Mask
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Description
The broken lines in the drawings depict portions of the mask that form no part of the claimed design.
Claims
The ornamental design for a mask, as shown and described.
Referenced Cited
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Patent History
Patent number: D1008450
Type: Grant
Filed: Apr 26, 2021
Date of Patent: Dec 19, 2023
Assignee: KEC-TECH LTD (Shenzhen)
Inventor: Shixiong Wang (Shenzhen)
Primary Examiner: Jonathan J Han
Assistant Examiner: Amanda J Berlinski
Application Number: 29/780,537
Type: Grant
Filed: Apr 26, 2021
Date of Patent: Dec 19, 2023
Assignee: KEC-TECH LTD (Shenzhen)
Inventor: Shixiong Wang (Shenzhen)
Primary Examiner: Jonathan J Han
Assistant Examiner: Amanda J Berlinski
Application Number: 29/780,537
Classifications
Current U.S. Class:
Mask (D24/110.1)