Polishing pad
Description
FIG. 1 is a perspective view of my design for a polishing pad;
FIG. 2 is a top plan view of my design shown in FIG. 1;
FIG. 3 is a bottom plan view of my design shown in FIG. 1;
FIG. 4 is a front view of my design shown in FIG. 1;
FIG. 5 is a back view of my design shown in FIG. 1;
FIG. 6 is a left side view of my design shown in FIG. 1; and,
FIG. 7 is a right side view of my design shown in FIG. 1.
The broken line showing of environmental structure is for illustrative purposes only and forms no part of the claimed design.
Claims
The ornamental design for a polishing pad, as shown and described.
Referenced Cited
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Patent History
Patent number: D510850
Type: Grant
Filed: Dec 20, 2002
Date of Patent: Oct 25, 2005
Assignee: Production Chemical Mfg. Inc. (Stockton, CA)
Inventor: Lewyn B. Boler, Jr. (Stockton, CA)
Primary Examiner: Gary D. Watson
Assistant Examiner: T. Chase Nelson
Attorney: John P. O'Banion
Application Number: 29/172,952
Type: Grant
Filed: Dec 20, 2002
Date of Patent: Oct 25, 2005
Assignee: Production Chemical Mfg. Inc. (Stockton, CA)
Inventor: Lewyn B. Boler, Jr. (Stockton, CA)
Primary Examiner: Gary D. Watson
Assistant Examiner: T. Chase Nelson
Attorney: John P. O'Banion
Application Number: 29/172,952
Classifications
Current U.S. Class:
D8/70