Support ring
Latest Patents:
- ANTIREFLECTIVE POLYMER AND HARDMASK COMPOSITION INCLUDING THE SAME
- COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
- EXPOSURE APPARATUS AND WIRING PATTERN FORMING METHOD
- DEBRIS CATCHER, ROTATING TARGET EXTREME ULTRAVIOLET (EUV) RADIATION GENERATION SYSTEM, METHOD OF GENERATING EUV RADIATION, METHOD OF INSPECTING PHOTOMASK, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- A PELLICLE CLEANING SYSTEM
Description
Claims
The ornamental design for a support ring, as shown and described.
Referenced Cited
Patent History
Patent number: D657176
Type: Grant
Filed: Jan 24, 2011
Date of Patent: Apr 10, 2012
Assignee: (Washington, DC)
Inventor: Marilyn Myres Stern (Washington, DC)
Primary Examiner: Susan Bennett Hattan
Assistant Examiner: Barbara B Lohr
Application Number: 29/372,844
Type: Grant
Filed: Jan 24, 2011
Date of Patent: Apr 10, 2012
Assignee: (Washington, DC)
Inventor: Marilyn Myres Stern (Washington, DC)
Primary Examiner: Susan Bennett Hattan
Assistant Examiner: Barbara B Lohr
Application Number: 29/372,844
Classifications
Current U.S. Class:
D6/580