Apertured nonwoven fabric

- Polymer Group, Inc.
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Description

FIG. 1 is a front perspective view of an apertured nonwoven fabric embodying the present design;

FIG. 2 is a greatly enlarged fragmentary front elevation of a portion of the apertured nonwoven fabric within the rectangular area designated as 2 in FIG. 1, it being understood that this view is representative of the remainder of the apertured nonwoven fabric shown in FIG. 1.

FIGS. 3 and 4 are top and bottom plan views, respectively, of the apertured nonwoven fabric shown in FIG. 2;

FIG. 5 is a rear elevational view of FIG. 2; and,

FIGS. 6 and 7 are opposite end elevational views of FIG. 2 of the present apertured nonwoven fabric.

Claims

The ornamental design for an apertured nonwoven fabric, substantially as shown and described.

Referenced Cited
U.S. Patent Documents
1852936 April 1932 Nebel
D120632 May 1940 Sheplan
3485695 December 1969 Ness
3558412 January 1971 Kurz
3978257 August 31, 1976 Ring
4548856 October 22, 1985 Ali Khan et al.
4695500 September 22, 1987 Dyer et al.
4906513 March 6, 1990 Kebbell et al.
5916661 June 29, 1999 Benson et al.
Patent History
Patent number: D481872
Type: Grant
Filed: Sep 30, 2002
Date of Patent: Nov 11, 2003
Assignee: Polymer Group, Inc. (North Charleston, SC)
Inventors: Gary Hennel (Troutman, NC), John Walton (Raleigh, NC), Nick Carter (Mooresville, NC)
Primary Examiner: Doris V. Coles
Assistant Examiner: T. Chase Nelson
Attorney, Agent or Law Firm: Wood, Phillips, Katz, Clark & Mortimer
Application Number: 29/168,339
Classifications
Current U.S. Class: D5/47
International Classification: 0505;