Eye mask

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Description

FIG. 1 is a perspective view of an eye mask showing my new design;

FIG. 2 is a perspective view thereof from another angle;

FIG. 3 is a front elevational view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a left side elevational view thereof;

FIG. 6 is a right side elevational view thereof;

FIG. 7 is a top plan view thereof; and,

FIG. 8 is a bottom plan view thereof.

The broken lines in the drawings show portions of the eye mask that form no part of the claimed design.

Claims

The ornamental design for an eye mask, as shown and described.

Referenced Cited
U.S. Patent Documents
D648858 November 15, 2011 Hayton
D710514 August 5, 2014 Campbell
D889676 July 7, 2020 Chen
D909674 February 2, 2021 Xiong
D1037339 July 30, 2024 Dijkstra
D1038215 August 6, 2024 Liu
D1047217 October 15, 2024 Zhong
D1100237 October 28, 2025 Dijkstra
D1101953 November 11, 2025 Chen
D1112783 February 10, 2026 Dijkstra
D1112787 February 10, 2026 He
D1114278 February 17, 2026 Yamazaki
20190126060 May 2, 2019 Dijkstra
20240416070 December 19, 2024 Hanbury
20260021321 January 22, 2026 Chun
Patent History
Patent number: D1134910
Type: Grant
Filed: Jul 31, 2025
Date of Patent: Jul 14, 2026
Assignee: Shenzhen Boliya Technology Co., Ltd (Shenzhen)
Inventor: LingZhi Wang (Shenzhen)
Primary Examiner: Mary Shannon Malley
Application Number: 30/016,005
Classifications