Respiratory mask

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Description

FIG. 1 is a front top right perspective view of a respiratory mask;

FIG. 2 is a front elevation view of the respiratory mask of FIG. 1;

FIG. 3 is a rear elevation view of the respiratory mask of FIG. 1;

FIG. 4 is a left elevation view of the respiratory mask of FIG. 1;

FIG. 5 is a right elevation view of the respiratory mask of FIG. 1;

FIG. 6 is a top plan view of the respiratory mask of FIG. 1; and,

FIG. 7 is a bottom plan view of the respiratory mask of FIG. 1.

The material of a respiratory mask is one of synthetic resin, carbon/silicon material, fiber material and rubber material, or their combination.

Claims

The ornamental design for a respiratory mask, as shown and described.

Referenced Cited
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Patent History
Patent number: D1010805
Type: Grant
Filed: Jul 29, 2020
Date of Patent: Jan 9, 2024
Assignee: SHEMA CO., LTD. (Daejeon)
Inventor: Dae Ick Han (Daejeon)
Primary Examiner: Jonathan J Han
Assistant Examiner: Amanda J Berlinski
Application Number: 29/744,426
Classifications
Current U.S. Class: Mask (D24/110.1)