Hat

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Description

FIG. 1 is a front, top and right-side perspective view of a hat embodying my design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left-side elevational view thereof, the right-side elevational view being a mirror image;

FIG. 5 is a top plan view thereof; and,

FIG. 6 is a bottom plan view thereof.

The stippled pattern shown intermittently on the surfaces of the claimed design represents the texture of fabric and is understood to be applied to the entire surface upon which the stippling occurs.

The broken lines shown in the drawings are stitch lines and form a part of the claimed design.

Claims

The ornamental design for a hat, as shown and described.

Referenced Cited
U.S. Patent Documents
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5966742 October 19, 1999 Cunliffe
5983398 November 16, 1999 Kronenberger
6016572 January 25, 2000 Park
D444292 July 3, 2001 Wang
6920644 July 26, 2005 Higgs
7020900 April 4, 2006 Ngan
7159247 January 9, 2007 Kim
D537239 February 27, 2007 Puett, III
D592834 May 26, 2009 Keiser
D614380 April 27, 2010 Lam et al.
D629183 December 21, 2010 Adams et al.
20020095715 July 25, 2002 Hong
20040003450 January 8, 2004 Wang
20070113319 May 24, 2007 Brinn et al.
Patent History
Patent number: D636562
Type: Grant
Filed: Nov 3, 2010
Date of Patent: Apr 26, 2011
Inventors: Sam Lam (Los Angeles, CA), Vicky Hoang (Los Angeles, CA)
Primary Examiner: Karen E Eldridge Powers
Attorney: Kelly, Lowry & Kelley, LLP
Application Number: 29/378,392
Classifications
Current U.S. Class: D2/882