ELASTIC EMISSIONS MACHINING SYSTEMS AND METHODS THEREOF
An elastic emission machining apparatus includes a machining element having a non-spherical shape that is configured to spin about an axis of rotation, a tank, and a driving system. The tank has a chamber positioned to receive the machining element and a slurry comprising a mixture of a liquid and chemically reactive fine particles. The driving system is coupled to and configured to engage the machining element to spin about the axis of rotation adjacent to a surface of the workpiece to accelerate the chemically reactive fine particles through a gap between the machining element and the surface of the workpiece.
This application claims the benefit of U.S. Provisional Patent Application No. 63/411,434, filed Sep. 29, 2022, which is hereby incorporated by reference in its entirety.
FIELDThe technology generally relates to systems and methods for precisely machining the surface of an article of manufacture, and, more particularly, for the fine figuring of an optical element using an elastic emission machining process.
BACKGROUNDTraditionally optical surfaces have been polished with so-called chemical-mechanical polishing (CMP) processes, such as that shown in
However, this particular CMP example is limited to spherical-shaped workpiece surfaces as only spherical-shaped workpiece and pad surfaces have full contact across their operative surfaces (assuming they both have the same radius of curvature). Nonetheless CMP figuring and polishing can produce optical surfaces having a roughness of less than 10 nm RMS and peak-to-valley figure error of less than 20 nm.
Elastic Emission Machining, or EEM, is a process for finishing (i.e., polishing and figuring) the surface of an optical element, including spherical, aspherical, cylindrical, acylindrical, free-form, etc., such as a mirror or the surface of a lens, with great precision. A typical prior art EEM system 50, as shown in
Continuing with reference to
In operation the surface 66 of the spinning spherical machining element 64 does not come into actual physical contact with the surface 72, but instead is placed within a few microns of surface 72 at its closest point of contact. As the spherical machining element 64 spins, particulates within the slurry 78 are drawn through the gap between surface 72 and the spinning spherical machining element 64 by the rotational action of the spinning spherical machining element 64, and these particulates subsequently come into contact with the surface 72 and, accordingly, cause material to be removed from the surface 72 of the workpiece 70. Indeed, to a first order approximation, the amount of material removed from the surface 72 is proportional to the distance or space between the surface 72 and the spherical machining element 64. Since the machining element 64 in the prior art is spherical, the machining element 64 will impart a spherical-shaped divot, such as the spherical machining mark 94 illustrated in
As shown in
An elastic emission machining apparatus includes a machining element having a non-spherical shape that is configured to spin about an axis of rotation, a tank, and a driving system. The tank has a chamber positioned to receive the machining element and a slurry comprising a mixture of a liquid and chemically reactive fine particles. The driving system is coupled to and configured to engage the machining element to spin about the axis of rotation adjacent to a surface of the workpiece to accelerate the chemically reactive fine particles through a gap between the machining element and the surface of the workpiece.
A method of making an elastic emission machining apparatus includes providing a machining element having a non-spherical shape and that is configured to spin about an axis of rotation. A chamber of a tank is positioned to receive the machining element and a slurry comprising a mixture of a liquid and chemically reactive fine particles. A driving system is coupled to and is configured to engage the machining element to spin about the axis of rotation adjacent to a surface of the workpiece to accelerate the chemically reactive fine particles through a gap between the machining element and the surface of the workpiece.
An elastic emission machining system for polishing, smoothing, and/or figuring the surface of an article of manufacture, such as an optical device including mirrors and lenses, in which a spinning elastic emission machining element in close proximity to the surface and submerged in a slurry causes particulates in the slurry to remove material from the surface in accordance with the shape of the elastic emission machining element. The elastic emission machining element have a non-spherical shape, including toroidal, atoroidal, ellipsoidal, acylindrical, aspherical, and polynomial shapes, and have an axis of rotation about which the machining element spins during the elastic emission machining process. Examples of this technology retain the beneficial features of elastic emission machining systems found in the prior art, including but not limited to sub-nanometer RMS surface roughness and deterministic material removal at the atomic mono-layer level. Additionally, examples of this technology have the added benefits of non-circular machining marks, methods for precision machining element manufacturing, machine control over the gap distance, and polishing slurry compound control, which can improve the precision of the machining elements, reduce machining time, improve the quality of the machined surface figure, and increase the utility of the EEM system.
Accordingly, examples of the claimed technology provide a number of advantages including providing an EEM system that employs a non-spherical machining element, several methods for manufacturing the precision machining elements, machine control over the gap, and polishing slurry compound control. Non-spherical machining elements impart a non-spherical machining mark onto the surface being EEM'ed. Non-spherical machining marks can have large aspect ratios in which a first width of the machining mark is significantly smaller than a second width of the mark, for example, which can be advantageously employed by an EEM machine to improve the efficacy of the EEM process. The roughness and precision of the machining element impacts the removal stability as well as the texture of the surface left behind by the machining element. To achieve the desired roughness and precision of the machining element, special manufacturing of the machining element had to take place. Controlling the EEM gap dictates the removal rate as well as the surface roughness of the workpiece. The polishing slurry compound and fluid can be controlled as well to include differing polishing compounds, different polishing compound particle sizes, and changing the fluid medium will also dictate the removal rate and surface roughness of the workpiece.
Applications of examples of this technology include, but are not limited, to silicon mirror manufacturing for X-ray synchrotrons, silicon wafer polishing for high accuracy flat silicon wafers, high energy laser optical elements, X-ray telescope optical elements, and other high accuracy optical element applications.
The following detailed description of examples of this technology utilize a right-hand Cartesian coordinate system in which the Z-direction is the Up direction and the EEM machining element rotates about an axis parallel to the X-axis in the belt orientation (
Examples of this technology will now be described with reference to
Continuing with reference to
Elastic emission machining systems 100 or 150 can also include an X-Y workpiece stage 132 which can be integrated into one mechanism or implemented as two separate stages, such as X-stage 170 and Y-stage 172 as shown in
Elastic emission machining systems 100 or 150 can additionally include a force gauge 116 shown in
Elastic emission machining systems 100 or 150 can additionally include a Z and ⊖Y stage 134, as shown in the example in
As seen in
Referring more specifically to the example shown in
Referring more specifically to the example shown in
Referring to
Referring to
Drive arm 108 is coupled to drive head 102 at one end and is coupled to axle 114 at the other end and, in this example, provides rigid spacing of driven pulley 146 from drive pulley 144 so that the belt 106 remains taut. Drive arm 108 is also shaped to enclose belt 106 and drive arm 108 at least partially to contain any splashes of slurry 126 that may occur as belt 106 moves through the slurry 126. Drive arm 108 can be made of a material, or coated with a material, which is not reactive with any of the constituents of slurry 126.
Tachometer 112 shown in
Force gauge 116 or 166 shown in the examples in
Force gauge 116 can have a Z-force measurement range of from 0 to 500 Newtons, and accuracy of better than 0.1 Newton, and precision better than 0.01 Newton. The temporal response of force gauge 116 can be such that less than 10 ms of time can elapse from when a change in gap 200 width occurs until digital processor 180 receives data from Z-force gauge 116 that the gap change has occurred. Force gauge 116 can also be such that forces can be measured as vectors and the X, Y, and Z components of the force can be calculated.
The free body force diagram 202 in
The pH gauge 118, which is at least partially submerged in slurry 126 within tanks 128 or 178, is an electronic device for measuring the acidity or alkalinity of the slurry during the EEM process. The pH of the slurry 126, as known in the art, becomes more basic during the EEM process as material is machined or otherwise removed from surface 120 of workpiece 122 and accumulates in slurry 126. As such, monitoring the slurry can be used as an indicator to the operator of the elastic emission systems 100 or 150 that the slurry 126 needs replacement. The pH of the slurry is also correlated to the concentration of the particles that are dissolved or suspended in a fluid. This value is calibrated with the initial pure particulate in the fluid, and as the machining action is taking place is monitored for changes. Changes in pH value, as stated previously, can be used as in indicator to the operator of the lifetime status of the slurry. pH gauge 118 can have an accuracy of 0.1 on the pH scale, or preferably have an accuracy of better than 0.01 on the pH scale. Note that pH gauge 118 can alternately be in circulation system 137, such as downstream from pump 140, so that circulating slurry 126 can flow through pH gauge 118 after being pumped by pump 140.
Workpiece 122 is an article of manufacture whose surface 120 is being machined by any one of the examples of this technology. Workpiece 122 is coupled to workpiece holder 124 during the EEM process so that workpiece 122, and its surface 120, can be positioned in a known location, especially in relation to machining element 110, so that only the certain desired location(s) of surface 120 is processed. Workpiece 122 can have rotational symmetry, or its periphery can be polygonal, elliptical, or otherwise be asymmetric, and the edges can be square to the coordinate system of elastic emission systems 100 or 150 (i.e., not tilted with respect to the Z-axis as defined in
Surface 120 of workpiece 122 is a surface being processed by any one of the examples of this technology. Surface 120 can include a clear aperture that does not extend to the edge of workpiece 122 and within which the EEM processing takes place. Surface 120 can have rotational symmetry and be spherical or aspherical in form for example, have left-right symmetry and be cylindrical or acylindrical in form for example, be substantially planar, or have a free-form shape without any symmetry. The peak-to-valley range of departure of surface 120 from a best-fit plane can be from 10 nm to 200 mm. The roughness of surface 120 before being processed with the elastic emission machining systems 100 or 150 can be between 100 microns RMS and 0.1 nm RMS, while the roughness of surface 120 after being processed with the elastic emission machining system 100 or 150 can be between 100 nm RMS and 0.05 nm RMS although other pre- and post-processing roughness ranges are possible as well.
Workpiece holder 124 is a mechanical device that detachably secures workpiece 122 to X-Y stage 132 either directly or indirectly through the floor of tanks 128 or 178. Workpiece holder 124 therefore must have a mechanism to capture, clamp, bond, or fasten workpiece 122, and, importantly, do so without stressing workpiece 122 or imparting a change in shape to surface 120. Workpiece holder 124 can also support workpiece 122 so that workpiece 122 is not deformed in a manner that changes the shape of surface 120 during the EEM process when machining element 110 is in close proximity to, and imparting a force onto, surface 120.
Slurry 126 is a mixture of water or oil and small particles 226 that are uniformly dispersed within the fluid. The fluid can be ultrapure and de-ionized and de-oxygenated water for best control and/or performance of the EEM process. The fluid can also be a pure oil-based fluid for EEM processes where water is unacceptable as in materials which are hygroscopic in nature. Particles 226 can have a width less than 10 microns, or more preferably less than 1 micron, and in any event must have widths less than the width of gap 200 as shown in
E=E0(1+2.5*V) (Equation 1)
Where in the above equation, E0 is the viscosity of the dispersion medium, V is the volume being occupied by the assumed spherical particulate, and E is the viscosity of the mixture.
In each of the examples, tanks 128 or 178 are used to contain the slurry 126 and ensure that a stable volume of slurry 126 always surrounds machining element 110, workpiece 122 and workpiece surface 120. Tanks 128 or 178 can have transparent sidewalls for ease of visual inspection of the EEM process as it occurs, or tanks 128 or 178 can have opaque sidewalls. Tanks 128 or 178 can be substantially filled with slurry 126 and outfitted with an air-tight cover such that air is kept out of tanks 128 or 178 so that, for example, the slurry 126 never comes into contact with air thereby preventing ambient O2 from dissolving into the slurry 126 from the atmosphere. Alternately tanks 128 or 178 can be mostly filled with slurry 126 while also provided with an air-tight cover, and the top-most portion of the tank filled with a non-reactive gas such as nitrogen. Drive head 102 or 154, respectively, can be located within tanks 128 or 178 or located outside of tanks 128 or 178, but if located outside of tanks 128 or 178 and tanks 128 or 178 are provided with an air-tight cover then the cover should also have sealing provisions about drive arm 108 or axle 164, respectively, which prevent ambient air from reaching slurry 126. All components comprising tanks 128 or 178 that encounter slurry 126 can include materials that are non-reactive with the constituents of slurry 126.
Temperature control unit 130, which is at least partially submerged in slurry 126 within tanks 128 or 178 can include a thermometer 136 as well as a device for heating and/or cooling the slurry 126 as needed to maintain a substantially constant temperature of the slurry 126 during the EEM process. To maintain the predictability or repeatability of the removal rate of material from surface 120 of workpiece 122 during the EEM process, the temperature of the slurry should be maintained within a ±1° C. temperature range, or more preferably within a ±0.1° C. temperature range, and the temperature of the slurry should be substantially homogeneous throughout the volume of tanks 128 or 178. The thermometer 136 of temperature control unit 130 measures the temperature of slurry 126, and the measured temperature is provided as an input to the heater or cooler of temperature control unit 130, through digital processor 180 so the heater or cooler of temperature control unit 130 can be activated as necessary by digital processor 180 to heat or cool the slurry 126 as needed so that the temperature of slurry 126 is maintained within a prescribed temperature range. Note that temperature control unit 130 can alternately be located in circulation system 137, such as downstream from pump 140, so that circulating slurry 126 can flow through temperature control unit 130 after being pumped by pump 140.
Referring to
Referring to
Referring to
In the examples in
Circulation system 137 includes circulating pump 140, along with source hose 138 and return hose 142 form a circuit through which slurry can flow outside and around tanks 128 or 178 thereby providing a means of agitating, stirring, mixing, or otherwise homogenizing the distribution of particles 226 within the slurry 126. The connections, ports, or interface of the source hose 138 with tanks 128 or 178 can be as simple as a unitary hole in a sidewall of tanks 128 or 178 to which source hose 138 is coupled, or a plurality of holes in one or more sidewalls of tanks 128 or 178 which can provide a broader areal distribution of intake to the circulation system 137. Alternately the entrance port of source hose 138 can be well inside tanks 128 or 178, such as, for example, proximal to machining element 110. Similarly, the connections, ports, or interface of the return hose 142 with tanks 128 or 178 can be as simple as a unitary hole in a sidewall of tanks 128 or 178 to which return hose 142 is coupled, or a plurality of holes in one or more sidewalls of tanks 128 or 178 which can provide a broader areal distribution of return flow to the tanks 128 or 178. Alternately the output port of return hose 142 can be well inside tanks 128 or 178, such as, for example, proximal to machining element 110. The rate of flow of slurry through circulating pump 140 can be between 100 ml/minute and 100 ml/second, or as expressed as a percentage of tanks 128 or 178 volume the rate of flow of slurry through circulating pump 140 can be between 0.1% of the tank volume/minute to 100% of the tank volume/minute. Components of circulating system including circulating pump 140, source hose 138 and return hose 142, whose elements encounter circulating slurry 128 generally have those elements, such as an impeller of circulating pump 140 and the inner walls of source hose 138 and return hose 142, made of a material that do not interact with the particles 226 within the slurry 128, said materials therefore generally being polymeric and non-metallic. The inner diameter of source hose 138 and return hose 142 can be between 1.0 mm and 52 mm.
Circulating system 137 can also include a filter 139 that serves to capture and sequester spurious particles in slurry 128 that have widths that are larger than approximately 50% of the gap 200 so these particles are not wedged into gap 200 or scraped across surface 120 at the gap 200 thereby imparting an undesirable gouge or scratch into surface 120. Filter 139 can capture and sequester spurious particles in slurry 128 that have widths that are larger than 10 microns, or preferably those particles having widths greater than 4 microns.
Circulating system 137 can also include an O2 gauge 178 which is coupled into circulating system 137 in a manner that O2 gauge 178 can access and sample slurry 126 as it flows through circulating system 137 for O2 gauge 178 to measure the oxygen content within slurry 126 and report the oxygen measurement to digital processor 180. Knowing the O2 content of the slurry 126 is important because it is known to those skilled in the art that oxygen dissolved in slurry 126 degrades the EEM material removal process, and therefore it is necessary that the oxygen content of the slurry is measured and monitored to ensure the oxygen content remains below a minimum threshold during the EEM process. The oxygen content of the slurry 126 preferably remains below 10 PPM, and ideally below 1 PPM. O2 gauge 178 can have an accuracy of 1% of its O2 reading, a measurement range of from 0.1 PPM to 100 PPM for example, and a resolution of 0.01 PPM. Note that O2 gauge 178 can be located elsewhere in elastic emission machining systems 100 or 150, such as within tanks 128 or 178 instead of being part of circulating system 137.
Dissolved solids gauge 190 is a device that measures the proportion or concentration of particles 226 within slurry 126, wherein the size of particles that dissolved solids gauge 190 is responsive to is less than approximately 2 μm in size. Similarly, turbidity gauge 192 is also a device that measures the proportion or concentration of particles 226 within slurry 126, wherein the size of particles that turbidity gauge 190 is responsive to is greater than approximately 0.5 μm in size. Utilizing both dissolved solids gauge 190 and turbidity gauge 192 allows for the measurement and determination of the concentration of particles 226 within slurry 126 in which the size of the particles can span a broad range such as from, for example, 0.1 μm in width up to 10 μm in width.
Digital processor 180 can be or include a conventional microprocessor with an external memory 183 or digital processor 180 can be or include a microcontroller with all memory located onboard. In another example, digital processor 180 can be or include a digital signal processor (DSP) integrated circuit, which is a microcomputer that has been optimized for digital signal processing applications, including mathematical operations needed for control of the EEM process. Digital processor 180 can be as simple as a sixteen-bit integer system, a thirty-two-bit, sixty-four-bit, or higher, and/or a floating-point system for higher performance when cost is not an issue. Also, by way of example only, the digital processor 180 can be an FPGA (Field-programmable gate array) or a CPLD (complex programmable logic device). Note that digital processor 180 can be coupled to, or provided with, ports through which electronic communications can be performed with all the peripheral devices shown in
Operator interface 182 can include any device peripheral to digital processor 180 through which an operator inputs commands to the digital processor 180 or receives information from digital processor 180. Examples of peripheral devices for inputting commands to digital processor 180 include a keyboard, computer mouse, pen, trackball, or touch-pad. Examples of peripheral devices for outputting information from digital processor 180 to an operator include displays and monitors, printers, as well as audible signaling devices.
Memory 183 stores programmed instructions and data for performing the EEM process or controlling the EEM process by digital processor 180 as illustrated herein for execution by the processing unit, although some or all of these instructions and data may be stored elsewhere. A variety of different types of memory storage devices, such as a random-access memory (RAM), a read only memory (ROM), hard disk, CD ROM, USB thumb-drive, flash memory, or other computer readable medium which is read from and/or written to by a magnetic, optical, or other reading and/or writing system coupled to the processing unit, can be used for the memory.
Digital input port 186 is an electronic interface through which digital data originating in an external electronic device is input to digital processor 180. Typically, the external electronic device, such as an areal interferometer or scanning displacement-measuring probe, is located several meters away from digital processor 180, and a digital serial communication bus is used through which digital data, such as measured surface topography data of surface 120, is communicated, is connected between the external electronic device and digital input port 186. Digital serial communication bus can be a USB, RS-232, RS-422, or preferably an ethernet bus protocol, and digital input port 186 translates or reformats the data arriving over the communication bus into electronic signaling usable by digital processor 180.
Machining element 110 or 160 is a key component of the elastic emission systems 100 or 150, respectively, as machining element 110 or 160 is what causes the particles 226 within slurry 126 to be accelerated to a non-zero velocity and move rapidly past surface 120 of workpiece 122 causing material to be removed form surface 120 during the EEM process. Machining element 110 is coupled to axle 114 and spins or rotates about an axis 151 which is common both to axle 114 and machining element 110 and machining element 160 is coupled to rotate on axle 164. The rotational velocity of machining element 110 or 160 can be at least 100 RPM (revolutions per minute) but less than 15,000 RPM, with an angular velocity of between 100 and 5000 RPM being ideal. Machining element 110 or 160 has rotational symmetry about axis 151, and the outer periphery region of machining element 110 or 160, which is that region about apex 201 and proximal to gap 200 as will be described later, can have a circular cross section, an elliptical cross section, parabolic or polynomial cross section, a trapezoidal or piece-wise linear cross-section, or any combination of these. The outer diameter of machining element 110 or 160 can be between 4 mm and 400 mm, and the width of machining element at its maximum extent can be between 4 mm and 100 mm. Machining element 110 or 160 can include an elastic material such as an elastomer such as silicone, polyisoprene, polybutadiene, rubber, or any organic material such as a polymer such as polycarbonate or acrylic. Alternately machining element can include a metal such as aluminum or stainless steel, or a ceramic material. The roughness of the surface of machining element 110 or 160, particularly at the outer periphery region, can be between 2 nm RMS and 10 microns RMS, although a surface roughness that is the same as, or less than, a width of particles 226 within slurry 126 is preferable. Elastomeric machining element 110 or 160 may be stiff and rigid and be substantially inelastic, which would be the case if machining element 110 or 160 were includes a metal, or elastomeric machining element 110 or 160 may be elastic in nature in which, for example, the elasticity of the elastomeric machining element 110 or 160 can be less than 60 on the Shore D scale. By way of example as shown in
With the EEM process, machining element 110 or 160 can be, but is not limited to, being represented by a thick rubber machining element 235 or a thin shrink-wrapped rubber machining element 236. The surface of the machining elements 110 or 160 need to be high precision, because the surface texture of the machining element 110 or 160 is imparted into the workpiece surface 120. With this knowledge, the machining element 110 or 160 needs to be precision manufactured and polished to a surface roughness that is on the order of the particle 226 size, from 50 nm to 10 μm. This roughness can be achieved in a variety of ways. The polished metal body 230 needs to start with this roughness such that any imperfections in the polished metal body 230 will not print through to the rubber 231 that is molded around it or to the heat shrink wrapped rubber 232 that is fitted to the surface as shown in
Machining element 110 or other machining elements as illustrated and described by way of the examples herein can have the shape of toroidal machining element 210 as illustrated in
Machining element 110 or other machining elements as illustrated and described by way of the examples herein can alternately have the shape of an asphere as defined by,
where C is the curvature (inverse of the radius), x is the radial distance from the apex of the tool, k is the conic constant, and An is the nth order aspheric coefficient.
Machining element 110 or other machining elements as illustrated and described by way of the examples herein can alternately have the shape of an elliptical machining element 250 as illustrated in
Machining element 110 or other machining elements as illustrated and described by way of the examples herein can alternately have the shape of polynomial machining element 300 as illustrated in
D=R+k2x2+k4x4+k6x6+ . . . etc. (Equation 3)
where k2, k4, and k6 are constants. Note that Equation 3 represents an even 6th order polynomial, although polynomials of other orders such as 2 (representing a parabola), 4, 8, 10, or higher, are possible as well, as is an odd polynomial in which case polynomial machining element 300 does not have left-right symmetry. An outer periphery 302 of polynomial machining element 300 is that portion of polynomial machining element 300 that is proximal to and includes the apex of polynomial machining element 300 and engages with gap 200 and performs the machining of surface 120.
An example of a machining mark 400 installed in a surface 120 by elastic emission machining system 100 having a non-spherical machining element 110 such as toroidal machining element 210 is illustrated in
Note that if the quantity WY of eccentric machining mark 400 of
An additional benefit of an eccentric machining element as compared to a spherical machining element is that an eccentric machining element has less surface area and therefore has less total areal contact with slurry 126. Since slurry 126 has a non-zero viscosity, then the slurry 126 acts to resist the rotational motion of the machining element when it is submerged in slurry, and this resistance is in accordance with the contact or surface area of the machining element. A machining element, such as exemplary toroidal machining element 210, elliptical machining element 250, polynomial machining element 300 having less surface area than prior art (spherical) machining element 64, will have less rotational resistance and can therefore spin faster for a given motor 104 power, or at an equivalent rotational speed with a lower powered motor 104.
The operation of elastic emission system 100 will now be described with reference to
Note that tool path calculations will incorporate other factors, variables, and parameters into the calculations to improve the performance of the deterministic EEM process, including, but not limited to, the temperature of the slurry 126, the pH of the slurry 126, the oxygen content of the slurry 126, the type and size of particulates 226 in slurry 126, the concentration of the particles 226 in slurry 126, the nominal gap 200 between machining element 110 and surface 120, and the rotational speed of machining element 110.
Next workpiece 122 is mechanically coupled to workpiece holder 124 in a known position relative to the coordinate system of the elastic emission machining system 100 so the desired toolpath on surface 120 substantially coincides with the path that machining element 110 will actually follow during EEM processing of surface 110 as described below. If not already prepared, the slurry 126 is then prepared in accordance with the parameters assumed by the tool path calculating algorithm, and the tanks 128 or 178 is then filled with the slurry. Circulating pump 140 is then activated by digital processor 180 and accordingly slurry 126 begins to flow through circulation system 137 as well as through tanks 128 or 178, and any oversized particles or contaminants in slurry 126 are removed by filter 139. At this time digital processor 180 receives slurry 126 temperature information from thermometer 136 and activates temperature control unit 130 to cool or heat slurry 126 as necessary so the temperature of slurry 126 becomes substantially the same as the slurry temperature assumed by the tool path calculating algorithm. At this time digital processor 180 receives slurry 126 oxygen content information from O2 gauge 178, and if the slurry 126 oxygen content is substantially different than that value assumed by the tool path calculating algorithm then the tool path calculating algorithm may be re-executed by digital processor 180 to account for the actual oxygen content of slurry 126. Similarly, at this time digital processor 180 receives slurry 126 pH information from pH gauge 118, and if the slurry 126 pH is substantially different than that value assumed by the tool path calculating algorithm then the tool path calculating algorithm may be re-executed by digital processor 180 to account for the actual pH of slurry 126.
After the temperature of the slurry 126 has stabilized and the properties of slurry 126 are in conformance with those slurry properties assumed by the tool path calculating algorithm, the actual EEM processing of surface 120 can begin. At this juncture the angle of the θY-stage 176 is set by digital processor 180 to that angle prescribed by the tool path calculating algorithm at the start of the tool path, the X-stage 170 is set by digital processor 180 to that position prescribed by the tool path calculating algorithm at the start of the tool path, and the Y-stage 172 is set by digital processor 180 to that position prescribed by the tool path calculating algorithm at the start of the tool path. At this time digital processor 180 activates motor 104 which causes machining element 110 to spin accordingly, and while motor 104 is activated digital processor also receives information from tachometer 112 about the speed of motor 104 and/or machining element 110 whereafter digital processor 180 issues commands to motor 104 that cause the rotational speed of machining element 110 to accelerate or decorate as needed to conform to the rotational speed of machining element 110 assumed by the tool path computing algorithm. Next digital processor 180 receives information from Z-force gauge 116 at the same time digital processor 180 activates Z-stage 174 causing drive head 102 and all associated components including machining element 110 to lower thereby causing machining element 110 to approach surface 120. As the drive head 102, etc., is being lowered by Z-stage 174 under the control of digital processor, the width of gap 200 is decreasing accordingly. When the gap 200 narrows sufficiently an opposing force will be generated by the dynamics of the slurry 126 within the gap 200, and this opposing force will be detected by Z-force gauge 116 and input to digital processor 180 which will use the force information as a proxy to the actual width of gap 200 (assuming an a priori relationship has been established between the force and the width of the gap 200). Once the desired gap 200 width has been reached, digital processor 180 issues new commands to Z-stage 174 to maintain this gap width.
At this juncture the spinning machining element 110 is at the nominal starting location (and nominal EEM processing conditions) relative to the surface 120 of workpiece 122. From this juncture it is a straightforward process for the digital processor 180 to execute the toolpath computed by the tool path computing algorithm, which is done by causing the machining element 110 to be translated in the X-direction by X-stage 170, causing the machining element 110 to be translated in the Y-direction by Y-stage 172, causing the machining element 110 to be rotated about the Oy-direction by Oy-stage 176, and causing the machining element 110 to be translated in the Z-direction by Z-stage 174 under the control of digital processor 180. During this process digital processor 180 receives information from Z-force gauge 116 about the width of gap 200 and accordingly digital processor 180 issues positioning commands to Z-stage 174 to maintain a nominal width of gap 200. Similarly, digital processor 180 continues to receive information from tachometer 112 and there-after issues commands to motor 104 in real-time to maintain a substantially constant rate of rotation of machining element 110. This process continues until the machining element 110 runs the entire length of the computed toolpath over surface 120, which may take between one second for small surfaces requiring minimal surface figuring to ten days for bigger surfaces requiring large amounts of surface figuring. The removal rate of material from the surface 120 of workpiece 122 by the machining element 100 of the described EEM process can be between ten seconds per atomic monolayer to ten atomic monolayers per second.
After the machining element 110 has run the entire length of the computed toolpath, the EEM figuring process of surface 120 is complete and the digital processor 180 issues commands to Z-stage 174 to retract and cause machining element 110 to be raised upward, away from surface 120, to its home position. Similarly, there-after digital processor 180 issues commands to X-stage 170, Y-stage 172, and θY-stage 176, so that each of these stages are also returned to their home positions. At this juncture machining element 110 can be removed from axle 114 and workpiece 122 can be removed from workpiece holder 124. Circulation pump 140 may remain ON so that slurry 126 remains in circulation and stays in a state of homogeneity for the next EEM process. Similarly, digital processor 180 may continue to receive information from thermometer 136 and accordingly issue commands to temperature control unit 130 to heat or cool the slurry 126 as needed to maintain the temperature of the slurry 126 at a prescribed temperature in anticipation of the next EEM process.
After removal from tanks 128 or 178 surface 120 is carefully cleaned of slurry 126 and then inspected with an areal interferometer or scanning displacement-measuring probe wherein its post-EEM-process surface figure is measured. If the remaining surface errors exceed a prescribed limit, then the new surface figure data from the metrology process are input to digital processor 180 through digital input port 186 and the above EEM process is repeated. This deterministic metrology—toolpath determination—EEM process can be executed multiple times until the surface figure error of surface 120 is less than a specified threshold.
Note that elastic emission system 100 is a four-axis system, utilizing motion control in the X, Y, Z, and θY axes. Alternate configurations having different numbers of axes such as three (in which one axis of motion is removed, such as the θY axis for example), five (in which one axis of motion is added, such as the θZ axis in which the workpiece 124 is rotated about an axis parallel to the Z-axis for example), or even six (in which two axes of motion are added, such as the θZ described above as well as a θX axis in which force gage 116 and all components coupled thereto rotate about an axis parallel to the X-axis for example). Note that adding axes of motion improves the versatility of the elastic emission system while removing one or more axes significantly diminishes the versatility of the elastic emission system while also reducing its cost and complexity. Additionally, the configuration of the axes relative to the workpiece 120 and machining element 110 can be re-arranged, such that, for example, the X and Y translation stages (170 and 172, respectively) cause the machining element 110 to move in X and Y instead of the workpiece 120, and the Z translation stage 174 can be configured to make the workpiece 120 move in the Z-direction instead of the machining element 110. Numerous other configurations of the motion stages and their respective translational and rotational actions are possible as well. Further, the same exemplary process can be used with the other examples illustrated and described herein, such as shown in
Elastic emission system 150 as illustrated in
Drive motor 154 can be a brushless DC motor or, less preferably, an AC motor that operates with standard 60 Hz grid power. Drive motor 154 can be controlled by digital processor 180 such that digital processor 180 can control the rotational speed of drive motor 154, or even activate or de-activate motor 154 as needed. Drive motor 154 speed control is needed so that the rotational speed of machining element 160 can be controlled by digital processor 180, which is needed to accommodate EEM process variations such as, for example, variations in gap 200 width or changes in slurry 126 temperature. Drive motor 154 can range in power from 1.0 Watts up to 250 Watts.
Yet another example utilizing a novel non-spherically shaped machining element is illustrated in
As with machining element 110, broad machining element 610 is a key component of an elastic emission system as machining element 610 is what causes the particles 226 within slurry 126 to be accelerated to a non-zero velocity and move rapidly past surface 620 of workpiece 622 causing material to be removed form surface 620 during the EEM process. The rotational velocity of broad machining element 610 can be at least 3600 RPM (revolutions per minute) but less than 14,400 RPM, with an angular velocity of between 8,000 and 12,000 RPM being ideal. Broad machining element 610 has rotational symmetry about axis 602, and a cross section of broad machining element surface 610 can have a circular cross section, an elliptical cross section, parabolic or polynomial cross section, a trapezoidal or piece-wise linear cross-section, or any combination of these. The outer diameter of broad machining element 610 can be between 4 mm and 400 mm, and the diameter of broad machining element at its maximum extent can be between 4 mm and 100 mm. Broad machining element 610 can include an elastic material such as an elastomer such as silicone, polyisoprene, polybutadiene, rubber, or any organic material such as a polymer such as polycarbonate or acrylic. Alternately broad machining element 610 can include a ceramic material, or a metal such as aluminum or stainless steel although metals are not preferred because particles 226 in slurry 626 can often react with a metal. The roughness of the surface of broad machining element 610 can be between 2 nm RMS and 10 microns RMS, although a surface roughness that is the same as, or less than, a width of particles 226 within slurry 626 is preferable. Elastomeric broad machining element 610 may be stiff and rigid and be substantially inelastic, which would be the case if machining element were includes a metal, or elastomeric broad machining element 610 may be elastic in nature in which, for example, the elasticity of the elastomeric machining element 610 can be less than 60 on the Shore D scale.
The elasticity of the elastic machining elements described heretofore has been noted as being a key parameter in the control and, indeed, the capabilities, of the EEM process, which is even more pronounced when the machining element is eccentric (i.e., non-spherical).
Alternately,
Note further that the width and depth of a machining mark is proportional to the dwell time (i.e., the length of time that a machining element is EEM'ing a particular location on surface 120) when an inelastic machining element 800 is utilized, while only the depth of a machining mark is proportional to the dwell time when an elastic machining element 700 is utilized. Finally, it should be noted that with an elastic machining element 700, the centrifugal forces within elastic machining element 700 arising from its rotation about axis 704 may modify the magnitude of the forces 710. That is, the rotational speed of elastic machining element 700 may be used to control the generation of machining mark 720 which provides another means for controlling the EEM material removal process from a surface 120 along a toolpath.
Having thus described the basic concept of invention, it will be rather apparent to those skilled in the art that the foregoing detailed disclosure is intended to be presented by way of example only and is not limiting. Various alterations, improvements, and modifications will occur and are intended to those skilled in the art, though not expressly stated herein. These alterations, improvements, and modifications are intended to be suggested hereby, and are within the spirit and scope of the invention. Additionally, the recited order of processing elements or sequences, or the use of numbers, letters, or other designations, such as arrows in the diagrams, therefore, is not intended to limit the claimed processes to any order or direction of travel of signals or other data and/or information except as may be specified in the claims. Accordingly, the invention is limited only by the following claims and equivalents thereto.
Claims
1. An elastic emission machining apparatus comprising:
- a machining element having a non-spherical shape that is configured to spin about an axis of rotation;
- a tank with a chamber positioned to receive the machining element and a slurry comprising a mixture of a liquid and chemically reactive fine particles; and
- a driving system coupled to and configured to engage the machining element to spin about the axis of rotation adjacent to a surface of the workpiece to accelerate the chemically reactive fine particles through a gap between the machining element and the surface of the workpiece.
2. The apparatus as set forth in claim 1 wherein the machining element is configured to spin about the axis of rotation that extends in a direction substantially parallel to at least a portion of a surface of the workpiece.
3. The apparatus as set forth in claim 1 wherein the shape of the machining element is acylindrical.
4. The apparatus as set forth in claim 1 wherein the shape of the machining element is an ellipsoid.
5. The apparatus as set forth in claim 1 wherein the shape of the outer perimeter of the machining element is polynomial.
6. The apparatus as set forth in claim 1 wherein the shape of the machining element is aspherical.
7. The apparatus as set forth in claim 1 wherein the shape of the machining element is toroidal.
8. The apparatus as set forth in claim 1 wherein the shape of the machining element is cylindrical.
9. The apparatus as set forth in claim 1 wherein the machining element is coupled to an axle and further comprising motion control devices coupled to effect at least one axis of linear motion and at least one axis of angular motion of the machining element.
10. The apparatus as set forth in claim 1 wherein the thickness of the gap is greater than the width of the chemically reactive fine particles.
11. A method of making an elastic emission machining apparatus, the method comprising:
- providing a machining element having a non-spherical shape and that is configured to spin about an axis of rotation;
- positioning a chamber of a tank to receive the machining element and a slurry comprising a mixture of a liquid and chemically reactive fine particles; and
- coupling a driving system to and that is configured to engage the machining element to spin about the axis of rotation adjacent to a surface of the workpiece to accelerate the chemically reactive fine particles through a gap between the machining element and the surface of the workpiece.
12. The method as set forth in claim 11 wherein the machining element is configured to spin about the axis of rotation that extends in a direction substantially parallel to at least a portion of a surface of the workpiece.
13. The method as set forth in claim 11 wherein the shape of the machining element is acylindrical.
14. The method as set forth in claim 11 wherein the shape of the machining element is an ellipsoid.
15. The method as set forth in claim 11 wherein the shape of the outer perimeter of the machining element is polynomial.
16. The system as set forth in claim 11 wherein the shape of the machining element is aspherical.
17. The method as set forth in claim 11 wherein the shape of the machining element is toroidal.
18. The method as set forth in claim 11 wherein the shape of the machining element is cylindrical.
19. The method as set forth in claim 11 wherein the machining element is coupled to an axle and further comprising motion control devices coupled to effect at least one axis of linear motion and at least one axis of angular motion of the machining element.
20. The method as set forth in claim 11 wherein the thickness of the gap is greater than the width of the chemically reactive fine particles.
Type: Application
Filed: Sep 28, 2023
Publication Date: Apr 25, 2024
Inventors: Michael D. RINKUS (Rochester, NY), James F. MUNRO (Ontario, NY)
Application Number: 18/375,045