Mask

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Description

FIG. 1 is a perspective view of a mask, showing my new design;

FIG. 2 is a front elevation view thereof;

FIG. 3 is a rear elevation view thereof;

FIG. 4 is a left side elevation view thereof;

FIG. 5 is a right side elevation view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

Claims

I claim the ornamental design for a mask, as shown and described.

Referenced Cited
U.S. Patent Documents
5214804 June 1, 1993 Carey
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D638170 May 17, 2011 Chen
D657917 April 17, 2012 Chen
D666710 September 4, 2012 Godfrey
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D850760 June 11, 2019 Greenblat
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Foreign Patent Documents
307144402 March 2022 CN
307144403 March 2022 CN
Patent History
Patent number: D1028222
Type: Grant
Filed: Jun 10, 2022
Date of Patent: May 21, 2024
Inventor: Jae Won Shin (Seoul)
Primary Examiner: Daniel J Domino
Assistant Examiner: Lee D. Starr
Application Number: 29/842,213
Classifications