Mask

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Description

FIG. 1 is a front, left and top perspective view of a mask, showing my design.

FIG. 2 is a front elevation view thereof.

FIG. 3 is a rear elevation view thereof.

FIG. 4 is a left side elevation view thereof.

FIG. 5 is a right side elevation view thereof.

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

Claims

The ornamental design for a mask as shown and described.

Referenced Cited
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Patent History
Patent number: D1048239
Type: Grant
Filed: Oct 24, 2022
Date of Patent: Oct 22, 2024
Inventor: Chuanlin Li (Zhejiang)
Primary Examiner: Michael C Stout
Assistant Examiner: Melvin L Davis
Application Number: 29/857,634
Classifications
Current U.S. Class: Mask (D21/660); D2/869; Face, Mouth, Or Ear (D29/108)