Mask

- DCSTAR INC
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Description

FIG. 1 is a front view of a mask showing my new design;

FIG. 2 is a rear view thereof;

FIG. 3 is a top view thereof;

FIG. 4 is a bottom view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a right side view thereof;

FIG. 7 is a perspective view thereof; and,

FIG. 8 is another perspective view thereof.

The broken lines depict portions of the mask that form no part of the claimed design.

The use of the symbol on the design article forming no part of the claimed design is a trademark under examination of DCSTAR INC.

Claims

The ornamental design for a mask, as shown and described.

Referenced Cited
U.S. Patent Documents
10926050 February 23, 2021 Eves
D936209 November 16, 2021 Eves
11471633 October 18, 2022 Baba
D1003431 October 31, 2023 Rothermel
D1019936 March 26, 2024 He
D1031973 June 18, 2024 He
D1053346 December 3, 2024 Rothermel
D1069102 April 1, 2025 He
D1084301 July 15, 2025 He
20090250061 October 8, 2009 Marasigan
Foreign Patent Documents
007984158-0005 January 2021 EM
015075473-0014 November 2024 EM
Patent History
Patent number: D1131784
Type: Grant
Filed: May 2, 2024
Date of Patent: Jun 23, 2026
Assignee: DCSTAR INC (New York, NY)
Inventor: Ligui He (New York, NY)
Primary Examiner: Daniel J Domino
Assistant Examiner: Lee D. Starr
Application Number: 29/940,524
Classifications