Pack mask
Latest FUJIFILM Corporation Patents:
- Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device
- Image processing apparatus, method for operating image processing apparatus, and program for operating image processing apparatus
- Washing solution and washing method for semiconductor substrate
- Medical image processing device, operation method to derive indirect findings in medical image showing at least shapes and properties of tissue of a lesion, and operation program of medical image processing device
- Information processing apparatus, information processing method, and information processing program for supporting interpretation of images
Description
Claims
The ornamental design for a pack mask, as shown and described.
Referenced Cited
U.S. Patent Documents
| 1286326 | December 1918 | Howard |
| 2038275 | April 1936 | Fogg |
| 4585797 | April 29, 1986 | Cioca |
| 5026552 | June 25, 1991 | Gueret et al. |
| 5537687 | July 23, 1996 | Garza |
| 5706828 | January 13, 1998 | Shiota |
| D426019 | May 30, 2000 | Aoki et al. |
| D499509 | December 7, 2004 | Hiroi |
| D544146 | June 5, 2007 | Kawamata |
| D631603 | January 25, 2011 | Tajima |
| D646842 | October 11, 2011 | Roman |
| 20040231694 | November 25, 2004 | Rosenblatt |
Patent History
Patent number: D689651
Type: Grant
Filed: Jun 25, 2012
Date of Patent: Sep 10, 2013
Assignee: FUJIFILM Corporation (Tokyo)
Inventors: Fumi Kusuda (Kanagawa), Miki Kinai (Kanagawa)
Primary Examiner: Zenia Bennett
Application Number: 29/425,583
Type: Grant
Filed: Jun 25, 2012
Date of Patent: Sep 10, 2013
Assignee: FUJIFILM Corporation (Tokyo)
Inventors: Fumi Kusuda (Kanagawa), Miki Kinai (Kanagawa)
Primary Examiner: Zenia Bennett
Application Number: 29/425,583
Classifications
Current U.S. Class:
Applicator Or Template (2) (D28/7)