Whole face covering mask

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Description

FIG. 1 is a plan view of the whole face covering mask embodying our design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is a right side elevational view thererof; and,

FIG. 6 is a front elevational view thereof.

Claims

The ornamental design for a whole face covering mask, as shown and described.

Referenced Cited
U.S. Patent Documents
3259127 July 1966 Klinger et al.
D331988 December 22, 1992 Markert
D336546 June 15, 1993 Lybrand
D378610 March 25, 1997 Reischel et al.
D569502 May 20, 2008 Abel et al.
D574486 August 5, 2008 Betz et al.
Patent History
Patent number: D602154
Type: Grant
Filed: Jan 24, 2008
Date of Patent: Oct 13, 2009
Assignee: Shigematsu Works Co., Ltd. (Tokyo)
Inventors: Kenichi Ono (Saitama), Shuichiro Shimada (Saitama)
Primary Examiner: Ian Simmons
Assistant Examiner: Christopher Lee
Attorney: Flynn, Thiel, Boutell & Tanis, P.C.
Application Number: 29/294,735
Classifications
Current U.S. Class: Including Eye Shield (5) (D24/110.2)