Aeration nozzle
Latest Patents:
- ANTIREFLECTIVE POLYMER AND HARDMASK COMPOSITION INCLUDING THE SAME
- COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE
- EXPOSURE APPARATUS AND WIRING PATTERN FORMING METHOD
- DEBRIS CATCHER, ROTATING TARGET EXTREME ULTRAVIOLET (EUV) RADIATION GENERATION SYSTEM, METHOD OF GENERATING EUV RADIATION, METHOD OF INSPECTING PHOTOMASK, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- A PELLICLE CLEANING SYSTEM
The broken line showing is included for the purpose of illustrating and forms no part of the claimed design.
Claims
The ornamental design for an aeration nozzle, as shown and described.
Type: Grant
Filed: May 24, 2013
Date of Patent: May 26, 2015
Assignees: (Yamaguchi), (Fukuoka)
Inventor: Akinori Ikeda (Yamaguchi)
Primary Examiner: Robin V Webster
Application Number: 29/455,880