Ceiling fan

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Description

FIG. 1 is a perspective view of a first embodiment of a ceiling fan showing our new design;

FIG. 2 is another perspective view thereof;

FIG. 3 is a front elevational view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a left side elevational view thereof;

FIG. 6 is a right side elevational view thereof;

FIG. 7 is a top plan view thereof;

FIG. 8 is a bottom plan view thereof;

FIG. 9 is an enlarged view of portion 9 shown in FIG. 1;

FIG. 10 is a perspective view of a second embodiment of the ceiling fan;

FIG. 11 is another perspective view thereof;

FIG. 12 is a front elevational view thereof;

FIG. 13 is a rear elevational view thereof;

FIG. 14 is a left side elevational view thereof;

FIG. 15 is a right side elevational view thereof;

FIG. 16 is a top plan view thereof;

FIG. 17 is a bottom plan view thereof; and,

FIG. 18 is an enlarged view of portion 18 shown in FIG. 10.

The dash-dash broken lines in the drawings depict portions of the ceiling fan that form no part of the claimed design. The dot-dash broken lines in FIGS. 1, 9-10 and 18 represent boundaries of the enlarged portions and form no part of the claimed design.

Claims

The ornamental design for a ceiling fan as shown and described.

Referenced Cited
U.S. Patent Documents
D750218 February 23, 2016 Gajewski
D759228 June 14, 2016 Gajewski
D780904 March 7, 2017 Gajewski
D873458 January 21, 2020 Holmes
D890319 July 14, 2020 Kraemer
D948024 April 5, 2022 Wang
D957616 July 12, 2022 Dalton
D960346 August 9, 2022 Lintner
D1002048 October 17, 2023 He
D1006978 December 5, 2023 Li
D1040326 August 27, 2024 Chen
D1043949 September 24, 2024 Chen
D1050517 November 5, 2024 Liang
D1051332 November 12, 2024 Chen
D1065490 March 4, 2025 Benacquisto
D1080849 June 24, 2025 Xue
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D1107208 December 23, 2025 Lintner
D1107284 December 23, 2025 Lintner
Patent History
Patent number: D1127192
Type: Grant
Filed: Nov 7, 2024
Date of Patent: May 19, 2026
Assignee: SHENZHEN HESUNG INTELLIGENCE LIMITED (Shenzhen)
Inventors: Jinglong Wang (Shenzhen), Lihu Wei (Shenzhen)
Primary Examiner: Janice Hallmark
Application Number: 29/972,030
Classifications