Cap for forming access opening to chamber

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Description

FIG. 1 is a top, front and left side isometric view of a first embodiment of a cap for forming access opening to chamber in accordance with the new design;

FIG. 2 is a front elevation view thereof;

FIG. 3 is a rear elevation view thereof;

FIG. 4 is a is a top plan view thereof

FIG. 5 is a bottom plan view thereof;

FIG. 6 is a left side elevation view thereof;

FIG. 7 is a right side elevation thereof;

FIG. 8 is a top, front and left side isometric view of a second embodiment of a cap for forming access opening to chamber in accordance with the new design;

FIG. 9 is a front elevation view thereof;

FIG. 10 is a rear elevation view thereof;

FIG. 11 is a is a top plan view thereof

FIG. 12 is a bottom plan view thereof;

FIG. 13 is a left side elevation view thereof; and,

FIG. 14 is a right side elevation thereof.

Claims

The ornamental design for a cap for forming access opening to chamber as shown and described.

Referenced Cited
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Foreign Patent Documents
217613 May 2024 CA
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Other references
  • “CP&P” May 1, 2024, Facebook.com, site visited Dec. 10, 2025: https://www.facebook.com/photo/?fbid=935953135206940&set=pcb.935953355206918 (Year: 2024).
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Patent History
Patent number: D1134700
Type: Grant
Filed: Apr 6, 2025
Date of Patent: Jul 14, 2026
Assignee: Cur-Tech, LLC (Stamford, CT)
Inventor: Frank J. Currivan (Riverside, CT)
Primary Examiner: Rachel A. Voorhies
Assistant Examiner: Matthew Bird
Application Number: 29/997,203
Classifications
Current U.S. Class: Treatment (D23/207)