed through identification of fluoride anion by ¹⁹F NMR, along with 11% loss of the fluorinated compound.

2. Two-Stage Reactions—Solid State/Solid State

General Procedure 2 (GP2): To a 15 mL stainless steel milling jar was added a stainless-steel ball (3 g), CaF₂ (4.0 mmol) and K₂HPO₄ (2.0 mmol). The jar was then closed and securely fitted to the mill which was set for 2×90 minutes at the frequency of 30 Hz (termed “pre-milling” step). The jar was then opened and the corresponding sulfonyl chloride (1.0 equiv) was added to the resulting white residue. The jar was then closed and securely fitted to the mill which was set for another 2×90 minutes at the frequency of 30 Hz (termed “fluorination” step). Once the reaction was complete, the jar was opened and the white solid residue was scratched out with a spatula and collected in a beaker. The jar was rinsed with EtOAc (3×5 mL) and transferred to the beaker. The resulting suspension was stirred at room temperature for 5 minutes, filtered over a short plug of silica gel (washed with ˜20 mL EtOAc), and the solvent was removed in vacuo and the crude mixture purified by silica gel chromatography if required.

2.1. Varying Pre-Milling and Fluorination Duration

Following GP2 outlined above, and having regard to Scheme 2.1 below, the effect of varying the duration of the pre-milling and fluorination steps was investigated. The results are outlined in Table 2.1. Longer pre-milling times lead to higher yields of organofluorine products (e.g., TsF). Longer fluorination times may also lead to higher yields of organofluorine products.

TABLE 2.1
Effect of varying the duration of pre-milling and
fluorination on product yield
	Pre-milling	Fluorination
Entry	(h)	(h)	TsF	TsCl	pTSA	MB
1	0	3	31%	4%	0%	35%
2	1	1	29%	47%	0%	76%
3	2	1	41%	22%	0%	63%
4	3	3	66%	0%	0%	66%

2.2. Assessing the Stability of P-Toluenesulphonyl Fluoride Under Mechanical Forces

Following GP2 outlined above, and having regard to Scheme 2.2 below, the stability of p-toluenesulphonyl fluoride under two-stage, solid state, ball milling conditions was investigated by replacing p-toluenesulphonyl chloride with p-toluenesulphonyl fluoride.

The partial instability of p-toluenesulfonyl fluoride under ball milling conditions was assessed. A stability experiment of p-toluenesulfonyl fluoride under mechanical forces and after pre-milling of CaF₂ and K₂HPO₄ showed that 31% of the fluorinated product is lost.

2.3. Varying Organic Substrate

Following GP2 outlined above, and having regard to Scheme 2.3 below, the effect of varying the organic substrate was investigated. Scheme 2.4 outlines the product yield obtained for each substrate.

2.4. Varying Organic Substrate

Following GP2 outlined above, and having regard to Scheme 2.5 the effect of replacing the p-toluenesulphonyl chloride substrate with 4-methylbenzoyl chloride was investigated. The results are outlined in Table 2.2.

TABLE 2.2
Effect of varying organic substrate on product yield
Entry	Fluorination	ArC(O)F	Arc(O)Cl	ArCO2H	(ArCO)2O
1	1	5%	63%	23%	0%
2	0.25	20%	34%	0%	19%

3. Two-Stage Reactions—Solid State/Solution Phase

General Procedure 3 (GP3): To a 15 mL stainless steel milling jar was added a stainless-steel ball (7 g), CaF₂ (4.0 mmol) and K₂HPO₄ (2.0 mmol). The jar was then closed and securely fitted to the mill which was set for 2×90 minutes at the frequency of 30 Hz (termed “pre-milling” step). Once the reaction was complete, the jar was opened and the white solid residue was collected. A 7 mL vial was charged with the milled solid residue, the corresponding electrophile (1.0 equiv) and MeCN (0.25 M), and then closed with a screw cap. After stirring at 100° C. for 5 to 16 hours (termed “fluorination” step), the resulting suspension was cooled to rt, filtered over a short plug of silica gel (washed with −20 mL EtOAc), and the solvent was removed in vacuo and the crude mixture purified by silica gel chromatography if required.

3.1. Inclusion of Additives

Following GP3 outlined above, and having regard to Scheme 3.1, the effect of including one or more additives during the fluorination step was investigated. The results are outlined in Table 3.1. The addition of additives such as 18-crown-6 or Schreiner's urea may increase the yield of organofluorine product.

TABLE 3.1
Effect of including various additives on product yield
Entry	Pre-milling (h)	Additives (equiv)	TsF	TsCl	pTSA
1	1	—	62%	15%	0%
2	1	18-crown-6 (1)	70%	0%	0%
3	3	Kryptofix [2.2.2] (1)	59%	0%	≈50%
4	3	Kryptofix [2.2.1] (1)	52%	0%	≈50%
5	3	Schreiner's Urea (0.1)	64%	8%	0%
6	3	Schreiner's Urea (0.1) +	79%	0%	≈20%
		18-crown-6 (1)

3.2. Varying Pre-Milling Duration

Following GP3 outlined above, and having regard to Scheme 3.2 below, the effect of varying the pre-milling duration was investigated. The results are outlined in Table 3.2. Longer pre-milling duration may increase the yield of organofluorine product (e.g., TsF) and decrease resulting yields of the starting material (e.g., TsCl).

TABLE 3.2
Effect of varying pre-milling duration on product yield
Entry	Pre-milling (h)	TsF	TsCl	pTSA
1	1	62%	15%	0%
2	3	79%	0%	≈20%
3	6	69%	0%	23%

3.3. Varying Pre-Milling Duration and Inclusion of Additives

Following GP3 outlined above, and having regard to Scheme 3.3, the effect of varying pre-milling duration and including one or more additives during the fluorination step was investigated. The results are outlined in Table 3.3. The addition of crown ethers and/or schreiner's urea may increase the yield of organofluorine product (e.g., TsF).

TABLE 3.3
Effect of varying pre-milling duration and the
inclusion of various additives on product yield
Entry	Pre-milling (h)	Additive	TsF	TsCl	pTSA
1	1	—	62%	15%	0%
2	1	18-crown-6	70%	0%	0%
3	3	Kryptofix [2.2.2]	59%	0%	≈50%
4	3	Kryptofix [2.2.1]	52%	0%	≈50%
5	3	Schreiner's Urea	64%	8%	0%
6	3	Urea + 18-crown-6	79%	0%	≈20%

Following GP3 outlined above, and having regard to Scheme 3.4, the effect of varying the amount of CaF₂ and K₂HPO₄ introduced during pre-milling and then added in the fluorination step was investigated. The results are outlined in Table 3.4.

TABLE 3.4
Effect of varying the amount of CaF2 and K2HPO4 on product yield
			K2HPO4	Additive
Entry	CaF2:K2HPO4	CaF2	(equiv)	(equiv)	TsF	TsCl
1	1:0	4	0	—	7%	70%
2	2:1	4	2	—	62%	15%
3	2:1	4	2	18-crown-6(1)	70%	0%
4	1:1	4	4	—	76%	0%
5	1:8	2	16	—	30%	8%

From the results outlined in Table 3.4, the use of a 2:1 ratio of ball milled CaF₂ and K₂HPO₄ (4 and 2 equivalents, respectively) in the fluorination reaction in the presence of 18-crown-6 ether may give similar yield as a 1:1 ratio of ball milled CaF₂ and K₂HPO₄ (4 equivalents each) without additive. The results also indicate that addition of 1 equivalent of 18-crown-6 ether may result in higher yields of organofluorine product and lower yields of organochlorine starting material. The results also indicate that addition of the second salt, K₂HPO₄ in any amount may increase the yield of organofluorine product in comparison to reactions where no K₂HPO₄ is added.

3.5. Varying Solvent

Following GP3 outlined above, and having regard to Scheme 3.5.1, the effect of varying the solvent used during the fluorination step was investigated. The results are outlined in Table 3.5. The results indicate that some the use of some solvents may lead to higher yields of organofluorine product. Solvents such as DMF, DMA, and DMSO may not be effective as they yields of TsF are in trace amounts, where as other solvents such as 1,2-dichlorobenzene, chlorobenzene, t-amylOH, and t-buOH may be more effective solvents with organofluorine product (e.g., TsF) yields of over 70%. Solvents which have a polar aprotic polarity index of 6.4 or greater may be particularly suitable for use in fluorination of organic compounds using fluorination reagents (e.g. as shown Scheme 3.5.1).

TABLE 3.5
Effect of varying solvent on product yield
Entry	Solvent	TsF	TsCl
1	DMF	trace	8%
2	DMA	trace	43%
3	DMSO	trace	0%
4	THF	27%	64%
5	2-MeTHF	65%	0%
6	1,4-dioxane	56%	16%
7	MeCN	76%	0%
8	EtCN	80%	4%
9	tBuCN	57%	31%
10	toluene	50%	50%
11	1,2-difluorobenzene	34%	62%
12	1,2-dichlorobenzene	84%	2%
13	trifluorotoluene	69%	17%
14	fluorobenzene	33%	55%
15	chlorobenzene	92%	0%
16	m-xylene	68%	31%
17	hexane	28%	62%
18	tBuOH	82%	0%
19	t-amylOH	73%	0%
20	H2O	32%	4%
21	Diglyme	46%	0%
22	Monoglyme	37%	0%

In some instances, reagent grade CaF₂ is milled with 1 equivalent of K₂HPO₄ for 3 hours at 30 Hz before 4 equivalents of the resulting reagent is reacted with TsCl in a solvent according to Scheme 3.5.2 to achieve the resulting TsF. In some instances, 1 equivalent of acid grade fluorspar is milled with 1 equivalent of K₂HPO₄ for 3 hours at 30 Hz according to Scheme 3.5.3 and 4 equivalents of the resulting fluorination reagent is reacted in a solvent with TsCl to achieve the fluorinated TsF. The resulting fluorinated TsF product yields resulting from reagent grade CaF₂ and acid grade fluorspar (81% and 82% respectively by NMR) may support the conclusion that either starting material can be used to synthesize the fluorinating reagent.

3.6. Varying Organic Substrate

Following GP3 outlined above, and having regard to Schemes 3.6a, 3.6b, 3.6c and 3.6 d the effect of replacing the p-toluenesulphonyl chloride substrate with 4-methylbenzoyl chloride, 2,4-dinitrochlorobenzene, 2-chloro-5-nitropyridine or 2-(bromomethyl)naphthalene was investigated. The results are outlined in Tables 3.6a, 3.6b, 3.6c and Scheme 3.6 d. The results may support that the fluorination reagent can sufficiently fluorinate various chlorinated aromatic compounds. The fluorination of toluene (40% yield), may indicate that the fluorination reagent can fluorinate non-halogenated compounds.

TABLE 3.6a
Effect of varying the organic substrate on product yield
Entry	Solvent	ArC(O)F	Arc(O)Cl	ArCO2H
1	EtCN	46%	65%	0%
2	PhCl	44%	45%	10%

TABLE 3.6b
Effect of varying the organic substrate on product yield
Entry	Solvent	ArF	ArCl
1	Toluene	40%	0%
2	1,2-dichlorobenzene	60%	23%
3	Chlorobenzene	49%	44%
4	1,2-difluorobenzene	49%	26%

TABLE 3.6c
Effect of varying the organic substrate on product yield
Entry	Solvent	CaF2 (equiv)	K2HPO4 (equiv)	ArF	ArCl
1	MeCN	4	2	18%	41%
2	MeCN	6	4	20%	16%
3	Toluene	4	2	14%	63%

3.7. Removal of Salt

To investigate the effect of removing the salt on the ability of CaF₂ to fluorinate p-toluenesulphonyl chloride, the reaction depicted in Scheme 3.7 was performed according to a similar procedure to GP3, in which the salt was removed from the pre-milling step. The results are outlined in Table 3.7. These results highlight the importance that the pre-milling of additive with CaF₂ has on the yield of the organofluorine product (e.g., TsF), wherein yields without the addition of the additive in the pre-milling step were less than 8%.

TABLE 3.7
Effect of removing the salt on product yield
Additive (equiv)	TsF	TsCl	pTSA
—	7%	70%	trace
K2HPO4 (2)	<2%	91%	0%
18-crown-6 (1)	4%	49%	0%
Krypt [2.2.2] (1)	4%	1%	trace
Krypt [2.2.1] (1)	2%	0%	trace
Dibenzo-18-crown-6 (1)	4%	96%	0%
Dibenzo-30-crown-10 (1)	5%	91%	0%
Dicyclohexano-18-crown-6 (1)	4%	84%	0%
18-crown-6 (1) + Schreiner's Urea (0.1)	4%	63%	0%

3.8. Varying Salt

Following GP3 outlined above, and having regard to Scheme 3.8 below, the effect of varying the nature of the salt was investigated. The results are outlined in Scheme 3.8. The variation of the salt from K₂SO₄ to K₂HPO₄ led to yields of 10% and 71% respectively in otherwise similar conditions. These results highlight the role the second salt may play in the formation of the fluorinating agent, and the resulting fluorinating agents ability to fluorinate the organic substrate. Specifically, the results highlight K₂HPO₄ as an exemplary salt additive.

4. Nucleophilic Fluorination with CaF₂

To investigate the efficacy of nucleophilic fluorination with CaF₂ in solution, several reactions detailed in Table 4.1 were attempted according to reaction scheme 4.1.

Briefly, a crown ether or cryptand (1 equiv.) described in Table 4.1 was dissolved with Schreiner's thio(urea) (20 mol %) with CaF₂ (5 equiv.). In some instances, an additive selected from K₃PO or Schreiner's urea was added to the reaction. In all cases, the yield of the fluorinated product was 0% or found in trace amounts as determined by ¹⁹F-NMR using 4-fluoroanisole as an internal standard. In all instances, solvents used were anhydrous. In some cases, the side product formed was 1-(2,4-dinitrophenoxy)-4-nitro-2-nitrosobenzene and urea degradation occurred. In other cases, no reaction occurred. The low to zero NMR yields of fluorinated product associated with these reactions may highlight the role of the pre-milling (mechanical force) step discussed herein between CaF₂ (first salt) and the second salt to form the fluorinating reagent.

TABLE 4.1
		Crown ether or
Entry	Solvent	Cryptand	Additive	NMR Yield
1		Kryptofix 221	—	0%
2		Kryptofix 222	—	0%
3	DMF	18-crown-6	—	0%
4		(Dibenzo)18-	—	0%
		crown-6 (or
		dicyclo)
5		18-crown-6	K3PO4	Traces
6		Kryptofix 221	—	0%
7		Kryptofix 222	—	0%
8	Toluene	(Dibenzo)18-	—	0%
		crown-6 (or
		dicyclo)
9		Kryptofix 221	Schreiner's urea	0%
10		Kryptofix 221	—	0%
11		Kryptofix 222	—	0%
12	1,2-DCE	18-crown-6	—	0%
13		Kryptofix 221	Schreiner's urea	0%
14		18-crown-6	K3PO4	traces

5. Fluorination of 4-Toluenesulfonyl Chloride with CaF₂ Using Ball Milling

5.1. Use of Phosphate Additives

The effect of phosphate additives on the reaction of CaF₂ and TsCl as seen in Scheme

CaF₂ (1.00 mmol, 5 equiv.), the phosphate additive (2 equiv., see Table 5.1), and TsCl (1 equiv.) were added to a 30 mL stainless steel jar with 2×2 g balls (316 SS grade) to undergo ball milling using a Retsch MM400 Ball Mill. The ball milling conditions were 30 Hz for 1 hour. The resulting products were examined for starting material (TsCl %), product (TsF %), and side product (TsOH %), as seen in Table 5.1 The yields were determined by ¹H and ¹⁹F-NMR with 4-fluoroanisole as an internal standard. In some instances, the phosphate additive was a carbonate additive or a sulfate additive. The experimental results indicate that the K₂HPO₄ and K₂CO₃ additives may be exemplary additives, increasing yields of organofluorine product (e.g., TsF).

TABLE 5.1
	Phosphate
Entry	Additive	TsCl (%)	TsF (%)	TsOH (%)	Mass Balance (%)
1	K3PO4	12	7	0	25
2	K2HPO4	62	17	0	79
3*	K2HPO4	40	25	0	65
4	KH2PO4	97	1	0	97
5	Na3PO4	74	6	0	80
6	Li3PO4	100	0	0	100
7	Na2HPO4	97	2	0	99
8	NaH2PO4	99	1	0	100
9	K2SO4	92	1	0	93
10	Na2SO4	92	3	0	95
11	MgSO4	97	1	0	98
12	Ag2SO4	4	<1	25	30
13	Na2CO3	93	3	0	93
14	KHCO3	80	5	0	85
15*	K2CO3	10	24	0	34
*Using 1 × 4 g ball, 15 mL jar

5.2. CaF₂ to K₂HPO₄ Ratio

Given the benefit that K₂HPO₄ may have as an additive in the reaction of CaF₂ and TsCl ball milling fluorination experiments, the ratio of CaF₂ and the K₂HPO₄ ratio was probed via Scheme 5.2.

Briefly, CaF₂ (varying equiv.) was added to a stainless steel jar with a 4 g ball (316 SS grade) along with K₂HPO₄ (2 equiv) and TsCl (1 equiv). The ball milling was completed with a Retsch MM400 Ball Mill at 30 Hz for 1 hour. The TsCl yield (%), TsF yield (%), and TsOH side product yield (%), were determined by ¹H and ¹⁹F-NMR with 4-fluoroanisole as an internal standard. The results can be seen in Table 5.2. The increased yield with increased ratio of CaF₂:K₂HPO₄ indicates that the ratio of the two salts may play an a role in optimizing the resulting yield of organofluorine product and a ratio of 2:1 may provide the highest yield of organofluorine product (e.g., TsF).

TABLE 5.2
	Equivalents	TsCl	TsF	TsOH	Mass balance
Entry	of CaF2	(%)	(%)	(%)	(%)
1	6	51	23	1	75
2	5	40	25	0	65
3	4	35	30	2	67
4	3	56	17	1	74
5	2	67	12	1	80
6	1	37	13	0	50

5.3. Product and Starting Material Stability

The stability of the product (TsF) and starting material (TsCl) were probed in the presence of CaF₂ and K₂HPO₄ for TsF and in the presence of K₂HPO₄ for TsCl as in Scheme

In the case of the product (TsF), upon ball milling in stainless steel jars with a Retsch MM400 ball mill at 30 Hz for 1 hour in the presence of CaF₂ (5.0 equiv.) and K₂HPO₄ (5.0 equiv), 81% of the product (TsF) was recovered. Some aqueous fluoride ion was observed in D₂O by NMR. The 81% recovery of the starting material, TsF, highlight the stability of the fluorinated material in the presence of the fluorinating reagent under milling conditions.

In the case of the starting material (TsCl), upon ball milling under similar conditions in the presence of K₂HPO₄ (1.0 equiv), 78% of the TsCl was recovered.

5.4. Step-Wise Addition in the Solid State

The effect on product yield when step-wise addition of starting materials was examined as seen in Scheme 5.4.

Ball milling was completed using a Retsch MM400 Ball Mill using 15 mL stainless steel jars and 3 g balls. Briefly, CaF₂ (4.0 equiv.) was added to the stainless steel jar with K₂HPO₄ (2.0 equiv.) and ball milling took place at 30 Hz (varying times seen in Table 5.4. In the second step, TsCl (1 mmol) was added to the stainless steel jar and fluorination via ball milling took place at 30 Hz (varying times seen in Table 5.4. Yields of TsCl and TsF (%) were determined by ¹H and ¹⁹F-NMR with 4-fluoroanisole as an internal standard. The results show that the combination of pre-milling of the CaF₂ and K₂HPO₄ followed by longer fluorination times may lead to higher yields of organofluorine product (e.g., 66% yield of TsF with 3 hrs of pre-milling followed by 3 hours of fluorination).

TABLE 5.4
	Pre-milling	Fluorination	TsCl	TsF	Mass
Entry	(x h)	(y h)	(%)	(%)	balance
1	0	3	4	31	35
2	1	1	47	29	76
3	2	1	22	41	63
4	3	3	0	66	66

5.5. Step-Wise Addition in the Solid State to Solution State

The effect on product yield was examined when K₂HPO₄ (2.0 equiv.) was first milled with CaF₂ (4.0 equiv.) at 30 Hz for 3 hours followed by a second step, solution state reaction with TsCl in acetonitrile (0.25 M) for 5 hours at 100° C. as seen in Scheme 5.5.

When adding CaF₂ (4 equiv.) and K₂HPO₄ (2.0 equiv.) to a stainless steel jar for ball milling at 30 Hz for 3 hours as seen in Scheme 5.5, followed by adding TsCl in the solution state (1.00 mmol, 0.25 M) and reacting the solution at 100° C. for 5 hours in acetonitrile, the yield of TsF was determined to be 62% with 15% of the TsCl recovered. The 62% yield of TsF may highlight the importance of pre-milling CaF₂ with the phosphate activator, K₂HPO₄ before the solution fluorination reaction with TsCl.

5.6. Step-Wise Addition in the Solid State to Solution State

Several control experiments were completed using ball milled CaF₂, as seen in Scheme 5.6, where the CaF₂ is not ball milled with the additive before addition of the TsCl.

In summary, CaF₂ (4.0 equiv.) is added to a 15 mL stainless steel jar and ball milled alone at 30 Hz for 3 hours before being added to an additive (see Table 5.6) and TsCl (1 mmol) in acetonitrile (0.25 M) and reacted for 5 hours at 100° C. This method may result in lower yields of fluorinated product than when the additive is milled with the CaF₂.

TABLE 5.6
						Mass
		Additive	TsCl	TsF	TsOH	Balance
Entry	Additive	Equiv	(%)	(%)	(%)	(%)
1	—	—	70	7	<1	77
2	K2HPO4	2	91	2	0	93
3	18-crown-6	1	49	4	0	53
4	Krypt [2.2.2]	1	1	4	<1	5
5	Krypt [2.2.1]	1	0	2	<1	3
6	Dibenzo-18-crown-6	1	96	4	0	100
7	Dibenzo-30-crown-6	1	91	5	0	96
8	Dicyclohexano-18-	1	84	4	0	88
	crown-6
9	18-crown-6 +	1 + 0.1	63	4	0	67
	Schreiner's Urea

5.7. Replacement of Reagent Grade CaF₂ with Acid Grade Fluorspar

In some instances, reagent grade CaF₂ was replaced with acid grade Fluorspar and screening of the various phosphate activators was completed as described in Scheme 5.7. The various phosphate activators included K₃PO₄, K₂HPO₄, KH₂PO₄, Na₃PO₄, Na₂HPO₄, KPO₃, K₄P₂O₇, K₅P₃O₁₀, Na₄P₂O₇, Na₅P₃O₁₀, (NaPO₃)₃, CaHPO₄, and α-Ca₃(PO₄)₂.

The Fluorspar (1.0 equiv.) was added to the stainless steel jar and milled for 3 hours at 30 Hz with a phosphate activator (1 equiv.) (see FIG. 3). Subsequently, the solid product is added, containing CaF₂ (4 equiv.) and phosphate activator (4 equiv.), to t-butanol (0.25 M) with TsCl (1.00 mmol) and reacted for 5 hours at 100° C. to obtain the fluorinated product (TsF). The yields of the reaction (TsF(%), TsCl (%)) can be seen in FIG. 3. Corresponding sulfonyl bromide and tosylate as substrates afforded the sulfonyl fluoride in 71%, and 26% respectively (using K₂HPO₄ as the additive, compared with 82% using the sulfonyl chloride). Using K₄P₂O₇ resulted in yields of 54% TsF. In some instances, the phosphate activators (e.g., CaHPO₄, (NaPO₃)₃, α-Ca₃(PO₄)₂) led to trace amounts or 0% of TsF product yield. In brief, the results indicate that the selection of the activator salt (second salt) may play a significant role in the resulting fluorinating reagent's ability to fluorinate the substrate. The results highlight potential exemplary additives including K₂HPO₄, Na₂HPO₄, K₄P₂O₇ and Na₄P₂O₇.

PXRD data was obtained for each of the solid products obtained from Fluorspar activation by various phosphate activators included K₃PO₄, K₂HPO₄, KH₂PO₄, Na₃PO₄, Na₂HPO₄, KPO₃, K₄P₂O₇, K₅P₃O₁₀, Na₄P₂O₇, Na₅P₃O₁₀, (NaPO₃)₃, CaHPO₄, and α-Ca₃(PO₄)₂. FIG. 4 shows the PXRD pattern resulting from milling of Fluorspar with KH₂PO₄ at 35 Hz for 3 hours. Table 5.7.1 shows the PXRD data from the milling of Fluorspar with KH₂PO₄ represented in FIG. 4. Labels on the diffraction pattern indicate crystalline phase of CaF₂ and KH₂PO₄.

TABLE 5.7.1
Pos.	Height	FWHM	d-spacing	Rel.
[°2Th.]	[cts]	[°2Th.]	[Å]	Int. [%]
17.4503	686.27	0.0528	5.07796	16.95
17.5072	731.34	0.0541	5.06577	18.06
23.9279	4049.59	0.1299	3.71901	100.00
28.0696	487.06	0.0433	3.17898	12.03
28.3647	574.15	0.1515	3.14657	14.18
29.8125	339.33	0.0866	2.99698	8.38
30.7783	2994.59	0.1407	2.90510	73.95
34.0483	591.48	0.0649	2.63321	14.61
35.2759	216.71	0.1732	2.54434	5.35
38.5033	368.10	0.0758	2.33817	9.09
40.6969	138.12	0.1299	2.21706	3.41
45.8277	299.07	0.1082	1.98008	7.39
46.5419	1217.04	0.0974	1.95135	30.05
47.1639	370.38	0.1515	1.92705	9.15
47.7466	132.31	0.1732	1.90488	3.27
48.9681	32.23	0.2598	1.86019	0.80
52.3336	26.58	0.3464	1.74821	0.66
54.0701	27.15	0.2598	1.69610	0.67
55.1283	170.76	0.0866	1.66602	4.22
55.7911	105.97	0.3031	1.64779	2.62
58.4622	159.43	0.1082	1.57871	3.94
58.8671	151.82	0.1082	1.56882	3.75
59.8709	40.85	0.2598	1.54489	1.01
64.0433	146.25	0.0866	1.45394	3.61
69.7452	120.73	0.1320	1.34726	2.98

FIG. 5 shows the PXRD pattern resulting from milling of Fluorspar with K₃PO₄ at 35 Hz for 3 hours. Table 5.7.2 shows the PXRD data from the milling of Fluorspar with K₃PO₄ represented in FIG. 5. Labels in FIG. 5 indicate crystalline phases of K₃PO₄*7H₂O, CaF₂, and an unidentified crystalline phase.

TABLE 5.7.2
Pos.	Height	FWHM	d-spacing	Rel. Int.
[°2Th.]	[cts]	[°2Th.]	[Å]	[%]
5.1808	76.50	0.5196	17.05776	13.83
K3PO4 16.3622	31.25	0.2598	5.41759	5.65
K3PO4 24.4974	60.81	0.1732	3.63384	11.00
K3PO4 26.1679	28.97	0.2598	3.40552	5.24
CaF2 28.4848	552.97	0.3031	3.13357	100.00
K3PO4 29.5428	228.67	0.2598	3.02372	41.35
new phase 31.5443	118.01	0.8659	2.83628	21.34
K3PO4 32.7690	166.89	0.2165	2.73303	30.18
K3PO4 35.1033	117.05	0.1732	2.55645	21.17
new phase 36.7972	77.63	0.2165	2.44256	14.04
K3PO4 37.7484	99.72	0.2165	2.38318	18.03
K3PO4 40.5069	24.30	0.3464	2.22702	4.39
K3PO4 42.3931	25.64	0.2165	2.13220	4.64
CaF2 47.1921	403.01	0.2381	1.92597	72.88
K3PO4 50.2093	39.46	0.1732	1.81708	7.14
K3PO4 51.7624	19.86	0.2598	1.76615	3.59
CaF2 55.9692	111.97	0.2598	1.64297	20.25
CaF2 68.9523	30.23	0.8448	1.36080	5.47

FIG. 6 shows the PXRD pattern resulting from milling of Fluorspar with Na₃PO₄ at 30 Hz for 3 hours. Table 5.7.3 shows the PXRD data from the milling of Fluorspar with Na₃PO₄ represented in FIG. 6. Labels in FIG. 6 indicate crystalline phases of Na₇F(PO₄)₂(H₂O)₁₉ and CaF₂.

TABLE 5.7.3
Pos.	Height	FWHM	d-spacing	Rel. Int.
[°2Th.]	[cts]	[°2Th.]	[Å]	[%]
11.0987	575.32	0.0758	7.97217	55.68
12.8527	230.21	0.1082	6.88791	22.28
18.1294	481.00	0.1299	4.89331	46.55
22.2114	429.50	0.0866	4.00239	41.57
25.7262	114.34	0.1515	3.46298	11.07
28.0698	819.87	0.0433	3.17896	79.35
CaF2 28.3394	1033.22	0.0758	3.14932	100.00
28.7953	453.13	0.1515	3.10049	43.86
29.3760	147.60	0.2165	3.04051	14.29
30.2262	90.55	0.1299	2.95690	8.76
30.7564	308.53	0.1299	2.90712	29.86
CaF2 31.6106	121.58	0.1515	2.83049	11.77
33.5540	611.75	0.0541	2.67086	59.21
37.0842	313.50	0.1082	2.42432	30.34
38.9278	168.51	0.1515	2.31365	16.31
41.1692	55.41	0.1732	2.19272	5.36
CaF2 47.0750	894.37	0.0528	1.92889	86.56
47.2052	643.97	0.0649	1.92546	62.33
49.4533	52.13	0.2598	1.84307	5.04
52.0627	30.14	0.8659	1.75667	2.92
CaF2 55.8334	157.23	0.2165	1.64664	15.22
57.5195	25.10	0.3464	1.60232	2.43
CaF2 68.8110	33.78	0.5280	1.36325	3.27

FIG. 7 shows the PXRD pattern resulting from milling of Fluorspar with Na₂HPO₄ at 35 Hz for 3 hours. Table 5.7.4 shows the PXRD data from the milling of Fluorspar with Na₂HPO₄ represented in FIG. 7. Labels in FIG. 7 indicate crystalline phases of CaF₂ and an unidentified crystalline phase.

TABLE 5.7.4
	Height	FWHM	d-spacing	Rel. Int.
Pos. [°2Th.]	[cts]	[°2Th.]	[Å]	[%]
20.1820	170.30	0.2598	4.40001	23.76
26.6900	46.47	0.2598	3.34008	6.48
CaF2 28.4541	716.88	0.2814	3.13689	100.00
33.2761	170.13	0.3031	2.69253	23.73
38.7654	18.81	0.5196	2.32296	2.62
CaF2 47.1554	663.65	0.2814	1.92738	92.57
CaF2 55.9176	188.00	0.3031	1.64436	26.22
CaF2 68.8390	51.16	0.4224	1.36276	7.14

FIG. 8 shows the PXRD pattern resulting from milling of Fluorspar with NaH₂PO₄ at 35 Hz for 3 hours. Table 5.7.5 shows the PXRD data from the milling of Fluorspar with NaH₂PO₄ represented in FIG. 8. Labels in FIG. 8 indicate crystalline phases of CaF₂ and NaH₂PO₄(H₂O)₃.

TABLE 5.7.5
Pos.	Height	FWHM	d-spacing	Rel. Int.
[°2Th.]	[cts]	[°2Th.]	[Å]	[%]
5.1628	111.00	0.5196	17.11719	10.75
10.6534	324.58	0.1515	8.30443	31.42
16.9107	580.27	0.0758	5.24309	56.18
17.2912	68.53	0.1299	5.12858	6.63
19.2624	595.57	0.0974	4.60795	57.66
20.2745	49.87	0.1515	4.38016	4.83
22.6340	196.21	0.1082	3.92860	18.99
23.3705	59.97	0.1732	3.80644	5.81
24.4355	101.84	0.1515	3.64289	9.86
26.6815	527.64	0.1299	3.34113	51.08
27.4363	400.96	0.0866	3.25090	38.82
28.3572	1032.95	0.1732	3.14738	100.00
29.8795	149.68	0.1515	2.99041	14.49
30.6959	268.41	0.1082	2.91271	25.98
31.2197	391.71	0.1515	2.86502	37.92
32.0102	118.51	0.1299	2.79606	11.47
32.7605	292.25	0.1732	2.73371	28.29
34.6523	115.42	0.1082	2.58868	11.17
36.1761	149.25	0.1299	2.48306	14.45
36.5045	135.17	0.1515	2.46148	13.09
37.8231	25.18	0.1732	2.37864	2.44
39.0272	36.90	0.4330	2.30798	3.57
39.9166	161.17	0.1299	2.25859	15.60
40.9910	67.01	0.3464	2.20183	6.49
42.3863	15.91	0.2598	2.13253	1.54
43.5308	53.93	0.2598	2.07908	5.22
43.9368	83.86	0.1732	2.06081	8.12
45.2239	81.41	0.1299	2.00510	7.88
46.0782	112.69	0.2598	1.96990	10.91
47.1350	786.79	0.1515	1.92817	76.17
49.5339	19.28	0.3031	1.84026	1.87
50.4606	41.62	0.2165	1.80862	4.03
51.1946	26.58	0.1732	1.78440	2.57
52.5781	49.03	0.1299	1.74066	4.75
55.9901	237.76	0.3897	1.64241	23.02
57.7920	25.50	0.5196	1.59541	2.47
59.7053	9.88	0.5196	1.54878	0.96
60.9672	20.31	0.3464	1.51971	1.97
63.2931	31.33	0.3464	1.46935	3.03
65.7834	24.71	0.2598	1.41963	2.39
68.4277	51.66	1.0560	1.36995	5.00

FIG. 9 shows the PXRD pattern resulting from milling of Fluorspar with KPO₃ at 35 Hz for 3 hours. Table 5.7.6 shows the PXRD data from the milling of Fluorspar with KPO₃ represented in FIG. 9. Labels in FIG. 9 indicate crystalline phases of CaF₂, KPO₃, and an unidentified amorphous phase.

TABLE 5.7.6
Pos.	Height	FWHM	d-spacing	Rel. Int.
[°2Th.]	[cts]	[°2Th.]	[Å]	[%]
KPO3 14.0459	162.80	0.2165	6.30536	9.79
KPO3 17.5192	108.65	0.2598	5.06233	6.53
KPO3 19.5372	32.72	0.3464	4.54377	1.97
KPO3 23.8310	52.28	0.3464	3.73391	3.14
KPO3 25.9074	266.00	0.3464	3.43917	15.99
KPO3 26.7862	254.20	0.3464	3.32830	15.28
CaF2 28.3520	1663.57	0.0866	3.14795	100.00
KPO3 31.7224	85.00	0.2598	2.82077	5.11
new phase 33.1713	75.46	0.4330	2.70079	4.54
CaF2 47.0642	1381.50	0.0660	1.92930	83.04
CaF2 55.8027	400.25	0.1082	1.64748	24.06
CaF2 68.7042	122.83	0.2112	1.36511	7.38

FIG. 10 shows the PXRD pattern resulting from milling of Fluorspar with K₄P₂O₇ at 35 Hz for 3 hours. Table 5.7.7 shows the PXRD data from the milling of Fluorspar with K₄P₂O₇ represented in FIG. 10. Labels in FIG. 10 indicate crystalline phases of CaF₂ and an unidentified crystalline phase.

TABLE 5.7.7
Pos.	Height	FWHM	d-spacing	Rel. Int.
[°2Th.]	[cts]	[°2Th.]	[Å]	[%]
5.1444	130.15	0.2598	17.17830	10.54
17.9889	94.86	0.1732	4.93120	7.68
18.7323	79.36	0.1732	4.73714	6.43
21.8984	254.80	0.1732	4.05888	20.64
22.6004	826.97	0.0541	3.93436	66.98
24.4977	89.59	0.2165	3.63379	7.26
25.3643	87.27	0.2598	3.51157	7.07
26.4568	735.97	0.1948	3.36898	59.61
27.0316	509.38	0.1732	3.29864	41.26
28.0638	1053.98	0.1948	3.17962	85.37
CaF2 28.3868	1234.61	0.1732	3.14417	100.00
29.1860	173.05	0.1732	3.05987	14.02
30.3572	76.33	0.1732	2.94443	6.18
31.6322	61.17	0.2598	2.82860	4.95
33.0425	312.45	0.1082	2.71103	25.31
34.8349	30.59	0.3464	2.57553	2.48
36.3748	54.35	0.2165	2.46996	4.40
37.6922	100.83	0.3031	2.38660	8.17
39.5079	62.17	0.2598	2.28100	5.04
40.3630	108.66	0.1299	2.23463	8.80
41.6540	56.14	0.2598	2.16831	4.55
42.3742	83.32	0.2165	2.13311	6.75
43.4426	48.03	0.2598	2.08309	3.89
46.0690	102.39	0.2598	1.97027	8.29
CaF2 47.1347	647.18	0.1299	1.92818	52.42
48.3579	85.22	0.2165	1.88223	6.90
49.4397	67.00	0.3031	1.84354	5.43
52.7532	64.11	0.3464	1.73529	5.19
53.9036	38.86	0.2598	1.70094	3.15
CaF2 55.8878	248.87	0.2598	1.64517	20.16
61.3555	21.45	0.4330	1.51102	1.74
62.4719	17.97	0.2598	1.48668	1.46
CaF2 68.7998	53.55	0.4224	1.36344	4.34

FIG. 11 shows the PXRD pattern resulting from milling of Fluorspar with K₅P₃O₁₀ at 35 Hz for 3 hours. Table 5.7.8 shows the PXRD data from the milling of Fluorspar with K₅P₃O₁₀ represented in FIG. 11. Labels in FIG. 11 indicate crystalline phases of CaF₂ and K₃H₃(PO₄)₂*2H₂O and an unidentified crystalline phase.

TABLE 5.7.8
Pos.	Height	FWHM	d-spacing	Rel. Int.
[°2Th.]	[cts]	[°2Th.]	[Å]	[%]
5.2732	114.29	0.5196	16.75922	27.96
17.2799	39.30	0.1732	5.13189	9.62
18.3993	55.60	0.1948	4.82211	13.60
19.5241	58.21	0.1299	4.54679	14.24
20.4719	53.71	0.1299	4.33836	13.14
20.8963	39.65	0.2165	4.25120	9.70
23.2997	88.92	0.1299	3.81784	21.76
25.3934	53.09	0.1299	3.50760	12.99
25.9552	58.44	0.3464	3.43294	14.30
26.8517	251.68	0.1299	3.32033	61.58
27.3606	340.00	0.1299	3.25972	83.19
CaF2 28.3670	375.75	0.3031	3.14632	91.94
29.0963	408.69	0.1732	3.06910	100.00
29.5586	337.62	0.1299	3.02214	82.61
30.2354	251.36	0.1515	2.95602	61.50
30.6491	301.67	0.1299	2.91705	73.81
31.7495	106.23	0.1732	2.81842	25.99
32.5474	69.78	0.1299	2.75113	17.08
33.6613	105.09	0.1299	2.66259	25.71
35.2089	141.22	0.1732	2.54903	34.56
36.5470	35.78	0.2598	2.45871	8.75
39.4710	71.52	0.2165	2.28305	17.50
40.0449	41.44	0.3464	2.25165	10.14
41.3836	75.03	0.1732	2.18185	18.36
41.8761	70.61	0.2598	2.15732	17.28
42.3942	65.61	0.1732	2.13215	16.05
42.8791	74.72	0.1299	2.10916	18.28
44.3482	31.39	0.3464	2.04264	7.68
46.6089	101.65	0.1732	1.94869	24.87
CaF2 47.1154	307.91	0.1732	1.92892	75.34
49.1345	20.31	0.3464	1.85428	4.97
50.2219	22.27	0.2598	1.81665	5.45
53.5032	26.67	0.5196	1.71272	6.53
CaF2 55.8875	78.51	0.4330	1.64518	19.21
56.9644	15.27	0.2598	1.61661	3.74
59.2874	12.50	0.5196	1.55869	3.06
61.4948	15.16	0.5196	1.50793	3.71
64.1902	14.04	0.5196	1.45097	3.43
CaF2 68.7999	38.69	0.4224	1.36344	9.47

FIG. 12 shows the PXRD pattern resulting from milling of Fluorspar with Na₄P₂O₇ at 35 Hz for 3 hours. Table 5.7.9 shows the PXRD data from the milling of Fluorspar with Na₄P₂O₇ represented in FIG. 12. Labels in FIG. 12 indicates a crystalline phase of CaF₂ and an unidentified crystalline phase.

TABLE 5.7.9
Pos.	Height	FWHM	d-spacing	Rel. Int.
[°2Th.]	[cts]	[°2Th.]	[Å]	[%]
18.5302	32.30	0.4330	4.78835	8.95
CaF2 28.3978	360.72	0.0758	3.14297	100.00
30.4726	184.31	0.3464	2.93354	51.10
40.0968	13.45	0.5196	2.24885	3.73
43.2966	15.99	0.5196	2.08978	4.43
CaF2 47.1173	295.61	0.1515	1.92885	81.95
54.0107	13.24	0.6927	1.69782	3.67
CaF2 55.8334	76.55	0.2598	1.64664	21.22
CaF2 68.8257	22.49	0.5280	1.36299	6.24

FIG. 13 shows the PXRD pattern resulting from milling of Fluorspar with Na₅P₃O₁₀ at 35 Hz for 3 hours. Table 5.7.10 shows the PXRD data from the milling of Fluorspar with Na₅P₃O₁₀ represented in FIG. 13. Labels in FIG. 13 indicates a crystalline phase of CaF₂ and an unidentified amorphous phase.

TABLE 5.7.10
		FWHM
Pos. [°2Th.]	Height [cts]	[°2Th.]	d-spacing [Å]	Rel. Int. [%]
28.2976	1396.75	0.1632	3.15126	100.00
47.0169	926.02	0.4896	1.93113	66.30
55.8035	259.77	0.4896	1.64609	18.60
68.6839	70.90	0.8160	1.36546	5.08

FIG. 14 shows the PXRD pattern resulting from milling of Fluorspar with Na(PO₃)₃ at 35 Hz for 3 hours. Table 5.7.11 shows the PXRD data from the milling of Fluorspar with Na(PO₃)₃ represented in FIG. 14. Labels in FIG. 14 indicates a crystalline phase of CaF₂.

TABLE 5.7.11
		FWHM
Pos. [°2Th.]	Height [cts]	[°2Th.]	d-spacing [Å]	Rel. Int. [%]
28.2976	1396.75	0.1632	3.15126	100.00
47.0169	926.02	0.4896	1.93113	66.30
55.8035	259.77	0.4896	1.64609	18.60
68.6839	70.90	0.8160	1.36546	5.08

FIG. 15 shows the PXRD pattern resulting from milling of Fluorspar with CaHPO₄ at 30 Hz for 3 hours. Table 5.7.12 shows the PXRD data from the milling of Fluorspar with CaHPO₄ represented in FIG. 15. Labels in FIG. 15 indicates crystalline phases of CaF₂ and Ca₅(PO₄)₃F.

TABLE 5.7.12
		FWHM
Pos. [°2Th.]	Height [cts]	[°2Th.]	d-spacing [Å]	Rel. Int. [%]
10.8159	22.19	0.3464	8.18003	1.71
16.9988	27.36	0.3464	5.21612	2.11
21.9471	44.50	0.2598	4.04997	3.43
22.9223	87.66	0.3031	3.87984	6.76
25.9108	464.01	0.1515	3.43873	35.79
26.7231	164.61	0.1299	3.33602	12.70
CaF2 28.3972	1296.45	0.2165	3.14305	100.00
29.1216	365.28	0.1732	3.06649	28.18
31.9522	1014.39	0.1515	2.80100	78.24
32.3833	548.05	0.1948	2.76469	42.27
33.1624	541.34	0.0866	2.70150	41.76
34.1845	268.43	0.2598	2.62303	20.71
35.6375	53.32	0.1732	2.51934	4.11
39.3033	78.45	0.1732	2.29241	6.05
40.0474	226.94	0.1515	2.25151	17.50
42.2195	64.59	0.3031	2.14056	4.98
43.9611	61.89	0.2598	2.05972	4.77
45.4737	106.84	0.2598	1.99467	8.24
CaF2 46.9114	1075.26	0.1515	1.93683	82.94
49.6178	342.27	0.3031	1.83734	26.40
50.7543	131.19	0.2165	1.79884	10.12
51.5785	118.41	0.2598	1.77201	9.13
52.3593	105.86	0.2598	1.74741	8.17
53.2237	143.52	0.1732	1.72106	11.07
CaF2 55.7559	291.37	0.4330	1.64875	22.47
60.1404	30.48	0.3464	1.53861	2.35
61.8997	32.01	0.3897	1.49904	2.47
63.2828	70.58	0.3464	1.46957	5.44
64.2073	72.79	0.6061	1.45062	5.61
65.5460	30.47	0.5196	1.42420	2.35
CaF2 68.7224	84.83	0.6336	1.36479	6.54

FIG. 16 shows the PXRD pattern resulting from milling of Fluorspar with Ca₃(PO₃)₂ at 35 Hz for 3 hours. Table 5.7.13 shows the PXRD data from the milling of Fluorspar with Ca₃(PO₃)₂ represented in FIG. 16. Labels in FIG. 16 indicates a crystalline phase of Ca₅(PO₃)₃F.

TABLE 5.7.13
		FWHM
Pos. [°2Th.]	Height [cts]	[°2Th.]	d-spacing [Å]	Rel. Int. [%]
22.0434	15.65	0.5196	4.03250	3.25
26.0518	184.78	0.1948	3.42044	38.31
28.3091	213.59	0.3031	3.15262	44.28
29.2225	140.14	0.2598	3.05613	29.05
32.0450	482.35	0.2598	2.79310	100.00
33.1785	229.57	0.2598	2.70022	47.59
34.2570	111.95	0.2165	2.61764	23.21
40.1975	87.58	0.2165	2.24345	18.16
42.3548	16.81	0.5196	2.13404	3.49
43.9319	15.64	0.5196	2.06102	3.24
46.9721	173.42	0.3464	1.93447	35.95
48.4374	53.81	0.3464	1.87932	11.16
49.6795	132.95	0.2165	1.83521	27.56
50.9224	56.80	0.3464	1.79330	11.78
53.3052	60.24	0.3464	1.71862	12.49
56.2117	34.73	0.6061	1.63645	7.20
61.9102	13.34	0.5196	1.49881	2.77
64.2938	23.96	0.8448	1.44768	4.97

5.8. Milling Frequency and Consumption of Crystalline CaF₂ in Solid State Reactions

An increased consumption of crystalline CaF₂ may be achieved by successively spiking the milled mixtures (A to D in Scheme 5.8.1) with additional K₂HPO₄ and milling for additional 3 hour periods until all of the crystalline CaF₂ was consumed as detailed in Scheme 5.8.1.

In this reaction, Fluorspar (1 equiv.) was added to a stainless steel container with 1 equivalent of K₂HPO₄ the mixture was milled for 3 hours at 30 Hz, followed by successive additions of 1 additional equivalent of K₂HPO₄, 0.5 equiv. K₂HPO₄, and 0.5 equiv. K₂HPO₄ each accompanied by 3 hours of milling at 30 Hz. FIG. 17 shows Powder X-Ray Diffraction patterns of each of these mixtures, labelled to show the appearance of the new species. The PXRD was obtained on a Bruker Eco D8 Diffractometer.

The effect of milling intensity was investigated as shown in Scheme 5.8.2. Acid grade Fluorspoar (1 equiv.) was milled with K₂HPO₄ (1 equiv.) at 30 Hz or 35 Hz for 3 hours and the powder reagent (A) was used in the fluorination of TsCl at 0.125 mmol scale and yields were determined by ¹H NMR and ¹⁹F NMR with 4-fluoroaniosole as an internal standard. Milling was completed using a Retsch MM400 ball mill and stainless steel jars (15 mL) and a 7 g ball.

FIG. 18 shows the results of the experiment, when the powder reagent is reacted in solution with TsCl in tBuOH (0.25 M) at 100° C. for 5 hours, showing that higher frequency milling may result in powder reagents, that when used for fluorination, may lead to higher fluorination yields. Additionally, when higher equivalents of the fluorination reagent (A) are used, higher fluorinations yields may be exhibited.

5.9. Varying Stoichiometry of CaF₂ (Fluorpar)

Milled mixtures A to C as seen in Scheme 5.9.1 were investigated as fluorinating reagents, in turn allowing for fluorination of TsCl at high yield using fewer equivalents of CaF₂ (Fluorspar).

In A, 1 equivalent of Fluorspar was milled with 1 equivalent of K₂HPO₄ at 30 or 35 Hz for 3 hours. In B, 1 additional equivalent of K₂HPO₄ was added and milled for 3 hours at 30 or 35 Hz. In C, 0.5 additional equivalent of K₂HPO₄ was added and milled for 3 hours at 30 or 35 Hz. The powder reagents were reacted with TsCl (1 equiv., 0.125-0.25 mmol) in solution as seen in Scheme 5.9.2 in tBuOH (0.25 M) at 100° C. for 5 hours. FIG. 19 shows the experimental results which indicate that lower equivalents of CaF₂ can lead to higher fluorination yields of organofluorine product (e.g., TsF).

Scheme 5.9.3 shows a reaction wherein the powder reagents of Scheme 5.9.1 were reacted with TsCl (1 equiv., 0.125-0.25 mmol) in a 0.25 M solution of tBuOH at 100° C. for 5 hours with the addition of water. The results (see FIG. 20) show that the addition of water to the reaction may be beneficial to achieving higher yields of organofluorine product (e.g., TsF).

Various experimental conditions were used using powder reagent C from Scheme 5.9.1 (containing 0.5 equivalents of CaF₂) as seen in Scheme 5.9.4 where C (0.5 equiv.) is reacted with TsCl (1 equiv., 0.125-0.25 mmol) in a solution of tBuOH (0.25 M) at 100° C. for 5 hours with the addition of varying amounts of water. FIG. 21 shows the results of these reactions. These results may indicate that larger amounts of added water may lower yields of fluorinated product but longer reaction times may increase product yield.

5.10. S—F Bond Scope

A series of reactions were completed to assess the scope of SO₂—Cl substrates that could undergo fluorination, and the associated fluorination yields. All yields were isolated unless otherwise stated and all reactions were on 0.5 mmol scale unless otherwise stated ¹⁹F NMR yields were determined using 4-fluoroanisole as an internal standard. In FIG. 22, ^bindicates that EtCN was used instead of tBuOH (anhydrous), ^cindicates that the product was prepared via addition of all trans farnesyl-mercaptan to ESF, ^dindicates that the reaction was completed using 2.2 equivalents of “reagent’, ^eindicates that the reaction was completed on 0.25 mmol scale, ^findicates that 1.25 mmol of “reagent” was used. In all instances, a INSOLIDO IST636 Ball Mill was used with stainless steel jars (15 mL) and ball (7 g) (316 SS grade). These reactions were carried out as detailed in Scheme 5.10.1 wherein Fluorspar (CaF₂) (1 equiv., acid grade) was milled with K₂HPO₄ (2.5 equiv. total) at 35 Hz for 9 hours total. The “reagent” (1 equiv.) was reacted with the R—SO₂Cl (1 equiv.) and H₂O (0-2 equiv) in tBuOH or EtCN (0.25 M) at 40-100° C. for 2-24 hours to achieve the fluorinated product. FIG. 22 shows all of the fluorinated products and their fluorinated yields. The results indicate that a wide range of substrates may undergo fluorination using the fluorination agents described herein.

5.11. C—F Bond Scope

A series of reactions were completed to assess the scope of R—X substrates that could undergo fluorination, wherein X indicates a halogen (Br or CI) and the associated fluorination yields. Benzyl fluorides, acyl fluorides, alpha-fluoro carbonyls, alkyl fluorides, and (hetero)aryl fluorides were of those C—F bonds investigated as seen in FIG. 23. The fluorination reagent was created via ball milling as shown in Scheme 5.11.1 wherein CaF₂ (FluorSpar) (1-4 equiv.) was milled with K₂HPO₄ (4-8 equiv.) at 35 Hz for 3-9 hours total. This solid reagent was reacted with the R—X substrate (1 equiv.), 18-C-6 (1 equiv.) and optionally H₂O (0-5 equiv.) in a solution of tBuOH at 60-100° C. for 5-48 hours to achieve the desired product, the yields and specific solution conditions of which can be seen in FIG. 23. All isolated yields are not in parentheses and were conducted on a 0.5 mmol scale. All yields in parentheses are NMR yields. All reactions were completed using an INSOLIDO IST636 Ball Mill and using stainless steel jars (15 mL) with a 7 g ball (316 SS grade). The results indicate a range of different halogenated functionalities can undergo fluorination using the forementioned fluorination reagents.

5.12 Solution State NMR and Powder X-Ray Diffraction

Fluorspar (CaF₂) was milled with K₂HPO₄ (2.5 equiv. total) as seen in Scheme 5.12.1 to form a “reagent”. The reagent was dissolved in D₂O to form D₂O soluble components for study via solution state NMR. FIG. 24A shows ¹⁹F NMR indicating the presence of F⁻ ion and PO₃F²⁻ ion in solution upon dissolution. FIG. 24B shows ³¹P NMR indicating the presence of PO₄³⁻ and PO₃F²⁻.

FIG. 25 shows a powder x-ray diffraction pattern (PXRD) of the “reagent” with a reference PXRD pattern for potassium fluoride (KF). The PXRD pattern indicated no presence of KF upon completion of the ball milling reaction. FIG. 26 and Table 5.12.1 show PXRD data of the fluorinating reagent, “Fluoromix” that results from the “reagent” formation depicted in Scheme 5.12.1 when fluorspar is milled with 2.5 total equivalents of K₂HPO₄. FIG. 27 shows the crystalline components of “reagent” consistent with X (KF (1 equiv.) milled with K₂HPO₄ (1 equiv.) at 30 Hz for 3 hours), Y (KF (1 equiv.) milled with K₂HPO₄ (1 equiv.) at 30 Hz for 3 hours followed by the addition of CaHPO₄ (1 equiv.)), and crystalline CaF₂ as a reference PXRD pattern. X and Y could be synthesized independently via Scheme 5.12.2.

This PXRD may indirectly support the formation and involvement of KF and CaHPO₄ species in the solid state reaction. The structures of X and Y were simulated based upon their PXRD patterns. FIG. 28A shows the simulated structure of X which may be K₃(HPO₄)F, which is a related structure to K₃(PO₃F)F. FIG. 28B shows the simulated structure of Y which may be K_2-xCa_y(PO₃F)_a(PO₄)_bF_c, which is a related structure to K₂PO₃F. FIG. 29 shows PXRD experiments for Fluorspar (acid grade), K₂HPO₄ (Fisher Chemical), and Fluorapatite (Thermo Fisher). FIG. 30 shows an overlay of PXRD diffractograms of fluoromix, fluorspar, X, and Y. Residual CaF₂ is also observed in the diffractogram of fluoromix. Table 5.12.2 shows PXRD data of the crystalline components of X which has a proposed structure of K₃(HPO₄)F. Table 5.12.3 shows PXRD data of the crystalline components of Y, which has a proposed structure of K_2-xCa_y(PO₃F)_a(PO₄)_bF_c.

TABLE 5.12.1
		FWHM
Pos. [°2Th.]	Height [cts]	[°2Th.]	d-spacing [Å]	Rel. Int. [%]
X 17.5396	65.74	0.1515	5.05648	6.01
Y 21.1279	153.67	0.3031	4.20512	14.06
X 23.5473	63.33	0.3031	3.77826	5.79
X 24.8414	38.29	0.2165	3.58428	3.50
CaF2 28.3270	387.64	0.1732	3.15067	35.46
X 29.3567	889.96	0.1515	3.04246	81.42
Y 29.6240	919.11	0.1299	3.01562	84.08
Y 30.5396	1093.11	0.1948	2.92727	100.00
X 31.5267	226.92	0.3031	2.83783	20.76
X 35.3807	392.48	0.0758	2.53704	35.91
X 36.7453	327.57	0.3897	2.44590	29.97
Y 37.3937	109.61	0.2165	2.40496	10.03
X 39.8065	109.97	0.3031	2.26458	10.06
Y 42.9495	272.27	0.4330	2.10586	24.91
X 47.1639	263.14	0.2381	1.92705	24.07
CaF2 47.8144	104.83	0.1732	1.90234	9.59
X 48.0882	90.13	0.3464	1.89215	8.24
X 51.4329	21.62	0.6927	1.77669	1.98
X 53.1839	95.20	0.2598	1.72225	8.71
Y 54.2330	105.76	0.2598	1.69139	9.68
CaF2 55.8995	80.81	0.1732	1.64485	7.39
Y 58.2038	53.48	0.2598	1.58510	4.89
Y 60.9230	31.01	0.2598	1.52071	2.84
X 63.4275	54.12	0.6061	1.46656	4.95
CaF2 68.7124	26.36	0.4224	1.36496	2.41

TABLE 5.12.2
		FWHM
Pos. [°2Th.]	Height [cts]	[°2Th.]	d-spacing [Å]	Rel. Int. [%]
15.5985	40.81	0.1299	5.68107	2.34
17.5367	177.21	0.1082	5.05732	10.16
23.3979	99.97	0.1082	3.80204	5.73
24.8981	123.18	0.2165	3.57625	7.06
26.5567	27.17	0.5196	3.35654	1.56
28.0843	158.50	0.0325	3.17734	9.09
28.8933	359.19	0.0974	3.09019	20.60
29.3501	1540.63	0.0660	3.04062	88.34
29.4006	1743.95	0.0433	3.03802	100.00
29.6670	626.50	0.1082	3.01134	35.92
31.3455	918.24	0.0758	2.85381	52.65
35.3783	844.95	0.0974	2.53721	48.45
36.4954	710.20	0.0866	2.46207	40.72
36.7261	985.15	0.1299	2.44713	56.49
38.4075	43.66	0.1732	2.34379	2.50
39.8011	290.42	0.1299	2.26487	16.65
42.8332	73.55	0.2598	2.11131	4.22
46.2683	122.18	0.2598	1.96224	7.01
47.7691	316.46	0.1299	1.90404	18.15
48.1576	199.11	0.1299	1.88959	11.42
48.7914	68.65	0.1299	1.86651	3.94
51.3864	36.92	0.6927	1.77819	2.12
53.1696	153.70	0.3031	1.72268	8.81
54.3855	72.83	0.4330	1.68701	4.18
54.8541	100.27	0.1299	1.67370	5.75
57.5120	39.39	0.3464	1.60251	2.26
58.1605	89.36	0.3031	1.58618	5.12
59.8088	33.81	0.3464	1.54635	1.94
60.8554	73.32	0.2165	1.52223	4.20
62.1974	28.45	0.2598	1.49258	1.63
63.7003	56.77	0.3031	1.46094	3.26
65.4523	51.25	0.3464	1.42601	2.94
66.7273	39.38	0.3464	1.40183	2.26
67.6556	48.24	0.4224	1.38369	2.77

TABLE 5.12.3
		FWHM
Pos. [°2Th.]	Height [cts]	[°2Th.]	d-spacing [Å]	Rel. Int. [%]
21.2490	76.30	0.2598	4.18143	12.32
29.5875	473.30	0.3464	3.01925	76.40
30.7329	619.48	0.3897	2.90929	100.00
35.9522	41.32	0.6927	2.49801	6.67
37.5864	65.52	0.3464	2.39308	10.58
43.1662	208.62	0.2598	2.09579	33.68
63.7377	27.33	0.7392	1.45896	4.41

Fluorspar (CaF₂) (1 equiv.) was milled with K₂HPO₄ (2.5 equiv.) at 35 Hz for 9 hours total to form a “reagent” as seen in Scheme 5.12.3. This reagent (“Fluoromix”) was washed with H₂O resulting in a water insoluble solid (84.5 mg from 500 mg of reagent, 17% yield). The resulting insoluble solid was examined via PXRD. FIG. 31 shows this PXRD with peaks labelled showing formation of Ca₅(PO₄)₃F or Ca₅(PO₄)₃OH (diamonds) and CaF₂ (circles). The PXRD data can also be found in Table 5.12.4.

TABLE 5.12.4
		FWHM
Pos. [°2Th.]	Height [cts]	[°2Th.]	d-spacing [Å]	Rel. Int. [%]
25.9666	64.58	0.2165	3.43147	5.97
26.7534	64.57	0.1299	3.33231	5.97
CaF2 28.4315	1080.91	0.2598	3.13933	100.00
31.9708	174.80	0.1515	2.79941	16.17
32.3361	113.01	0.1299	2.76862	10.45
33.1708	97.67	0.2598	2.70084	9.04
34.1856	47.24	0.1732	2.62295	4.37
40.1111	44.33	0.2598	2.24808	4.10
42.3659	13.44	0.5196	2.13351	1.24
CaF2 47.0602	1011.70	0.1584	1.92946	93.60
47.1777	927.10	0.1515	1.92652	85.77
49.6779	42.95	0.2598	1.83526	3.97
50.8430	17.12	0.2598	1.79591	1.58
52.3671	13.80	0.2598	1.74717	1.28
53.3150	27.45	0.3464	1.71832	2.54
CaF2 55.8298	292.84	0.1948	1.64674	27.09
64.2404	13.33	0.5196	1.44996	1.23
CaF2 68.7885	84.35	0.5280	1.36364	7.80

In another instance, Fluorspar (CaF₂) was milled with equimolar CaHPO₄ to produce Z as seen in Scheme 5.12.4. This milling was completed at 30 Hz for 3 hours; FIG. 32A shows PXRD of Z as well as the water insoluble solid resulting from the reaction forming Z. FIG. 32B shows the PXRD of Z with crystalline phases of Ca₅(PO₄)₃F and CaF₂ highlighted. The PXRD data of Z can be found in Table 5.12.5. The milling of CaF₂ with equimolar anhydrous CaHPO₄ produces Z consistent Ca₅(PO₄)₃F (or Ca₅(PO₄)₃₀H) and CaF₂.

TABLE 5.12.5
		FWHM
Pos. [°2Th.]	Height [cts]	[°2Th.]	d-spacing [Å]	Rel. Int. [%]
10.8159	22.19	0.3464	8.18003	1.71
16.9988	27.36	0.3464	5.21612	2.11
21.9471	44.50	0.2598	4.04997	3.43
22.9223	87.66	0.3031	3.87984	6.76
25.9108	464.01	0.1515	3.43873	35.79
26.7231	164.61	0.1299	3.33602	12.70
CaF2 28.3972	1296.45	0.2165	3.14305	100.00
29.1216	365.28	0.1732	3.06649	28.18
31.9522	1014.39	0.1515	2.80100	78.24
32.3833	548.05	0.1948	2.76469	42.27
33.1624	541.34	0.0866	2.70150	41.76
34.1845	268.43	0.2598	2.62303	20.71
35.6375	53.32	0.1732	2.51934	4.11
39.3033	78.45	0.1732	2.29241	6.05
40.0474	226.94	0.1515	2.25151	17.50
42.2195	64.59	0.3031	2.14056	4.98
43.9611	61.89	0.2598	2.05972	4.77
45.4737	106.84	0.2598	1.99467	8.24
CaF2 46.9114	1075.26	0.1515	1.93683	82.94
49.6178	342.27	0.3031	1.83734	26.40
50.7543	131.19	0.2165	1.79884	10.12
51.5785	118.41	0.2598	1.77201	9.13
52.3593	105.86	0.2598	1.74741	8.17
53.2237	143.52	0.1732	1.72106	11.07
CaF2 55.7559	291.37	0.4330	1.64875	22.47
60.1404	30.48	0.3464	1.53861	2.35
61.8997	32.01	0.3897	1.49904	2.47
63.2828	70.58	0.3464	1.46957	5.44
64.2073	72.79	0.6061	1.45062	5.61
65.5460	30.47	0.5196	1.42420	2.35
CaF2 68.7224	84.83	0.6336	1.36479	6.54

5.13. Polyfluorination using Fluorspar Activated with K₂HPO₄

Gem-Difluorination was tested using fluorspar and K₂HPO₄ as an activating agent as described in Scheme 5.13.1.

Briefly, the substrate was reacted with 2 equiv. of {(CaF₂)(K₂HPO₄)_2.5} which was obtained via milling at 35 Hz and 1 equivalent of 18-C-6 in 0.25 M solvent (described in Table 5.13.1) and reacted at 100° C. for 15 hours in a sealed tube. The yields of fluorinated products and side products can be seen in Table 5.13.1. The results indicate that difluorination may be achieved from dihalogenated starting materials using the fluorinating agents described herein, with low yields of monofluorinated product.

TABLE 5.13.1
Entry	Solvent	ArOCHCl2[a]	ArOCHClF[b]	ArOCHF2[b]	ArOCHO[a]
1	AcOH	n.d.	0%	0%	65%
2	DMSO	n.d.	0%	0%	<1%
3	tAmOH	n.d.	0%	18%	<1%
4	PhCl	n.d.	11%	19%	<1%
5[c]	PhCl	n.d.	9%	17%	<1%
6	MeCN	n.d.	4%	30%	0%
[a]quantified by 1H-NMR;
[b]quantified by 19F-NMR;
[c]entry from previous screening (30 Hz ball milling);
n.d. = not determined due to overlapping signal

In some instances, the gem-difluorination was tested as described in Scheme 5.13.2.

Briefly, the substrate was reacted with 2 equiv. of {(CaF₂)(K₂HPO₄)_2.5} which was obtained via milling at 35 Hz and 1 equivalent of an additive (see Table 5.13.2), HBD, and reacted in a solvent (0.25 M) at 100° C. for 15 hours in a sealed tube. The yields of fluorinated product and side products as determined from NMR can be seen in Table 5.13.2. Similarly to above, the results indicate that difluorination may be achieved from dihalogenated starting materials using the fluorinating agents described herein, with low yields of monofluorinated product.

TABLE 5.13.2
Entry	Additive	HBD	ArOCHCl2[a]	ArOCHClF[b]	ArOCHF2[b]	ArOCHO[a]
1	1 eq. 18-C-6	—	n.d.	18%	36%	0%
2[c]	1 eq. 18-C-6	—	n.d.	13%	32%	0%
3[d]	1 eq. 18-C-6	—	n.d.	8%	24%	0%
4	1 eq.	—	n.d.	5%	21%	0%
	[2.2.2]Cryptand
5	1 eq. 18-C-6	1 eq.	n.d.	1%	5%	n.d.
		Schreiner's
		urea[e]
6	1 eq. 18-C-6	0.2 eq.	n.d.	9%	34%	n.d.
		Science cat.[e]

5.14. Mechanistic Understanding of Mechanochemical Activation of Fluorspar with K₂HPO₄

Fluorspar (CaF₂) is ball milled with anhydrous K₂HPO₄ to afford a fluorinating reagent (Fluoromix) (Scheme 5.14.1) which is comprised of crystalline phases (X, Y) and residual crystalline CaF₂. Powder X-Ray Diffraction (PXRD) patterns of species X and Y match the reflection (peaks) positions and peak intensities observed in Fluoromix. Calcium hydrogen phosphate (CaHPO₄) and potassium fluoride (KF) may be products of the reaction between CaF₂ and K₂HPO₄. X is the product of ball milled KF with K₂HPO₄, and X has the proposed structure K₃(HPO₄)F and is isostructural to K₃(PO₃F)F. Y has the proposed structure K_2-xCa_y(PO₃)F_a(PO₄)_bF_c and is isostructural to K₂PO₃F. The formation of X and Y from ball milling fluorspar and K₂HPO₄ may indirectly support the formation of KF and CaHPO₄ as intermediates in this reaction en route to X and Y. A PXRD diffractogram of the water insoluble component of fluoromix was measured and contains reflections that are consistent with CaF₂ and Ca₅(PO₄)₃F (fluorapatite) as a mixture (mixture Z). Z may be independently prepared by ball milling CaHPO₄ with CaF₂.

Table 5.14.1 shows the PXRD data of starting material, Fluorspar (CaF₂). Table 5.14.2 and FIG. 33 show PXRD data of X, consistent with K₃(HPO₄)F (related structure to K₃(PO₃F)F). Table 5.14.3 and FIG. 34 show PXRD data of Y, consistent with K_2-xCa_y(PO₃F)_a(PO₄)_bF_c (related to K₂PO₃F). Table 5.14.4 shows PXRD data of Z, consistent with Ca₅(PO₄)₃F and unreacted CaF₂.

TABLE 5.14.1
Pos. [°2Th.]	d-spacing [Å]	Rel. Int. [%]
28.2976	3.15126	100.00
47.0169	1.93113	66.30
55.8035	1.64609	18.60
68.6839	1.36546	5.08

TABLE 5.14.2
Pos. [°2Th.] Rel. Int. [%]
15.5985      2.34
17.5367      10.16
23.3979      5.73
24.8981      7.06
26.5567      1.56
28.0843      9.09
28.8933      20.60
29.3501      88.34
29.4006      100.00
29.6670      35.92
31.3455      52.65
35.3783      48.45
36.4954      40.72
36.7261      56.49
38.4075      2.50

TABLE 5.14.3
Pos. [°2Th.] Rel. Int. [%]
21.2490      12.32
29.5875      76.40
30.7329      100.00
35.9522      6.67
37.5864      10.58
43.1662      33.68
63.7377      4.41

TABLE 5.14.4
Pos. [°2Th.] Rel. Int. [%]
22.0434      3.25
26.0518      38.31
28.3091      44.28
29.2225      29.05
32.0450      100.00
33.1785      47.59
34.2570      23.21
40.1975      18.16
42.3548      3.49
43.9319      3.24
46.9721      35.95
48.4374      11.16
49.6795      27.56
50.9224      11.78
53.3052      12.49
56.2117      7.20
61.9102      2.77
64.2938      4.97

Each crystalline species of the Fluoromix (X or Y) was prepared independently and tested in the fluorination of tosyl chloride (TsCl). X or Y can be used to convert S(VI)—Cl bonds into an S(VI)—F bond whilst CaF₂ or Z (“apatite structure” consistent with Ca₅(PO₄)₃F) do not afford any fluorinated product. The fluorination using X or Y was carried out as described in Scheme 5.14.3, X or Y (1 equiv. with respect to fluoride) was reacted in a tBuOH solution with the TsCl (1 equiv.) with H₂O at 100° C. for 5 hours to afford the fluorinated product. The resulting yields when Fluoromix was used, or when X or Y were used independently are seen in FIG. 35 for fluorinated product yield TsF and starting material yield TsCl. Fluoromix and X (ball milled KF with K₂HPO₄) afford toslyl fluoride (TsF) in high yield. Fluorination yield is decreased when Y (ball milled KF, K₂HPO₄ and CaHPO₄) is used, indicative of reduced fluorinating ability when CaHPO₄ is incorporated into product X, which may be ameliorated through the addition of water (2 equiv.).

6. Alternative Activators of Fluorspar (CaF₂)

6.1. Formation of KCaF₃ and NaF using Hydroxide Activators

Hydroxide activators (KOH and NaOH) were probed as alternative activators as described in Schemes 6.1.1 and 6.1.2. Briefly, Fluorspar (CaF₂, 1 equiv.) was added to a stainless steel jar with KOH (1 equiv.) and milled for 3 hours at 35 Hz. Based on PXRD data, this reaction resulted in the formation of KCaF₃ and Ca(OH)₂. Alternatively, Fluorspar (CaF₂, 1 equiv.) was milled with NaOH (2 equiv.) for 6 hours at 35 Hz. As determined by PXRD, this reaction led to the formation of NaF and Ca(OH)₂. FIG. 36 shows the PXRD of products from the reaction shown in Scheme 6.1.2 between Fluorspar and NaOH.

6.2. Fluorination of TsCl Using Hydroxide Activators

Fluorspar (1 equiv.) was milled with KOH (2 equiv.) at 35 Hz for 3 hours as depicted in Scheme 6.2.1 to form Ca(OH)₂, KCaF₃, and residual CaF₂ (A). This mixture was milled with dry ice (10 equiv.) at 20 Hz for 60 seconds to form (B) consisting of KHCO₃, KCaF₃, and CaF₃. The mixture (A) was also heated at 520° C. for 1 hour to form (C), CaO, KCaF₃, and CaF₂. These mixtures (2 equiv.) were reacted in solution with TsCl (1 equiv., 0.125 mmol) according to scheme 6.2.1 in acetonitrile (anhydrous) at 100° C. for 3 hours to form the fluorinated product. In some case, an additive such as Schreiner's Urea or 18-crown-6 was added (see Table 6.2). Fluorination of TsCl using either the treated or untreated KCaF₃/Ca(OH)₂ mixture was achieved. The results indicate that using hydroxide activators with Fluorspar, fluorination can occur. Exemplary conditions include the addition of additives such as crown ethers or Schreiner's urea.

TABLE 6.2
	Mixture
Entry	(2 eq)	Additive (1 eq)	TsF (%)	TsCl (%)	TsOH (%)
1	A	—	0	0	100
2	B	—	12	37	51
3	C	—	11	36	53
4	A	18-crown-6	17	0	70
5	B	18-crown-6	17	0	70
6	C	18-crown-6	36	34	30
7	A	Schreiner's urea	31	52	17

6.3. Fluorination of TsCl using Alternative non-Phosphate Activators

Alternative non-phosphate activators were investigated and fluorination of TsCl was investigated via Scheme 6.3.1. Fluorspar (CaF₂, 1 equiv.) was milled with the activator (1.0 or 2.0 equiv., see FIG. 37) for 3 hours at 35 Hz to form A. A was used as the fluorinating reagent with TsCl in a tBuOH (0.25 M) solution and reacted at 100° C. for 5 hours to from a fluorinated product. The NMR yields of the reactions using various activators are shown in FIG. 37. The reaction using sodium sulfite (Na₂SO₃) as an activator resulted in an itractable mixture of products in the solution phase. The non-phosphate activators included K₂CO₃, KHCO₃, K₂SO₄, KHSO₄, Cs₂SO₄, K₂S₂O₇, Na₂SO₃, KNO₃, and sodium citrate dihydrate. The fluorination yields indicate that exemplary non-phosphate activators may include Na₂SO₃ and sodium citrate dihydrate. The resulting activated fluorspar reagent (A) was analyzed with PXRD.

FIG. 38 shows the PXRD pattern resulting from milling of Fluorspar with K₂CO₃ at 35 Hz for 3 hours. Table 6.3.1 shows the PXRD data from the milling of Fluorspar with K₂CO₃ represented in FIG. 38. Labels in FIG. 38 indicates a crystalline phase of K₂CO₃ and CaF₂.

TABLE 6.3.1
		FWHM
Pos. [°2Th.]	Height [cts]	[°2Th.]	d-spacing [Å]	Rel. Int. [%]
12.9106	144.72	0.0866	6.85716	24.98
25.8539	101.94	0.1299	3.44616	17.59
26.6959	31.71	0.1299	3.33935	5.47
26.9959	49.07	0.1515	3.30292	8.47
28.3703	579.44	0.1515	3.14597	100.00
29.7826	196.84	0.1299	2.99991	33.97
30.8164	76.76	0.1082	2.90160	13.25
32.2202	235.71	0.0758	2.77831	40.68
32.4335	324.62	0.0758	2.76053	56.02
32.7123	347.33	0.0649	2.73764	59.94
35.2790	40.41	0.1299	2.54412	6.97
38.7430	65.59	0.2165	2.32425	11.32
39.1613	57.38	0.2165	2.30039	9.90
39.8516	57.63	0.2165	2.26212	9.95
40.5478	39.16	0.1299	2.22488	6.76
41.4026	122.91	0.0866	2.18089	21.21
47.0989	443.53	0.1082	1.92956	76.55
49.4343	20.97	0.2598	1.84373	3.62
50.9012	18.98	0.2598	1.79399	3.28
51.3471	15.41	0.6927	1.77946	2.66
53.7815	18.31	0.2598	1.70452	3.16
55.8616	121.34	0.2598	1.64588	20.94
68.7508	30.46	0.4224	1.36430	5.26

FIG. 39 shows the PXRD pattern resulting from milling of Fluorspar with KHCO₃ at 35 Hz for 3 hours. Table 6.3.2 shows the PXRD data from the milling of Fluorspar with KHCO₃ represented in FIG. 39. Labels in FIG. 39 indicates a crystalline phase of KHCO₃ and CaF₂.

TABLE 6.3.2
		FWHM
Pos. [°2Th.]	Height [cts]	[°2Th.]	d-spacing [Å]	Rel. Int. [%]
12.2501	123.64	0.1299	7.22535	27.19
24.4342	359.63	0.1732	3.64308	79.09
28.4554	435.01	0.2165	3.13675	95.67
28.9876	115.83	0.1299	3.08036	25.47
30.2433	454.69	0.0758	2.95526	100.00
31.4423	373.37	0.1948	2.84525	82.11
31.6259	389.58	0.1299	2.82915	85.68
31.9991	116.90	0.1299	2.79700	25.71
34.2459	130.85	0.1082	2.61846	28.78
38.0312	76.88	0.1732	2.36610	16.91
39.4041	196.56	0.1948	2.28677	43.23
40.8305	89.69	0.1732	2.21012	19.72
44.6882	80.08	0.1732	2.02789	17.61
47.1870	351.72	0.2381	1.92616	77.35
49.8903	69.65	0.2165	1.82795	15.32
50.9410	47.90	0.3464	1.79268	10.54
52.5013	55.63	0.2598	1.74302	12.23
56.0264	96.82	0.3031	1.64143	21.29
60.9589	15.94	0.6927	1.51990	3.51
65.6349	9.80	0.5196	1.42249	2.16
68.8465	32.51	0.4224	1.36263	7.15

FIG. 40 shows the PXRD pattern resulting from milling of Fluorspar with K₂SO₄ at 35 Hz for 3 hours. Table 6.3.3 shows the PXRD data from the milling of Fluorspar with K₂SO₄ represented in FIG. 40. Labels in FIG. 40 indicates a crystalline phase of K₂SO₄ and CaF₂.

TABLE 6.3.3
		FWHM
Pos. [°2Th.]	Height [cts]	[°2Th.]	d-spacing [Å]	Rel. Int. [%]
5.1556	100.92	0.5196	17.14099	11.33
17.7779	36.96	0.2598	4.98925	4.15
21.4518	292.38	0.1948	4.14236	32.83
23.8955	141.47	0.1299	3.72398	15.88
25.5175	46.92	0.1732	3.49084	5.27
26.4249	109.07	0.1299	3.37299	12.25
28.4008	706.53	0.2381	3.14265	79.33
29.2377	76.72	0.1299	3.05458	8.61
29.8670	833.06	0.0792	2.98916	93.54
29.9401	809.94	0.0528	2.98943	90.94
30.8750	890.60	0.1056	2.89383	100.00
31.1020	655.56	0.1584	2.87322	73.61
33.7120	49.11	0.1848	2.65650	5.51
34.5815	14.87	0.3168	2.59168	1.67
35.7248	83.91	0.1584	2.51131	9.42
36.0391	128.92	0.1848	2.49013	14.48
37.2299	267.29	0.1056	2.41317	30.01
37.9967	105.23	0.2112	2.36621	11.82
40.5344	186.48	0.1320	2.22374	20.94
40.9781	123.32	0.1320	2.20068	13.85
43.1380	77.39	0.1584	2.09536	8.69
43.5430	254.60	0.1584	2.07680	28.59
45.4011	59.57	0.2112	1.99603	6.69
47.0925	613.94	0.2112	1.92821	68.94
48.2283	114.70	0.1056	1.88542	12.88
48.8066	52.18	0.2112	1.86442	5.86
49.2157	47.15	0.2640	1.84988	5.29
51.6379	21.04	0.4224	1.76865	2.36
53.6603	17.56	0.3168	1.70667	1.97
54.1987	54.01	0.1584	1.69098	6.06
55.0831	70.70	0.1584	1.66590	7.94
55.7987	159.66	0.1584	1.64622	17.93
58.8748	48.50	0.3696	1.56733	5.45
62.8418	18.13	0.4224	1.47759	2.04
64.2204	50.41	0.2640	1.44916	5.66
64.6329	57.18	0.1056	1.44090	6.42
65.1681	35.16	0.3168	1.43036	3.95
68.7906	49.87	0.4224	1.36360	5.60
69.4698	51.79	0.1584	1.35192	5.82

FIG. 41 shows the PXRD pattern resulting from milling of Fluorspar with KHSO₄ at 35 Hz for 3 hours. Table 6.3.4 shows the PXRD data from the milling of Fluorspar with KHSO₄ represented in FIG. 41. Labels in FIG. 41 indicates a crystalline phase of KHSO₄, K₂Ca(SO₄)₂H₂O₂ (syngenite), and CaF₂.

TABLE 6.3.4
		FWHM		Rel.
Pos. [°2Th.]	Height [cts]	[°2Th.]	d-spacing [Å]	Int. [%]
9.4797	62.07	0.1732	9.32980	10.47
Syngenite 15.6743	57.87	0.1299	5.65376	9.76
18.2434	113.03	0.1732	4.86298	19.06
18.8952	64.59	0.1732	4.69668	10.89
Syngenite 19.4234	42.96	0.1515	4.57012	7.24
19.9139	83.23	0.1515	4.45866	14.03
20.5445	43.12	0.1299	4.32320	7.27
21.6718	30.63	0.1732	4.10080	5.17
23.3210	593.11	0.0541	3.81439	100.00
25.4818	325.95	0.1948	3.49564	54.96
Syngenite 26.3384	453.30	0.1515	3.38386	76.43
26.7634	121.85	0.1299	3.33109	20.54
27.5127	464.84	0.0866	3.24204	78.37
28.4297	569.90	0.1948	3.13953	96.09
29.6910	393.27	0.1515	3.00896	66.31
Syngenite 30.6219	98.75	0.2598	2.91958	16.65
31.5012	126.68	0.1299	2.84006	21.36
31.8374	218.30	0.1948	2.81084	36.81
32.7922	180.11	0.1732	2.73115	30.37
33.6933	46.12	0.1515	2.66014	7.78
34.9230	58.91	0.1299	2.56924	9.93
35.8691	45.63	0.1299	2.50361	7.69
36.4744	33.67	0.1732	2.46344	5.68
36.8389	48.58	0.1732	2.43990	8.19
37.3834	75.15	0.1948	2.40560	12.67
38.0312	189.76	0.1082	2.36610	31.99
38.6991	85.51	0.1515	2.32679	14.42
39.8702	103.10	0.2165	2.26111	17.38
41.9603	48.09	0.1299	2.15319	8.11
42.8908	55.71	0.1299	2.10861	9.39
45.0074	102.01	0.2598	2.01424	17.20
47.2173	385.29	0.1948	1.92500	64.96
48.1065	74.23	0.2165	1.89147	12.52
49.2473	55.11	0.1732	1.85030	9.29
51.7741	33.44	0.2598	1.76578	5.64
52.9853	18.43	0.4330	1.72824	3.11
55.5297	67.74	0.3464	1.65493	11.42
56.0099	72.11	0.3464	1.64187	12.16
59.4932	19.67	0.2598	1.55379	3.32
61.0679	11.65	0.3464	1.51745	1.96
62.0966	12.94	0.2598	1.49476	2.18
64.3255	26.65	0.2598	1.44824	4.49
66.4721	11.96	0.6061	1.40659	2.02
67.5187	17.00	0.2598	1.38731	2.87
68.5917	21.96	0.7392	1.36707	3.70

FIG. 42 shows the PXRD pattern resulting from milling of Fluorspar with K₂S₂O₇ at 35 Hz for 3 hours. Table 6.3.5 shows the PXRD data from the milling of Fluorspar with K₂S₂O₇ represented in FIG. 42. Labels in FIG. 42 indicates a crystalline phase of K₂S₂O₇ and CaF₂.

TABLE 6.3.5
		FWHM
Pos. [°2Th.]	Height [cts]	[°2Th.]	d-spacing [Å]	Rel. Int. [%]
18.6759	158.99	0.1515	4.75132	19.51
24.5269	213.14	0.1515	3.62953	26.15
24.9651	223.94	0.2598	3.56681	27.48
25.8936	81.49	0.4330	3.44098	10.00
27.6051	292.05	0.2598	3.23141	35.83
28.1502	512.13	0.1299	3.17005	62.83
28.4887	815.05	0.1082	3.13315	100.00
29.6651	116.36	0.2165	3.01153	14.28
30.8497	134.66	0.2165	2.89854	16.52
34.5076	53.64	0.2165	2.59921	6.58
36.1930	16.57	0.5196	2.48194	2.03
37.8307	47.81	0.8659	2.37818	5.87
39.8507	39.48	0.6927	2.26217	4.84
41.3817	17.93	0.5196	2.18195	2.20
43.2539	26.00	0.5196	2.09174	3.19
44.9790	24.93	0.6927	2.01545	3.06
47.1481	476.17	0.1948	1.92766	58.42
55.9592	126.70	0.4330	1.64324	15.54
58.2197	8.73	0.6927	1.58471	1.07
68.7851	52.76	0.4224	1.36370	6.47

FIG. 43 shows the PXRD pattern resulting from milling of Fluorspar with Na₂SO₃ at 35 Hz for 3 hours. Table 6.3.6 shows the PXRD data from the milling of Fluorspar with Na₂SO₃ represented in FIG. 43. Labels in FIG. 43 indicates a crystalline phase of Na₂SO₃, CaF₂, and an unidentified amorphous phase.

TABLE 6.3.6
		FWHM
Pos. [°2Th.]	Height [cts]	[°2Th.]	d-spacing [Å]	Rel. Int. [%]
23.8355	155.83	0.1732	3.73321	21.77
28.1608	715.75	0.0433	3.16889	100.00
28.4753	622.31	0.1948	3.13460	86.95
32.9735	156.27	0.2165	2.71654	21.83
34.8502	131.51	0.2598	2.57444	18.37
41.0281	13.76	0.8659	2.19993	1.92
47.1164	387.85	0.1082	1.92888	54.19
48.6067	69.26	0.3464	1.87317	9.68
55.9232	109.79	0.3031	1.64421	15.34
59.8245	19.50	0.6927	1.54598	2.72
68.8731	43.89	0.4224	1.36217	6.13

FIG. 44 shows the PXRD pattern resulting from milling of Fluorspar with KNO₃ at 35 Hz for 3 hours. Table 6.3.7 shows the PXRD data from the milling of Fluorspar with KNO₃ represented in FIG. 44. Labels in FIG. 44 indicates a crystalline phase of KNO₃ and CaF₂.

TABLE 6.3.7
		FWHM
Pos. [°2Th.]	Height [cts]	[°2Th.]	d-spacing [Å]	Rel. Int. [%]
19.0933	166.39	0.1515	4.64838	22.78
23.6201	730.32	0.0758	3.76677	100.00
23.8949	426.50	0.1515	3.72408	58.40
28.3673	462.76	0.1732	3.14629	63.36
29.5161	370.32	0.1948	3.02640	50.71
32.4746	143.69	0.1948	2.75712	19.68
33.1816	102.66	0.1299	2.69998	14.06
33.9155	403.95	0.0866	2.64321	55.31
37.4570	21.26	0.2598	2.40105	2.91
38.6730	61.71	0.1732	2.32830	8.45
41.2213	299.90	0.1082	2.19006	41.07
41.8893	124.68	0.2165	2.15667	17.07
44.1951	129.97	0.1082	2.04936	17.80
46.7107	259.71	0.2598	1.94468	35.56
47.0655	348.31	0.3897	1.93085	47.69
51.8589	16.72	0.3464	1.76309	2.29
55.8970	78.75	0.6061	1.64492	10.78
58.3619	15.97	0.2598	1.58118	2.19
61.0249	22.10	0.5196	1.51841	3.03
66.9806	17.43	0.2598	1.39714	2.39
68.9193	53.99	0.3696	1.36137	7.39

FIG. 45 shows the PXRD pattern resulting from milling of Fluorspar with KOH at 35 Hz for 3 hours. Table 6.3.8 shows the PXRD data from the milling of Fluorspar with KOH represented in FIG. 45. Labels in FIG. 45 indicates a crystalline phase of Ca(OH)₂, KCaF₂, and CaF₂.

TABLE 6.3.8
		FWHM		Rel.
Pos. [°2Th.]	Height [cts]	[°2Th.]	d-spacing [Å]	Int. [%]
Ca(OH)2 18.3059	55.74	0.3031	4.84651	11.78
KCaF3 20.4243	53.12	0.2165	4.34838	11.22
26.8143	11.39	0.2598	3.32487	2.41
CaF2 28.3800	144.77	0.1732	3.14491	30.58
KCaF3 28.9043	473.34	0.2165	3.08905	100.00
KCaF3 32.4309	19.70	0.3464	2.76074	4.16
Ca(OH)2 34.1756	142.38	0.3897	2.62369	30.08
KCaF3 35.6082	66.30	0.3464	2.52135	14.01
KCaF3 38.5478	17.24	0.2598	2.33558	3.64
KCaF3 41.3008	308.88	0.1299	2.18604	65.26
Ca(OH)2 47.2316	123.86	0.4330	1.92445	26.17
KCaF3 51.1272	175.11	0.3897	1.78659	36.99
Ca(OH)2 54.5376	32.39	0.4330	1.68266	6.84
CaF2 55.7686	27.72	0.3031	1.64840	5.86
KCaF3 59.7330	68.83	0.4330	1.54813	14.54
Ca(OH)2 62.8171	18.65	0.3464	1.47934	3.94
CaF2 67.6726	26.77	0.6336	1.38338	5.65

FIG. 46 shows the PXRD pattern resulting from milling of Fluorspar with NaOH at 35 Hz for 3 hours. Table 6.3.9 shows the PXRD data from the milling of Fluorspar with NaOH represented in FIG. 46. Labels in FIG. 46 indicates a crystalline phase of Ca(OH)₂, NaF, CaF₂, and an unidentified amorphous material.

TABLE 6.3.9
		FWHM		Rel.
Pos. [°2Th.]	Height [cts]	[°2Th.]	d-spacing[Å]	Int. [%]
Ca(OH)2 18.0813	122.86	0.6061	4.90620	13.13
Ca(OH)2 28.0362	493.55	0.0325	3.18268	52.73
CaF2 28.2772	936.03	0.2165	3.15610	100.00
Ca(OH)2 34.2959	199.53	0.3464	2.61477	21.32
NaF 38.4222	319.14	0.4763	2.34292	34.09
CaF2 47.0805	700.67	0.1732	1.93027	74.86
Ca(OH)2 50.9401	63.28	0.3464	1.79271	6.76
NaF 55.8343	213.37	0.3031	1.64662	22.80
CaF2 68.7807	53.36	0.5280	1.36378	5.70

7. Fluorination Using Fluorapatite

7.1. S—F Bond Formation using Fluorapatite in the Solid State

In some instances, fluorapatite was used in combination with K₃PO₄ to fluorinate TsCl in the solid state via ball milling as described in Scheme 7.1.1, the results of which can be found in Table 7.1. Briefly, fluorapatite (Ca₅(PO₄)₃F, 5 equiv.) and K₃PO₄ in varying ratios were milled at 30 Hz for 1 hour in 15 mL stainless steel jars using a 7 g ball. TsCl was added and milled for 1 hour longer at 30 Hz to obtain a fluorinated product (see Table 7.1 for yields). The grains of fluorapatite used were approximately 0.06-0.19 inches. The solid state reactions resulted in yields of organo-fluorine product (TsF) of 5% or less.

TABLE 7.1
	Ca5(PO4)3F/K3PO4	Ca5(PO4)3F			Mass
Entry	ratio	(equiv)	TsF	TsCl	Balance
1	2.5:1	5	5%	trace	5%
2	10:1	5	<1%	35%	<36%
0.25 mmol scale; 19F NMR yields (4-fluoroanisole) in CDCl3

7.2. S—F Bond Formation Using Fluorapatite in the Solid State and Solution State

Fluorapatite (Ca₅(PO₄)₃F) (approximately 0.06-0.19 in) was used in combination with K₂HPO₄ as described in Scheme 7.2.1 to create a fluorination reagent via ball milling under varying conditions as seen in Table 7.2. Specifically, fluorapatite (4 equiv.) was milled with K₂HPO₄ (20 equiv.) for 3 hours at varying frequencies, jar loading (mg/mL), and jar sizes (mL). The resulting powder reagent was reacted with p-TolSO₂—Cl (TsCl) (1 equiv.) in a tBuOH (0.25 M) solution at 100° C. for 5 hours resulting in a fluorinated product, TsF. The yield of the fluorinated product and starting material, TsCl can be found in Table 7.2. The results indicate that jar loading may affect ball milling/fluorination yield and higher frequencies may be beneficial to yield. The results also highlight that, the solution reaction of the fluorapatite-K₂HPO₄ fluorination reagent with the TsCl can result in higher fluorinated product (TsF) yields than seen in the solid state reaction of Example 7.1.

TABLE 7.2
		Jar	Jar	Powder
	Frequency	Loading	Size	Loading
Entry	(Hz)	(mg/mL)	(mL)	(g)	TsF	TsCl
1	30	17	30	0.5	15%	0%
2	30	33	30	1	21%	0%
3	30	33	15	0.5	28%	0%
4	30	67	15	1	23%	0%
5	30	133	15	2	15%	0%
6	35	33	15	0.5	36%	0%

7.3. Activator Screening Using Fluorapatite

Various activators were used in combination with fluorapatite to test their efficacy in forming a fluorinating reagent. The resulting fluorinating reagents, “Fluoromix”, were probed as fluorinating reagents via reaction with p-TolSO₂—Cl (TsCl) and yields of TsF were determined via ¹⁹F NMR using 4-fluoroanisole as an internal standard. The reactions were carried out as described in Scheme 7.3.1.

Briefly, fluorapatite (1 equiv.) was milled with an activator (see Table 7.3) at 30 Hz for 3 hours in a 15 mL stainless steel jar with a 7 g ball to create Fluoromix. Fluoromix (0.2 mmol) was added to a PhCl solution (0.25 M) with p-TolSO₂—Cl (1.0 equiv., 0.05 mmol) and reacted at 100° C. for 5 hours to form the fluorinated product, TsF. The yields of TsF and the side product yields can be found in Table 7.3. Successful fluorination may be possible with exemplary activators KCl+K₂HPO₄ or potassium pyrophosphate, although the success of fluorinating the TsCl starting material may be dependent on the activator used.

TABLE 7.3
Entry	Activator	Total Mass	PO3F2−	F−	TsF	TsCl
1	KCl (9 equiv.)	1000 mg	0%	0%	0%	87%
2	K2CO3 (4.5 equiv.)	1000 mg	0%	0%	0%	0%
3	KCl (9 equiv.) + K2HPO4 (1 equiv.)	600 mg	0%	2%	9%	0%
4	K2CO3 (4.5 equiv.) + K2HPO4 (1 equiv.)	600 mg	0%	15%	0%	0%
5	K2CO3 (4.5 equiv.) + K2HPO4 (2 equiv.)	600 mg	0%	17%	0%	0%
6	KHCO3 (5 equiv.)	600 mg	0%	5%	0%	0%
7	KHCO3 (5 equiv.) + K2HPO4 (2 equiv.)	600 mg	0%	3%	trace	0%
8	KH2PO4 (5 equiv.)	500 mg	0%	1%	0%	85%
9	K3PO4 (5 equiv.)	500 mg	0%	14%
10	Potassium pyrophosphate (2.5 equiv.)	500 mg	0%	25%	4%	26%
11	Potassium triphosphate (1.67 equiv.)	500 mg	6%	3%	trace	51%

7.4. Varying Stoichiometry of Fluorapatite Fluorination

Various conditions were probed in order to examine changes in fluorination yield using fluoroapatite. This included changing the stoichiometry between fluorapatite, the phosphate activator, the TsCl, as well as changing the reaction time, as seen in Schemes 7.4.1-7.4.3.

In all conditions, the fluorapatite was milled first with the phosphate activator before being reacted in the solution phase with the TsCl (p-TolSO₂—Cl). When fluorapatite (2 equiv.) was milled with 2 equiv. of the phosphate activator followed by solution phase reaction with 0.05 mmol of TsCl as described in Scheme 7.4.1, the TsF yield was 81%. When 1.2 equiv. of fluorapatite was milled with 1.2 equiv. of phosphate activator followed by solution phase reaction with TsCl (0.05 mmol), the TsF yield was 78%. Finally, when fluorapatite (1.2 equiv.) was milled with 1.2 equiv. of phosphate followed by solution phase reaction for 10 minutes with 0.25 mmol of TsCl, the yield of TsF was 74%. The yields of the organo-fluorine product indicate that pyrophosphate activator along with 18-crown-6 may be an exemplary combination to achieve high organo-fluorination yields.

7.5. Reaction Scope of Fluorapatite Fluorination

As described in scheme 7.5.1, fluorapatite was milled with a phosphate activator to form the fluorination agent and reacted in the solution phase with a range of RSO₂—Cl substrates to form RSO₂—F (see FIG. 47). FIG. 47 shows the yields of the resulting reactions and fluorinated products which range from 12% to 79%. The reactions were carried out as follows. Fluorapatite (1.2 equiv.) was milled with the phosphate activator (1.2 equiv) at 30 Hz for 9 hours in a 30 mL stainless steel jar with 1 16 g ball. The resulting powder reagent was reacted with the RSO₂—Cl substrate (1.0 equiv., 0.25 mmol) in the solution phase in t-AmOH (0.25 M) at 100° C. for 10 minutes with 18-crown-6 and 12 equiv. of H₂O resulting in the fluorinated product. The results show that the pyrophosphate activator in addition to 18-crown-6 may be used with fluorapatite as a fluorinating reagent to fluorinate a wide variety of substrates including aliphatic and aromatic substrates.

7.6. Mechanistic Insight of Fluorapatite Mechanochemical Reaction by PXRD

The mechanism of the mechanochemical reaction between fluorapatite (Ca₅(PO₄)₃F) and K₄P₂O₇ was investigated via subsequent additions and milling as described in Scheme 7.6.1 via the formation and analysis of products A-D.

FIG. 48 shows the stacked PXRD patterns of products A, B, C, and D where circles indicate fluorapatite starting material and x indicate a new species. This data shows the consumption of crystalline fluorapatite by mechanochemical reaction with potassium pyrophosphate and a new crystalline species forming over the course of the reaction. Products C and D may be indicative of no fluorapatite starting material, whereas Ca₅(PO₄)₃F starting material is present in samples A and B.

FIG. 49 shows a PXRD pattern of pure fluorapatite after 1 hour of milling overlayed with a fluorapatite sample (1 equiv.) that was milled for 12 hours total at 35 Hz with K₄P₂O₇ (4 equiv.). The result indicates consumption of the fluorapatite by mechanochemical reaction with potassium pyrophosphate.

FIG. 50 shows a comparison of the PXRD pattern of the reaction 1:4 equiv. milling reaction (D) between fluorapatite (Ca₅(PO₄)₃F) and K₄P₂O₇, and the milling reaction between potassium fluoride (KF, 1 equiv.) and K₂HPO₄ (2 equiv., 35 Hz, 3 hours) followed by CaHPO₄ (1 equiv., 35 Hz, 3 hours) as seen in Scheme 7.6.2. The resulting patterns may indicate a similar structure of D to one of the components in the Y (Y=K_2-xCa_y (PO₃F)_a(PO₄)_bF_c). The peaks at higher degrees 2-theta value than those observed in the PXRD of the crystalline phase of Y are consistent with a closely related structure to Y with different ratios of Ca²⁺, K⁺, F⁻, or PO₄³⁻.

Product D from Scheme 7.6.1 was washed with water and separated into an H₂O insoluble component and an H₂O soluble component. FIG. 51 shows the PXRD data of the water insoluble component and is compared to a crystalline reference pattern, in this case, pure milled, Ca₅(PO₄)₃F (fluorapatite). The water insoluble product's PXRD pattern may be consistent with Ca₅(PO₄)₃F or Ca₅(PO₄)₃₀H.

7.7. Fluorapatite Activation Using Potassium Pyrophosphate

Fluorapatite activation was tested using 1 equivalent of potassium pyrophosphate (K₄P₂O₇) and the milling reaction was monitored via PXRD. The milling reaction proceeded as described in Scheme 7.7.1 wherein 1 equivalent of fluorapatite (Ca₅(PO₄)₃F was milled with 1 equivalent of K₄P₂O₇ at 30 Hz for 9 hours using a 16 g ball in a 30 mL stainless steel jar. FIG. 52 and Table 7.7.1 show the PXRD data indicating presence of crystalline phases of Ca₅(PO₄)₃F and an unidentified amorphous phase. No crystalline potassium pyrophosphate was observed by PXRD.

TABLE 7.7.1
		FWHM
Pos. [°2Th.]	Height [cts]	[°2Th.]	d-spacing [Å]	Rel. Int. [%]
25.9458	189.47	0.1732	3.43417	42.12
28.0927	147.16	0.1732	3.17642	32.71
29.0831	149.29	0.2598	3.07046	33.19
31.8944	449.86	0.1515	2.80595	100.00
33.0730	230.80	0.2165	2.70860	51.30
34.1646	94.18	0.2598	2.62451	20.94
39.9834	64.49	0.2598	2.25497	14.34
46.8705	71.79	0.2598	1.93843	15.96
48.2530	37.20	0.3464	1.88607	8.27
49.5507	96.86	0.3464	1.83967	21.53
50.7233	43.60	0.2598	1.79986	9.69
52.2369	41.11	0.2598	1.75122	9.14
53.1801	43.37	0.3464	1.72236	9.64
63.3126	19.73	0.6336	1.46773	4.39

In another instance, fluorapatite (1 equiv.) was milled with 4 equivalents of potassium pyrophosphate to consume the crystalline fluorapatite as described in Scheme 7.7.2. Briefly, the fluorapatite was milled with 1 equivalent of potassium pyrophosphate for 3 hours at 35 Hz before the addition of a second equivalent and subsequent milling for 3 hours at 35 Hz, and this was repeated until 4 total equivalents of potassium pyrophosphate had been added and milled with the fluorapatite. The resulting product was analyzed by PXRD as seen in FIG. 53 and Table 7.7.2. The PXRD was consistent with an unidentified crystalline phase which is isostructural to K_2-xCa_y(PO₃F)_a(PO₄)_bF_c.

TABLE 7.7.2
		FWHM
Pos. [°2Th.]	Height [cts]	[°2Th.]	d-spacing [Å]	Rel. Int. [%]
21.5831	92.10	0.3464	4.11746	13.29
24.1496	48.92	0.6061	3.68537	7.06
26.0036	45.04	0.2598	3.42666	6.50
28.0998	238.05	0.0433	3.17562	34.35
30.0617	479.63	0.3897	2.97270	69.20
31.2880	693.08	0.2381	2.85893	100.00
33.1727	63.32	0.3464	2.70068	9.14
36.4610	31.20	0.6061	2.46431	4.50
38.3505	58.81	0.6061	2.34714	8.48
43.7833	141.57	0.5196	2.06767	20.43
46.9843	14.31	0.6927	1.93400	2.06
59.1913	20.45	0.6927	1.56099	2.95
65.1133	39.12	0.8448	1.43143	5.64

7.8. Fluorapatite and Fluorspar Activation

Fluorapatite and Fluorspar activation with K₄P₂O₇ (4 equiv.) and K₂HPO₄ (2.5 equiv.) respectively were compared via PXRD as seen in FIG. X. The activations reactions were completed as described in Scheme 7.8.1 and 7.8.2.

8. Alternative Mechanochemical Procedures: Twin-Screw Extruder & Planetary Ball Mill

8.1. Materials and Abbreviations

Thermofisher Process 11 Twin Screw Extruder was fixed with a gravimetric single screw feeder (hopper) for programmed addition of solids. The pressurized die was not fixed to the twin-screw extruder for these experiments. Extrudite refers to the processed material that comes out the end of the extruder. CaF₂ (97% reagent grade purchased from Alfa Aesar and used as received. K₂HPO₄ (anhydrous, 98%) purchased from Acros Organics and used as received. Screw configurations are shown in each graphics and are made up of conveying “C”, kneading “K”, and reverse “R” elements. Multiple individual elements make up a “section”. Furthermore, kneading sections can be subdivided by rotation from previous element, these can be at 30°, 60° or 90°. F_R=feed rate of solids into the extruder. S_S=screw speed at which the stainless-steel screws co-rotate. S_T=screw temperature, each of the six segments can be heated to an individual temperature and these are specified if used. T_R=residence time which is measured by the first time solids fall into the twin-screw extruder to the first time solids are observed at the exit.

8.2. General Procedure for Twin-Screw Extrusion

To a 100 mL conical flask was charged CaF₂ (3.12 g, 40 mmol) and K₂HPO₄ (6.97 g, 40 mmol). The solids were loosely mixed with a spatula and then charged into the single screw feeder. At this point the relevant feed rate (F_R), screw speed (S_S), and screw temperature (S_T) were programmed on the twin-screw extruder. The extruder was turned on, followed swiftly by the hopper. A 50 mL collection beaker was placed at the exit of the screw. After observation of the first appearance of solids coming out the exit, the beaker was used to collect the first ˜200 mg. Following this the collection beakers were exchanged and the “fluoromix” extrudite collected. This was continued until amount collected slows down significantly. At this point the beaker is exchanged back again for the first beaker to collect any residual extrudite. The “fluoromix” is then weighed (usually about 7 grams). The material is decanted into a vial and kept under vacuum overnight.

8.3. Variation of Screw Temperature on Generation of Active Fluorination Material

Following the general procedure outlined above (Example 8.2), the effect of screw temperature (S_T) was investigated. FIG. 54 shows a general scheme for which CaF₂ (40 mmol) and K₂HPO₄ (40 mmol) are reacted to form the active fluorinated material. The temperature, S_T, was varied between 25° C. and 200° C. and the screw speed was 50 rpm. The residence time was 100 seconds. The resulting “fluoromix” was reacted with TsCl in the solution state in tBuOH (0.25 M) at 100° C. for 5 hours to form the fluorinated product, TsF. The screw temperatures, resulting fluorinated product, TsF, yields, and starting material yields, TsCl can be seen in Table 8.3. The results may indicate that lower screw temperatures may be helpful in achieving higher yields of organo-fluorine product (e.g., TsF) and lower yields of starting material (e.g., TsCl).

TABLE 8.3
ST (° C.)	TsF (%)	TsCl (%)
25	7	68
50	6	77
100	6	79
150	5	78
200	3	85

8.4. Variation of Screw Speed on Generation of Active Fluorination Material

Following the general procedure outlined above (Example 8.2), the effect of screw speed (S_S) on generation of active fluorination material was investigated. FIG. 55 shows a general scheme for which CaF₂ (40 mmol) and K₂HPO₄ (40 mmol) are reacted to form the active fluorinated material. The spin speed was varied between 10 rpm and 75 rpm and the residence time (T_R) was varied as shown in Table 8.4. The screw temperature was 25° C. and feed rate was 10 g/min. The resulting active fluorinated material, “Fluoromix” was reacted with TsCl in a tBuOH solution (0.25 M) at 100° C. for 5 hours to form the fluorinated product. The spin speed (S_S), residence time (T_R), product yield (TsF), and starting material yield (TsCl) can be seen in Table 8.4. The results may indicate that the screw speed and residence time may not significantly impact the resulting yield of organo-fluorine product (e.g., TsF).

	TABLE 8.4
	SS (rpm)	TR (secs)	TsF (%)	TsCl (%)
	10	torqued	—	—
	10*	420	6	68
	25	165	6	77
	75	80	6	67
	*FR = 5 g min−1

8.5. Variation of Amount of Times Recycled Through Extruder on Generation of Active Fluorination Species

Following the general procedure outlined above (Example 8.2), in this instance the solids were fed by spatula into the twin-screw extruder (without the use of a hopper), and at the end of the screwing process, the extrudite was added back into the extruder for a further number of runs (e.g., recycled). This serves to impar the same amount of mechanical force but increase the residence time. The effect of extrudite recycling was investigated via the Scheme seen in FIG. 56. FIG. 56 shows the general scheme for which CaF₂ (40 mmol) and K₂HPO₄ (40 mmol) can be reacted to form the active fluorinated species. In this instance, the feed rate is variable, the screw speed is 50 rpm, the screw temperature is 25° C., and the residence time is 100 seconds, but the resulting material is recycled back into the extruder 1, 2, or 3 times the results of which can be seen in Table 8.5. The resulting “Fluoromix” was reacted with 1 equiv. of TsCl in the solution state (0.25 M tBuOH) at 100° C. for 5 hours to form the fluorinated product. The resulting fluorinated product yield, TsF, and starting material yield, TsCl, can also be seen in Table 8.5. These results indicate that increased recycling times may result in higher yield of organo-fluorine product (e.g., TsF) and lower yields of starting material (e.g., TsCl).

TABLE 8.5
Recycled	TsF (%)	TsCl (%)
1	7	67
2	9	58
3	9	54

8.6. Extruding CaF₂ Without the Presence of K₂HPO₄

Following the general procedure outlined above (Example 8.2), in this instance, CaF₂ fed into the twin-screw extruder without the presence of K₂HPO₄. FIG. 57 shows the general scheme for which CaF₂ (40 mmol) is added into the twin-screw extruder with variable feed rates, at a screw speed of 50 rpm, a screw temperature of 25° C., and a residence time of 100 seconds. The resulting “CaF₂” that has been extruded was reacted with TsCl (1 equiv.) in a 0.25 M tBuOH solution with added K₂HPO₄ (4 equiv.) and reacted at 100° C. for 5 hours to form a fluorinated product, TsF. The result was a TsF yield of 6% and a TsCl yield of 58% when the CaF₂ was not extruded in the presence of K₂HPO₄. Under mechanical forces, and without the presence of an ionic salt in the mechanochemical process, CaF₂ may be activated to provide fluoride in the conversion of p-toluenesulfonyl chloride to p-toluenesulfonyl fluoride.

8.7. Investigations into Altering the Screw Configuration

Following the general procedure outlined above (Example 8.2), in this instance, a screw configuration (configuration 1) is outlined as seen in FIG. 58. The effect of screw configuration 1 was analyzed. FIG. 58 shows a general scheme for which CaF₂ (40 mmol) and K₂HPO₄ (40 mmol) are added to the twin-screw extruder with a feed rate of 2 g min⁻¹, a screw speed of 50 rpm, a screw temperature of 25° C., and a residence time of 40 seconds. An alternate configuration was also examined (screw configuration 2). Screw configuration 2 was “C-(30-60-90)-C-(60)-C-(60-90)-C”, whereas screw configuration 1 was “C-90-C-60-C-90-C”. The resulting “fluoromix” was reacted with TsCl (1 equiv.) in a solution of tBuOH (0.25 M) at 100° C. for 5 hours to form the resulting fluorinated product, TsF. The yield of fluorinated, TsF was 20% and yield of starting material, TsCl, was 40% upon utilization of screw configuration 1. The utilization of additional alternative screw configurations may be useful in increasing and/or tuning the yield of organo-fluorine products (e.g., TsF).

8.8. Planetary Mills

The Fritsch Pulverisette planetary mill was used. Zirconia jars (12 mL) and zirconia balls (3.4 g) were used in milling experiments. To a zirconia jar, added was charged fluorspar (312 mg, 4 mmol) and K₂HPO₄ (697 mg, 4 mmol) and either one or two 3.4 g zirconia balls. The jars were sealed and attached to the planetary mill. The mill was set to 800 rpm, 15-minute milling session, 11 repeats (12 in total), with a 2 minute gap between each one, and reverse in direction of milling after each session. After this time the material was scraped out of the vial and added to a vial which was kept under vacuum overnight before use. Scheme 8.8.1 shows a general scheme for which CaF₂ (4 equiv.) is milled via a planetary mill with 4 equiv. of K₂HPO₄. The resulting powder was reacted with TsCl (1 equiv.) in a solution of tBuOH (0.25 M) at 100° C. for 5 hours. The resulting yield when 1 ball was used in the milling was 12% TsF (72% TsCl starting material). The resulting yield when 2 balls were used in the milling was 11% TsF (76% TsCl starting material). Thus, planetary mills may be useful in creating fluorinating reagents comprising CaF₂ and an activator (e.g., K₂HPO₄)

While specific embodiments of the invention have been described herein for the purpose of reference and illustration, various modifications will be apparent to a person skilled in the art without departing from the scope of the invention as defined by the appended claims.

The project leading to this application has received funding from the European Research Council (ERC) under the European Union's Horizon 2020 research and innovation programme (grant agreement No 832994).

Claims

1. An activated fluorination reagent, the reagent comprising:

a first salt, the first salt comprising calcium and fluorine; and

a second salt, the second salt comprising an anion, which said anion when combined with Ca2+ to form a third salt has a lattice energy greater than 2450 KJ/mol;

wherein, a powder x-ray diffraction spectrum of the activated reagent comprises characteristic 2θ reflections at about 21.9°, 30.3°, 31.6°, or 43.4°.

2. The activated fluorination reagent of claim 1, wherein the first salt is CaF2 or Ca5(PO4)3F.

3. The activated fluorination reagent of claim 1, wherein the second salt is a metal hydroxide, a metal sulphite, a metal sulphate, a carbonate, or an inorganic phosphate.

4. The activated fluorination reagent of claim 3, wherein the inorganic phosphate is a pyrophosphate.

5. The activated fluorination reagent of claim 3, wherein the inorganic phosphate is K2HPO4, KH2PO4, K3PO4, K4P2O7, KPO3, K5P3O10, Na5P3O10, or Na4P2O7.

6. The activated fluorination reagent of claim 1, wherein a ratio of the first salt to the second salt is about 1:0.5 to 1:100.

7. The activated fluorination reagent of claim 6, wherein a ratio of the first salt to the second salt is about 1:1 to 1:5.

8. The activated fluorination reagent of claim 5, wherein the activated fluorination reagent comprises <1 ppm of HF.

9. The activated fluorination reagent of claim 7, wherein a powder x-ray diffraction spectrum of the activated reagent comprises characteristic 2θ reflections at about 18.0°, 18.7°, 21.9°, 22.6°, 24.5°, 25.4°, 26.5°, 27.0°, 28.0°, 29.2°, 30.3°, 31.6°, 33.0°, 34.8°, 36.4°, 37.70, 39.50, 40.4°, 41.7°, 42.4°, 43.4°, 46.1°, 48.4°, 49.40, 52.8°, and/or 53.9°.

10. The activated fluorination reagent of claim 7, wherein a powder x-ray diffraction spectrum of the activated reagent comprises at least three characteristic 2θ reflections selected from the group of about 18.0°, 18.7°, 21.9°, 22.6°, 24.5°, 25.4°, 26.5°, 27.0°, 28.0°, 29.2°, 30.3°, 31.6°, 33.0°, 34.8°, 36.4°, 37.70, 39.50, 40.4°, 41.7°, 42.4°, 43.4°, 46.1°, 48.4°, 49.4°, 52.8°, and 53.9°.

11. The activated fluorination reagent of claim 7, wherein a powder x-ray diffraction spectrum of the activated reagent comprises characteristic at least four 2θ reflections selected from the group of about 18.0°, 18.7°, 21.9°, 22.6°, 24.5°, 25.4°, 26.5°, 27.0°, 28.0°, 29.2°, 30.3°, 31.6°, 33.0°, 34.8°, 36.4°, 37.70, 39.50, 40.4°, 41.7°, 42.4°, 43.4°, 46.1°, 48.4°, 49.4°, 52.8°, and 53.9°.

12. The activated fluorination reagent of claim 7, wherein a powder x-ray diffraction spectrum of the activated reagent comprises characteristic 2θ reflections at about 21.9°, 30.3°, 31.6°, and 43.4°.

13. The activated fluorination reagent of claim 7, wherein a powder x-ray diffraction spectrum of the activated reagent comprises characteristic 2θ reflections at about 18.0°, 18.7°, 21.9°, 22.6°, 24.5°, 25.4°, 26.5°, 27.0°, 28.0°, 29.2°, 30.3°, 31.6°, 33.0°, 34.8°, 36.4°, 37.70, 39.50, 40.4°, 41.7°, 42.4°, 43.4°, 46.1°, 48.4°, 49.40, 52.8°, and 53.9°.

14. The activated fluorination reagent of claim 12, wherein each of the characteristic 2θ reflections has a relative intensity of at least 1% when normalized to the highest peak.

15. The activated fluorination reagent of claim 14, wherein each of the characteristic θ reflections has a relative intensity of at least 5% when normalized to the highest peak of a background subtracted powder x-ray diffraction spectrum wherein at least the peaks corresponding to the first and second salt are subtracted.

16. The activated fluorination reagent of claim 15, wherein the first salt is CaF2.

17. The activated fluorination reagent of claim 15, wherein the first salt is Ca5(PO4)3F.

18. The activated fluorination reagent of claim 16, wherein the second salt is Na2HPO4, K2HPO4, NaH2PO4, KH2PO4, Na3PO4, K3PO4, K4P2O7, KPO3, K5P3O10, Na5P3O10, or Na4P2O7.

19. The activated fluorination reagent of claim 17, wherein the second salt is Na2HPO4, K2HPO4, NaH2PO4, KH2PO4, Na3PO4, K3PO4, K4P2O7, KPO3, K5P3O10, Na5P3O10, or Na4P2O7.

20. The activated fluorination reagent of claim 18, wherein the activated fluorination reagent comprises <1 ppb of HF.