Mask

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Description

FIG. 1 is a top front right-side perspective view of a mask, showing my new design;

FIG. 2 is a bottom rear left-side perspective view thereof;

FIG. 3 is a front view thereof;

FIG. 4 is a rear view thereof;

FIG. 5 is a left-side view thereof;

FIG. 6 is a right-side view thereof;

FIG. 7 is a top view thereof; and,

FIG. 8 is a bottom view thereof.

Claims

The ornamental design for a mask, as shown and described.

Referenced Cited
U.S. Patent Documents
D435650 December 26, 2000 Kwok
D640011 June 14, 2011 Teng
10772371 September 15, 2020 Sabin
10835704 November 17, 2020 Heimbuch
D905847 December 22, 2020 Orman
D925726 July 20, 2021 Kim
D936906 November 23, 2021 Xin
D959644 August 2, 2022 Kim
D963157 September 6, 2022 Kim
D964658 September 20, 2022 McGinnis
D972717 December 13, 2022 Son
D973864 December 27, 2022 An
D980968 March 14, 2023 Hwang
20070251522 November 1, 2007 Welchel
20110297152 December 8, 2011 Duveen
20130139816 June 6, 2013 Proctor
20160129287 May 12, 2016 Danford
20210386134 December 16, 2021 Plank
20220008761 January 13, 2022 Adams
20220192289 June 23, 2022 Lee
20220331620 October 20, 2022 Gu
20230158345 May 25, 2023 Pathania
20230181942 June 15, 2023 Tian
Patent History
Patent number: D1012276
Type: Grant
Filed: May 3, 2021
Date of Patent: Jan 23, 2024
Inventor: Hui-Mei Chen (New Taipei)
Primary Examiner: Jonathan J Han
Assistant Examiner: Amanda J Berlinski
Application Number: 29/781,968
Classifications
Current U.S. Class: Mask (D24/110.1)