Eye mask
Latest Shenzhen JueYiEr Technology Co., Ltd. Patents:
Description
The broken lines shown in the drawings illustrate portions of the article and form no part of the claimed design.
Claims
The ornamental design for an eye mask, as shown and described.
Referenced Cited
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Patent History
Patent number: D1043780
Type: Grant
Filed: Oct 15, 2021
Date of Patent: Sep 24, 2024
Assignee: Shenzhen JueYiEr Technology Co., Ltd. (Shenzhen)
Inventor: Shaowei Cai (Shenzhen)
Primary Examiner: Maria J. Edwards
Assistant Examiner: Dina Michelle Hoeynck
Application Number: 29/811,619
Type: Grant
Filed: Oct 15, 2021
Date of Patent: Sep 24, 2024
Assignee: Shenzhen JueYiEr Technology Co., Ltd. (Shenzhen)
Inventor: Shaowei Cai (Shenzhen)
Primary Examiner: Maria J. Edwards
Assistant Examiner: Dina Michelle Hoeynck
Application Number: 29/811,619
Classifications
Current U.S. Class:
Opaque Or Perforated Mask (D16/301)