Bag
Description
2. Bag
2. Bag; the fine lines that are irregularly interrupted are meant to suggest the contour of the surface.
The broken lines in the drawings depict stitching and portions of the article that form no part of the claimed design.
Claims
The ornamental design for bag as shown and described.
Referenced Cited
U.S. Patent Documents
Other references
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- Mcmthailand, Instagram.com [online], Published Jun. 25, 2024, Viewed Jan. 10, 2025, https://www.instagram.com/mcmthailand/p/C8qiubJv_1U/?locale=zh-hans&img_index=2 (Year: 2024).
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Patent History
Patent number: D1116447
Type: Grant
Filed: Dec 22, 2023
Date of Patent: Mar 10, 2026
Assignee: MCM GLOBAL AG (Zug)
Inventor: Garyeong Seo (Seoul)
Primary Examiner: Jennifer L Rempfer
Assistant Examiner: John Patrick G Ribay
Application Number: 35/519,703
Type: Grant
Filed: Dec 22, 2023
Date of Patent: Mar 10, 2026
Assignee: MCM GLOBAL AG (Zug)
Inventor: Garyeong Seo (Seoul)
Primary Examiner: Jennifer L Rempfer
Assistant Examiner: John Patrick G Ribay
Application Number: 35/519,703
Classifications
Current U.S. Class:
D3/243