VR mask

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Description

FIG. 1 is a perspective view of a VR mask showing our new design;

FIG. 2 is another perspective view thereof;

FIG. 3 is a front elevational view thereof;

FIG. 4 is a rear elevational view thereof;

FIG. 5 is a left side elevational view thereof;

FIG. 6 is a right side elevational view thereof;

FIG. 7 is a top plan view thereof;

FIG. 8 is a bottom plan view thereof; and,

FIG. 9 is an enlarged view of portion 9 shown in FIG. 1.

The dash-dash broken lines in the drawings depict portions of the VR mask that form no part of the claimed design. The dot-dash broken lines represent boundaries of the enlarged portions and form no part of the claimed design. The dash-dot-dot broken lines represent boundaries of the claim and form no part of the claimed design.

Claims

The ornamental design for a VR mask as shown and described.

Referenced Cited
U.S. Patent Documents
D142221 August 1945 Moeller
D950063 April 26, 2022 Jackson
D971210 November 29, 2022 Su
D971882 December 6, 2022 Meng
D973658 December 27, 2022 Li
D1001127 October 10, 2023 Hu
D1004574 November 14, 2023 Wen
D1045859 October 8, 2024 Liu
D1053868 December 10, 2024 Ma
D1054420 December 17, 2024 Anderson
D1054421 December 17, 2024 Anderson
D1054422 December 17, 2024 Ma
D1055057 December 24, 2024 Anderson
D1062729 February 18, 2025 Anderson
D1074673 May 13, 2025 Huang
D1075772 May 2025 Anderson
D1077820 June 3, 2025 Anderson
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Patent History
Patent number: D1146909
Type: Grant
Filed: Dec 30, 2024
Date of Patent: Sep 8, 2026
Assignee: Shenzhen Youban Zhihui Technology Limited (Shenzhen)
Inventors: Jinhong Fang (Shenzhen), Minliang Ruan (Shenzhen), Zhangcai Zhu (Shenzhen)
Primary Examiner: Austin Murphy
Application Number: 29/981,373
Classifications
Current U.S. Class: Head Mounted (D14/372)