Mask
Description
Claims
The ornamental design for a mask, as shown and described.
Referenced Cited
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Patent History
Patent number: D1012276
Type: Grant
Filed: May 3, 2021
Date of Patent: Jan 23, 2024
Inventor: Hui-Mei Chen (New Taipei)
Primary Examiner: Jonathan J Han
Assistant Examiner: Amanda J Berlinski
Application Number: 29/781,968
Type: Grant
Filed: May 3, 2021
Date of Patent: Jan 23, 2024
Inventor: Hui-Mei Chen (New Taipei)
Primary Examiner: Jonathan J Han
Assistant Examiner: Amanda J Berlinski
Application Number: 29/781,968
Classifications
Current U.S. Class:
Mask (D24/110.1)