Mask

- ResMed Limited
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Description

FIG. 1 is a front view of a mask according to our design;

FIG. 2 is a rear view thereof;

FIG. 3 is a left side view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a top view thereof;

FIG. 6 is a bottom view thereof; and,

FIG. 7 is a partial enlarged exploded view of a portion of the mask.

The broken lines show environment or structure and are for illustrative purposes only, forming no part of the claimed design.

The dotted lines represent the border between claimed and unclaimed subject matter and forms no part of the claimed design.

The illustration of stitching in FIGS. 1-7, also in broken lines, is for illustrative purposes only and forms no part of the claimed designed.

The use of stippling for the cushion is an alternative form of shading compared to the headgear.

Claims

The ornamental appearance of a mask, as shown and described.

Referenced Cited
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Other references
  • Gunaratnam et al., U.S. Appl. No. 29/265,319, filed Aug. 30, 2006.
  • InnoMed Technologies, “Nasal-Pap Freestyle™” Brochure, 2004, 2 pages.
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  • Viasys Healthcare, “Lyra Nasal CPAP Interface” Brochure, 2004, 2 pages.
Patent History
Patent number: D656607
Type: Grant
Filed: Jun 8, 2009
Date of Patent: Mar 27, 2012
Assignee: ResMed Limited (Bella Vista)
Inventors: Michael K. Gunaratnam (Marsfield), Philip R. Kwok (Chatswood), Robin G. Hitchcock (Normanhurst), Lee J. Veliss (West Ryde), Memduh Guney (Killara), Richard Sokolov (Earlwood), Perry D. Lithgow (Moruya), Donald Darkin (Dural), Susan R. Lynch (Bella Vista), Rachael E. Moore (North Bondi)
Primary Examiner: Wan Laymon
Attorney: Nixon & Vanderhye P.C.
Application Number: 29/311,731