Mask

- KEC-TECH LTD

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Description

FIG. 1 is a perspective view of a mask showing my new design;

FIG. 2 is another perspective view thereof;

FIG. 3 is a front elevational view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a left side elevational view thereof;

FIG. 6 is a right side elevational view thereof;

FIG. 7 is a top plan view thereof;

FIG. 8 is a bottom plan view thereof; and,

FIG. 9 is another perspective view of the mask thereof where the mask is in a configuration of use.

The broken lines in the drawings depict portions of the mask that form no part of the claimed design.

Claims

The ornamental design for a mask, as shown and described.

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Patent History
Patent number: D1008450
Type: Grant
Filed: Apr 26, 2021
Date of Patent: Dec 19, 2023
Assignee: KEC-TECH LTD (Shenzhen)
Inventor: Shixiong Wang (Shenzhen)
Primary Examiner: Jonathan J Han
Assistant Examiner: Amanda J Berlinski
Application Number: 29/780,537
Classifications
Current U.S. Class: Mask (D24/110.1)