Apertured nonwoven fabric

- Polymer Group, Inc.
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Description

FIG. 1 is a perspective view of a apertured nonwoven fabric showing my new design;

FIG. 2 is a side elevational view thereof taken along lines 2—2 of FIG. 1, the opposite side elevational view being a mirror image; and,

FIG. 3 is a top plan view thereof.

The broken lines surrounding the claimed design indicate that the apertured nonwoven fabric has indeterminate length and width. The broken lines form no part of the claimed design.

Claims

The ornamental design for a apertured nonwoven fabric, substantially as shown and described.

Referenced Cited
U.S. Patent Documents
D15291 August 1884 Whitman
D27114 May 1897 Cross
2158929 May 1939 Dunajeff
D194184 December 1962 Clauss
D205890 October 1966 Pink
D272957 March 6, 1984 Bergsland
D364040 November 14, 1995 Suskind
D371447 July 2, 1996 Williams
5688538 November 18, 1997 Barr et al.
5702663 December 30, 1997 Seemann
5876835 March 2, 1999 Noble et al.
6017597 January 25, 2000 Minakami
Patent History
Patent number: D465337
Type: Grant
Filed: May 15, 2001
Date of Patent: Nov 12, 2002
Assignee: Polymer Group, Inc. (North Charleston, SC)
Inventors: Keith Curtis (Benson, NC), Michael Putnam (Fuquay-Varina, NC)
Primary Examiner: Doris V. Coles
Assistant Examiner: T. Chase Nelson
Attorney, Agent or Law Firm: Wood, Phillips, Katz, Clark & Mortimer
Application Number: 29/142,005
Classifications
Current U.S. Class: D5/47; D5/1; D5/60
International Classification: 0506;