Hat
Description
The stippled pattern shown intermittently on the surfaces of the claimed design represents the texture of fabric and is understood to be applied to the entire surface upon which the stippling occurs.
The broken lines shown in the drawings are stitch lines and form a part of the claimed design.
Claims
The ornamental design for a hat, as shown and described.
Referenced Cited
U.S. Patent Documents
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D537239 | February 27, 2007 | Puett, III |
D592834 | May 26, 2009 | Keiser |
D614380 | April 27, 2010 | Lam et al. |
D629183 | December 21, 2010 | Adams et al. |
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Patent History
Patent number: D636562
Type: Grant
Filed: Nov 3, 2010
Date of Patent: Apr 26, 2011
Inventors: Sam Lam (Los Angeles, CA), Vicky Hoang (Los Angeles, CA)
Primary Examiner: Karen E Eldridge Powers
Attorney: Kelly, Lowry & Kelley, LLP
Application Number: 29/378,392
Type: Grant
Filed: Nov 3, 2010
Date of Patent: Apr 26, 2011
Inventors: Sam Lam (Los Angeles, CA), Vicky Hoang (Los Angeles, CA)
Primary Examiner: Karen E Eldridge Powers
Attorney: Kelly, Lowry & Kelley, LLP
Application Number: 29/378,392
Classifications
Current U.S. Class:
D2/882