Polishing pad
Description
Claims
The ornamental design for a polishing pad, as shown and described.
Referenced Cited
U.S. Patent Documents
Foreign Patent Documents
Other references
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- Chemical Guys poliushing pad, Amazon reviews 2021, site visited Oct. 21, 2023, https://www.amazon.com/Chemical-Guys-BUFX114HEX5-Hex-Logic-Light-Medium/dp/B00OTW7JMM/.
Patent History
Patent number: D1011669
Type: Grant
Filed: Aug 26, 2022
Date of Patent: Jan 16, 2024
Inventor: Shengwang Fan (Xingtai)
Primary Examiner: John R Yeh
Application Number: 29/866,081
Type: Grant
Filed: Aug 26, 2022
Date of Patent: Jan 16, 2024
Inventor: Shengwang Fan (Xingtai)
Primary Examiner: John R Yeh
Application Number: 29/866,081
Classifications
Current U.S. Class:
Scraper, Duster, Mop, Or Sponge (D32/40);
D8/70