Contoured masking patch

- PLEASE ME LLC
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Description

FIG. 1 is a top front perspective view of a contoured masking patch showing my new design;

FIG. 2 is a top rear perspective view thereof;

FIG. 3 is a front elevation view thereof;

FIG. 4 is a rear elevation view thereof;

FIG. 5 is a right elevation view thereof, with the left elevation view being a mirror image thereof;

FIG. 6 is a top elevation view thereof;

FIG. 7 is a bottom elevation view of the embodiment; and,

FIG. 8 is a section view of the invention, taken along 8-8 in FIG. 3.

The stippling shown in the drawings illustrate an adhesive surface of the contoured masking patch.

Claims

The ornamental design for a contoured masking patch, as shown and described.

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Patent History
Patent number: D1043973
Type: Grant
Filed: Oct 4, 2019
Date of Patent: Sep 24, 2024
Assignee: PLEASE ME LLC (Brooklyn, NY)
Inventor: Eddie Sitt (Brooklyn, NY)
Primary Examiner: Justin M Jonaitis
Assistant Examiner: Holly M Rodriguez
Application Number: 29/708,260
Classifications
Current U.S. Class: Absorbent (17) (D24/124)