Mask

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Description

FIG. 1 is a front, left and top perspective view of a mask, showing my design.

FIG. 2 is a front elevation view thereof.

FIG. 3 is a rear elevation view thereof.

FIG. 4 is a left side elevation view thereof.

FIG. 5 is a right side elevation view thereof.

FIG. 6 is a top plan view thereof.

FIG. 7 is a bottom plan view thereof.

FIG. 8 is a front, left and top perspective view of a second embodiment of a mask.

FIG. 9 is a front elevation view of the second embodiment of the mask of FIG. 8.

FIG. 10 is a rear elevation view of the second embodiment of the mask of FIG. 8.

FIG. 11 is a left side elevation view of the second embodiment of the mask of FIG. 8.

FIG. 12 is a right side elevation view of the second embodiment of the mask of FIG. 8.

FIG. 13 is a top plan view of the second embodiment of the mask of FIG. 8; and,

FIG. 14 is a bottom plan view of the second embodiment of the mask of FIG. 8.

Claims

The ornamental design for a mask, as shown and described.

Referenced Cited
U.S. Patent Documents
D373744 September 17, 1996 Wotton
D386523 November 18, 1997 Allen
D523492 June 20, 2006 Saruhashi
D678433 March 19, 2013 Judkins
D703277 April 22, 2014 Scott
D748207 January 26, 2016 Luo
D750713 March 1, 2016 Chang
D785102 April 25, 2017 Ruffin, Jr.
D819759 June 5, 2018 Yen
D821508 June 26, 2018 Lyakhovich
D840580 February 12, 2019 Huang
D947296 March 29, 2022 Luo
D968239 November 1, 2022 Homer
D982678 April 4, 2023 Li
D986986 May 23, 2023 Cai
D988887 June 13, 2023 Homer
D1018720 March 19, 2024 Pandolfi
D1018745 March 19, 2024 Pandolfi
D1020082 March 26, 2024 Churakov
Patent History
Patent number: D1047021
Type: Grant
Filed: Oct 24, 2022
Date of Patent: Oct 15, 2024
Inventor: Chuanlin Li (Zhejiang)
Primary Examiner: Michael C Stout
Assistant Examiner: Melvin L Davis
Application Number: 29/857,633
Classifications
Current U.S. Class: Mask (D21/660); D2/869; Face, Mouth, Or Ear (D29/108)