Face mask
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The broken lines shown in the drawings are only provided to illustrate the environment of the design, and form no part of the claimed design.
Claims
The ornamental design for a face mask, as shown and described.
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Type: Grant
Filed: Feb 21, 2012
Date of Patent: Jan 7, 2014
Assignee: Honeywell International Inc. (Morristown, NJ)
Inventors: Clay Sun (Shanghai), Yajun Edwin Zhang (Shanghai), Eric Xia (Shanghai), Zhao Xia Jin (Shanghai), Pete Madson (Shanghai)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/413,803