Mask for light exposure

- Lou T.S Co., Ltd.

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Description

FIG. 1 is a perspective view of a mask for light exposure according to the present design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a left view thereof;

FIG. 6 is a top view thereof;

FIG. 7 is a bottom view thereof; and,

FIG. 8 is an illustrative view of the mask in use showing the mask worn on the face of human.

The broken lines are included for the purpose of illustrating environmental structure and form no part of the claimed design.

Claims

The ornamental design for mask for light exposure, as shown and described.

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Patent History
Patent number: D711008
Type: Grant
Filed: Feb 25, 2013
Date of Patent: Aug 12, 2014
Assignee: Lou T.S Co., Ltd. (Gwangju)
Inventor: Sang Hyuck Park (Seoul)
Primary Examiner: Eric Goodman
Assistant Examiner: John Reickel
Application Number: 29/446,491
Classifications