Polishing pad

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Description

FIG. 1 is a front elevation view of a polishing pad showing the new design;

FIG. 2 is a back elevation view thereof;

FIG. 3 is a left-side view thereof;

FIG. 4 is a right-side view thereof;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof;

FIG. 7 is a perspective view thereof; and,

FIG. 8 is a another perspective view thereof.

Claims

The ornamental design for a polishing pad, as shown and described.

Referenced Cited
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Foreign Patent Documents
306692372 July 2021 CN
307553850 September 2022 CN
Other references
  • Chemical Guys poliushing pad, Amazon reviews 2021, site visited Oct. 21, 2023, https://www.amazon.com/Chemical-Guys-BUFX114HEX5-Hex-Logic-Light-Medium/dp/B00OTW7JMM/.
Patent History
Patent number: D1011669
Type: Grant
Filed: Aug 26, 2022
Date of Patent: Jan 16, 2024
Inventor: Shengwang Fan (Xingtai)
Primary Examiner: John R Yeh
Application Number: 29/866,081
Classifications
Current U.S. Class: Scraper, Duster, Mop, Or Sponge (D32/40); D8/70