Mask

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Description

FIG. 1 is a perspective view of a mask embodying my design;

FIG. 2 is an elevational front view thereof;

FIG. 3 is an elevational rear view thereof;

FIG. 4 is a right side elevational view thereof;

FIG. 5 is a left side elevational view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

Claims

The ornamental design for a mask, as shown and described.

Referenced Cited
U.S. Patent Documents
4729132 March 8, 1988 Fierro
D352046 November 1, 1994 Kataoka
5371555 December 6, 1994 Nagel
D363482 October 24, 1995 Robinson et al.
5724119 March 3, 1998 Leight
D397334 August 25, 1998 Larian
6009563 January 4, 2000 Swanson et al.
D439266 March 20, 2001 Rose
D440967 April 24, 2001 Jung
6511177 January 28, 2003 Hall et al.
20040160572 August 19, 2004 Jannard et al.
Patent History
Patent number: D505969
Type: Grant
Filed: Mar 19, 2004
Date of Patent: Jun 7, 2005
Assignee: Eastcolight (Hong Kong) Ltd. (Lai Chi Kok)
Inventor: Wa Sang Yeung (Kowloon)
Primary Examiner: Raphael Barkai
Attorney: Intellectual Property Law Group LLP
Application Number: 29/201,800